Patents by Inventor Miya (Yi-Cheng) Hsieh
Miya (Yi-Cheng) Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140040049Abstract: A video playback system includes a video distribution server and at least one information processing device. The video distribution server includes a video distribution portion that performs streaming distribution of a video stream, an alternative video distribution portion that distributes an alternative video, and a control information distribution portion that distributes control information. The information processing device includes a receiving portion that receives the video stream, the alternative video, and the control information, a storage portion that stores the alternative video and the control information, a video stream playback portion that performs streaming playback of the video stream, an alternative video playback portion that plays back the stored alternative video, and a playback switching control portion that, based on the stored control information, controls switching between the streaming playback and the playback of the alternative video.Type: ApplicationFiled: October 3, 2013Publication date: February 6, 2014Applicant: Sony CorporationInventors: Akinori Iida, Yukihisa Miya, Hidehiko Kakinuma, Kazumasa Sato
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Patent number: 8643962Abstract: A lens moving mechanism includes a guide shaft extending in an optical axis direction and a lens frame. The lens frame includes a transfer portion which follows movement of the nut member, which is screw-engaged with a lead screw of a motor. An effective length of the guide shaft is greater than that of the lead screw so that an end of the guide shaft and the motor overlap each other. Part of the fit-on portion of the lens frame is positioned where the end of the guide shaft and the motor overlap each other when the lens frame is at a lens-frame moving end, and is positioned to face the lead screw in a direction orthogonal to the optical axis when the lens frame is at the opposite lens-frame moving end.Type: GrantFiled: December 20, 2012Date of Patent: February 4, 2014Assignee: Hoya CorporationInventors: Kota Miya, Hiroshi Nomura
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Patent number: 8641829Abstract: Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.Type: GrantFiled: July 15, 2013Date of Patent: February 4, 2014Assignee: Hitachi Kokusai Electric Inc.Inventors: Tomoki Horita, Kazuhiro Hirahara, Hironobu Miya, Atsuhiko Suda, Hirohisa Yamazaki
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Patent number: 8623146Abstract: A cooling gas discharge nozzle 7 is arranged above an initial position P(Rin) distant from a rotation center P(0) of a substrate W toward the outer edge of the substrate W and supplies a cooling gas to the initial position P(0) of the rotating substrate W to solidify DIW adhering to an initial region including the initial position P(Rin) and the rotation center P(0). Following formation of an initial solidified region FR0, a range to be solidified is spread toward the outer edge of the substrate W and all the DIW (liquid to be solidified) adhering to a substrate surface Wf is solidified to entirely freeze a liquid film LF.Type: GrantFiled: January 19, 2012Date of Patent: January 7, 2014Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Masahiko Kato, Naozumi Fujiwara, Katsuhiko Miya
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Publication number: 20140004706Abstract: Provided is a plasma processing apparatus which includes a plurality of upstream-side expansion valves and a plurality of downstream-side expansion valves connected to respective refrigerant inlets and respective refrigerant outlets to adjust a flow rate or a pressure of a refrigerant flowing into the respective refrigerant inlets and a flow rate or a pressure of a refrigerant flowing out from the respective refrigerant outlets. Openings of the upstream-side expansion valves and openings of the downstream-side expansion valves are adjusted so that no change in flow rate of the refrigerant occurs in a plurality of refrigerant channels between the plurality of upstream-side expansion valves and the plurality of downstream-side expansion valves via the plurality of refrigerant channels in a refrigeration cycle allowing the refrigerant to flow therein.Type: ApplicationFiled: June 27, 2013Publication date: January 2, 2014Inventors: Go MIYA, Masaru IZAWA, Takumi TANDOU
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Patent number: 8619376Abstract: A lens support frame includes an annular body portion; a large diameter lens holding groove on an inner peripheral surface of the body portion which is open on one side; a small diameter lens holding groove formed on an inner peripheral surface of the body portion and is open on the one side; and large-diameter-groove and small-diameter-groove lens-bonding depressions formed on inner peripheral surfaces of a large diameter lens holding groove and the small diameter lens holding groove, respectively, and allow an adhesive to be injected into the large-diameter-groove and small-diameter-groove lens-bonding depressions through end openings thereof on the one side, the end opening of the small-diameter-groove lens-bonding depression being communicatively connected with the large-diameter-groove lens-bonding depression. Circumferential positions of the large-diameter-groove and small-diameter-groove lens-bonding depressions are mutually different.Type: GrantFiled: October 3, 2012Date of Patent: December 31, 2013Assignee: Hoya CorporationInventor: Kota Miya
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Publication number: 20130327939Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.Type: ApplicationFiled: August 20, 2013Publication date: December 12, 2013Applicant: HITACHI HIGH-TECHNOLOGIESInventors: Go MIYA, Seiichiro KANNO, Hiroyuki KITSUNAI, Masaru MATSUSHIMA, Toru SHUTO
