Patents by Inventor Nan Wang

Nan Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220365017
    Abstract: A pH measurement system includes a measurement apparatus that is capable of connection to a mobile device and a server and that includes a measuring instrument and a monitoring device. The measuring instrument includes a tube, and a sensor rod that is disposed is the tube and that is for sensing a pH value of a measurement target. The monitoring device includes a microcontroller communicatively connected to the sensor rod, an operation module for operation by a user, a communication module for communication with the mobile device and the server, and a display module for displaying information. The microcontroller provides the pH value to the mobile device or the server through the communication module.
    Type: Application
    Filed: December 27, 2021
    Publication date: November 17, 2022
    Inventors: Chang-Hsien Tai, Yao-Nan Wang, Cheng-Huei Yang, Chin-Lung Chang, Tsung-Che Wu
  • Publication number: 20220361336
    Abstract: A metal circuit structure based on a flexible printed circuit (FPC) contains: a substrate, a first metal layer attached on the substrate, a second metal layer formed on the first metal layer, and an intermediate layer defined between the first metal layer and the second metal layer. A first surface of the intermediate layer is connected with the first metal layer, and a second surface of the intermediate layer is connected with the second metal layer. The intermediate layer is made of a first material, the second metal layer is made of a second material, and the first material of the intermediate layer does not act with the second material of the second metal layer.
    Type: Application
    Filed: May 7, 2021
    Publication date: November 10, 2022
    Inventors: Cheng-Neng Chen, Sui-Ho Tsai, Yun-Nan Wang, Chiao-Hui Wang
  • Publication number: 20220359438
    Abstract: A method for forming a chip structure is provided. The method includes providing a semiconductor substrate, a first conductive line, and a first dielectric layer. The method includes forming a first conductive layer over the first dielectric layer. The method includes forming a second conductive layer over the first conductive layer. The method includes forming a second dielectric layer over the second conductive layer and the first conductive layer. The method includes forming a first through hole passing through the second dielectric layer, the first conductive layer, and the first dielectric layer. The method includes forming a first conductive structure in and over the first through hole.
    Type: Application
    Filed: July 26, 2022
    Publication date: November 10, 2022
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Fan HUANG, Mao-Nan WANG, Hui-Chi CHEN, Dian-Hau CHEN, Yen-Ming CHEN
  • Patent number: 11494270
    Abstract: A data backup method includes querying a first block of a first blockchain for unused transaction output information based on a first condition being met, the first block including each block of all blocks included in the first blockchain; generating transaction information according to the unused transaction output information obtained based on the querying, the transaction information indicating a transaction operation based on an account address to which the unused transaction output information belongs; recording the transaction information in a second block and releasing the second block, and recording the second block on which a consensus is reached on a second blockchain; and backing up the first blockchain into a storage system, and deleting the first blockchain. Counterpart apparatus, terminal, server, and/or non-transitory computer-readable medium are also contemplated.
    Type: Grant
    Filed: October 8, 2020
    Date of Patent: November 8, 2022
    Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LTD
    Inventors: Rui Guo, Mao Cai Li, Zong You Wang, Hai Tao Tu, Li Kong, Kai Ban Zhou, Chang Qing Yang, Nan Wang, Yong Ding, Yi Fang Shi
  • Publication number: 20220350707
    Abstract: A method for handling a trusted execution environment operating system crash is provided. The method includes: when it is detected, in a running process of a security service, that a TEE OS crashes, an electronic device stores a hardware status parameter of a TEE and a security context of an REE that are obtained when the TEE OS crashes, and suspends the security service; the electronic device restarts the TEE OS; the electronic device sets, based on the stored hardware status parameter of the TEE, a hardware status parameter of the TEE obtained after the TEE OS is restarted; the electronic device sets, based on the stored security context of the REE, a security context of the REE obtained after the TEE OS is restarted and a context of the TEE obtained after the TEE OS is restarted; and the electronic device restores the security service.
    Type: Application
    Filed: July 15, 2022
    Publication date: November 3, 2022
    Inventors: Xiameng HU, Ning JIA, Yu LI, Nan WANG
  • Publication number: 20220341735
    Abstract: The present disclosure provides an in-situ observation system for a bottom boundary layer (BBL) over a shallow-water cohesive seabed and an arrangement method thereof. It establishes a low-cost and easy-operation hydraulic pile foundation system (2), which can ensure the piling depth to achieve the anti-settling and stability. The stainless-steel sticks are assembled freely to construct the interference-free observation unit (1). As the porous discs are used between the feet of the observation unit (1) and the top of the bottom piles, the observation system can be accurately fixed to the pile foundation. It is thus not limited by the self-weight and can integrate various instruments upon requirement. The components in this system can be easily obtained and conveniently maintained. The present disclosure has the advantages of low-cost and stability, can be widely used for long-term in-situ observation of the BBL.
