Patents by Inventor Miya (Yi-Cheng) Hsieh

Miya (Yi-Cheng) Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7811412
    Abstract: A substrate processing apparatus comprises a spin chuck holding and rotating a substrate and an atmosphere blocking member, corresponding in planar shape and size to the substrate, arranged oppositely and proximately to the upper surface of the substrate and formed with a processing solution discharge port and a gas discharge port discharging a processing solution and gas to the central portion of the upper surface of the substrate respectively. The atmosphere blocking member is formed with an outer gas discharge port outside the gas discharge port in plan view for discharging the gas to the upper surface of the substrate. The outer gas discharge port is so formed on the atmosphere blocking member that an arrival position of the gas discharged from the outer gas discharge port is closer to the center of the upper surface of the substrate held by a spin base than an intermediate portion between the center and the outer peripheral edge of the upper surface.
    Type: Grant
    Filed: August 27, 2003
    Date of Patent: October 12, 2010
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Katsuhiko Miya, Akira Izumi
  • Publication number: 20100253800
    Abstract: A focusing apparatus having a lead screw made of resin, both ends of which are supported by at least one stationary member to be freely rotatable, and a focusing lens group that is movable in an optical axis direction by rotation of the lead screw, the focusing apparatus includes a position detection sensor for detecting whether the focusing lens group is positioned at a reference position in the optical axis direction, and a focus detector which performs a focus-state detecting operation to detect a focus state of an object. The focusing apparatus moves the focusing lens group to a predetermined lens position in which the focus-state detecting operation is not performed, and the reference position is positioned in a close vicinity of the predetermined lens position.
    Type: Application
    Filed: March 30, 2010
    Publication date: October 7, 2010
    Applicant: HOYA CORPORATION
    Inventors: Kota MIYA, Kouhei OGUMA
  • Publication number: 20100233044
    Abstract: Adsorbent dust can be recovered while spraying is prevented. An apparatus is provided with a desulfurization-denitration tower body and an adsorbent discharging device. An entrance louver and an exit louver are provided for forming a packed moving bed of an adsorbent that moves downward inside the tower body, the apparatus has a throttle portion provided with a side panel that is inclined so that a spacing gradually decreases toward a discharging device, the throttle portion being provided between the tower body and the discharging device, and first partitions are provided inside the throttle portion. A second partition extending along the incline direction of the side panel is provided at a predetermined distance from the bottom end of the exit louver above the side panel, and a gap is provided between the bottom end part of the exit louver and the side panel of the throttle portion.
    Type: Application
    Filed: September 16, 2008
    Publication date: September 16, 2010
    Applicant: J-Power EnTech Inc.
    Inventors: Masahiro Miya, Koji Ono, Junya Mochida
  • Publication number: 20100233887
    Abstract: A production method for a semiconductor device comprising the first step of supplying a first reaction material to a substrate housed in a processing chamber to subject to a ligand substitution reaction a ligand as a reaction site existing on the surface of the substrate and the ligand of the first reaction material, the second step of removing the excessive first reaction material from the processing chamber, the third step of supplying a second reaction material to the substrate to subject a ligand substituted by the first step to a ligand substitution reaction with respect to a reaction site, the fourth step of removing the excessive second reaction material from the processing chamber, and a fifth step of supplying a third reaction material excited by plasma to the substrate to subject a ligand, not subjected to a substitution reaction with respect to a reaction site in the third step, to a ligand substitution reaction with respect to a reaction site, wherein the steps 1-5 are repeated a specified number
    Type: Application
    Filed: May 27, 2010
    Publication date: September 16, 2010
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hironobu Miya, Kazuyuki Toyoda, Norikazu Mizuno, Taketoshi Sato, Masanori Sakai, Masayuki Asai, Kazuyuki Okuda, Hideki Horita
  • Patent number: 7779785
    Abstract: Disclosed is a producing method of a semiconductor device comprising a first step of supplying a first reactant to a substrate to cause a ligand-exchange reaction between a ligand of the first reactant and a ligand as a reactive site existing on a surface of the substrate, a second step of removing a surplus of the first reactant, a third step of supplying a second reactant to the substrate to cause a ligand-exchange reaction to change the ligand after the exchange in the first step into a reactive site, a fourth step of removing a surplus of the second reactant, and a fifth step of supplying a plasma-excited third reactant to the substrate to cause a ligand-exchange reaction to exchange a ligand which has not been exchange-reacted into the reactive site in the third step into the reactive site, wherein the first to fifth steps are repeated predetermined times.