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Patent number: 8589972Abstract: A video playback system includes a video distribution server and at least one information processing device. The video distribution server includes a video distribution portion that performs streaming distribution of a video stream, an alternative video distribution portion that distributes an alternative video, and a control information distribution portion that distributes control information. The information processing device includes a receiving portion that receives the video stream, the alternative video, and the control information, a storage portion that stores the alternative video and the control information, a video stream playback portion that performs streaming playback of the video stream, an alternative video playback portion that plays back the stored alternative video, and a playback switching control portion that, based on the stored control information, controls switching between the streaming playback and the playback of the alternative video.Type: GrantFiled: June 4, 2008Date of Patent: November 19, 2013Assignee: Sony CorporationInventors: Akinori Iida, Yukihisa Miya, Hidehiko Kakinuma, Kazumasa Sato
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Publication number: 20130298947Abstract: Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.Type: ApplicationFiled: July 15, 2013Publication date: November 14, 2013Inventors: Tomoki HORITA, Kazuhiro Hirahara, Hironobu Miya, Atsuhiko Suda, Hirohisa Yamazaki
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Publication number: 20130273589Abstract: A microfluidic cell culture apparatus includes a cell retention chamber and a perfusion channel. The cell retention chamber has a structured surface. The structured surface includes a major surface from which a plurality of projections extends into the chamber. The plurality of projections are arranged to suspend cells cultured in the chamber above the major surface. The first perfusion channel is configured to provide laminar flow of a fluid through the channel and forms a plurality of openings in communication with the cell retention chamber. The openings are configured to prevent cells from the retention chamber from entering the perfusion channel.Type: ApplicationFiled: June 6, 2013Publication date: October 17, 2013Inventors: Ronald Allen Faris, Vasiliy Nikolaevich Goral, Miya Yi-Cheng Hsieh, Odessa Natalie Petzold, Po Ki Yuen
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Publication number: 20130271611Abstract: An imaging device performs optimum focus correction at low cost with an autofocus device that moves a lens for focusing an image. The imaging device includes a camera signal processing part having a contrast signal generation part that extracts a high frequency component from a video signal and generates a contrast signal of the video signal based on the extracted high frequency component. The imaging device also has a controller that performs focus control based on the contrast signal. The controller performs an ON/OFF control of an infrared rays cut filter and includes a recording part to hold a set value of an ON/OFF state of the infrared rays cut filter. The camera signal processing part includes a signal conversion processing part to change a ratio of RGB of the video signal to be sent to the contrast signal generation part based on the set value.Type: ApplicationFiled: April 16, 2013Publication date: October 17, 2013Applicant: HITACHI, LTD.Inventors: Miya MORIMOTO, Tomoaki NISHIGUCHI
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Patent number: 8534452Abstract: Fixed amount discharging equipment for simultaneously discharging a particulate body from a plurality of containers containing the particulate body, comprising a casing to the interior of which is provided a belt conveyor and having a particulate body discharge hole below the carrying direction end of the belt conveyor, and a plurality of supply arranged in the carrying direction of the belt conveyor and passing through the casing, lower ends thereof penetrating into the casing and being arranged above the belt of the belt conveyor, the lower ends of the supply pipes being such that the downstream sides thereof in the belt carrying direction have notches of a predetermined length from the end faces upward.Type: GrantFiled: February 26, 2009Date of Patent: September 17, 2013Assignee: J-Power EnTech, Inc.Inventors: Kuninori Furuyama, Masahiro Miya, Ryo Suzuki
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Patent number: 8519332Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.Type: GrantFiled: June 29, 2012Date of Patent: August 27, 2013Assignee: Hitachi High-Technologies CorporationInventors: Go Miya, Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto
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Patent number: 8518165Abstract: An exhaust-gas treating apparatus, which includes an adsorption tower for removing various harmful substances in an exhaust gas using an adsorbent, a regeneration tower for releasing adsorbed substances from the adsorbent, a first transfer passage for transferring the adsorbent from the adsorption tower to the regeneration tower, a second transfer passage for transferring the adsorbent from the regeneration tower to the adsorption tower, a lock hopper connected to one end of the regeneration tower on a higher differential pressure side of a first differential pressure between an inside of the regeneration tower and an inside of the first transfer passage and a second differential pressure between the inside of the regeneration tower and an inside of the second transfer passage to thereby secure gas-tightness, a sealing unit connected to the other end of the regeneration tower on a lower differential pressure side to thereby secure gas-tightness, and an adjusting unit for maintaining the differential pressureType: GrantFiled: March 16, 2009Date of Patent: August 27, 2013Assignee: J—Power Entech, Inc.Inventors: Kuninori Furuyama, Masahiro Miya, Ryo Suzuki
