Abstract: Magnetoresistive (MR) sensors employing dual MR devices for differential MR sensing are provided. These MR sensors may be used as biosensors to detect the presence of biological materials as an example. An MR sensor includes dual MR sensor devices that may be tunnel magnetoresistive (TMR) devices or giant magnetoresistive (GMR) devices as examples. The MR devices are arranged such that a channel is formed between the MR devices for receiving magnetic nanoparticles. A magnetic stray field generated by the magnetic nanoparticles causes free layers in the MR devices to rotate in opposite directions, thus causing differential resistances between the MR devices for greater sensing sensitivity. Further, as another aspect, by providing the channel between the MR devices, the magnetic stray field generated by the magnetic nanoparticles can more easily rotate the magnetic moment orientation of the free layers in the MR devices, thus further increasing sensitivity.

Abstract: A magnetic random access memory (MRAM) array including several bit cells is described. Each of the bit cells may include a perpendicular magnetic tunnel junction (pMTJ) including a reference layer, a barrier layer supporting the reference layer, and a free layer supporting the barrier layer. A spin-hall conductive material layer may support the free layer. A driver may be operable to set a state of at least one of the bit cells using an increased spin-transfer torque (STT) current and a spin-hall effect from the spin-hall conductive material layer. The increased STT current may be driven through the spin-hall conductive material layer and the pMTJ so that a spin current is generated from the reference layer and the spin-hall conductive material layer.

Abstract: Aspects disclosed include reducing or avoiding metal deposition from etching magnetic tunnel junction (MTJ) devices. In one example, a width of a bottom electrode of an MTJ device is provided to be less than a width of the MTJ stack of the MTJ device. In this manner, etching of the bottom electrode may be reduced or avoided to reduce or avoid metal redeposition as a result of over-etching the MTJ device to avoid horizontal shorts between an adjacent device(s). In another example, a seed layer is embedded in a bottom electrode of the MTJ device. In this manner, the MTJ stack is reduced in height to reduce or avoid metal redeposition as a result of over-etching the MTJ device. In another example, an MTJ device includes an embedded seed layer in a bottom electrode which also has a width less than a width of the MTJ stack.

Abstract: A three-dimensional (3D) ferroelectric dipole metal-oxide semiconductor ferroelectric field-effect transistor (MOSFeFET) system, and related methods and systems are disclosed. The 3D ferroelectric dipole MOSFeFET system includes a bottom dielectric layer, a gate layer disposed above the bottom dielectric layer, and a top dielectric layer disposed on top of the gate layer. The 3D ferroelectric dipole MOSFeFET system also includes at least one source line (SL) line and at least one bit line (BL). At least one interconnect, which extends between the bottom dielectric layer and the top dielectric layer interconnects the at least one SL with the at least one BL. A ferroelectric dipole MOSFeFET(s) is formed at an intersection area of the at least one interconnect and the gate layer. The 3D ferroelectric dipole MOSFeFET system can lead to improved component density and reduced footprint.

Abstract: Error detection and correction decoding apparatus performs single error correction-double error detection (SEC-DED) or double error correction-triple error detection (DEC-TED) depending on whether the data input contains a single-bit error or a multiple-bit error, to reduce power consumption and latency in case of single-bit errors and to provide powerful error correction in case of multiple-bit errors.

Abstract: A semiconductor device includes an interconnect layer and a bottom electrode of a resistive memory device. The bottom electrode is coupled to the interconnect layer, and the bottom electrode is comprised of cobalt tungsten phosphorus (CoWP).

Abstract: Metal-oxide semiconductor (MOS) transistor offset-cancelling (OC), zero-sensing (ZS) dead zone, current-latched sense amplifiers (SAs) (CLSAs) (OCZS-SAs) for sensing differential voltages are provided. An OCZS-SA is configured to amplify received differential data and reference input voltages with a smaller sense amplifier offset voltage to provide larger sense margin between different storage states of memory bitcell(s). The OCZS-SA is configured to cancel out offset voltages of input and complement input transistors, and keep the input and complement input transistors in their activated state during sensing phases so that sensing is not performed in their “dead zones” when their gate-to-source voltage (Vgs) is below their respective threshold voltages.