    Type: Grant
    Filed: February 15, 2006
    Date of Patent: August 24, 2010
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Hironobu Miya, Kazuyuki Toyoda, Norikazu Mizuno, Taketoshi Sato, Masanori Sakai, Masayuki Asai, Kazuyuki Okuda, Hideki Horita
  • Patent number: 7778224
    Abstract: A mobile station apparatus in a CDMA/TDD mobile communication system employs a communication frame including a plurality of time slots. The time slots include a plurality of forward link time slots, disposed at regular intervals in the communication frame and assigned a common control channel. The time slots further include time slots other than the plurality of forward link time slots, divided into reverse link time slots and forward link time slots according to an amount of information on a forward link and on a reverse link. The mobile station apparatus includes a receiver that receives the communication frame including the plurality of time slots. A measurer measures individual reception qualities of the plurality of forward link time slots in the received communication frame including the forward link time slots assigned the common control channel. A weighter assigns a weight to each measured reception quality of the plurality of forward time slots.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: August 17, 2010
    Assignee: Panasonic Corporation
    Inventors: Masaki Hayashi, Kazuyuki Miya, Toyoki Ue, Katsuhiko Hiramatsu
  • Patent number: 7773313
    Abstract: A cam mechanism includes a cam ring having front and rear cam grooves which have a common reference cam diagram and are formed so that a front part of the front cam groove and a rear part of the rear cam groove are omitted from the reference cam diagram. A normal-width section and a wide-width section are provided in each of the front and rear cam grooves. In a zoom range, an associated cam follower of a driven member is engaged in the normal-width section of one of the front and rear cam grooves, and another associated cam follower of the driven member is positioned out of the other of the front and rear cam grooves. In a transition state between the zoom range and an accommodated position, both of the associated cam followers are positioned out of the normal-width sections of the respective front and rear cam grooves.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: August 10, 2010
    Assignee: Hoya Corporation
    Inventors: Kazunori Ishizuka, Toshiharu Suzuki, Makio Oishi, Koto Miya
  • Patent number: 7771836
    Abstract: A golden ornament includes a base material; a Ti coating film which is formed on a surface of the base material in an atmosphere of an inert gas other than nitrogen and whose Ti atom content is constant in the thickness direction; a TiN gradient coating film which is formed on the Ti coating film and whose N atom content has a gradient in the thickness direction; a TiN coating film which is formed on the TiN gradient coating film and whose contents of Ti atoms and N atoms are constant in the thickness direction; an Au—TiN mixture gradient coating film which is formed on the TiN coating film and whose Au atom content has a gradient in the thickness direction; and an Au—TiN mixture coating film which is formed on the Au—TiN mixture gradient coating film and whose contents of Au atoms, Ti atoms, and N atoms are constant in the thickness direction.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: August 10, 2010
    Assignee: Citizen Holdings Co., Ltd.
    Inventors: Koichi Naoi, Fumio Tase, Yukio Miya, Osamu Tanaka, Masayoshi Ushikubo
  • Publication number: 20100197368
    Abstract: To provide a connecting means that can facilitate electrical connection between the circuit boards mounted in an electronic apparatus and can attain the miniaturization of connecting parts. A cable harness body comprising a plurality of cables for electrically connecting circuit boards mounted in an electronic apparatus and the terminal members disposed on both ends of said cables, wherein at least one of said terminal members is comprised of a flexible circuit board and an adhesive layer on the surface of the electric connecting part of said flexible circuit board.