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Patent number: 8506714Abstract: Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.Type: GrantFiled: January 24, 2007Date of Patent: August 13, 2013Assignee: Hitachi Kokusai Electric Inc.Inventors: Tomoki Horita, Kazuhiro Hirahara, Hironobu Miya, Atsuhiko Suda, Hirohisa Yamazaki
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Patent number: 8500888Abstract: A regeneration tower including a regeneration tower main body having a long trunk, and desorbed gas discharge passages through which a desorbed gas is discharged. The regeneration tower main body is configured so that a heating unit that heats an adsorbent, a separation part that separates desorbable substances as a desorbed gas from the heated adsorbent, and a cooling unit that cools the adsorbent from which the desorbable substances have been desorbed by heating are communicatively disposed in one direction and the heating unit and the cooling unit have approximately the same sectional outer diameter.Type: GrantFiled: March 16, 2009Date of Patent: August 6, 2013Assignee: J-Power EnTech, Inc.Inventors: Kuninori Furuyama, Masahiro Miya, Ryo Suzuki
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Patent number: 8481303Abstract: A microfluidic cell culture apparatus includes a cell retention chamber and a perfusion channel. The cell retention chamber has a structured surface. The structured surface includes a major surface from which a plurality of projections extends into the chamber. The plurality of projections are arranged to suspend cells cultured in the chamber above the major surface. The first perfusion channel is configured to provide laminar flow of a fluid through the channel and forms a plurality of openings in communication with the cell retention chamber. The openings are configured to prevent cells from the retention chamber from entering the perfusion channel.Type: GrantFiled: March 3, 2010Date of Patent: July 9, 2013Assignee: Corning IncorporatedInventors: Ronald A. Faris, Vasiliy N. Goral, Miya (Yi-Cheng) Hsieh, Odessa N. Petzold, Po Ki Yuen
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Patent number: 8481434Abstract: To remove the deposit including a high dielectric constant film deposited on an inside of a processing chamber, by using a cleaning gas activated only by heat. The method includes the steps of: loading a substrate or a plurality of substrates into the processing chamber; performing processing to deposit the high dielectric constant film on the substrate by supplying processing gas into the processing chamber; unloading the processed substrate from the inside of the processing chamber; and cleaning the inside of the processing chamber by supplying a halide gas and an oxygen based gas into the processing chamber, and removing the deposit including the high dielectric constant film deposited on the inside of the processing chamber, and in the step of cleaning the inside of the processing chamber, the concentration of the oxygen based gas in the halide gas and the oxygen based gas is set to be less than 7%.Type: GrantFiled: July 8, 2008Date of Patent: July 9, 2013Assignee: Hitachi Kokusai Electric Inc.Inventors: Hironobu Miya, Eisuke Nishitani, Yuji Takebayashi, Masanori Sakai, Hirohisa Yamazaki, Toshinori Shibata, Minoru Inoue
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Patent number: 8469334Abstract: A solenoid actuator (1) attached to hydraulic equipment comprises a shaft (5) connected to the hydraulic equipment, a plunger (4) fixed to the shaft (5), a coil (12) which magnetically drives the plunger (4), and a first bearing (7) and a second bearing (8) supporting the shaft (5) on either sides of the plunger (4). A plunger front chamber (74) is formed between the first bearing (7) and the plunger (4), and a plunger rear chamber (75) is formed between the plunger (4) and the second bearing (8). By providing a plunger exterior oil passage (63) on the outside of the plunger (4) to connect the plunger front chamber (74) to the plunger rear chamber (75), working oil flows through the plunger exterior oil passage (63) every time the plunger (4) strokes, thereby preventing a deposit of contaminant on the plunger (4) without increasing a stroke resistance of the plunger (4).Type: GrantFiled: November 2, 2009Date of Patent: June 25, 2013Assignee: Kayaba Industry Co., Ltd.Inventors: Hideki Yamagata, Mamoru Hosogai, Hideki Tsuchiya, Yoshiharu Miya, Tomoyuki Fujita, Koichiro Akatsuka, Kenji Yazaki
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Publication number: 20130146450Abstract: [Problems] To provide an ion-exchange membrane using an inexpensive nonwoven fabric sheet as a base sheet, featuring excellent properties such as strength, dimensional stability and shape stability, effectively suppressing undulation when it is brought into contact with the electrolyte, and having a low membrane resistance and stable properties. [Means for Solution] An ion-exchange membrane comprising a nonwoven fabric sheet 1 and an ion-exchange resin coating 3 formed on one surface of the nonwoven fabric sheet 1, the nonwoven fabric sheet 1 having a fiber layer structure that includes long filament layers 5 of a fiber diameter of 8 to 30 ?m on both surfaces thereof and an extra-fine filament layer 7 of a fiber diameter of not more than 5 ?m as an intermediate layer formed by melt-adhesion of fibers between the long filament layers 5.Type: ApplicationFiled: August 8, 2011Publication date: June 13, 2013Applicants: ASAHI KASEI FIBERS CORPORATION, ASTOM CORPORATIONInventors: Masayuki Kishino, Toshio Aritomi, Kiyotaka Yoshie, Minoru Yoshida, Tatsuhiko Miya, Ikuo Ueno