Abstract: A wastewater purification apparatus includes an elongate tank, which has an inflow for feeding wastewater, a first vertical agitator with a first hyperboloid agitator body mounted on a vertical first agitator shaft and provided in a first treatment portion downstream of the inflow on the first narrow side, a second vertical agitator with a second hyperboloid agitator body mounted on a vertical second agitator shaft and provided in a second treatment portion downstream of the first vertical agitator, an aeration device with a fan for aerating wastewater received in the tank, a first drive device for rotating the first hyperboloid agitator body in a first rotation direction, a second drive device for rotating the second hyperboloid agitator body in a second rotation direction opposite the first rotation direction, and a decanter for discharging purified wastewater in a third treatment portion on a second narrow side opposite the first narrow side.

Abstract: An analysis method is for automatically determining radiological result data from radiology data sets. In an embodiment, the method includes provisioning a first radiology data set at least based on X-ray data of a first X-ray energy spectrum; provisioning at least one second radiology data set at least based on X-ray data of a second X-ray energy spectrum; provisioning an analysis unit including a neural network, to analyze radiology data sets including an input layer with a plurality of cells, a number of intermediate layers and an output layer representing a radiological result; analyzing the first radiology data set and the at least one second radiology data set, at least subsets of the first radiology data set and the at least one second radiology data set being assigned to different cells of the input layer for joint processing in the neural network; and acquiring result data on the output layer.

Abstract: A wastewater purification apparatus includes an elongate tank, which has an inflow for feeding wastewater, a first vertical agitator with a first hyperboloid agitator body mounted on a vertical first agitator shaft and provided in a first treatment portion downstream of the inflow on the first narrow side, a second vertical agitator with a second hyperboloid agitator body mounted on a vertical second agitator shaft and provided in a second treatment portion downstream of the first vertical agitator, an aeration device with a fan for aerating wastewater received in the tank, a first drive device for rotating the first hyperboloid agitator body in a first rotation direction, a second drive device for rotating the second hyperboloid agitator body in a second rotation direction opposite the first rotation direction, and a decanter for discharging purified wastewater in a third treatment portion on a second narrow side opposite the first narrow side.

Abstract: An apparatus for preparing food having a heating device with hot plate, a filter device and a cover device, which is in operative connection with the filter device and has an upper side, an underside and side surfaces. The cover device, on the underside, has at least one entry opening of a flow channel for exhaust air, the flow channel being arranged in the interior of the cover device. The flow channel, on a first side surface, has an exit opening, wherein the exit opening can be positioned such that the exhaust air can flow via the exit opening into an entry opening of the filter device.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.

Abstract: A wavefront correction element for use in an optical system, in particular in an optical system of a microlithographic projection exposure apparatus, includes a substrate (220, 230), an arrangement of electrically conductive conductor tracks (222, 232) provided on the substrate, wherein a wavefront of electromagnetic radiation incident on the wavefront correction element is manipulatable by electrical driving of the conductor tracks, and an insulating layer (221, 231), which electrically insulates the conductor tracks from one another, wherein the insulating layer has first regions and second regions, wherein the electrical breakdown strength of the insulating layer to withstand a breakdown of electrical charge through the insulating layer as far as the arrangement of conductor tracks is lower in the second regions than in the first regions by at least a factor of two.

Abstract: A wavefront correction element for use in an optical system, in particular in an optical system of a microlithographic projection exposure apparatus, includes a substrate (220, 230), an arrangement of electrically conductive conductor tracks (222, 232) provided on the substrate, wherein a wavefront of electromagnetic radiation incident on the wavefront correction element is manipulatable by electrical driving of the conductor tracks, and an insulating layer (221, 231), which electrically insulates the conductor tracks from one another, wherein the insulating layer has first regions and second regions, wherein the electrical breakdown strength of the insulating layer to withstand a breakdown of electrical charge through the insulating layer as far as the arrangement of conductor tracks is lower in the second regions than in the first regions by at least a factor of two.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.

Abstract: An analysis method is for automatically determining radiological result data from radiology data sets. In an embodiment, the method includes provisioning a first radiology data set at least based on X-ray data of a first X-ray energy spectrum; provisioning at least one second radiology data set at least based on X-ray data of a second X-ray energy spectrum; provisioning an analysis unit including a neural network, to analyze radiology data sets including an input layer with a plurality of cells, a number of intermediate layers and an output layer representing a radiological result; analyzing the first radiology data set and the at least one second radiology data set, at least subsets of the first radiology data set and the at least one second radiology data set being assigned to different cells of the input layer for joint processing in the neural network; and acquiring result data on the output layer.

