Patents by Inventor Shinichi Yotsuya

Shinichi Yotsuya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050115594
    Abstract: A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.
    Type: Application
    Filed: December 1, 2004
    Publication date: June 2, 2005
    Inventors: Toshiko Hosoda, Shinichi Yotsuya
  • Publication number: 20050106776
    Abstract: A method of manufacturing an organic electroluminescent display device, an organic electroluminescent display device, and a display device equipped with an organic electroluminescent display device are provided that enable a microlens to be formed without affecting an organic luminescent layer during the manufacturing process and to easily manufacture an organic electroluminescent display device with increased light output efficiency. According to the method, a lens pattern corresponding to a microlens that refracts the light from an organic luminescent layer is formed by performing photolithography treatment on a first transparent resin film formed on a substrate, and the microlens is formed by performing reflow treatment on the lens pattern.
    Type: Application
    Filed: June 4, 2004
    Publication date: May 19, 2005
    Inventor: Shinichi Yotsuya
  • Patent number: 6893575
    Abstract: A mask has a monocrystal substrate having opposite surfaces which are planes having Miller indices {110}. A plurality of penetrating holes are formed in the monocrystal substrate. An opening shape of each of the penetrating holes is a polygon and each side of the polygon is parallel with a plane in a group of the {111} planes. The wall surfaces of the penetrating holes are the {111} planes. In the method of manufacturing a mask, openings are formed in the etching resistant film corresponding to the shape of the penetrating holes and the monocrystal substrate is etched.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: May 17, 2005
    Assignee: Seiko Epson Corporation
    Inventor: Shinichi Yotsuya
  • Publication number: 20050088751
    Abstract: To provide a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate 1A includes a first substrate 2 with concaves for microlenses having a plurality of first concaves 31 and first aligment marks 71 formed on a first glass substrate 29, a second substrate 8 with concaves for microlenses having a plurality of second concaves 32 and second aligment marks 72 formed on a second glass substrate 89, a resin layer 9, microlenses 4 consisting of doulbe convex lenses formed of a resin filled in between the first and second concaves 31 and 32, and spacers 5.
    Type: Application
    Filed: November 19, 2004
    Publication date: April 28, 2005
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Nobuo Shimizu, Shinichi Yotsuya, Hideto Yamashita, Masami Murata, Koichi Akiyama
  • Patent number: 6875542
    Abstract: A method of manufacturing a mask includes attaching to a first substrate formed with an opening a second substrate formed with a plurality of penetrating holes. The plurality of penetrating holes are disposed inside the opening. The first substrate and the second substrate may be joined together by anode coupling. First and second alignment marks may be used for positioning the second substrate and the first substrate when attaching the second substrate to the first substrate.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: April 5, 2005
    Assignee: Seiko Epson Corporation
    Inventor: Shinichi Yotsuya
  • Publication number: 20050064622
    Abstract: A mask is disclosed for use in forming a thin-layer pattern of an organic electroluminescence element having high-precision pixels. The mask is manufactured by wet-etching a (100) silicon wafer (single crystal silicon substrate) 1 in a crystal orientation-dependent anisotropic fashion so as to form through-holes 11 having (111)-oriented walls 11a serving as apertures corresponding to a thin-layer pattern to be formed.
    Type: Application
    Filed: October 5, 2004
    Publication date: March 24, 2005
    Applicant: Seiko Epson Corporation
    Inventors: Mitsuro Atobe, Shinichi Kamisuki, Ryuichi Kurosawa, Shinichi Yotsuya
  • Publication number: 20050051516
    Abstract: A mask has a monocrystal substrate having opposite surfaces which are planes having Miller indices {110}. A plurality of penetrating holes are formed in the monocrystal substrate. An opening shape of each of the penetrating holes is a polygon and each side of the polygon is parallel with a plane in a group of the {111} planes. The wall surfaces of the penetrating holes are the {111} planes. In the method of manufacturing a mask, openings are formed in the etching resistant film corresponding to the shape of the penetrating holes and the monocrystal substrate is etched.
    Type: Application
    Filed: September 14, 2004
    Publication date: March 10, 2005
    Applicant: Seiko Epson Corporation
    Inventor: Shinichi Yotsuya
  • Patent number: 6850368
    Abstract: To provide a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate 1A includes a first substrate 2 with concaves for microlenses having a plurality of first concaves 31 and first aligment marks 71 formed on a first glass substrate 29, a second substrate 8 with concaves for microlenses having a plurality of second concaves 32 and second aligment marks 72 formed on a second glass substrate 89, a resin layer 9, microlenses 4 consisting of double convex lenses formed of a resin filled in between the first and second concaves 31 and 32, and spacers 5.