    Type: Application
    Filed: April 4, 2006
    Publication date: August 5, 2010
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Yoshihisa Kawate, Takuro Miya, Kohichiro Kawate
  • Patent number: 7767026
    Abstract: An on-off valve 81 is opened during rinsing, whereby a part of DIW supplied to a processing liquid supply section 43 is guided into inside a suction pipe 82. After rinsing, a puddle is formed between a lower cleaning nozzle 29 and the bottom surface of a wafer. As the on-off valve 81 is opened while an on-off valve 86 is kept close, the puddle is sucked at a first speed (V1) which is regulated by a needle valve 85 and set to a relatively slow speed. Once the puddle is collected into inside the lower cleaning nozzle 29, the on-off valve 86 is opened so that the puddle is sucked at a second speed (V2) which is regulated by a needle valve 84 and which is faster than said first speed.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: August 3, 2010
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Katsuhiko Miya
  • Patent number: 7767594
    Abstract: Disclosed is a producing method of a semiconductor device, including: loading at least one substrate formed on a surface thereof with a tungsten film into a processing chamber; and forming a silicon oxide film on the surface of the substrate which includes the tungsten film by alternately repeating following steps a plurality of times: supplying the processing chamber with a first reaction material including a silicon atom while heating the substrate at 400° C.; and supplying the processing chamber with hydrogen and water which is a second reaction material while heating the substrate at 400° C. at a ratio of the water with respect to the hydrogen of 2×10?1 or lower.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: August 3, 2010
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Hironobu Miya, Masayuki Asai, Norikazu Mizuno
  • Publication number: 20100186774
    Abstract: Provided is a cleaning method for removing a film adhered inside a processing chamber of a substrate processing apparatus used for forming a desired film on a substrate by supplying a material gas for film formation. The method is provided with a step of supplying a halogen containing gas into the processing chamber, and a step of supplying a fluorine containing gas into the processing chamber while supplying the halogen containing gas, after starting to supply the halogen containing gas. In the step of supplying the fluorine containing gas, a supply flow volume ratio of the halogen containing gas to the entire gas supplied into the processing chamber is within a range of 20-25%.
    Type: Application
    Filed: September 9, 2008
    Publication date: July 29, 2010
    Inventors: Hironobu Miya, Yuji Takebayashi, Masanori Sakai, Shinya Sasaki, Hirohisa Yamazaki, Atsuhiko Suda, Takashi Tanioka
  • Patent number: 7764142
    Abstract: A bit phase shifter includes a plurality of phase shifters having phase shift amounts and connected in series through connection paths; and a first adjusting circuit provided in the connection path between every adjacent two of the plurality of phase shifters. The first adjusting circuit includes a first inductance which attains impedance matching to each of capacitances provided by the adjacent two phase shifters.
    Type: Grant
    Filed: January 31, 2008
    Date of Patent: July 27, 2010
    Assignee: NEC Electronics Corporation
    Inventor: Tatsuya Miya
  • Patent number: 7756522
    Abstract: A dynamic traffic control method is disclosed that controls traffic in a radio network system where a radio network controller causes plural radio base stations to change radio outputs. The method comprises a step of measuring a channel utilization rate of each of cells of the radio base stations every predetermined period, a step of predicting whether the rate of a first cell of the cells reaches an implementation level, at which radio output control over the first cell is required, in a next period based on a movement of the rate in the past if the channel utilization rate of the first cell is at a warning level, and a step of reducing the radio output of the first cell and increasing the radio output of a second cell adjacent to the first cell if the rate of the first cell is predicted to reach the implementation level.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: July 13, 2010
    Assignee: Fujitsu Limited
    Inventors: Mitsugi Nomiya, Hiroyasu Taguchi, Kazuyoshi Nakajima, Miya Inami, Yayoi Itoh, Kiyomi Hasesaka, Hiroyuki Sasai
  • Publication number: 20100173501
    Abstract: Disclosed is a producing method of a semiconductor device, including: loading at least one substrate formed on a surface thereof with a tungsten film into a processing chamber; and forming a silicon oxide film on the surface of the substrate which includes the tungsten film by alternately repeating following steps a plurality of times: supplying the processing chamber with a first reaction material including a silicon atom while heating the substrate at 400° C.; and supplying the processing chamber with hydrogen and water which is a second reaction material while heating the substrate at 400° C. at a ratio of the water with respect to the hydrogen of 2×10?1 or lower.
