Patents by Inventor Shinji Kubota

Shinji Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200251308
    Abstract: A radio frequency power source according to an exemplary embodiment includes a power generator configured to generate radio frequency power. The radio frequency power includes a plurality of power components. The plurality of power components respectively have a plurality of frequencies set symmetrically with respect to a fundamental frequency at an interval of a predetermined frequency. The envelope of the radio frequency power has peaks that periodically appear at a time interval defined by the predetermined frequency or a frequency that is a multiple of twice or more the predetermined frequency. The power level of the radio frequency power is set to be zero in a period excluding a period between a zero-cross region of the envelope immediately before a point in time of appearance of each of the peaks and a zero-cross region of the envelope immediately after the point in time of the appearance.
    Type: Application
    Filed: January 27, 2020
    Publication date: August 6, 2020
    Applicant: Tokyo Electron Limited
    Inventors: Shinji KUBOTA, Takashi DOKAN
  • Publication number: 20200221058
    Abstract: A projector includes a projection section, a spectral imaging section, and a control section, wherein the control section makes the projection section project an adjusting image corresponding to a color and a gray level of an image to be projected by the projection section while changing the color and the gray level to a first color and a first gray level, the first color and a second gray level, a second color and a third gray level, and the second color and a fourth gray level, sets a measurement condition corresponding to the color to the spectral imaging section, and makes the spectral imaging section take the adjusting images projected by the projection section to obtain spectral imaging data.
    Type: Application
    Filed: January 7, 2020
    Publication date: July 9, 2020
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Tetsuo MANO, Shinji KUBOTA, Hiroyuki ICHIEDA
  • Patent number: 10707054
    Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: July 7, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Shinji Kubota
  • Publication number: 20200203129
    Abstract: In a plasma processing apparatus according to an embodiment, a first radio-frequency power supply is connected to a lower electrode of a substrate support provided within a chamber via a first matcher. The first radio-frequency power supply supplies first radio-frequency power for bias to the lower electrode. The second radio-frequency power supply is connected to a load via a second matcher. The second radio-frequency power supply supplies second radio-frequency power for plasma generation. A controller of the second matcher sets an impedance of a matching circuit of the second matcher such that a reflection from the load of the second radio-frequency power supply is reduced in a designated partial period within each cycle of the first radio-frequency power.
    Type: Application
    Filed: December 18, 2019
    Publication date: June 25, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Chishio Koshimizu, Takashi Dokan, Shinji Kubota
  • Patent number: 10672616
    Abstract: A plasma processing apparatus includes a microwave generation unit configured to generate a microwave, a processing vessel configured to introduce the microwave thereinto, and a gas supply mechanism configured to supply a gas into the processing vessel, plasma being generated within the processing vessel so that a plasma processing is performed on a processing target object. The microwave generation unit includes an oscillation circuit configured to oscillate the microwave, a pulse generation circuit configured to oscillate a control wave having a predetermined frequency bandwidth at a predetermined cycle, and a frequency modulation circuit configured to modulate a frequency of the microwave to a modulated wave having the predetermined frequency bandwidth by the control wave and output the modulated wave, and the frequency modulation circuit alternately and repeatedly outputs the modulated wave and a non-modulated microwave at the predetermined cycle.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: June 2, 2020
    Assignee: TOKYO ELECTON LIMITED
    Inventor: Shinji Kubota
  • Patent number: 10665416
    Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: May 26, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Shinji Kubota, Naohiko Okunishi, Yosuke Tamuro, Shota Kaneko
  • Publication number: 20200118814
    Abstract: A plasma processing method includes performing a first plasma processing in a processing chamber in a first period, and performing a second plasma processing in the chamber in a second period which is after the first period or following the first period. The first plasma processing and the second plasma processing are performed in a state where a substrate is disposed on a substrate support stage provided in the processing chamber. A sequence including the first plasma processing and the second plasma processing is performed a plurality of times.