    Type: Grant
    Filed: July 8, 2003
    Date of Patent: February 1, 2005
    Assignee: Seiko Epson Corporation
    Inventors: Nobuo Shimizu, Shinichi Yotsuya, Hideto Yamashita, Masami Murata, Koichi Akiyama
  • Publication number: 20050019968
    Abstract: To provide a high-precision deposition mask capable of vapor deposition on a large-sized deposition substrate in a vacuum deposition process, a method for readily manufacturing the deposition mask at low cost, an electroluminescent display unit, a method for manufacturing the unit, and an electronic apparatus including the electroluminescent display unit. A deposition mask has a configuration in which one or more mask chips each including a single crystal silicon substrate are joined to a mask support. The one or more mask chips are joined to respective predetermined sections of the mask support, the orientations of the one or more mask chips are arranged in such a manner that the crystal orientation of the single crystal silicon substrate is aligned in a predetermined direction, and the single crystal silicon substrate of each mask chip has openings.
    Type: Application
    Filed: May 26, 2004
    Publication date: January 27, 2005
    Inventors: Takayuki Kuwahara, Shinichi Yotsuya
  • Publication number: 20040214449
    Abstract: A precision mask for deposition is provided that includes a first brace having a plurlaity of sections placed in parallel to each other at given intervals. The first brace forms portions that define a plurality of first openings. The precision mask for deposition also includes at least one second brace that is placed on the first brace so as to intersect with the first brace. The second brace forms portions that define a plurality of second openings. The second brace is joined to the first brace at a point where the second brace intersects with the first brace.
    Type: Application
    Filed: January 20, 2004
    Publication date: October 28, 2004
    Inventors: Shinichi Yotsuya, Takayuki Kuwahara
  • Publication number: 20040189185
    Abstract: A light emitting display panel and a manufacturing method thereof capable of improving an extraction efficiency of emitted light, preventing reflection of incident light from outside as well as appearance of the image display, and enhancing current efficiency and a life of the panel including the light emitting element are provided. The light emitting display panel comprises a transparent substrate equipped with a light emitting element on a first surface thereof, a second surface of the transparent substrate defining a display surface; and a microlens array disposed above the second surface of the transparent substrate 1. The method of manufacturing the light emitting display panel comprises the step of adhering the microlens array with the second surface of the transparent substrate via adhesive.
    Type: Application
    Filed: February 3, 2004
    Publication date: September 30, 2004
    Inventor: Shinichi Yotsuya
  • Publication number: 20040166652
    Abstract: A method of manufacturing a mask includes: attaching a second substrate having a plurality of penetrating holes to a first substrate having an opening. The second substrate is attached such that the penetrating holes are positioned within the opening. A groove is formed on a surface of the first substrate facing the second substrate. The groove is utilized to form a flow path between the first and second substrates.
    Type: Application
    Filed: March 2, 2004
    Publication date: August 26, 2004
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Shinichi Yotsuya
  • Publication number: 20040142108
    Abstract: A method includes a step of attracting a glass substrate 20 that is a subject for deposition using the electrostatic attraction of a stage 1, a step of aligning the attracted glass substrate with a deposition mask 2, and a step of evaporating an organic compound that is a deposition material, used for forming electroluminescent elements so as to deposit the compound on the glass substrate 20. An electrostatic chucking function is provided to the deposition mask according to needs, whereby the adhesion is enhanced.
    Type: Application
    Filed: November 24, 2003
    Publication date: July 22, 2004
    Inventors: Mitsuro Atobe, Shinichi Yotsuya
  • Patent number: 6720236
    Abstract: A method of manufacturing a mask includes: attaching a second substrate having a plurality of penetrating holes to a first substrate having an opening. The second substrate is attached such that the penetrating holes are positioned within the opening. A groove is formed on a surface of the first substrate facing the second substrate. The groove is utilized to form a flow path between the first and second substrates.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: April 13, 2004
    Assignee: Seiko Epson Corporation
    Inventor: Shinichi Yotsuya
  • Publication number: 20040026360
    Abstract: A plurality of penetrating holes are formed in a substrate, each of the penetrating holes connecting a first opening and a second opening larger than the first opening. An etching resistant film is formed on a first surface of the substrate avoiding areas in which the first openings will be formed, part of the second surface in which the penetrating holes are formed being exposed so as to expose areas each of which includes two or more of the second openings. Small holes are formed in the formation regions for each of the penetrating holes. Etching having crystal orientation dependence is performed from both the first and second surfaces of the substrate.