Abstract: Dynamically controlling voltage for access (i.e., read and/or write) operations to magneto-resistive random access memory (MRAM) bit cells to account for process variations is disclosed. An MRAM bit cell process variation measurement circuit (PVMC) is configured to measure process variations in MTJs that affect MTJ resistance, which can change write current at a given fixed supply voltage applied to an MRAM bit cell. The MRAM bit cell PVMC may also be configured to measure process variations in logic circuits representing process variations in access transistors employed in MRAM bit cells. These measured process variations in MTJs and/or logic circuits are used to dynamically determine a supply voltage for access operations to MRAM.

Abstract: An apparatus includes a perpendicular magnetic tunnel junction (MTJ) including a free layer. The apparatus includes a spin orbit torque metal layer coupled to the perpendicular MTJ and configured to change a magnetization state of the free layer responsive to flow of a current along the spin orbit torque metal layer. The apparatus includes a random number generator configured to generate a random number at least partially based on a state of the perpendicular MTJ.

Abstract: A particular apparatus includes a magnetic tunnel junction (MTJ) device and a transistor. The MTJ device and the transistor are included in a comparator that has a hysteresis property associated with multiple transition points that correspond to magnetic switching points of the MTJ device.

Abstract: Error detection and correction decoding apparatus performs single error correction-double error detection (SEC-DED) or double error correction-triple error detection (DEC-TED) depending on whether the data input contains a single-bit error or a multiple-bit error, to reduce power consumption and latency in case of single-bit errors and to provide powerful error correction in case of multiple-bit errors.

Abstract: Multi-step programming of heat-sensitive non-volatile memory (NVM) in processor-based systems, and related methods and systems are disclosed. To avoid relying on programmed instructions stored in heat-sensitive NVM during fabrication, wherein the programmed instructions can become corrupted during thermal packaging processes, the NVM is programmed in a multi-step programming process. In a first programming step, a boot loader comprising programming instructions is loaded into the NVM. The boot loader may be loaded into the NVM after the thermal processes during packaging are completed to avoid risking data corruption in the boot loader. Thereafter, the programmed image can be loaded quickly into a NV program memory over the peripheral interface using the boot loader to save programming time and associated costs, as opposed to loading the programmed image using lower transfer rate programming techniques. The processor can execute the program instructions to carry out tasks in the processor-based system.

Abstract: Dynamically controlling voltage for access (i.e., read and/or write) operations to magneto-resistive random access memory (MRAM) bit cells to account for process variations is disclosed. An MRAM bit cell process variation measurement circuit (PVMC) is configured to measure process variations in MTJs that affect MTJ resistance, which can change write current at a given fixed supply voltage applied to an MRAM bit cell. The MRAM bit cell PVMC may also be configured to measure process variations in logic circuits representing process variations in access transistors employed in MRAM bit cells. These measured process variations in MTJs and/or logic circuits are used to dynamically determine a supply voltage for access operations to MRAM.

Abstract: Non-volatile (NV)-content addressable memory (CAM) (NV-CAM) cells employing differential magnetic tunnel junction (MTJ) sensing for increased sense margin are disclosed. By the NV-CAM cells employing MTJ differential sensing, differential cell voltages can be generated for match and mismatch conditions in response to search operations. The differential cell voltages are amplified to provide a larger match line voltage differential for match and mismatch conditions, thus providing a larger sense margin between match and mismatch conditions. For example, a cross-coupled transistor sense amplifier employing positive feedback may be employed to amplify the differential cell voltages to provide a larger match line voltage differential for match and mismatch conditions. Providing NV-CAM cells that have a larger sense margin can mitigate sensing issues for increased search operation reliability.