    Type: Application
    Filed: October 11, 2019
    Publication date: April 16, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takashi DOKAN, Shinji KUBOTA
  • Patent number: 10622197
    Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered on a predetermined center frequency; a plasma generating unit configured to generate plasma by using the carrier wave group; a spectrum detecting unit configured to detect a progressive wave spectrum and a reflection wave spectrum of the carrier wave group; and a control unit configured to calculate, by using the progressive wave spectrum and the reflection wave spectrum, an absorption power which is a power of the carrier wave group absorbed into the plasma, and configured to adjust a parameter, which varies a minimum value of the reflection wave spectrum and a frequency corresponding to the minimum value, such that the absorption power becomes equal to or larger than a threshold value.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: April 14, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shinji Kubota, Takashi Dokan, Koji Koyama, Naoki Matsumoto
  • Publication number: 20200027688
    Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.
    Type: Application
    Filed: July 19, 2018
    Publication date: January 23, 2020
    Inventors: Shinji KUBOTA, Naohiko OKUNISHI, Yosuke TAMURO, Shota KANEKO
  • Patent number: 10534448
    Abstract: Detection accuracy of a distance between a tip of a pointing element and a screen is to be improved. An interactive projector includes a projection unit, a plurality of cameras, and a position detection unit that detects a three-dimensional position of the pointing element with respect to the projected screen based on a plurality of images including the pointing element of which the image is captured by the plurality of cameras. When a direction separated from the projected screen is defined as a Z direction, the second camera is arranged at a position nearer the projected screen than that of the first camera in the Z direction.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: January 14, 2020
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Tormod Njolstad, Gudmund Ake Slettemoen, Oystein Damhaug, Shinji Kubota
  • Patent number: 10436987
    Abstract: An optical module includes a substrate on which an optical waveguide is provided; a housing that houses the substrate and includes a through path arranged on a side wall of the housing so as to extend in a direction that crosses the optical waveguide; a ferrule that houses an end portion of an optical fiber; and an optical path conversion element that is fixed on the ferrule, that is fixed on an end surface of the substrate on the end portion side of the optical waveguide, and that has a size smaller than a width of the substrate and a width of the ferrule along a longitudinal direction of the substrate. The end portion of the optical waveguide is arranged at a position close to the through path of the housing relative to a central portion in a width direction of the substrate.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: October 8, 2019
    Assignee: FUJITSU OPTICAL COMPONENTS LIMITED
    Inventors: Shinji Maruyama, Yoshinobu Kubota, Yoshimitsu Sakai
  • Patent number: 10429994
    Abstract: A projector includes an imaging unit which images a screen SC, and a position detection unit which detects an indication position of an indicator based on a captured image of the imaging unit. The position detection unit detects reflected light of detection light reflected by the indicator from the captured image of the imaging unit and obtains the indication position of the indicator based on the position of the reflected light detected from the captured image and the distance between the screen SC and the imaging unit.
