Patents by Inventor Prashant Kumar

Prashant Kumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS OF REDUCING CHAMBER RESIDUES
    Publication number: 20230151487
    Abstract: The present disclosure relates to systems and methods for reducing the formation of hardware residue and minimizing secondary plasma formation during substrate processing in a process chamber. The process chamber may include a gas distribution member configured to flow a first gas into a process volume and generate a plasma therefrom. A second gas is supplied into a lower region of the process volume. Further, an exhaust port is disposed in the lower region to remove excess gases or by-products from the process volume during or after processing.
    Type: Application
    Filed: January 20, 2023
    Publication date: May 18, 2023
    Inventors: Liangfa HU, Prashant Kumar KULSHRESHTHA, Anjana M. PATEL, Abdul Aziz KHAJA, Viren KALSEKAR, Vinay K. PRABHAKAR, Satya Teja Babu THOKACHICHU, Byung Seok KWON, Ratsamee LIMDULPAIBOON, Kwangduk Douglas LEE, Ganesh BALASUBRAMANIAN
  • SYSTEMS AND METHODS FOR FORECASTING INBOUND TELECOMMUNICATIONS ASSOCIATED WITH AN ELECTRONIC TRANSACTIONS SUBSCRIPTION PLATFORM
    Publication number: 20230146271
    Abstract: Disclosed are systems and methods for forecasting inbound telecommunications, and more particularly, for analyzing real-time and historical call center data, and applying a forecasting model to said data in order to predict inbound call volume. Additionally, tools are disclosed for manipulating call center data and generating visual representations of metrics pertaining to forecasting call center data via a dashboard.
    Type: Application
    Filed: December 29, 2022
    Publication date: May 11, 2023
    Inventors: Avinash SINGH, Prashant Kumar RAI, Chirag JAIN, Ankita SINHA
  • METHODS AND SYSTEMS FOR DIAGNOSING ENGINE CYLINDERS
    Publication number: 20230126002
    Abstract: Systems and methods are provided for diagnosing cylinders in an engine. In one example, the method may include while receiving first feedback from a vibration sensor coupled to a first cylinder of the engine, perturbing the first cylinder during engine operation. Responsive to the first feedback indicating a first vibration level difference greater than or equal to a first threshold difference, a first indication of a first degradation condition of the first cylinder may be set, and thereafter the engine may be operated based on whether or not the first indication was set.
    Type: Application
    Filed: October 25, 2021
    Publication date: April 27, 2023
    Inventors: Prashant Kumar, David Schroeck
  • Electronic outcry messaging for electronic trading
    Patent number: 11625779
    Abstract: Methods, devices, and systems for facilitation of communication between participants of an electronic marketplace involve receiving a message generated from a market participant and transmitting the message to other market participants. The facilitation also involves receiving responses to the message from the other market participants and transmitting the responses to the message originating market participant such that the transmitted response is imperceptible to the other market participants.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: April 11, 2023
    Assignee: Chicago Mercantile Exchange Inc.
    Inventors: Daniel Judson, Prashant Kumar
  • Clean processes for boron carbon film deposition
    Patent number: 11613808
    Abstract: Exemplary semiconductor processing methods may include forming a seasoning film on a heater of a processing chamber by a first deposition process. The method may include performing a hardmask deposition process in the processing chamber. The method may include cleaning the processing chamber by a first cleaning process. The method may include monitoring a gas produced during the first cleaning process. The method may include cleaning the processing chamber using a second cleaning process different from the first cleaning process. The method may also include monitoring the gas produced during the second cleaning process.
