Abstract: A memory module comprising a non-volatile cell array and a re-mapper. A page map table is stored in the non-volatile cell array, and includes mappings of old page addresses to new page addresses. The re-mapper is configured to direct memory operations referencing an old page address to the new page address that the old page address is mapped to. The mappings are created when a memory cell is determined to be in a failure state.

Abstract: An apparatus includes a capping layer disposed on top of a free layer. The apparatus also includes a magnetic etch stop layer disposed on top of the capping layer. The capping layer and the magnetic etch stop layer are included in a spin-transfer torque magnetoresistive random access memory (STT-MRAM) magnetic tunnel junction (MTJ) device.

Abstract: A magnetoresistive random access memory (MRAM) device includes a top electrode or top contact above a metal hard mask which has a limited height due to process limitations in advanced nodes. The metal hard mask is provided on a magnetic tunnel junction (MTJ). The top contact for the MTJ is formed within a dielectric layer, such as a low dielectric constant (low-k) or extremely low-k layer. An additional dielectric layer is provided above the top contact for additional connections for additional circuitry to form a three-dimensional integrated circuit (3D IC).

Abstract: A magnetoresistive random access memory (MRAM) device includes a top electrode or top contact above a metal hard mask which has a limited height due to process limitations in advanced nodes. The metal hard mask is provided on a magnetic tunnel junction (MTJ). The top contact for the MTJ is formed within a dielectric layer, such as a low dielectric constant (low-k) or extremely low-k layer. An additional dielectric layer is provided above the top contact for additional connections for additional circuitry to form a three-dimensional integrated circuit (3D IC).

Abstract: An integrated interposer may include a substrate and a resistive-type non-volatile memory (NVM) array(s). The integrated interposer may also include a contact layer on a first surface of the substrate. The contact layer may include interconnections configured to couple the resistive-type NVM array(s) to a die(s). The resistive-type NVM array(s) may be partially embedded within the contact layer of the integrated interposer.

Abstract: An STT magnetic memory includes adjacent columns of STT magnetic memory elements having a top electrode and a bottom electrode. A shared bit line is coupled to the top electrode of the STT magnetic memory elements in at least two of the adjacent columns. The bottom electrodes of the STT magnetic memory elements of one of the adjacent columns are selectively coupled to one source line, and the bottom electrodes of the STT magnetic memory elements of another among the adjacent columns are selectively coupled to another source line.

Abstract: A magnetic tunnel junction (MTJ) device in a magnetoresistive random access memory (MRAM) and method of making the same are provided to achieve a high tunneling magnetoresistance (TMR), a high perpendicular magnetic anisotropy (PMA), good data retention, and a high level of thermal stability. The MTJ device includes a first free ferromagnetic layer, a synthetic antiferromagnetic (SAF) coupling layer, and a second free ferromagnetic layer, where the first and second free ferromagnetic layers have opposite magnetic moments.

Abstract: Systems and methods for forming precise and self-aligned top metal contact for a Magnetoresistive random-access memory (MRAM) device include forming a magnetic tunnel junction (MTJ) in a common interlayer metal dielectric (IMD) layer with a logic element. A low dielectric constant (K) etch stop layer is selectively retained over an exposed top surface of the MTJ. Etching is selectively performed through a top IMD layer formed over the low K etch stop layer and the common IMD layer, based on a first chemistry which prevents etching through the low K etch stop layer. By switching chemistry to a second chemistry which precisely etches through the low K etch stop layer, an opening is created for forming a self-aligned top contact to the exposed top surface of the MTJ.

Abstract: Methods and apparatuses, wherein the method includes providing a logic device. The method substantially surrounds a metal gate with a transition metal oxide on at least one side, wherein the transition metal oxide is comprised of hafnium oxalate and silicon dioxide. The method provides a bottom electrode (BE), wherein the BE is comprised of at least one of silicon or tungsten.

Abstract: Systems and methods relate to providing a constant sensing current for reading a resistive memory element. A load voltage generator provides a load voltage based on a current mirror configured to supply a constant current that is invariant with process-voltage-temperature variations. A data voltage is generated based on the generated load voltage, by passing a sensing current mirrored from the constant current, through the resistive memory element. A reference voltage is generated, also based on the generated load voltage and by passing reference current mirrored from the constant current, through reference cells. A logical value stored in the resistive memory element is determined based on a comparison of the data voltage and the reference voltage, where the determination is free from effects of process-voltage-temperature variations.

Abstract: Flexible film electrical-test substrates with at least one conductive contact post for integrated circuit (IC) bump(s) electrical testing, and related methods and testing apparatuses are disclosed. The backside structure of an electrical-test substrate comprises a flexible dielectric film structure. One or more fine-pitched conductive coupling posts are formed on conductive pads disposed on a front side of the flexible dielectric film structure through a fabrication process. A first pitch of the conductive coupling post(s) in the flexible dielectric film structure is provided to be the same or substantially the same as a second pitch of one or more bumps in an IC, such as die or interposer (e.g., forty (40) micrometers (?m) or less). This allows the conductive coupling post(s) to be placed into mechanical contact with at least one bump of the IC, point-by-point, during an electrical test to electrically testing of the IC.