    Type: Grant
    Filed: January 20, 2015
    Date of Patent: October 1, 2019
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Hieu Nguyen, Tormod Njolstad, Babak Moussakhani, Karol Marcin Pawlak, Kenji Tanaka, Shinji Kubota
  • Patent number: 10432144
    Abstract: A high-frequency phase-locked oscillation circuit having an extremely narrow peak width and a stable frequency so that a high-frequency wave that is oscillated by the MR element solves a problem of a large peak width of oscillation spectrum. The high-frequency phase-locked oscillation circuit includes a magnetoresistive element that oscillates a high-frequency wave with an oscillating frequency; a reference signal source that outputs a reference signal with a reference frequency; a phase-locked loop circuit having a phase comparator, a loop filter, and a frequency divider; an adder that adds a phase error signal output from the loop filter and a bias voltage for oscillating the high-frequency wave from the magnetoresistive element, and that inputs an added bias voltage to the magnetoresistive element; and a filter provided between the frequency divider and the magnetoresistive element.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: October 1, 2019
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Shingo Tamaru, Hitoshi Kubota, Akio Fukushima, Shinji Yuasa
  • Patent number: 10340344
    Abstract: A silicon carbide semiconductor device includes a silicon carbide substrate, a gate insulating film, and a gate electrode. The gate insulating film is provided as being in contact with the first main surface of the silicon carbide substrate. The gate electrode is provided on the gate insulating film such that the gate insulating film lies between the gate electrode and the silicon carbide substrate. In a first stress test in which a gate voltage of ?5 V is applied to the gate electrode for 100 hours at a temperature of 175° C., an absolute value of a difference between a first threshold voltage and a second threshold voltage is not more than 0.5 V, with a threshold voltage before the first stress test being defined as the first threshold voltage and a threshold voltage after the first stress test being defined as the second threshold voltage.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: July 2, 2019
    Assignees: Sumitomo Electric Industries, Ltd., Renesas Electronics Corporation
    Inventors: Ryosuke Kubota, Shunsuke Yamada, Taku Horii, Takeyoshi Masuda, Daisuke Hamajima, So Tanaka, Shinji Kimura, Masayuki Kobayashi
  • Patent number: 10319344
    Abstract: A system consisting of a plurality of terminals storing image data and an image displaying device which are connected with each other through a network capable of two-way communication has the disadvantage of decreasing in throughput on account of slow image data transfer over the network. The image displaying device performs two-way communications with each of the terminals by a communication means at the display device side. Also, the image displaying device acquires image data from a relevant terminal while instructing other terminals to suspend transmission by the image data acquisition controlling means, thereby suspending transmission of image data. The image displaying device displays images by the image displaying means based on the thus acquired image data.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: June 11, 2019
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Minoru Sato, Shinji Kubota, Tomohiro Nomizo
  • Publication number: 20190148155
    Abstract: In a substrate processing method, electrons having a first energy are supplied from an electron beam generator into an inner space of a chamber body of a substrate processing apparatus to generate negative ions by attaching the electrons to molecules in a processing gas supplied to the inner space. Then a positive bias voltage is applied to an electrode of a supporting table that supports a substrate mounted on thereon in the inner space to attract the negative ions to the substrate.
    Type: Application
    Filed: November 8, 2018
    Publication date: May 16, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shinji KUBOTA, Kazuya NAGASEKI, Akihiro YOKOTA, Gen TAMAMUSHI
  • Publication number: 20190148115
    Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.
    Type: Application
    Filed: January 10, 2019
    Publication date: May 16, 2019
    Inventor: Shinji Kubota
  • Patent number: 10217612
    Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: February 26, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Shinji Kubota
  • Patent number: 10114475
    Abstract: A projection system includes a light emitting apparatus that emits detection light to a detection area for detecting indication positions of indicators, and a projector that detects the indication positions of the indicators in the detection area. The projector includes an imaging portion that captures an image of the detection area, and a position detection portion that detects at least one of an image of light generated by the indicator and an image of the detection light reflected on the indicator from data of a captured image of the imaging portion, and discriminates and detects the indication positions of the indicator and the indicator based on light emission timings of the indicator and the light emitting apparatus.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: October 30, 2018
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Hallvard Naess, Tormod Njolstad, Sverre Dale Moen, Karol Marcin Pawlak, Shinji Kubota
  • Publication number: 20180211818
    Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered on a predetermined center frequency; a plasma generating unit configured to generate plasma by using the carrier wave group; a spectrum detecting unit configured to detect a progressive wave spectrum and a reflection wave spectrum of the carrier wave group; and a control unit configured to calculate, by using the progressive wave spectrum and the reflection wave spectrum, an absorption power which is a power of the carrier wave group absorbed into the plasma, and configured to adjust a parameter, which varies a minimum value of the reflection wave spectrum and a frequency corresponding to the minimum value, such that the absorption power becomes equal to or larger than a threshold value.
    Type: Application
    Filed: July 19, 2016
    Publication date: July 26, 2018
    Inventors: Shinji Kubota, Takashi Dokan, Koji Koyama, Naoki Matsumoto