    Type: Application
    Filed: January 5, 2010
    Publication date: July 8, 2010
    Inventors: Hironobu Miya, Masayuki Asai, Norikazu Mizuno
  • Patent number: 7751445
    Abstract: A base station apparatus in a CDMA/TDD mobile communication system is provided. A signal is formed employing a frame configuration with a plurality of time slots and spreading processing utilizes a long spreading code for identifying a cell and a short spreading code for acquiring frame synchronization. The base station apparatus includes a first control channel former that forms a first control channel including a symbol that is spread by a first short spreading code. A second control channel former forms a second control channel including a symbol spread by a second short spreading code and positioned at a same timing as the symbol spread by the first short spreading code.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: July 6, 2010
    Assignee: Panasonic Corporation
    Inventors: Masaki Hayashi, Kazuyuki Miya, Osamu Kato
  • Patent number: 7744721
    Abstract: A plasma processing apparatus including a processing chamber for subjecting an object to plasma processing, a gas inlet, an evacuation device, a sample stage for the object, a power supply, and at least one induction coil. The at least one induction coil enables generation of the plasma in the processing chamber and is formed by connecting a plurality of identical coil elements in a parallel circuit-like arrangement so that current flows in each of the plurality of identical coil elements in a same direction when viewed from the sample stage.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: June 29, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Manabu Edamura, Go Miya, Ken Yoshioka
  • Publication number: 20100127712
    Abstract: The electronic component tester includes: a socket configured to supply power to connection terminals for operating an electronic component; an electronic component mount member on which the electronic component is to be mounted; and a temperature adjusting member which is configured to come into contact with the electronic component mount member to keep the electronic component at a predetermined temperature. The electronic component mount member includes a heat transfer plate on which the electronic component is to be mounted and which is configured to come into contact with the temperature adjusting member, and an electronic component cover for covering the electronic component. The heat transfer plate includes through holes.
    Type: Application
    Filed: October 15, 2009
    Publication date: May 27, 2010
    Inventors: Takanori Miya, Isao Hayami, Shoichi Tanaka
  • Patent number: RE41444
    Abstract: In the CDMA Radio Multiplex Transmission, transfer function of line is inferred by using common pilot signal and synchronous detection is performed accordingly. The transmitting end transmits by periodically inserting pilot symbols into one channel only of multiplexed channels. The receiving end infers line condition (transfer function) from the received pilot symbols and, on the basis of the information thus obtained, performs synchronous detection of each channel multiplexed.
    Type: Grant
    Filed: November 13, 2008
    Date of Patent: July 20, 2010
    Assignee: Panasonic Corporation
    Inventor: Kazuyuki Miya
  • Patent number: RE41819
    Abstract: The transmission apparatus according to the present invention includes a switching device that switches the multiplexing destination of mask symbols and uses this switching device to switch the multiplexing destination of the mask symbols so that the mask symbols multiplexed with control channel signals transmitted in parallel from a plurality of antennas may be transmitted from only one antenna at each transmission timing.
    Type: Grant
    Filed: May 10, 2007
    Date of Patent: October 12, 2010
    Assignee: Panasonic Corporation
    Inventors: Kazuyuki Miya, Masaki Hayashi, Takashi Kitade