Abstract: The present invention provides an open-type head mount display device and a display method thereof. The open-type head mount display device according to the present invention comprises a display unit for generating display images; a focusing lens unit for adjusting the object distance of a display image from a user's eye; an image acquisition unit for acquiring the image of the two eyes of the user; a focal distance analyzing unit for obtaining the focal distance of the user's eye according to the image of the two eyes of the user; and a lens adjusting unit for adjusting the position of the focusing lens unit in the light ray propagation direction of the display image according to a control command from the analyzing unit, so that the object distance of the display image is matched with the current focal distance of the user's eye.

Abstract: An array substrate and a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate (1); a thin film transistor, a passivation layer (5) and a transparent electrode (6), sequentially formed on the substrate, wherein a groove (51) is formed in an upper surface of the passivation layer (5), and the transparent electrode (6) is provided in the groove (51).

Abstract: An array substrate, a method of fabricating the same, and a liquid crystal display device are disclosed. The method comprises: sequentially forming a first transparent conductive material layer, an insulation material layer, a semiconductor material layer and a photoresist layer on a substrate base and forming patterns including a gate line, a gate, a gate insulation layer, a semiconductor layer and a first transparent electrode by patterning process; forming a passivation layer and forming a source via and a drain via connected to the semiconductor layer in the passivation layer; sequentially forming a second transparent conductive material layer and a source-drain metal layer and forming patterns including a source, a drain and a second transparent electrode by patterning process, the gate insulation layer is formed only on the gate and the gate line, the source and the drain include stacked second transparent conductive material layer and source-drain metal layer.

Abstract: An array substrate and a fabrication method thereof, and a display device are provided. The array substrate comprises a gate line and a data line intersecting with each other. The data line and the gate line are formed in a same layer on a substrate, the data line is disconnected in a region of the gate line. A connection pattern is formed in the region of the gate line, the connection pattern is insulated from the gate line, and ends of the data line located on both sides of the gate line are electrically connected by the connection pattern.

Abstract: The embodiments of the invention disclose a scanning type backlight module and a display device. Since a laser light source with good collimation is applied, during a display time of a frame, with the modulation of the optical path regulator, the laser emitted from the laser light source performs a progressive scanning for a region corresponding to at least one row of pixel units in a light guide plate or a display panel. Therefore, the problem of dynamic picture ghosting can be solved effectively; moreover, since the progressive scanning for the entire light guide plate can be realized by changing the light propagation path of the laser emitted from the laser light source with the optical path regulator, the number of the laser light sources can be reduced and the production cost can be decreased.

Abstract: An array substrate and a display device, the array substrate comprises a fan-out area (91), an edge area (93) and a display area (92) for performing display, the fan-out area (91) and the edge area (93) are connected with the display area (92) and located on two non-adjacent sides of the display area (92) respectively; a plurality of wirings (1) are arranged on the array substrate, and the wirings (1) are routed through the display area (92) and extend into the edge area (93), the input end of each wiring (1) is located in the fan-out area (91); pads (2) are configured for the wirings (1) respectively are located on the side far away from the input end of each wiring, and the pads (2) are located in the edge area (93).

Abstract: An array substrate, a method for fabricating the same and a display device are disclosed. The array substrate includes: a gate electrode of a TFT and a gate insulation layer sequentially formed on a base substrate; a semiconductor active layer, an etch stop layer and a source electrode and a drain electrode of the TFT sequentially formed on a part of the gate insulation layer that corresponds to the gate electrode of the TFT, the source and drain electrodes of the TFT are respectively in contact with the semiconductor active layer by way of via holes. The array substrate further includes: a first insulation layer formed between the gate electrode of the TFT and the gate insulation layer and the gate electrode is in contact with the gate insulation layer at a channel region of the TFT between the source electrode and the drain electrode of the TFT.

Abstract: A manufacturing method of a thin film transistor, a manufacturing method of an array substrate and an array substrate are provided. The manufacturing method of the thin film transistor comprises: forming an active layer, a source electrode and a drain electrode on a substrate by one patterning process, the active layer, the source electrode and the drain electrode being located in a same layer. The manufacturing method of the thin film transistor can effectively reduce the number of patterning processes, so as to enhance the capacity in mass production, and reduce the cost.

Abstract: Disclosed is an array substrate, a method of manufacturing the same, and a display device. The method of manufacturing an array substrate includes: forming a pattern comprising an active layer, a source, a drain, a data line and a pixel electrode on a base substrate through a single patterning process; forming a pattern of an insulating layer; forming a pattern comprising a gate and a gate line through a single patterning process. In the array substrate, the method of manufacturing the same, and the display device of the present invention, only two patterning processes are required to achieve the fabrication of the array substrate, which has less and simple process steps, thereby reduces the manufacturing complexity and manufacturing cost, and increasing the production efficiency and the economic benefit.

Abstract: The present disclosure provides an array substrate, its manufacturing method and a display device. The method includes forming a source electrode and a drain electrode of a thin film transistor, an active layer and a first transparent electrode in the array substrate by a masking step. The active layer and the first transparent electrode are formed by an identical metal oxide layer, and the source electrode and the drain electrode are arranged above the active layer. The first transparent electrode corresponds to a first semi-transparent region of a mask, a channel region of the thin film transistor corresponds to a second semi-transparent region of the mask, the source electrode and drain electrode of the thin film transistor correspond to a non-transparent region of the mask, and the first semi-transparent region of the mask is of transmittance greater than that of the second semi-transparent region of the mask.

