Abstract: A stacked assembly includes a stacked structure stacked on a through via recessed reveal structure. The through via recessed reveal structure includes recesses within a backside surface of an electronic component that expose backsides of through vias. Pillars of the stacked structure are attached to the exposed backsides of the through vias through the recesses. The recesses in combination with the pillars work as a lock and key arrangement to insure self-alignment of the pillars with the backsides of the through vias allowing fine pitch interconnections to be realized. Further, by forming the interconnections to the backsides of the through vias within the recesses, the overall thickness of the stacked assembly is minimized. Further still, by forming the interconnections to the backsides of the through vias within the recesses, shorting between adjacent through vias is minimized or eliminated.

Abstract: A method includes forming a patterned sacrificial layer on a first carrier and a patterned trace layer on the patterned sacrificial layer. The patterned sacrificial layer and the patterned trace layer are laminated to a dielectric material. The first carrier and the patterned sacrificial layer are removed creating sacrificial layer gaps above the patterned trace layer. The sacrificial layer gaps are filled with a trace layer isolation dielectric material. Shield trenches are laser-ablated within the dielectric material and on opposite sides of a signal trace of the patterned trace layer. The shield trenches are filled with an electrically conductive material to form shield walls. The electrically conductive material is patterned to form a shield top. The shield top, the shield walls, and a second carrier form a bias shield around the signal trace.

Abstract: A method of forming an electronic component package includes coupling a first surface of an electronic component to a first surface of a first dielectric strip, the electronic component comprising bond pads on the first surface; forming first via apertures through the first dielectric strip to expose the bond pads; and filling the first via apertures with an electrically conductive material to form first vias electrically coupled to the bond pads. The bond pads are directly connected to the corresponding first vias without the use of a solder and without the need to form a solder wetting layer on the bond pads.

Abstract: Through vias extend through a substrate between a frontside surface and a backside surface, the through vias comprising active surface ends at the frontside surface. A frontside redistribution structure is coupled to the active surface ends, the frontside redistribution structure exerting force on the frontside surface, e.g., due to a difference in the thermal coefficient of expansion (TCE) between the frontside redistribution structure and the substrate. To prevent warpage of the substrate, a backside warpage control structure is coupled to the backside surface of the substrate. The backside warpage control structure exerts an equal but opposite force to the force exerted by the frontside redistribution structure thus avoiding warpage of the substrate.

Abstract: Methods and systems for a semiconductor device package with a die to interposer wafer first bond are disclosed and may include bonding a plurality of semiconductor die comprising electronic devices to an interposer wafer, and applying an underfill material between the die and the interposer wafer. A mold material may be applied to encapsulate the die. The interposer wafer may be thinned to expose through-silicon-vias (TSVs) and metal contacts may be applied to the exposed TSVs. The interposer wafer may be singulated to generate assemblies comprising the semiconductor die and an interposer die. The die may be placed on the interposer wafer utilizing an adhesive film. The interposer wafer may be singulated utilizing one or more of: a laser cutting process, reactive ion etching, a sawing technique, and a plasma etching process. The die may be bonded to the interposer wafer utilizing a mass reflow or a thermal compression process.

Abstract: Methods and systems for a semiconductor device with through-silicon via-less deep wells are disclosed and may include forming a mask pattern on a silicon carrier, etching wells in the silicon carrier, and forming metal contacts in the etched wells, wherein the metal contacts comprise a plurality of deposited metal layers. Redistribution layers may be formed on a subset of the contacts and a dielectric layer may be formed on the silicon carrier and formed redistribution layers. Vias may be formed through the dielectric layer to a second subset of the contacts and second redistribution layers may be formed on the dielectric layer. A semiconductor die may be electrically coupled to the second formed redistribution layers and formed vias. The semiconductor die and top surface of the dielectric layer may be encapsulated and the silicon carrier may be thinned to a thickness of the contacts or may be completely removed.

Abstract: An interposer having a multilayered conductive pattern portion that is constructed by repeating the direct printing on a carrier of one or more conductive pattern layers and application of one or more insulating layers between the printed conductive pattern layers is described. Also, a method for manufacturing the interposer, a semiconductor package using the interposer, and a method for fabricating the semiconductor package are described.

