Patents by Inventor Quang Le

Quang Le has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MAGNETIC READ SENSOR HAVING FLAT SHIELD PROFILE
    Publication number: 20130163124
    Abstract: A magnetic read sensor having a flat shield for improved gap thickness definition and control. The magnetic read head includes a sensor stack and hard bias layer formed at either side of the sensor stack. A SiNx hard bias capping layer is formed over the hard bias layers between the hard bias structure and the upper magnetic shield. The hard bias capping layer has an upper surface that has been planarized by chemical mechanical polishing that is co-planar with an upper surface of the sensor stack. The read sensor is constructed by a method wherein the hard bias capping layer is constructed of a material (e.g. SiNx) that is also used as a CMP stop layer and that can be planarized by chemical mechanical polishing while having some resistance to removal by chemical mechanical polishing.
    Type: Application
    Filed: December 22, 2011
    Publication date: June 27, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hicham M. Sougrati, Quang Le, Honglin Zhu
  • MAGNETIC SENSOR HAVING HARD BIAS STRUCTURE FOR OPTIMIZED HARD BIAS FIELD AND HARD BIAS COERCIVITY
    Publication number: 20130163121
    Abstract: A magnetic read sensor having a hard bias structure that extends beyond the back edge of the sensor stack by a controlled, distance that is chosen to maximize both hard bias field and hard bias magnetic coercivity and anisotropy. The hard bias structure has a back edge that is well defined and that has a square corner at its innermost end adjacent to the sensor stack. The magnetic sensor can be constructed by a process that includes a separate making an milling process that is dedicated to defining the back edge of the hard bias structure.
    Type: Application
    Filed: December 22, 2011
    Publication date: June 27, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, David J. Seagle, Guangli Liu, Yongchul Ahn, Simon H. Liao
  • METHOD FOR MANUFACTURING A MAGNETIC SENSOR USING TWO STEP ION MILLING
    Publication number: 20130135772
    Abstract: A method for manufacturing a magnetic sensor that includes depositing a plurality of mask layers, then forming a stripe height defining mask over the sensor layers. A first ion milling is performed just sufficiently to remove portions of the free layer that are not protected by the stripe height defining mask, the first ion milling being terminated at the non-magnetic barrier or spacer layer. A dielectric layer is then deposited, preferably by ion beam deposition. A second ion milling is then performed to remove portions of the pinned layer structure that are not protected by the mask, the free layer being protected during the second ion milling by the dielectric layer.
    Type: Application
    Filed: November 29, 2011
    Publication date: May 30, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yongchul Ahn, Xiaozhong Dang, Quang Le, Simon H. Liao
  • MAGNETIC BIAS STRUCTURE FOR MAGNETORESISTIVE SENSOR HAVING A SCISSOR STRUCTURE
    Publication number: 20130082696
    Abstract: A scissor style magnetic sensor having a novel hard bias structure for improved magnetic biasing robustness. The sensor includes a sensor stack that includes first and second magnetic layers separated by a non-magnetic layer such as an electrically insulating barrier layer or an electrically conductive spacer layer. The first and second magnetic layers have magnetizations that are antiparallel coupled, but that are canted in a direction that is neither parallel with nor perpendicular to the air bearing surface by a magnetic bias stricture. The magnetic bias structure includes a neck portion extending from the back edge of the sensor stack and having first and second sides that are aligned with first and second sides of the sensor stack. The bias structure also includes a tapered or wedged portion extending backward from the neck portion.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 4, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Simon H. Liao, Shuxia Wang, Guangli Liu, Yongchul Ahn
  • MAGNETIC BIAS STRUCTURE FOR MAGNETORESISTIVE SENSOR
    Publication number: 20130083432
    Abstract: A magnetic read head having a hard bias structure that both optimizes magnetic bias field and also ensures manufacturability while maintaining sensor stripe height integrity. The read head includes a sensor stack having a back edge and first and second laterally opposed sides. A hard bias structure extending from each of the first and second sides of the sensor stack has a neck portion located near the sensor and having a back edge that is aligned with and parallel to the back edge of the sensor stack. The hard bias structure also includes a flared portion having a back edge that defines an angle relative to the air bearing surface of the read head. The back edge preferably defines and angle of 45-75 degrees relative to the air bearing surface.