Abstract: A method for producing a mirror element, in particular for a microlithographic projection exposure apparatus includes: providing a substrate (101, 102, 103, 104, 201, 202, 301, 302, 401, 402, 501, 502, 801, 901, 951, 961); and forming a layer stack (111, 112, 113, 114, 211, 212, 311, 312, 411, 412, 511, 512) on the substrate, wherein the layer stack is formed so that a setpoint curvature of the mirror element for a predetermined operating temperature is generated by a bending force exerted by the layer stack, wherein the substrate has a curvature deviating from the setpoint curvature of the mirror element prior to the formation of the layer stack, and wherein the bending force exerted by the layer stack is at least partly generated by virtue of a post-treatment for changing the layer tension of the layer stack.

Abstract: A laminating body for laminating a foil onto a substrate includes a pressure area on which there is imprinted a structure which forms an embossing in the foil upon lamination of the foil onto the substrate.

Abstract: A reflective optical element, in particular for a microlithographic projection exposure apparatus or a mask inspection apparatus. According to one aspect, the reflective optical element has an optically effective surface, a substrate (405, 505), a reflection layer system (410, 510) and at least one porous outgassing layer (450, 550), which at least intermittently releases particles adsorbed in the outgassing layer (450, 550) when the optically effective surface (400a, 500a) is irradiated by electromagnetic radiation.

Abstract: A mask (M) for EUV lithography includes: a substrate (7), a first surface region (A1) formed by a surface (8a) of a multilayer coating (8) embodied to reflect EUV radiation (27), said surface (8a) facing away from the substrate (7), and a second surface region (A2) formed by a surface (18a) of a further coating (18) embodied to reflect DUV radiation (28) and to suppress the reflection of EUV radiation (27), said surface (18a) facing away from the substrate (7). The further coating is a multilayer coating (18). Also disclosed are an EUV lithography apparatus that includes such a mask (M) and a method for determining a contrast proportion caused by DUV radiation when imaging a mask (M) onto a light-sensitive layer.

Abstract: A reflective optical element, in particular for a microlithographic projection exposure apparatus or a mask inspection apparatus. According to one aspect, the reflective optical element has an optically effective surface, a substrate (405, 505), a reflection layer system (410, 510) and at least one porous outgassing layer (450, 550), which at least intermittently releases particles adsorbed in the outgassing layer (450, 550) when the optically effective surface (400a, 500a) is irradiated by electromagnetic radiation.

Abstract: An apparatus for preparing food having a heating device with hot plate, a filter device and a cover device, which is in operative connection with the filter device and has an upper side, an underside and side surfaces. The cover device, on the underside, has at least one entry opening of a flow channel for exhaust air, the flow channel being arranged in the interior of the cover device. The flow channel, on a first side surface, has an exit opening, wherein the exit opening can be positioned such that the exhaust air can flow via the exit opening into an entry opening of the filter device.

Abstract: In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm.

Abstract: A coin comprising a metallic disc separated from a concentric annular metallic ring by a concentric intervening layer. The metallic disc has a first electrical conductivity and the annular metallic ring has a second electrical conductivity. This intervening layer comprises a transparent dielectric material that connects the metallic disc to the annular metallic ring. The intervening layer has a width to provide a separation of inductive signatures of the metallic disc and the annular metallic ring. The width is based on an electrical conductivity ratio of the first electrical conductivity to the second electrical conductivity and is further based on a geometry of the coin. In some embodiments, the intervening layer comprises a transparent polymer including additives, such as a UV stabilizer or a fluorescent component.

Abstract: A system and method for processing of dual-energy image data measurements are disclosed. The image data acquired on a computed tomograph is collected together to form a container before being sent to client devices for post-processing. The container contains a control object for the respective image dataset, which includes evaluation specifications and post-processing specifications for post-processing of the image data on the client device.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus, has an optically effective surface (10a), a mirror substrate (11) and a reflection layer stack (12) configured to reflect electromagnetic radiation that is incident on the optically effective surface. A metallic diffusion barrier layer (13) is arranged on that side of the reflection layer stack which faces toward the optically effective surface, and a stabilization layer (14) is arranged on the side of the diffusion barrier layer that faces toward the optically effective surface (10a). The stabilization layer reduces deformation of the diffusion barrier layer compared to an analogous structure without such a stabilization layer upon irradiation of the optically effective surface with electromagnetic radiation. The stabilization layer has a porosity, a relative density of which is no more than 80%, where the relative density is defined as the ratio between geometric density and true density.

Abstract: A mask (M) for EUV lithography includes: a substrate (7), a first surface region (A1) formed by a surface (8a) of a multilayer coating (8) embodied to reflect EUV radiation (27), said surface (8a) facing away from the substrate (7), and a second surface region (A2) formed by a surface (18a) of a further coating (18) embodied to reflect DUV radiation (28) and to suppress the reflection of EUV radiation (27), said surface (18a) facing away from the substrate (7). The further coating is a multilayer coating (18). Also disclosed are an EUV lithography apparatus that includes such a mask (M) and a method for determining a contrast proportion caused by DUV radiation when imaging a mask (M) onto a light-sensitive layer.