Abstract: An array substrate, a method of fabricating the same, and a liquid crystal display device are disclosed. The method comprises: sequentially forming a first transparent conductive material layer, an insulation material layer, a semiconductor material layer and a photoresist layer on a substrate base and forming patterns including a gate line, a gate, a gate insulation layer, a semiconductor layer and a first transparent electrode by patterning process; forming a passivation layer and forming a source via and a drain via connected to the semiconductor layer in the passivation layer; sequentially forming a second transparent conductive material layer and a source-drain metal layer and forming patterns including a source, a drain and a second transparent electrode by patterning process, the gate insulation layer is formed only on the gate and the gate line, the source and the drain include stacked second transparent conductive material layer and source-drain metal layer.

Abstract: Provided are oxide thin-film transistor and display device employing the same, and method for manufacturing an oxide thin-film transistor array substrate. A source electrode and a drain electrode are located below an oxide active layer pattern, and a gate electrode is located below the source electrode and the drain electrode, and the gate insulating layer is located between the gate electrode and the source electrode/the drain electrode.

Abstract: The present invention provides an open head mount display device and a display method thereof, relates to the field of head mount display technology, and can solve technical problems (such as a tedious operation, a poor display effect, an inaccurate position of the display image or the like) of the open head mount display device in the prior art. The open head mount display device of the present invention comprises: a display unit for providing a display image to user's eyes; an image acquisition unit for acquiring an image of an external object; an image analysis unit for analyzing and determining a position of the external object relative to the user's eyes in accordance with the image acquired by the image acquisition unit; and an image adjusting unit for adjusting the display image in accordance with an analysis result of the image analysis unit.

Abstract: The present invention provides a TFT, an array substrate and a display device. The TFT includes a gate electrode, a source electrode, a drain electrode, and a semiconductor layer. The source electrode and the drain electrode are arranged on different layers. The semiconductor layer is in electrical connection to the source electrode and the drain electrode, respectively; wherein, a region on the semiconductor layer which is corresponding to a region between the source electrode and the drain electrode is a channel region. The present invention also provides an array substrate and a display device comprising the on TFT.

Abstract: An array substrate and a manufacturing method thereof, a liquid crystal display panel and a display device are provided, the array substrate comprises a base substrate, and thin film transistors and pixel electrodes provided on the base substrate, the pixel electrode and the active layer in the thin film transistor are provided in the same layer. The active layer is formed of transparent oxide semiconductor material, and the concentration of carriers in the oxide semiconductor material may be increased by performing a plasma process on the oxide semiconductor material, thus the pixel electrode may be manufactured by using the oxide semiconductor material used for manufacturing the active layer, thereby the pixel electrode and the active layer can be provided in the same layer, the number of the masks can be reduced, the manufacturing process is simplified, production cost is saved, the productivity is increased, and the manufacturing time is shortened.

Abstract: This disclosure provides a circuit substrate, a display panel and a display device for solving the problem of a relatively large electrode pitch of the circuit substrate in the prior art while reducing the production cost. Wherein the circuit substrate comprises a substrate, a plurality of first electrodes arranged on the substrate, and insulating convex structures arranged between the substrate and the first electrodes, the convex structure comprising a top face and a bottom face, wherein the top face contacts with the first electrode, and the bottom face contacts with the substrate.

Abstract: This invention provides an array substrate, a method for fabricating the same, and an OLED display device. Each pixel unit of the array substrate comprises: a TFT drive layer; an OLED further away from the substrate than the TFT drive layer and driven by it, the OLED sequentially comprises a first electrode, a light emitting layer, a second electrode, wherein the first electrode is transparent, and the second electrode is a transflective layer, or the second electrode is transparent and has a transflective layer disposed thereon; a reflection layer disposed between the TFT drive layer and the OLED and forming a microcavity structure with the transflective layer, and a reflective surface of the reflection layer has a concave-convex or corrugated structure disposed thereon for causing diffuse reflection of light; and a color filter film disposed between the reflection layer and the OLED and located in the microcavity structure.

Abstract: An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate comprise a base substrate (11), a gate line, a data line, and a pixel region defined by intersection of the gate line and the data line, which are formed on the base substrate (11), wherein the pixel region comprises a thin film transistor, and the thin film transistor comprises a gate, a gate insulation layer, an active layer, a source and a drain, the pixel region further comprise: at least one groove (110), formed on a surface of the base substrate (11); a first electrode layer (12) comprising at least one first electrode bar (120), the first electrode bars (120) are disposed in the groove (110) and electrically connected with each other; and a second electrode layer (13) comprising at least one second electrode bar (130), wherein the second electrode bars (130) are disposed outside the groove (110) and electrically connected with each other.

Abstract: A manufacturing method of an array substrate, comprising the following steps: S1 forming a gate signal line and a gate electrode on a base substrate, successively depositing a gate insulating layer, an active layer, and a metal layer, faulting a mask formed of photoresist on the metal layer, and removing the metal layer outside a region for forming a data line and source/drain electrodes through the mask; S2. simultaneously etching the active layer and ashing the photoresist so as to expose the metal layer within a channel region; S3. etching the active layer exposed by the photoresist after being ashed after the step S2; S4. removing the metal layer within the channel region.

Abstract: An array substrate, a method for fabricating the same and a display device are disclosed. The array substrate comprises a plurality of gate lines and a plurality of data lines which intersect each other to define a plurality of pixel regions, each of the pixel regions comprises a thin film transistor and further comprises: a base substrate; more than one protrusion disposed apart from each other on the base substrate; a first electrode layer comprising at least one first electrode strip disposed in a gap between adjacent protrusions; a second electrode layer comprising at least one second electrode strip disposed on the protrusions.