    Type: Application
    Filed: September 29, 2011
    Publication date: April 4, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Simon H. Liao, Shuxia Wang, Guangli Liu, Yongchul Ahn
  • METHOD FOR MANUFACTURING A MAGNETORESISTIVE SENSOR USING SIMULTANEOUSLY FORMED HARD BIAS AND ELECTRICAL LAPPING GUIDE
    Publication number: 20130001187
    Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.
    Type: Application
    Filed: June 29, 2011
    Publication date: January 3, 2013
    Inventors: Quang Le, Shin Funada, Jui-Lung Li
  • Method for manufacturing a magnetic tape head using a TMR sensor
    Patent number: 8333898
    Abstract: A method for manufacturing a magnetic tape head having a data sensor and a servo sensor. The data sensor and servo sensor are each separated from first and second magnetic shields by a non-magnetic gap layer, and the gap thickness for the servo sensor is larger than the gap thickness for the data sensor. The method involves depositing a first gap layer over shield structures, then depositing a second gap layer using a liftoff process to remove the second gap layer over the data sensor region. A plurality of sensor layers are then deposited, and a stripe height defining mask structure is formed over the data and servo sensor regions, the mask having a back edge that is configured to define a stripe height of the data and servo sensors. An ion milling is then performed to define the stripe height and to remove gap material from the field.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: December 18, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Diane L. Brown, Quang Le, Chang-Man Park, David J. Seagle, Eileen Yan
  • Method for manufacturing a magnetoresistive sensor having a flat shield
    Patent number: 8296930
    Abstract: A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield to be very thin.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: October 30, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Shin Funada, Quang Le, Thomas L. Leong, Jui-Lung Li, Chang-Man Park, Ning Shi, Hicham M. Sougrati
  • METHOD FOR MANUFACTURING AN ADVANCED MAGNETIC READ SENSOR
    Publication number: 20120231296
    Abstract: A method for manufacturing a magnetic sensor that minimizes topography resulting from stripe height defining masking and patterning in order to facilitate definition of track width. The method includes depositing a series of mask layers and then masking and ion milling the series of sensor layers to define a back edge of a sensor. A non-magnetic fill layer is then deposited, the magnetic fill layer being constructed of a material that has an ion mill rate that is similar to that of the series of sensor layers. A second masking and milling process is then performed to define the track width of the sensor and hard bias is deposited. Because the non-magnetic fill layer is removed at substantially the same rate as the sensor material the structure has a very flat topography on which to form the sensor track width.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 13, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Jui-Lung Li, Yongchul Ahn, Simon H. Liao, Guangli Liu, Masaya Nishioka
  • Write head with self-align layer and a method for making the same
    Patent number: 8259413
    Abstract: A system according to one embodiment includes a write pole having an end region positioned towards an air bearing surface, a first flare point, and a second flare point positioned between the air bearing surface and the first flare point; and a shield positioned above the write pole, wherein a cross sectional area of the write pole at a point between the first and second flare points along a plane passing through the write pole and oriented about parallel to the air bearing surface is greater than a cross sectional area of the end region of the write pole along a plane oriented parallel to the plane passing through the second flare point. Additional systems and methods are also presented.