Abstract: Methods and systems for backside dielectric patterning for wafer warpage and stress control are disclosed and may include thinning a semiconductor wafer comprising one or more through silicon vias (TSVs) and one or more die to expose the TSVs on a first surface of the wafer. The wafer may be passivated by depositing dielectric layers. The passivated wafer may be planarized and portions dielectric layers may be selectively removed to reduce a strain on the wafer. Metal contacts may be placed on the exposed TSVs prior to or after the selectively removal. The die may comprise functional electronic die or interposer die. Portions of the dielectric layers may be selectively removed in a radial pattern and may comprise a nitride and/or silicon dioxide layer. The wafer may be thinned to below a top surface of the TSVs. The dielectric layers may be selectively removed utilizing a dry etch process.

Abstract: A method of forming an electronic component package includes coupling a first surface of an electronic component to a first surface of a first dielectric strip, the electronic component comprising bond pads on the first surface; forming first via apertures through the first dielectric strip to expose the bond pads; and filling the first via apertures with an electrically conductive material to form first vias electrically coupled to the bond pads. The bond pads are directly connected to the corresponding first vias without the use of a solder and without the need to form a solder wetting layer on the bond pads.

Abstract: A redistribution pattern is formed on active surfaces of electronic components while still in wafer form. The redistribution pattern routes bond pads of the electronic components to redistribution pattern terminals on the active surfaces of the electronic components. The bond pads are routed to the redistribution pattern terminals while still in wafer form, which is a low cost and high throughput process, i.e., very efficient process.

Abstract: An extended landing pad substrate package includes a dielectric layer having an upper surface and an opposite lower surface. A lower circuit pattern is embedded in the lower surface of the dielectric layer. The lower circuit pattern includes traces having a first thickness and extended landing pads having a second thickness greater than the first thickness. Blind via apertures are formed through an upper circuit pattern embedded into the upper surface of the dielectric layer, through the dielectric layer and to the extended landing pads. The length of the blind via apertures is minimized due to the increase second thickness of the extended landing pads as compared to the first thickness of traces. Accordingly, the width of the blind via apertures at the upper surface of the dielectric layer is minimized.

Abstract: A method for making an integrated circuit substrate having laminated laser-embedded circuit layers provides a multi-layer high-density mounting and interconnect structure for integrated circuits. A prepared substrate, which may be a rigid double-sided dielectric or film dielectric with conductive patterns plated, etched or printed on one or both sides is laminated with a thin-film dielectric on one or both sides. The thin-film is laser-ablated to form channels and via apertures and conductive material is plated or paste screened into the channels and apertures, forming a conductive interconnect pattern that is isolated by the channel sides and vias through to the conductive patterns on the prepared substrate. An integrated circuit die and external terminals can then be attached to the substrate, providing an integrated circuit having a high-density interconnect.

Abstract: Methods for temporary wafer molding for chip-on-wafer assembly may include bonding one or more semiconductor die to an interposer wafer, applying a temporary mold material to encapsulate the bonded die, and backside processing the interposer, which may be singulated to generate assemblies comprising the bonded die, the interposer die, which may be bonded to packaging substrates. The temporary mold material may be removed and the bonded die may be tested. Additional die may be bonded to the assemblies based on the electrical testing. The interposer may be singulated utilizing one or more of: a laser cutting process, reactive ion etching, a sawing technique, and a plasma etching process. The backside processing may comprise thinning the interposer wafer to expose through-silicon-vias (TSVs) and placing metal contacts on the exposed TSVs. The die may be bonded to the interposer utilizing a mass reflow or thermal compression process.

Abstract: Methods for a semiconductor device package with a die-to-die first bond are disclosed and may include bonding one or more semiconductor die comprising electronic devices to an interposer die. An underfill material may be applied between the semiconductor die and the interposer die, and a mold material may be applied to encapsulate the semiconductor die. The interposer die may be thinned to expose through-silicon-vias (TSVs). The bonding of the semiconductor die may comprise adhering the semiconductor die to an adhesive layer, and bonding the semiconductor die to the interposer die. The semiconductor die may comprise micro-bumps for coupling to the interposer die, wherein the bonding comprises: positioning the micro-bumps in respective wells in a layer disposed on the interposer die; and bonding the micro-bumps to the interposer die. The semiconductor die may be bonded to the interposer die utilizing a mass reflow process or a thermal compression process.