    Type: Grant
    Filed: October 22, 2020
    Date of Patent: March 28, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Jiheng Zhao, Abdul Aziz Khaja, Prashant Kumar Kulshreshtha, Fang Ruan
  • Targeted heat control systems
    Patent number: 11600470
    Abstract: Exemplary semiconductor processing chambers may include a chamber body including sidewalls and a base. The chambers may include a substrate support extending through the base of the chamber body. The substrate support may include a support platen configured to support a semiconductor substrate. The substrate support may include a shaft coupled with the support platen. The substrate support may include a shield coupled with the shaft of the substrate support. The shield may include a plurality of apertures defined through the shield. The substrate support may include a block seated in an aperture of the shield.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: March 7, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Venkata Sharat Chandra Parimi, Satish Radhakrishnan, Xiaoquan Min, Sarah Michelle Bobek, Sungwon Ha, Prashant Kumar Kulshreshtha, Vinay Prabhakar
  • Device information method and apparatus for directing link-layer communication
    Patent number: 11595305
    Abstract: A network device has an input configured to receive a message relating to a given device attempting to forward one or more packets across a computer network. The message has given device information relating to the given device. In addition, the routing device also has a selector, operatively coupled with the input, configured to select (after receiving the given data) a given group routing policy from a plurality of group routing policies. Preferably, the selector is configured to select the given group routing policy as a function of the given device information. The routing device also has an output operatively coupled with the selector. The output is configured to cause routing of device communication across the network using link-layer routes specified by the given group routing policy.
    Type: Grant
    Filed: February 23, 2022
    Date of Patent: February 28, 2023
    Assignee: 128 Technology, Inc.
    Inventors: Patrick J. MeLampy, Abilash Menon, Michael Baj, Prashant Kumar
  • Pedestal for substrate processing chambers
    Patent number: 11584994
    Abstract: Aspects of the present disclosure relate generally to pedestals, components thereof, and methods of using the same for substrate processing chambers. In one implementation, a pedestal for disposition in a substrate processing chamber includes a body. The body includes a support surface. The body also includes a stepped surface that protrudes upwards from the support surface. The stepped surface is disposed about the support surface to surround the support surface. The stepped surface defines an edge ring such that the edge ring is integrated with the pedestal to form the body that is monolithic. The pedestal also includes an electrode disposed in the body, and one or more heaters disposed in the body.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: February 21, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Sarah Michelle Bobek, Venkata Sharat Chandra Parimi, Prashant Kumar Kulshreshtha, Vinay K. Prabhakar, Kwangduk Douglas Lee, Sungwon Ha, Jian Li
  • HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
    Publication number: 20230041963
    Abstract: Methods and techniques for deposition of amorphous carbon films on a substrate are provided. In one example, the method includes depositing an amorphous carbon film on an underlayer positioned on a susceptor in a first processing region. The method further includes implanting a dopant or the inert species into the amorphous carbon film in a second processing region. The implant species, energy, dose & temperature in some combination may be used to enhance the hardmask hardness. The method further includes patterning the doped amorphous carbon film. The method further includes etching the underlayer.
    Type: Application
    Filed: October 11, 2022
    Publication date: February 9, 2023
    Inventors: Rajesh PRASAD, Sarah BOBEK, Prashant Kumar KULSHRESHTHA, Kwangduk Douglas LEE, Harry WHITESELL, Hidetaka OSHIO, Dong Hyung LEE, Deven Matthew Raj MITTAL, Scott FALK, Venkataramana R. CHAVVA
  • User information method and apparatus for directing link-layer communication
    Patent number: 11575577
    Abstract: A network device has an input configured to receive a message relating to a given user attempting to forward one or more packets across a computer network. The message has given user information relating to the given user. In addition, the routing device also has a selector, operatively coupled with the input, configured to select (after receiving the message) a given group routing policy from a plurality of group routing policies. Preferably, the selector is configured to select the given group routing policy as a function of the given user information. The routing device also has an output operatively coupled with the selector. The output is configured to cause routing of user communication across the network using link-layer routes specified by the given group routing policy.
    Type: Grant
    Filed: February 23, 2022
    Date of Patent: February 7, 2023
    Assignee: 128 Technology, Inc.
    Inventors: Patrick J. MeLampy, Abilash Menon, Michael Baj, Prashant Kumar
  • HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
    Publication number: 20230029929
    Abstract: Methods and techniques for deposition of amorphous carbon films on a substrate are provided. In one example, the method includes depositing an amorphous carbon film on an underlayer positioned on a susceptor in a first processing region. The method further includes implanting a dopant or the inert species into the amorphous carbon film in a second processing region. The implant species, energy, dose & temperature in some combination may be used to enhance the hardmask hardness. The method further includes patterning the doped amorphous carbon film. The method further includes etching the underlayer.