    Type: Grant
    Filed: December 31, 2008
    Date of Patent: September 4, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Christian René Bonhôte, Quang Le, Jeffrey S. Lille, Vladimir Nikitin, Aron Pentek
  • Manufacturing a narrow track read head
    Patent number: 8252516
    Abstract: Embodiments of the invention operate to narrow the track width of a read head used in a disk drive. In one embodiment, a magnetic read head has a track width of about 40 nm or less. The read head is fabricated by a method that includes fabricating a film stack from a substrate, a sensor material, a stop material, a first release material, a mask material, and a photo resist material. The mask material may include a masking substrate material and a second release material. The film stack is processed by forming a read head image in the photo resist material, removing portions of the film stack that lie outside the read head image of the photo resist material, stripping the film stack to remove the photo resist, mask and first release materials, and milling the sensor material according to the read head image.
    Type: Grant
    Filed: October 30, 2008
    Date of Patent: August 28, 2012
    Assignee: HGST Netherlands, B.V.
    Inventors: Quang Le, Jui-Lung Li
  • METHOD FOR MANUFACTURING A MAGNETIC TAPE HEAD USING A TMR SENSOR
    Publication number: 20120152891
    Abstract: A method for manufacturing a magnetic tape head having a data sensor and a servo sensor. The data sensor and servo sensor are each separated from first and second magnetic shields by a non-magnetic gap layer, and the gap thickness for the servo sensor is larger than the gap thickness for the data sensor. The method involves depositing a first gap layer over shield structures, then depositing a second gap layer using a liftoff process to remove the second gap layer over the data sensor region. A plurality of sensor layers are then deposited, and a stripe height defining mask structure is formed over the data and servo sensor regions, the mask having a back edge that is configured to define a stripe height of the data and servo sensors. An ion milling is then performed to define the stripe height and to remove gap material from the field.
    Type: Application
    Filed: December 20, 2010
    Publication date: June 21, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Diane L. Brown, Quang Le, Chang-Man Park, David J. Seagle, Eileen Yan
  • Method And Apparatus For Network Node Discovery
    Publication number: 20120155322
    Abstract: Various methods and devices are provided to address the need for improved network node discovery. In one method, a network node receives from a sending node a request indicating a criterion of interest to an originator node. If the network node meets the criterion, the network node sends a response to the originator node indicating that the network node meets the criterion. The network node also forwards the request to any nodes that neighbor the network node other than the sending node.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 21, 2012
    Inventors: Jaideep S. Lamba, Chienwen Tien, Liem Quang Le
  • MULTI-ANGLE HARD BIAS DEPOSITION FOR OPTIMAL HARD-BIAS DEPOSITION IN A MAGNETIC SENSOR
    Publication number: 20120156390
    Abstract: A method for manufacturing a magnetic sensor that result in improved magnetic bias field to the sensor, improved shield to hard bias spacing and a flatter top shield profile. The method includes a multi-angled deposition of the hard bias structure. After forming the sensor stack a first hard bias layer is deposited at an angle of about 70 degrees relative to horizontal. This is a conformal deposition. Then, a second deposition is performed at an angle of about 90 degrees relative to horizontal. This is a notching deposition, that results in notches being formed adjacent to the sensor stack. Then, a hard bias capping layer is deposited at an angle of about 55 degrees relative to horizontal. This is a leveling deposition that further flattens the surface on which the top shield can be electroplated.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 21, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Satoru Araki, Shin Funada, Insik Jin, Quang Le, Simon H. Liao, Chang-Man Park
  • TMR READER WITHOUT DLC CAPPING STRUCTURE
    Publication number: 20120127616
    Abstract: Embodiments herein generally relate to TMR readers and methods for their manufacture. The embodiments discussed herein disclose TMR readers that utilize a structure that avoids use of the DLC layer over the sensor structure and over the hard bias layer. The capping structure over the sensor structure functions as both a protective layer for the sensor structure and a CMP stop layer. The hard bias capping structure functions as both a protective structure for the hard bias layer and as a CMP stop layer. The capping structures that are free of DLC reduce the formation of notches in the second shield layer so that second shield layer is substantially flat.