Abstract: Methods and systems for a semiconductor device package with a die to interposer wafer first bond are disclosed and may include bonding a plurality of semiconductor die comprising electronic devices to an interposer wafer, and applying an underfill material between the die and the interposer wafer. A mold material may be applied to encapsulate the die. The interposer wafer may be thinned to expose through-silicon-vias (TSVs) and metal contacts may be applied to the exposed TSVs. The interposer wafer may be singulated to generate assemblies comprising the semiconductor die and an interposer die. The die may be placed on the interposer wafer utilizing an adhesive film. The interposer wafer may be singulated utilizing one or more of: a laser cutting process, reactive ion etching, a sawing technique, and a plasma etching process. The die may be bonded to the interposer wafer utilizing a mass reflow or a thermal compression process.

Abstract: Methods for a semiconductor device package with a die-to-die first bond are disclosed and may include bonding one or more semiconductor die comprising electronic devices to an interposer die. An underfill material may be applied between the semiconductor die and the interposer die, and a mold material may be applied to encapsulate the semiconductor die. The interposer die may be thinned to expose through-silicon-vias (TSVs). The bonding of the semiconductor die may comprise adhering the semiconductor die to an adhesive layer, and bonding the semiconductor die to the interposer die. The semiconductor die may comprise micro-bumps for coupling to the interposer die, wherein the bonding comprises: positioning the micro-bumps in respective wells in a layer disposed on the interposer die; and bonding the micro-bumps to the interposer die. The semiconductor die may be bonded to the interposer die utilizing a mass reflow process or a thermal compression process.

Abstract: Methods for temporary wafer molding for chip-on-wafer assembly may include bonding one or more semiconductor die to an interposer wafer, applying a temporary mold material to encapsulate the bonded die, and backside processing the interposer, which may be singulated to generate assemblies comprising the bonded die, the interposer die, which may be bonded to packaging substrates. The temporary mold material may be removed and the bonded die may be tested. Additional die may be bonded to the assemblies based on the electrical testing. The interposer may be singulated utilizing one or more of: a laser cutting process, reactive ion etching, a sawing technique, and a plasma etching process. The backside processing may comprise thinning the interposer wafer to expose through-silicon-vias (TSVs) and placing metal contacts on the exposed TSVs. The die may be bonded to the interposer utilizing a mass reflow or thermal compression process.

Abstract: Methods and systems for a semiconductor device package with a die-to-packing substrate first bond are disclosed and may include bonding a first semiconductor die to a packaging substrate, applying an underfill material between the first semiconductor die and the packaging substrate, and bonding one or more additional die to the first semiconductor die. The additional die may comprise electronic devices. The first semiconductor die may comprise an interposer die or may comprise electronic devices. The first semiconductor die may be bonded to the packaging substrate utilizing a mass reflow process or a thermal compression process. The additional die may be bonded to the first die utilizing a mass reflow process or a thermal compression process. The bonded die may be encapsulated in a mold material, which may comprise a polymer. The one or more additional die may comprise micro-bumps for coupling to the first semiconductor die.

Abstract: A method of forming an electronic component package includes coupling a first surface of an electronic component to a first surface of a first dielectric strip, the electronic component comprising bond pads on the first surface; forming first via apertures through the first dielectric strip to expose the bond pads; and filling the first via apertures with an electrically conductive material to form first vias electrically coupled to the bond pads. The bond pads are directly connected to the corresponding first vias without the use of a solder and without the need to form a solder wetting layer on the bond pads.

Abstract: A method includes forming a patterned buildup layer on a first surface of a dielectric layer, the patterned buildup layer including a patterned buildup layer opening exposing a trace coupled to the dielectric layer. A conductor layer is flash plated on the patterned buildup layer and within the patterned buildup layer opening. The patterned buildup layer opening is filled with a blanket conductive filler layer. The blanket conductive filler layer and the conductor layer are planarized to form a flip chip bump.