    Type: Application
    Filed: October 10, 2022
    Publication date: February 2, 2023
    Inventors: Rajesh PRASAD, Sarah BOBEK, Prashant Kumar KULSHRESHTHA, Kwangduk Douglas LEE, Harry WHITESELL, Hidetaka OSHIO, Dong Hyung LEE, Deven Matthew Raj MITTAL, Scott FALK, Venkataramana R. CHAVVA
  • Systems and methods for forecasting inbound telecommunications
    Patent number: 11570305
    Abstract: Systems and methods forecast inbound telecommunications, and more particularly, analyze real-time and historical call center data, and apply a forecasting model to the data in order to predict inbound call volume. These systems and methods employ tools that manipulate call center data and generate visual representations of metrics pertaining to forecasting call center data via a dashboard.
    Type: Grant
    Filed: November 29, 2021
    Date of Patent: January 31, 2023
    Assignee: CaaStle, Inc.
    Inventors: Avinash Singh, Prashant Kumar Rai, Chirag Jain, Ankita Sinha
  • Methods of reducing chamber residues
    Patent number: 11560623
    Abstract: The present disclosure relates to systems and methods for reducing the formation of hardware residue and minimizing secondary plasma formation during substrate processing in a process chamber. The process chamber may include a gas distribution member configured to flow a first gas into a process volume and generate a plasma therefrom. A second gas is supplied into a lower region of the process volume. Further, an exhaust port is disposed in the lower region to remove excess gases or by-products from the process volume during or after processing.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: January 24, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Liangfa Hu, Prashant Kumar Kulshreshtha, Anjana M. Patel, Abdul Aziz Khaja, Viren Kalsekar, Vinay K. Prabhakar, Satya Teja Babu Thokachichu, Byung Seok Kwon, Ratsamee Limdulpaiboon, Kwangduk Douglas Lee, Ganesh Balasubramanian
  • Training corpus refinement and incremental updating
    Patent number: 11488055
    Abstract: Training corpus refinement and incremental updating includes obtaining a training corpus having training samples, refining the training corpus to produce a refined training corpus of data, by applying to the training corpus overlap and noise reduction treatments, maintaining an incremental intelligence database based on filtered user feedback and having candidate feedback training samples to augment the refined training corpus, controlling integration of the candidate feedback training samples with the refined training corpus, and augmenting the refined training corpus with at least some of the candidate feedback training samples to produce an augmented training corpus.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: November 1, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Prashant Kumar, John Vaughan
  • METHOD AND SYSTEM FOR DYNAMICALLY OPTIMIZING THE OPERATIONS OF LOGISTICS MANAGEMENT SYSTEM
    Publication number: 20220343260
    Abstract: This disclosure relates generally to the method and system for dynamically optimizing the operations of logistics management system. The existing methods for optimizing the operational processes in the sorting terminals are not dynamic as the sorting terminal operations are largely manual and experience driven. The proposed method and system describe an actor-based representation of simulatable digital twin of the sorting terminal that enables in-silico quantitative exploration of design space to help human experts arrive at the right decisions related to the logistics management system. The proposed method and system initially construct a high-fidelity simulatable digital twin of the sorting terminal, validate it, set it up with real data, and simulate various adaptation and design alternatives to understand their impacts on the key performance indicator values.
    Type: Application
    Filed: March 21, 2022
    Publication date: October 27, 2022
    Applicant: Tata Consultancy Services Limited
    Inventors: Souvik BARAT, Vinay KULKARNI, Subramaniam DHANDAPANI, Prashant KUMAR, Solomon Pushparaj MANUELRAJ, Sai Prasad PARMESWARAN, Monika GAJRANI
  • METHODS AND SYSTEMS FOR APPLICATION DEPLOYMENT AND OPTIMIZATION
    Publication number: 20220342648
    Abstract: Systems and methods described herein provide an application priority optimization service. Application information associated with an application to be deployed at a Multi-access Edge Computing (MEC) network is received and parameters associated with execution of the application are determined based on the application information. The application is deployed at the MEC network and information associated with performance of the application is obtained. Resources allocated for execution of the application may be adjusted based on the performance of the application to create a modified application and the modified application may be executed at the MEC network.