    Type: Application
    Filed: November 24, 2010
    Publication date: May 24, 2012
    Inventors: HONGLIN ZHU, Liubo Hong, Hicham M. Sougrati, Quang Le, Jui-Lung Li, Chando Park
  • METHOD FOR MANUFACTURING A NARROW MAGNETIC READ WIDTH CURRENT PERPENDICULAR TO PLANE MAGNETORESISTIVE SENSOR
    Publication number: 20120125884
    Abstract: A method for manufacturing a magnetic read head having a very narrow track width. The method includes the use of a non-Si containing photoresist to form a mask prior to ion milling to define the track-width of the sensor. Previously only Si-containing resists were used. The Si in the resist turned to an oxide, which allowed the photoresist to withstand the reactive ion etching used for image transfer to an underlying hard mask. The Si-containing resist, however, has limitations as to how small the mask can be made. It has been found that a non-Si-containing resist provides better resolution at very narrow track-width definition, and also provides good temperature resistance. Some modifications to the process allow the non-Si-containing resist to be used in the construction of the magnetic read sensor.
    Type: Application
    Filed: November 24, 2010
    Publication date: May 24, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B. V.
    Inventors: Ki S. Chung, Vincent Gemena, Quang Le, Eileen Yan
  • Additive write pole process for wrap around shield
    Patent number: 8137570
    Abstract: A method for manufacturing a magnetic write head having a wrap around magnetic trailing shield and a very narrow track width. A magnetic write pole is formed by forming a mask over a magnetic write pole material and performing a first ion milling to define the write pole. The mask includes a hard mask layer such as diamond like carbon (DLC) and further mask layers formed over the hard mask layer. In order to facilitate manufacture at very narrow track widths processes are employed to remove re-deposited material and the remaining portions of the mask structure (except the hard mask). Further processing can then be employed without the risk of a very narrow mask structure and redep bending or breaking during later manufacturing steps.
    Type: Grant
    Filed: April 9, 2008
    Date of Patent: March 20, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Quang Le
  • Method for making a magnetic head having a non-GMR shunt
    Patent number: 8136227
    Abstract: A magnetic head having non-GMR shunt for perpendicular recording and method for making magnetic head having non-GMR shunt for perpendicular recording is disclosed. A shunt is provided for shunting charge from a read sensor. The shunt is formed co-planar with the read sensor and is fabricated using non-GMR materials.
    Type: Grant
    Filed: October 11, 2005
    Date of Patent: March 20, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Michael Feldbaum, Quang Le, Edward H. Lee, Neil L. Robertson, Charles G. Seegel, III
  • Methods for fabricating perpendicular recording heads with controlled separation regions
    Patent number: 8099855
    Abstract: Methods of recording head fabrication are provided to fabricate a region of separation material between a write pole and a shield of a write head that forms a controlled spacing between the write pole and the shield of the write head. The method comprises forming a mask structure having an opening exposing a write pole of the write head and forming separation material above the portions of the write pole exposed by the opening. The method further comprises removing the mask structure and forming a shield of the write head above the separation material. The separation material forms a spacing between the write pole and the shield, which controls the amount of flux from the write pole absorbed by a shield (e.g., a wrap around shield) of the write head.
    Type: Grant
    Filed: December 16, 2007
    Date of Patent: January 24, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventor: Quang Le
  • Method for producing tight pitched coil with reduced processing steps
    Patent number: 8048281
    Abstract: Methods for fabricating thin film magnetic head coil structures are disclosed. The methods disclose deposition of a first thick seed layer, followed by deposition of an ultra-thin second seed layer. Coil structures having sub-micron pitch and high aspect ratios are deposited on the second ultra-thin seed layer, which is removed from between the coil windings via an isotropic etch process such as wet etching or RIE. Subsequent to selective removal of the ultra-thin second seed layer, the first thick seed layer is utilized to deposit pole and backgap structures, eliminating the need to deposit (and remove) a subsequent seed layer on the coil structure.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: November 1, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Christian Rene Bonhote, Quang Le, Ihavin Sinha