Abstract: Systems and methods relate to providing a correct reference voltage for reading a resistive memory element such as a magnetoresistive random access memory (MRAM) bit cell. Two or more reference voltages are provided for each MRAM bit cell and a correct reference voltage is selected from the two or more reference voltages for reading the MRAM bit cell. The correct reference voltage meets sensing margin requirements for reading the MRAM bit cell and overcomes non-idealities and offset voltages in read circuitry for reading the MRAM bit cell. An indication of the correct reference voltage is stored in a non-volatile latch or other non-volatile programmable memory and provided to the read circuitry.

Abstract: Systems and methods of integration of resistive memory elements with logic elements in advanced nodes with improved mechanical stability and reduced parasitic capacitance include a resistive memory element and a logic element formed in a common integration layer extending between a bottom cap layer and a top cap layer. At least a first intermetal dielectric (IMD) layer of high-K value is formed in the common integration layer and surrounding at least the resistive memory element, to provide high rigidity and mechanical stability. A second IMD layer of low-K value to reduce parasitic capacitance of the logic element is formed in either the common integration layer, a top layer above the top cap layer or an intermediate layer in between the top and bottom cap layers. Air gaps may be formed in one or more IMD layers to further reduce capacitance.

Abstract: Systems and methods for reducing a probability of read disturbance during a read operation on a resistive memory bit cell include a dual stage sensing scheme, which is used to reduce pulse widths of sensing currents for reading the resistive memory bit cell. During a first stage of the read operation on the resistive memory bit cell, a first sensing current is passed in a first direction through the resistive memory bit cell, and during a second stage of the read operation, a second sensing current is passed in an opposite, second direction through the resistive memory bit cell. Durations of the first and second stages are each equal to half of the duration of the read operation, which reduces pulse width of the first and second sensing currents. Probability of read disturbance occurring is limited to at most one of the first or second stages.

Abstract: Systems and methods relate to operations on a magnetoresistive random access memory (MRAM) bit cell using a circuit configured in multiple phases. In a sensing circuit phase, the circuit configured to determine a first differential voltage between a data voltage across the bit cell and a reference voltage. In a pre-amplifying phase, the circuit is configured to pre-amplify the first differential voltage to generate a pre-amplified differential voltage, which does not have offset voltages that may arise due to process variations. In a sense amplifier phase, the circuit is configured to amplify the pre-amplified differential voltage in a latch. Generation of the pre-amplified differential voltage cancels offset voltages which may arise in the latch. In a write phase, the circuit is further configured to write a write data value to the MRAM bit cell.

Abstract: A magnetic tunnel junction (MTJ) device includes a pinned layer, a tunnel barrier layer on the pinned layer, and a free layer on the tunnel barrier layer. The MTJ device also includes a perpendicular magnetic anisotropic (PMA) enhancement layer on the free layer, a capping layer on the PMA enhancement layer, and a conductive path electrically shorting the capping layer, the PMA enhancement layer and the free layer. A method of fabricating a perpendicular magnetic tunnel junction (pMTJ) device includes forming a capping layer, a perpendicular magnetic anisotropic (PMA) enhancement layer and a free layer. The method also includes forming a conductive layer to short the capping layer, the PMA enhancement layer and the free layer.

Abstract: An apparatus includes a first magnetic tunnel junction (MTJ) device of a differential MTJ pair. The apparatus further includes a second MTJ device of the differential MTJ pair. The first MTJ device includes a sense layer having a high coercivity portion.

Abstract: A perpendicular magnetic tunnel junction (pMTJ) device includes a perpendicular reference layer, a tunnel barrier layer on a surface of the perpendicular reference layer, and a perpendicular free layer on a surface of the tunnel barrier layer. The pMTJ device also includes a dielectric passivation layer on the tunnel barrier layer and surrounding the perpendicular free layer. The pMTJ device further includes a high permeability material on the dielectric passivation layer that is configured to be magnetized by the perpendicular reference layer and to provide a stray field to the perpendicular free layer that compensates for a stray field from the perpendicular reference layer.

Abstract: A resistive memory array includes an array of one-transistor, one-resistor (1T1R) bit cells on a die. The resistive memory array also includes an array of zero-transistor, one-resistor (0T1R) bit cells arranged with the array of 1T1R bit cells on the same die.

Abstract: An MRAM cell may include a magnetic tunneling junction (MTJ). The MTJ includes a pin layer, a barrier layer, a free layer, and a capping layer. The MRAM cell further includes a bidirectional diode selector, directly coupled to an electrode of the MTJ, to enable access to the MTJ.