Abstract: Magnetic tunnel junction (MTJ) memory bit cells that decouple source line layout from access transistor node size to facilitate reduced contact resistance are disclosed. In one example, an MTJ memory bit cell is provided that includes a source plate disposed above and in contact with a source contact for a source node of an access transistor. A source line is disposed above and in electrical contact with the source plate to electrically connect the source line to the source node. The source plate allows the source line to be provided in a higher metal level from the source and drain contacts of the access transistor such that the source line is not in physical contact with (i.e., decoupled from) the source contact. This allows pitch between the source line and drain column to be relaxed from the width of the source and drain nodes without having to increase contact resistance.

Abstract: High aspect ratio vertical interconnect access (via) interconnections in magnetic random access memory (MRAM) bit cells are disclosed. In one aspect, an exemplary MRAM bit cell includes a coupling column interconnecting an access transistor and a magnetic tunnel junction (MTJ) therein. The coupling column is disposed across a plurality of interconnection layers. In one aspect, the coupling column comprises a high aspect ratio via. In another aspect, the high aspect ratio via is connected directly between a drain contact coupled to a drain of the access transistor and to an end electrode of the MTJ such that no interconnection line and/or interconnection island is provided in the coupling column. In certain aspects, the coupling column may be disposed between an interconnection line and an adjacent interconnection line without increasing an existing interconnection line pitch, thus allowing for a reduction in MRAM bit cell pitch.

Abstract: A material stack of a synthetic anti-ferromagnetic (SAF) reference layer of a perpendicular magnetic tunnel junction (MTJ) may include an SAF coupling layer. The material stack may also include and an amorphous spacer layer on the SAF coupling layer. The amorphous spacer layer may include an alloy or multilayer of tantalum and cobalt or tantalum and iron or cobalt and iron and tantalum. The amorphous spacer layer may also include a treated surface of the SAF coupling layer.

Abstract: Systems and methods relate to operations on a magnetoresistive random access memory (MRAM) bit cell using a circuit configured in multiple phases. In a sensing circuit phase, the circuit configured to determine a first differential voltage between a data voltage across the bit cell and a reference voltage. In a pre-amplifying phase, the circuit is configured to pre-amplify the first differential voltage to generate a pre-amplified differential voltage, which does not have offset voltages that may arise due to process variations. In a sense amplifier phase, the circuit is configured to amplify the pre-amplified differential voltage in a latch. Generation of the pre-amplified differential voltage cancels offset voltages which may arise in the latch. In a write phase, the circuit is further configured to write a write data value to the MRAM bit cell.

Abstract: Shadow-effect compensated fabrication of magnetic tunnel junction (MTJ) semiconductor elements is disclosed. Providing shadow-effect compensated fabrication of MTJ elements can provide reduced free layer sizing for enhanced MTJ operational margin. In certain aspects, to reduce size of a free layer during fabrication of an MTJ to provide enhanced write and retention symmetry, ion beam etching (IBE) fabrication process is employed to fabricate a free layer smaller than the pinned layer. To avoid asymmetrical footing being fabricated in free layer due to shadow-effect of neighboring MTJs, an ion beam directed at the MTJ is shadow-effect compensated. The angle of incidence of the ion beam directed at the MTJ is varied as the MTJ is rotated to be less steep when another MTJ is in directional line of the ion beam and the MTJ being fabricated. Thus, the free layer is etched more uniformly in the MTJ while avoiding increased etching damage.

Abstract: A method of sensing a data value stored at a memory cell according to a dual mode sensing scheme includes determining, at a sensing circuit, whether a resistance of a magnetic tunnel junction (MTJ) element is within a first range of resistance values, within a second range of resistance values, or within a third range of resistance values. The MTJ element is included in the memory cell. The method also includes determining the data value stored at the memory cell according to a first mode of operation if the resistance of the MTJ element is within the first range of resistance values or within the third range of resistance values. The method further includes determining the data value stored at the memory cell according to a second mode of operation if the resistance of the MTJ element is within the second range of resistance values.