    Type: Application
    Filed: August 17, 2020
    Publication date: October 27, 2022
    Inventors: Dehai SONG, Nan WANG, Xianwen BAO, Guangxue LI, Chuanxiang WANG
  • Patent number: 11482603
    Abstract: A semiconductor device and a method for forming the semiconductor device are provided. The method includes providing a substrate; forming a fin on the substrate, where the substrate includes a fin dense region and a fin sparse region; forming a gate structure across the fin over the substrate; forming a source-drain doped layer in the fin on both sides of the gate structure; forming a dielectric layer over the substrate, where the dielectric layer covers a top of the gate structure; and forming a first through-hole in the dielectric layer on a side of the gate structure in the fin sparse region, where a bottom of the first through-hole exposes a top sidewall of the gate structure.
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: October 25, 2022
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventor: Nan Wang
  • Patent number: 11476165
    Abstract: A semiconductor device and a method for forming the semiconductor device are provided. The method includes providing a substrate including an NMOS region and a PMOS region, forming an isolation layer on the substrate, forming initial hard mask layers on the isolation layer, and forming hard mask layers by removing a number of initial hard mask layers from the initial hard mask layers. The method also includes forming openings in the isolation layer in the NMOS region by removing portions of the isolation layer covered by the hard mask layers in the NMOS region, forming first fins in the openings in the isolation layer in the NMOS region, forming openings in the isolation layer in the PMOS region by removing portions of the isolation layer covered by the hard mask layers in the PMOS region, and forming second fins in the openings in the isolation layer in the PMOS region.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: October 18, 2022
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventor: Nan Wang
  • Publication number: 20220320413
    Abstract: This method is for manufacturing a thermoelectric conversion module in which a first conductive member, a thermoelectric conversion element, a second conductive member are joined by joining members, the method comprising: a step for, after applying on the first conductive member a first paste including metal particles, disposing the thermoelectric conversion element on the first paste, and compressing and spreading the first paste; a step for disposing the second conductive member, after applying a second paste including metal particles in a controlled amount, on the thermoelectric conversion element, and compressing and spreading the second paste; and a step for sintering the first and the second pastes to obtain joining members.
    Type: Application
    Filed: September 4, 2020
    Publication date: October 6, 2022
    Applicant: HITACHI METALS, LTD.
    Inventors: Tomotake TOHEI, Takashi NOGAWA, Nan WANG, Michiko MATSUDA, Takeshi SHIMADA
  • Patent number: 11456304
    Abstract: A semiconductor structure and a forming method thereof are provided.
    Type: Grant
    Filed: November 25, 2020
    Date of Patent: September 27, 2022
    Assignees: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION, SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
    Inventor: Nan Wang
  • Patent number: 11456216
    Abstract: A fabrication method of a semiconductor structure is provided. The method includes: providing a substrate; forming fin structures on the substrate along a first direction with isolation grooves between adjacent fin structures, where each fin structure includes sacrificial layers stacked along a normal direction of the substrate and a channel layer between every two adjacent sacrificial layers; forming a first isolation layer in each isolation groove; forming a second isolation layer at a surface of each first isolation layer to fill up a corresponding isolation groove; forming a dummy gate structure; removing first isolation layers; removing the dummy gate structure to form a gate opening at ends of the sacrificial layers along a second direction perpendicular to the first direction; removing the sacrificial layers to form gate grooves between adjacent channel layers; and forming a gate structure in the gate opening and the gate grooves surrounding the channel layers.
    Type: Grant
    Filed: April 7, 2021
    Date of Patent: September 27, 2022
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventor: Nan Wang
  • Patent number: 11444183
    Abstract: A semiconductor structure and a formation method thereof are provided. In one form, the method includes: providing a base; patterning the base to form a substrate and discrete fins and pseudo fins which protrude from the substrate, wherein the fins are located in a device region, and the pseudo fins are located in isolation regions; removing the pseudo fins in the isolation regions; forming isolation layers on the substrate exposed by the fins, wherein the isolation layers cover part of the side walls of the fins; and thinning the isolation layers in the isolation regions, wherein the remaining isolation layers in the isolation regions are regarded as target isolation layers, and the surfaces of the target isolation layers are lower than the surfaces of the isolation layers between the discrete fins.
    Type: Grant
    Filed: November 9, 2020
    Date of Patent: September 13, 2022
    Assignees: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION, SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
    Inventor: Nan Wang
  • Publication number: 20220283627
    Abstract: A portable computing device including a central processing unit (CPU) and a controller is provided. The controller is coupled between the CPU, a graphics processing unit, and a battery module. The controller determines whether to adjust performance of the CPU and the graphics processing unit according to at least one of a battery capacity, a battery power, a battery current, a battery voltage, or a battery temperature of the battery module.
    Type: Application
    Filed: February 10, 2022
    Publication date: September 8, 2022
    Applicant: ASUSTeK COMPUTER INC.
