Abstract: A projector moves a first imaging lens and a second imaging lens in a direction that intersects the optical axis of an imaging section to adjust the imaging range of the imaging section and moves the first imaging lens and the second imaging lens in the direction that intersects the optical axis of the imaging section to switch the imaging lens located in a position corresponding to the imaging section from one to another.

Abstract: The plasma processing apparatus according to an exemplary embodiment includes a chamber, a radio-frequency power supply, and a correction signal generator. The radio-frequency power supply outputs a pulsed radio-frequency power in a first period. The radio-frequency power supply outputs a pulsed radio-frequency power in one or more second periods after the first period. The correction signal generator generates a correction signal that oscillates in a reverse phase with respect to a reflected wave monitor signal in the first period. The radio-frequency power supply generates a combined radio-frequency power using the correction signal. The power supply is configured to alternately repeat output of the pulsed radio-frequency power in the first period and output of the combined radio-frequency power in the one or more second periods.

Abstract: A plasma processing apparatus includes a processing vessel; a carrier wave group generating unit configured to generate a carrier wave group including multiple carrier waves having different frequencies belonging to a preset frequency band centered around a predetermined center frequency; and a plasma generating unit configured to generate plasma within the processing vessel by using the carrier wave group.

Abstract: A projector includes a projection section, a spectral imaging section, and a control section, wherein the control section makes the projection section project an adjusting image corresponding to a color and a gray level of an image to be projected by the projection section while changing the color and the gray level to a first color and a first gray level, the first color and a second gray level, a second color and a third gray level, and the second color and a fourth gray level, sets a measurement condition corresponding to the color to the spectral imaging section, and makes the spectral imaging section take the adjusting images projected by the projection section to obtain spectral imaging data.

Abstract: A plasma processing apparatus includes: a first electrode on which a substrate is placed; a plasma generation source that generates plasma; a bias power supply that supplies bias power to the first electrode; a source power supply that supplies source power to the plasma generation source; and a controller. The controller performs a control such that a first state and a second state of the source power are alternately applied in synchronization with a high frequency cycle of the bias power, or a phase within one cycle of a reference electrical state indicating any one of a voltage, a current and an electromagnetic field measured in a power feed system of the bias power, and performs a control to turn OFF the source power at least at a negative side peak of the phase within one cycle of the reference electrical state.

Abstract: A plasma processing method includes performing a first plasma processing in a processing chamber in a first period, and performing a second plasma processing in the processing chamber during a second period continuously after the first period. In the first period and the second period, a first radio-frequency power for bias is continuously supplied to a lower electrode. A second radio-frequency power for plasma generation may be supplied as a pulsed radio-frequency power in a first partial period in each cycle of the first radio-frequency power in the first period. The second radio-frequency power may be supplied as a pulsed radio-frequency power in a second partial period in each cycle of the first radio-frequency power in the second period.

Abstract: A control method of a plasma processing apparatus including a first electrode and a second electrode includes supplying a bias power to the first electrode, and supplying a negative DC voltage to the second electrode. The negative DC voltage periodically repeats a first state that takes a first voltage value and a second state that takes a second voltage value having an absolute value smaller than the first voltage value. The control method further includes a first control process of applying the first state of the negative DC voltage in a partial time period within each cycle of a signal synchronized with a cycle of a radio frequency of the bias power, or in a partial time period within each cycle of a periodically varying parameter measured in a transmission path of the bias power, and applying the second state continuously with the first state.

Abstract: In a substrate processing method, electrons having a first energy are supplied from an electron beam generator into an inner space of a chamber body of a substrate processing apparatus to generate negative ions by attaching the electrons to molecules in a processing gas supplied to the inner space. Then a positive bias voltage is applied to an electrode of a supporting table that supports a substrate mounted on thereon in the inner space to attract the negative ions to the substrate.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A projector includes a projection section, a spectral imaging section, and a control section, wherein the control section makes the projection section project an adjusting image corresponding to a color and a gray level of an image to be projected by the projection section while changing the color and the gray level to a first color and a first gray level, the first color and a second gray level, a second color and a third gray level, and the second color and a fourth gray level, sets a measurement condition corresponding to the color to the spectral imaging section, and makes the spectral imaging section take the adjusting images projected by the projection section to obtain spectral imaging data.

Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.

Abstract: The plasma processing apparatus according to an exemplary embodiment includes a chamber, a radio-frequency power supply, and a correction signal generator. The radio-frequency power supply outputs a pulsed radio-frequency power in a first period. The radio-frequency power supply outputs a pulsed radio-frequency power in one or more second periods after the first period. The correction signal generator generates a correction signal that oscillates in a reverse phase with respect to a reflected wave monitor signal in the first period. The radio-frequency power supply generates a combined radio-frequency power using the correction signal. The power supply is configured to alternately repeat output of the pulsed radio-frequency power in the first period and output of the combined radio-frequency power in the one or more second periods.

Abstract: A projector moves a first imaging lens and a second imaging lens in a direction that intersects the optical axis of an imaging section to adjust the imaging range of the imaging section and moves the first imaging lens and the second imaging lens in the direction that intersects the optical axis of the imaging section to switch the imaging lens located in a position corresponding to the imaging section from one to another.

Abstract: A radio frequency power source according to an exemplary embodiment includes a power generator configured to generate radio frequency power. The radio frequency power includes a plurality of power components. The plurality of power components respectively have a plurality of frequencies set symmetrically with respect to a fundamental frequency at an interval of a predetermined frequency. The envelope of the radio frequency power has peaks that periodically appear at a time interval defined by the predetermined frequency or a frequency that is a multiple of twice or more the predetermined frequency. The power level of the radio frequency power is set to be zero in a period excluding a period between a zero-cross region of the envelope immediately before a point in time of appearance of each of the peaks and a zero-cross region of the envelope immediately after the point in time of the appearance.

Abstract: A projector includes a projection section, a spectral imaging section, and a control section, wherein the control section makes the projection section project an adjusting image corresponding to a color and a gray level of an image to be projected by the projection section while changing the color and the gray level to a first color and a first gray level, the first color and a second gray level, a second color and a third gray level, and the second color and a fourth gray level, sets a measurement condition corresponding to the color to the spectral imaging section, and makes the spectral imaging section take the adjusting images projected by the projection section to obtain spectral imaging data.

Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.

Abstract: In a plasma processing apparatus according to an embodiment, a first radio-frequency power supply is connected to a lower electrode of a substrate support provided within a chamber via a first matcher. The first radio-frequency power supply supplies first radio-frequency power for bias to the lower electrode. The second radio-frequency power supply is connected to a load via a second matcher. The second radio-frequency power supply supplies second radio-frequency power for plasma generation. A controller of the second matcher sets an impedance of a matching circuit of the second matcher such that a reflection from the load of the second radio-frequency power supply is reduced in a designated partial period within each cycle of the first radio-frequency power.

Abstract: A plasma processing apparatus includes a microwave generation unit configured to generate a microwave, a processing vessel configured to introduce the microwave thereinto, and a gas supply mechanism configured to supply a gas into the processing vessel, plasma being generated within the processing vessel so that a plasma processing is performed on a processing target object. The microwave generation unit includes an oscillation circuit configured to oscillate the microwave, a pulse generation circuit configured to oscillate a control wave having a predetermined frequency bandwidth at a predetermined cycle, and a frequency modulation circuit configured to modulate a frequency of the microwave to a modulated wave having the predetermined frequency bandwidth by the control wave and output the modulated wave, and the frequency modulation circuit alternately and repeatedly outputs the modulated wave and a non-modulated microwave at the predetermined cycle.

Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.

Abstract: A plasma processing method includes performing a first plasma processing in a processing chamber in a first period, and performing a second plasma processing in the chamber in a second period which is after the first period or following the first period. The first plasma processing and the second plasma processing are performed in a state where a substrate is disposed on a substrate support stage provided in the processing chamber. A sequence including the first plasma processing and the second plasma processing is performed a plurality of times.