Abstract: A semiconductor apparatus includes a substrate, a buffer layer made of a monocrystal semiconductor material and formed on the substrate, a strained-Si layer formed on the buffer layer and having a lattice constant different from that of the buffer layer, a monocrystal insulating film formed on the strained-Si layer and made of a material having a rare earth structure with a lattice constant different from that of Si, and an electrode formed on the insulating film.

Abstract: A semiconductor device comprises a base substrate, a silicon oxide layer formed on the base substrate, a first semiconductor layer formed on the silicon oxide layer, the first semiconductor layer including an SiGe layer with a Ge concentration not less than 30 atomic %, a second semiconductor layer formed on the first semiconductor layer, the second semiconductor layer including a Ge layer or an SiGe layer with a Ge concentration higher than the first semiconductor layer, a gate electrode configured to induce a channel in a surface region of the second semiconductor layer, and a gate insulating film formed between the second semiconductor layer and the gate electrode.

Abstract: An object of the invention is to provide a complete depletion-mode SOI field-effect transistor in which transistors having different threshold voltages are integrated. A SiGe film having a high Ge composition and a SiGe film having a low Ge composition are formed on an insulating film, and strain-Si films are respectively formed thereon. Transistors including channel regions in the strain-Si films obtained as a result of this are formed, so that the transistors having different threshold voltages can be integrated.

Abstract: An exposure apparatus is provided for performing exposure processes with high accuracy by accurately performing pressure control inside a chamber having a plurality of air-conditioning chambers. The inside of the main chamber which accommodates the exposure apparatus is divided into a plurality of air-conditioning chambers, and a pressure detection device which detects the pressure is provided with each of the plurality of air-conditioning chambers. Also, among the plurality of the air-conditioning chambers, the pressure inside a main column which accommodates an exposure stage on which a wafer in mounted and subjected to an exposure process, is set to be higher than the pressure of the other air-conditioning chambers based on detection results obtained from the pressure detection devices.

Abstract: A method of manufacturing a semiconductor device which includes forming a first SiGe layer having a low content of Ge, forming an oxide layer by implanting oxygen ions into the first SiGe layer, and then annealing the first SiGe layer. The method also includes forming, on the first SiGe layer, a second SiGe layer which has a higher content of Ge than the first SiGe layer, forming a strained Si layer on the second SiGe layer, and forming a field effect transistor in which the strained Si layer is used a channel region. Further, a field effect transistor may be formed on a semiconductor substrate having an indefectible, high-quality, buried oxide layer and a largely strained Si layer, and hence a high-speed, low-power-consumption semiconductor device can be realized.

Abstract: A semiconductor device comprises a base substrate, an insulating film formed on the substrate, an undoped first and lattice-relaxed semiconductor layer formed on the insulating film, a second semiconductor layer having a tensile strain and formed on the first semiconductor layer, and a MISFET formed on the second semiconductor layer. Since the MISFET is formed in a strained Si layer, electrons are prevented from scattering in a channel region, improving the electron mobility. Furthermore, since the MISFET is formed in a thin SOI layer having a thickness of 100 nm or less, it is possible to reduce a parasitic capacitance in addition to the improvement of the electron mobility. As a result, the MISFET excellent in drivability can be obtained.

Abstract: A semiconductor device includes an insulating layer, a semiconductor board formed on a selected portion of the insulating layer, a semiconductor layer formed on at least one of the major side surfaces of the semiconductor board, which is different from the semiconductor board in lattice constant, and having source and drain regions and a channel region therebetween, the area of the channel region being larger than that of the bottom surface of the semiconductor board, which contacts the insulating layer, and a gate electrode formed on the channel region via a gate insulating layer.

Abstract: A backward laser beam radiated from a laser diode is received in a photo diode, and an intensity of a forward laser beam radiated from the laser diode is adjusted according to the intensity of the received backward laser beam. The forward laser beam radiated from the laser diode is collimated in a first lens held by a lens holder, and a most portion of the forward laser beam is output through a package window inclined with respect to an optical axis of the laser diode. The remaining portion of the forward laser beam is reflected on the package window as a reflected laser beam and is transmitted through the first lens to be converged in a narrow area placed above the laser diode. A light shielding plate extending in a plane orthogonal to the optical axis is arranged in a wide area including the narrow area and shields the photo diode from the reflected laser beam from. Therefore, the intensity of the forward laser beam radiated from the laser diode is correctly adjusted.

Abstract: A method of manufacturing a semiconductor device which includes forming a first SiGe layer having a low content of Ge, forming an oxide layer by implanting oxygen ions into the first SiGe layer, and then annealing the first SiGe layer. The method also includes forming, on the first SiGe layer, a second SiGe layer which has a higher content of Ge than the first SiGe layer, forming a strained Si layer on the second SiGe layer, and forming a field effect transistor in which the strained Si layer is used a channel region. Further, a field effect transistor may be formed on a semiconductor substrate having an indefectible, high-quality, buried oxide layer and a largely strained Si layer, and hence a high-speed, low-power-consumption semiconductor device can be realized.