    Type: Application
    Filed: April 26, 2021
    Publication date: October 27, 2022
    Inventors: Karthik Ramaswamy, Prashant Kumar Rajpal, Sivanaga Ravi Kumar Chunduru Venkata, Darshan Gupta
  • Highly etch selective amorphous carbon film
    Patent number: 11469107
    Abstract: Methods and techniques for deposition of amorphous carbon films on a substrate are provided. In one example, the method includes depositing an amorphous carbon film on an underlayer positioned on a susceptor in a first processing region. The method further includes implanting a dopant or the inert species into the amorphous carbon film in a second processing region. The implant species, energy, dose & temperature in some combination may be used to enhance the hardmask hardness. The method further includes patterning the doped amorphous carbon film. The method further includes etching the underlayer.
    Type: Grant
    Filed: July 27, 2020
    Date of Patent: October 11, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Rajesh Prasad, Sarah Bobek, Prashant Kumar Kulshreshtha, Kwangduk Douglas Lee, Harry Whitesell, Hidetaka Oshio, Dong Hyung Lee, Deven Matthew Raj Mittal, Scott Falk, Venkataramana R. Chavva
  • COMPUTE-IN-MEMORY DEVICES, SYSTEMS AND METHODS OF OPERATION THEREOF
    Publication number: 20220309328
    Abstract: A method can include, for each row of a nonvolatile memory (NVM) cell array, generating a multiply-accumulate (MAC) result for the row by applying input values on bit lines. Each MAC result comprising a summation of an analog current or voltage that is a function of each input value modified by a corresponding weight value stored by the NVM cells of the row. By operation of at least one multiplexer, one of the rows can be connected to an analog-to-digital converter (ADC) circuit to convert the analog current or voltage of the row into a digital MAC value. A storage element of each NVM cell can be configured to store a weight value that can vary between no less than three different values. Corresponding devices and systems are also disclosed.
    Type: Application
    Filed: March 29, 2021
    Publication date: September 29, 2022
    Applicant: Infineon Technologies LLC
    Inventors: Prashant Kumar Saxena, Vineet Agrawal, Venkatraman Prabhakar
  • Method of fast estimation of scene brightness and optimal camera exposure
    Patent number: 11438519
    Abstract: A method and an apparatus for adjusting an optimal exposure of a camera are provided. The method may include: receiving a camera start command to activate a camera of an electronic device; capturing an image frame of a scene by the camera; obtaining an Exposure Brightness Response (EBR) of the camera; providing the EBR and the image frame as an input to a pre-trained neural network specific to the camera; and determining a plurality of exposure parameters of the camera and a mean pixel brightness (MPB) by using the pre-trained neural network.
    Type: Grant
    Filed: January 13, 2021
    Date of Patent: September 6, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Soumyadarshi Adhikari, Prashant Kumar, Srinivasa Mysore Ravindra, Mahammadrafi Maniyar, Prasanth Kammampati
  • Processing systems and methods to control process drift
    Patent number: 11430641
    Abstract: Exemplary methods of semiconductor processing may include forming a plasma of a fluorine-containing precursor. The methods may include performing a chamber clean in a processing region of a semiconductor processing chamber. The processing region may be at least partially defined between a faceplate and a substrate support. The methods may include generating aluminum fluoride during the chamber clean. The methods may include contacting surfaces within the processing region with a carbon-containing precursor. The methods may include volatilizing aluminum fluoride from the surfaces of the processing region.
    Type: Grant
    Filed: July 2, 2021
    Date of Patent: August 30, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Vivien Chua, Prashant Kumar Kulshreshtha, Zhijun Jiang, Fang Ruan, Diwakar Kedlaya