Abstract: A projection exposure tool (10) for microlithography with a measuring apparatus (36) disposed in an optical path (28) of the projection exposure tool (10) for the locally and angularly resolved measurement of an irradiation strength distribution. The measuring apparatus (36) includes a measuring field with an arrangement (56) of focusing optical elements (42) disposed at respective individual points of the measuring field (41), a common image plane (44) for the focusing optical elements (42), a locally resolving radiation detector (46) with a recording surface (48) for the locally resolved recording of a radiation intensity, the recording surface (48) being disposed in the common image plane (44), and the radiation detector outputting radiation intensity signals for a plurality of angle values indicative of a respective angularly resolved irradiation strength distribution for at least one of the individual measuring field points.

Abstract: A method of manufacturing an optical system having plural optical elements mounted relative to each other on a mounting structure of the optical system comprises disposing the optical system in a beam path of an interferometer apparatus having an interferometer optics and a selectable hologram for shaping a beam of measuring light to be incident on surfaces of the optical elements of the optical system; selecting a first hologram of the interferometer apparatus and recording at least one first interference pattern generated by measuring light reflected from a surface of a first optical element; selecting a second hologram of the interferometer apparatus, wherein the second hologram is different from the first hologram, and recording at least one second interference pattern generated by measuring light reflected from a surface of a second optical element, which is different from the first optical element; and adjusting a position of the first optical element relative to the second optical element on the mounti

Abstract: A method of manufacturing an optical system having plural optical elements mounted relative to each other on a mounting structure of the optical system comprises disposing the optical system in a beam path of an interferometer apparatus having an interferometer optics and a selectable hologram for shaping a beam of measuring light to be incident on surfaces of the optical elements of the optical system; selecting a first hologram of the interferometer apparatus and recording at least one first interference pattern generated by measuring light reflected from a surface of a first optical element; selecting a second hologram of the interferometer apparatus, wherein the second hologram is different from the first hologram, and recording at least one second interference pattern generated by measuring light reflected from a surface of a second optical element, which is different from the first optical element; and adjusting a position of the first optical element relative to the second optical element on the mounti

Abstract: A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.

Abstract: A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49;

Abstract: A lithography method is proposed employing a projection exposure system having a catoptric imaging optics comprising a mirror formed as phase mask in the imaging beam path, wherein the mirror formed as phase mask exhibits continuous regions having dielectric layers provided thereon. Optionally, the regions of the mirror formed as phase mask are configured such that an axial extension of an image of a point (DOF) of the imaging is increased or/and a lateral extension of an image of a point of the imaging is decreased. Preferably multiple exposures of a same radiation sensitive substrate are performed in order to achieve an increase in resolution and scaling down of the manufacturing trace structures (61, 61?), respectively.

Abstract: A projection exposure system and method of manufacturing a miniaturized device using the projecting exposure system uses an imaging of a patterning structure onto a substrate using a projection optical system. Measuring light is directed through the projection optical system to be incident on the substrate and measuring light reflected from the substrate is superimposed with reference light to generate an interference pattern. The interference pattern is analyzed to determine imaging properties of the projecting optical system. Actuators of the projection optical system may be used to improve the imaging characteristics.

Abstract: A projection illumination system with a plurality of optical components (29, 32) includes an interferometer arrangement (37) whose components are arranged outside a projection beam path (17) of the projection illumination system. Measurement radiation of the interferometer arrangement strikes a surface (35) of the optical component (29) to be measured under a large angle of incidence (?). Actuators (83, 87) of the projection illumination system can be actuated as a function of a measurement radiation intensity distribution detected using the interferometer arrangement in order to change imaging characteristics of the projection illumination system and to keep them stable in particular also with respect to drifting.

Abstract: A method for determining the shape of a rough surface of an object comprises the steps of providing an object having a given roughness related height variation; providing an interferometer for wave front measurement comprising a measurement beam of electromagnetic radiation having a wavelength ? not exceeding 10 times of the roughness related height variation of the object surface, which measurement beam comprises an incoming wave for illuminating the object surface and an outgoing wave comprising radiation from the incoming wave reflected off the object surface; directing the incoming wave of the measurement beam onto the object surface at least two different probing locations, thereby illuminating an areal element of the object surface at each of the probing locations; and measuring the respective phase distribution of the outgoing wave by means of the interferometer of each of the at least two different probing locations.

Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.

Abstract: Illumination devices and masks for microlithography projection exposure systems, as well as related systems and methods, are disclosed.

Abstract: A method of processing an optical element having a spherical surface comprises providing a first interferometer apparatus having an interferometer optics with an aspherical lens for transforming a beam of a first spherical beam type into a beam of a second spherical beam type, arranging the optical element in a beam path of an incident beam provided by the interferometer optics, interferometrically taking a first measurement of the optical element, and determining first deviations of the spherical surface. The method further comprises arranging the aspherical lens in a beam path of a measuring beam provided by a beam source of a second interferometer apparatus, wherein the measuring beam is one of the first spherical type and the second spherical type, interferometrically taking a second measurement using the measuring beam, and determining second deviations of an aspherical surface of the aspherical lens.

Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.

Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.

Abstract: In a method for calibrating a radius test bench for measuring radii of optical elements, in particular of lenses and spherical mirrors, there are provided an illuminating system 1 that generates a spherical wave and a diffractive optical element 3 that retroreflects a spherical wave of a specific radius into itself. The diffractive optical element 3 is introduced into the radius test bench in at least two positions, a first position thereof being a cat's eye position 1 and another position being an autocollimation position, as a result of which it is possible to use the radius of curvature simulated by the diffractive optical element 3 to detect deviations of the radius test bench from this radius of curvature as errors of the radius test bench, and thus to take them into account in the measurements of optical elements to be tested.

Abstract: A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.

Abstract: A method for qualifying and/or manufacturing an optical surface includes: arranging a first substrate having a first surface and a second surface opposite the first surface in a beam path of a first incident beam with the first surface facing towards the first incident beam, and taking an interferometric measurement of the second surface; arranging the first substrate in the beam path of the first incident beam with the second surface facing towards the first incident beam, and taking an interferometric measurement of the second surface; arranging a third surface of a second substrate in a beam path of a second incident beam, and taking an interferometric measurement of the third surface; arranging the third surface of the second substrate and the first substrate in the beam path of the second incident beam, and taking an interferometric measurement of the third surface.

Abstract: A projection exposure system and method of manufacturing a miniaturized device using the projecting exposure system uses an imaging of a patterning structure onto a substrate using a projection optical system. Measuring light is directed through the projection optical system to be incident on the substrate and measuring light reflected from the substrate is superimposed with reference light to generate an interference pattern. The interference pattern is analyzed to determine imaging properties of the projecting optical system. Actuators of the projection optical system may be used to improve the imaging characteristics.

Abstract: A method of calibrating an interferometer for determining an optical property of the interferometer uses a calibrating optical arrangement. The calibrating optical arrangement comprises at least one diffractive pattern and a mirror having a reflecting surface. The diffractive pattern and the reflecting surface are disposed at a distance from each other in a beam path of measuring light emitted from an interferometer optics of the interferometer system to be calibrated.

Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.