Abstract: A semiconductor device comprises a base substrate, a silicon oxide layer formed on the base substrate, a first semiconductor layer formed on the silicon oxide layer, the first semiconductor layer including an SiGe layer with a Ge concentration not less than 30 atomic %, a second semiconductor layer formed on the first semiconductor layer, the second semiconductor layer including a Ge layer or an SiGe layer with a Ge concentration higher than the first semiconductor layer, a gate electrode configured to induce a channel in a surface region of the second semiconductor layer, and a gate insulating film formed between the second semiconductor layer and the gate electrode.

Abstract: A thermoelectric semiconductor has a P-type semiconductor and an N-type semiconductor disposed in parallel. A heat absorbing side of the thermoelectric semiconductor and a substrate that has an optical element mounted on its upper surface are disposed on the same plane. A heat radiation side of the thermoelectric semiconductor is disposed such that a direction from the heat absorbing side to the heat radiation side of the thermoelectric semiconductor is parallel with the upper surface of the substrate. Based on this arrangement, it is possible to set the environmental temperature of an optical module to the same level as the operation temperature of a laser diode.

Abstract: This optical module includes solder which solders an anode electrode of a PD element for detecting back light emitted from an LD element and wiring patterns, and solder which solders a cathode electrode and wiring patterns.

Abstract: A method of manufacturing a semiconductor device which includes forming a first SiGe layer having a low content of Ge, forming an oxide layer by implanting oxygen ions into the first SiGe layer, and then annealing the first SiGe layer. The method also includes forming, on the first SiGe layer, a second SiGe layer which has a higher content of Ge than the first SiGe layer, forming a strained Si layer on the second SiGe layer, and forming a field effect transistor in which the strained Si layer is used a channel region. Further, a field effect transistor may be formed on a semiconductor substrate having an indefectible, high-quality, buried oxide layer and a largely strained Si layer, and hence a high-speed, low-power-consumption semiconductor device can be realized.

Abstract: In a conventional optical element module, a filter substrate mounting an air-core coil thereto is mounted in the vicinity of a light emitting element, and the light emitting element and the air-core coil are electrically connected to each other by a bonding wire, etc. Therefore, a problem exists in that it is difficult to set the length of a line path between the light emitting element and the air-core coil to about 1 mm or less, and no preferable high frequency characteristics are obtained.

Abstract: There are disclosed a wavelength detector capable of accurately detecting the wavelength of an entered light beam by a simple configuration without needing any highly accurate fine-adjustments, and an optical transmitter equipped with the wavelength detector.

Abstract: High-speed and low-power-consuming transistors such as field effect transistors having strained Si channels and hetero-bipolar transistors are integrated with each other. Used here is a complex structure in which an MOSFET having a thin-film SiGe buffer layer and a strained Si channel are laminated on an insulating film and an HBT having an SiGe base layer formed on a thin-film SiGe layer by epitaxial growth and an Si emitter layer formed on the SiGe base layer are combined with each other. The thin-film SiGe layer formed on the insulating film of the MOSFET is made thinner than the counterpart of the HBT. The thin-film SiGe layer formed on the insulating film of the MOSFET has Ge concentration higher than that of the counterpart of the HBT.

Abstract: The inventive optical module has a feeder line for electrically connecting a semiconductor laser with an electric signal input/output unit of a package. The feeder line has a dielectric substrate and a conductor film formed on the dielectric substrate, which consists of a material having thermal conductivity smaller than that of aluminum oxide. Thus obtained is an optical module capable of inhibiting a semiconductor laser from wavelength change caused by heat flowing into the same in a high-density wavelength division multiplex optical transmission system multiplexing a plurality of signals in an optical wavelength region in high density and transmitting the same.

Abstract: A backward laser beam radiated from a laser diode is received in a photo diode, and an intensity of a forward laser beam radiated from the laser diode is adjusted according to the intensity of the received backward laser beam. The forward laser beam radiated from the laser diode is collimated in a first lens held by a lens holder, and a most portion of the forward laser beam is output through a package window inclined with respect to an optical axis of the laser diode. The remaining portion of the forward laser beam is reflected on the package window as a reflected laser beam and is transmitted through the first lens to be converged in a narrow area placed above the laser diode. A light shielding plate extending in a plane orthogonal to the optical axis is arranged in a wide area including the narrow area and shields the photo diode from the reflected laser beam from. Therefore, the intensity of the forward laser beam radiated from the laser diode is correctly adjusted.