    Inventors: Hao-Hsuan Lin, Yu-Hsiu Su, Chun-Nan Wang, Jia-Ying Wu, Chia-Sen Chang, Yu-Cheng Shen, Shih-Hsiang Kao
  • Patent number: 11437331
    Abstract: A chip structure is provided. The chip structure includes a semiconductor substrate. The chip structure includes a first dielectric layer over the semiconductor substrate. The chip structure includes a first conductive layer over the first dielectric layer. The chip structure includes a second dielectric layer over the first conductive layer and the first dielectric layer. The chip structure includes a first conductive via passing through the second dielectric layer, the first conductive layer, and the first dielectric layer and electrically connected to the first conductive layer. The chip structure includes a second conductive via passing through the second dielectric layer and the first dielectric layer. The chip structure includes a first conductive pad over and in direct contact with the first conductive via. The chip structure includes a second conductive pad over and in direct contact with the second conductive via.
    Type: Grant
    Filed: October 17, 2019
    Date of Patent: September 6, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Fan Huang, Mao-Nan Wang, Hui-Chi Chen, Dian-Hau Chen, Yen-Ming Chen
  • Publication number: 20220278109
    Abstract: Semiconductor structures is provided. The semiconductor structure includes a semiconductor substrate having at least one first region, a plurality of second regions and a plurality of third regions; at least one second fin formed on one second region of the plurality of second region; at least one third fin formed on one third region of the plurality of third regions; a first epitaxial layer formed in the at least one first fin; and a second epitaxial layer formed in the at least one second fin and the at least one third fin.
    Type: Application
    Filed: May 17, 2022
    Publication date: September 1, 2022
    Inventor: Nan WANG
  • Publication number: 20220277967
    Abstract: A wafer cassette for receiving a wafer is provided. The wafer cassette includes a cassette housing, a first supporting rib and a second supporting rib. The first supporting rib is disposed in the cassette housing, wherein the first supporting rib includes a front supporting portion, a middle supporting portion and a rear supporting portion, the front supporting portion is connected to one end of the middle supporting portion, the rear supporting portion is connected to the other end of the middle supporting portion, and the front supporting portion has a front curved edge. The second supporting rib is disposed in the cassette housing. An edge portion of the wafer is supported by the first supporting rib and the second supporting rib, and the front supporting portion, the middle supporting portion and the rear supporting portion contact the wafer simultaneously.
    Type: Application
    Filed: February 26, 2021
    Publication date: September 1, 2022
    Inventors: Chao-Chih WANG, Ya-Nan WANG, Chia-He WU, Cheng-Han CHIANG
  • Publication number: 20220272840
    Abstract: A double-sided and multilayer flexible printed circuit (FPC) substrate contains: a body, multiple tilted vias passing through the body, a sputtering layer, multiple conductive portions, and multiple copper circuit layers. The sputtering layer is adhered on the body and the multiple tilted vias. A respective conductive portion is formed in a respective titled via and is connected with the sputtering layer. The multiple copper circuit layers are located on a top and a bottom of the body and are connected with the sputtering layer, and the multiple copper circuit layers are connected via the multiple conductive portions.
    Type: Application
    Filed: February 22, 2021
    Publication date: August 25, 2022
    Inventors: Sui-Ho Tsai, Cheng-Neng Chen, Yun-Nan Wang, Chih-Yuan Chao, Hsueh-Tsung Lu
  • Patent number: 11423625
    Abstract: An Augmented Reality (AR) scene image processing method, an electronic device and a storage medium are provided. The method includes that: shooting pose data of an AR device is acquired; presentation special effect data of a virtual object corresponding to the shooting pose data in a reality scene is acquired based on the shooting pose data and position pose data of the virtual object in a three-dimensional scene model representing the reality scene; and an AR scene image is displayed through the AR device based on the presentation special effect information.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: August 23, 2022
    Assignee: BEIJING SENSETIME TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Xinru Hou, Qing Luan, Chongshan Sheng, Fei Jiao, Huafu Ou, Shengchuan Shi, Nan Wang, Hanqing Jiang
  • Patent number: 11423695
    Abstract: A first face region within a first image is determined. The first face region includes a location of a face within the first image. Based on the determined first face region within the first image, a predicted face region within a second image is determined. A first region of similarity within the predicted face region is determined. The first region of similarity has at least a predetermined degree of similarity to the first face region within the first image. Whether a second face region is present within the second image is determined. The location of the face within the second image is determined based on the first region of similarity, the determination of whether the second face region is present within the second image, and a face region selection rule.
    Type: Grant
    Filed: May 10, 2021
    Date of Patent: August 23, 2022
    Assignee: Advanced New Technologies Co., Ltd.
    Inventors: Nan Wang, Zhijun Du, Yu Zhang
  • Patent number: D962796
    Type: Grant
    Filed: April 15, 2022
    Date of Patent: September 6, 2022
    Inventor: Nan Wang