    Type: Application
    Filed: April 14, 2003
    Publication date: February 12, 2004
    Applicant: Seiko Epson Corporation
    Inventors: Shinichi Yotsuya, Kazushige Umetsu, Daisuke Sawaki
  • Publication number: 20040008417
    Abstract: To provide a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate 1A includes a first substrate 2 with concaves for microlenses having a plurality of first concaves 31 and first aligment marks 71 formed on a first glass substrate 29, a second substrate 8 with concaves for microlenses having a plurality of second concaves 32 and second aligment marks 72 formed on a second glass substrate 89, a resin layer 9, microlenses 4 consisting of doulbe convex lenses formed of a resin filled in between the first and second concaves 31 and 32, and spacers 5.
    Type: Application
    Filed: July 8, 2003
    Publication date: January 15, 2004
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Nobuo Shimizu, Shinichi Yotsuya, Hideto Yamashita, Masami Murata, Koichi Akiyama
  • Patent number: 6677237
    Abstract: A semiconductor chip having a vertical current conduction structure of a high reliability: a semiconductor device, a circuit substrate, and an electronic apparatus each containing such semiconductor chips; and a method for producing them. A prehole (3) is formed in a silicon substrate (10) surface-oriented to a (100) face by laser beam irradiation. The prehole (3) is enlarged by anisotropic etching to thereby form a through-hole (4). An electrically insulating film is formed on an inner wall of the through-hole (4). An electrically conducting material is provided inside the insulating film to thereby form a metal bump (30).
    Type: Grant
    Filed: June 12, 2002
    Date of Patent: January 13, 2004
    Assignee: Seiko Epson Corporation
    Inventors: Kazushige Umetsu, Jun Amako, Shinichi Yotsuya, Katsuji Arakawa
  • Patent number: 6650461
    Abstract: A spatial light modulator is constructed from a conductive silicon mirror substrate and a glass electrode substrate including sodium, anode-bonded together. The silicon mirror substrate has micromirrors arranged in a matrix, torsion bars coupling these micromirrors in the x-direction, and a frame coupled to both ends of the torsion bars. A glass electrode substrate has a central depression, a rim around the periphery thereof, pillars projecting from within the depression, and electrodes and wiring driving micromirrors formed within the depression in an inclining manner. Both ends of the torsion bars are bonded to the rim of the frame portion, and intermediate portions of the torsion bars are bonded to the pillars. Both ends of the torsion bars are cut away from the frame portion during dicing.
    Type: Grant
    Filed: July 10, 2002
    Date of Patent: November 18, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Mitsuro Atobe, Hiroshi Koeda, Shinichi Yotsuya
  • Publication number: 20030199144
    Abstract: A mask is disclosed for use in forming a thin-layer pattern of an organic electroluminescence element having high-precision pixels. The mask is manufactured by wet-etching a (100) silicon wafer (single crystal silicon substrate) 1 in a crystal orientation-dependent anisotropic fashion so as to form through-holes 11 having (111)-oriented walls 11a serving as apertures corresponding to a thin-layer pattern to be formed.
    Type: Application
    Filed: May 6, 2003
    Publication date: October 23, 2003
    Applicant: Seiko Epson Corporation
    Inventors: Mitsuro Atobe, Shinichi Kamisuki, Ryuichi Kurosawa, Shinichi Yotsuya
  • Patent number: 6618200
    Abstract: The present invention provides a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate includes a first substrate with concaves for microlenses having a plurality of first concaves and first alignment marks formed on a first glass substrate, a second substrate with concaves for microlenses having a plurality of second concaves and second alignment marks formed on a second glass substrate, a resin layer, microlenses comprised of double convex lenses formed of a resin filled in between the first and second concaves, and spacers.
    Type: Grant
    Filed: April 10, 2001
    Date of Patent: September 9, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Nobuo Shimizu, Shinichi Yotsuya, Hideto Yamashita, Masami Murata, Koichi Akiyama