Patents by Inventor Shu Yen
Shu Yen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11739642Abstract: The disclosed embodiment is related to a manufacturing method of a die-formed 3-dimensional plastic impeller of a centrifugal pump and the impeller manufactured thereby, including a mold for twisted blade and a mold for impeller outlet, the mold for twisted blade is configured to form a twisted blade portion of each blade of the impeller, the mold for impeller outlet is configured to form a rear portion of each blade, a hub rim part of the impeller, and a shroud rim part of the impeller so that the hub rim part, the shroud rim part, and the blades are formed in a single piece at the same molding process.Type: GrantFiled: September 25, 2019Date of Patent: August 29, 2023Assignee: ASSOMA INC.Inventors: Chih-Hsien Shih, Chih-Kuan Shih, Huan-Jan Chien, Shu-Yen Chien, Chin-Cheng Wang, Yuan Hung Lin, Peng-Hsiang Chen
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Publication number: 20230189498Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.Type: ApplicationFiled: February 6, 2023Publication date: June 15, 2023Applicants: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
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Patent number: 11643471Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.Type: GrantFiled: July 26, 2022Date of Patent: May 9, 2023Assignee: GlycoNex Inc.Inventors: Tong-Hsuan Chang, Mei-Chun Yang, Liahng-Yirn Liu, Jerry Ting, Shu-Yen Chang, Yen-Ying Chen, Yu-Yu Lin, Shu-Lun Tang
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Patent number: 11641979Abstract: The present invention is concerned with a culinary whisk with an elongate profile defining a longitudinal axis and having a proximal end and a distal end, comprising a handle portion and a utility portion, wherein the utility portion includes a plurality of wire loops, and wherein the wire loop has an asymmetric profile and includes an upper elongate leg portion and a lower foot portion and wherein each wire loop has a web member extending across a wire segment of the lower foot portion.Type: GrantFiled: November 12, 2020Date of Patent: May 9, 2023Assignee: Dandre Technology Innovation LimitedInventors: Shu Yen Wong, Andre Ludwig
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Patent number: 11631679Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.Type: GrantFiled: May 10, 2022Date of Patent: April 18, 2023Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
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Publication number: 20230059336Abstract: An electrical connector assembly is applied to be disposed on a circuit board. The electrical connector assembly includes an electrical connector and a grounding metal member that is sleeved around an outer side of the electrical connector. The grounding metal member has a first surrounding segment and a second surrounding segment that outwardly extends from an end of the first surrounding segment. The second surrounding segment has a shielding portion being ring-shaped and a plurality of extension portions that extend from the shielding portion. The grounding metal member is configured to be connected to a grounding circuit of the circuit board through the shielding portion and the extension portions.Type: ApplicationFiled: July 6, 2022Publication date: February 23, 2023Inventors: PEI-SHU YEN, PING-CHUNG LO, WEI-CHUN TSAO
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Patent number: 11581199Abstract: A wafer drying method that detects molecular contaminants in a drying gas as a feedback parameter for a multiple wafer drying process is disclosed. For example, the method includes dispensing, in a wafer drying module, a drying gas over a batch of wafers. Further, the method includes collecting the drying gas from an exhaust of the wafer drying module and determining the concentration of contaminants in the drying gas. The method also includes re-dispensing the drying gas over the batch of wafers if the concentration of contaminants is greater than a baseline value and transferring the batch of wafers out of the wafer drying module if the concentration is equal to or less than the baseline value.Type: GrantFiled: May 24, 2019Date of Patent: February 14, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Wei-Chun Hsu, Sheng-Wei Wu, Shu-Yen Wang
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Publication number: 20220403042Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.Type: ApplicationFiled: July 26, 2022Publication date: December 22, 2022Inventors: Tong-Hsuan CHANG, Mei-Chun YANG, Liahng-Yirn LIU, Jerry TING, Shu-Yen CHANG, Yen-Ying CHEN, Yu-Yu LIN, Shu-Lun TANG
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Publication number: 20220362815Abstract: The present disclosure describes a wafer cleaning process in which a drained cleaning solution, which is used to remove metal contaminants from the wafer, is sampled and analyzed to determine the concentration of metal ions in the solution. The wafer cleaning process includes dispensing, in a wafer cleaning station, a chemical solution on one or more wafers; collecting the dispensed chemical solution; determining a concentration of contaminants in the chemical solution; in response to the concentration of the contaminants being greater than a baseline value, adjusting one or more parameters in the cleaning process; and in response to the concentration of the contaminants being equal to or less than the baseline value, transferring the one or more wafers out of the wafer cleaning station.Type: ApplicationFiled: July 28, 2022Publication date: November 17, 2022Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Wei Chao, Shu-Yen Wang
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Patent number: 11502180Abstract: A semiconductor device includes a substrate having at least a trench formed therein. A conductive material fills a lower portion of the trench. A barrier layer is between the conductive material and the substrate. An insulating layer is in the trench and completely covers the conductive material and the barrier layer, wherein a portion of the insulating layer covering the barrier layer has a bird's peak profile.Type: GrantFiled: February 17, 2020Date of Patent: November 15, 2022Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Chia-Wei Wu, Ting-Pang Chung, Tien-Chen Chan, Shu-Yen Chan
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Publication number: 20220359237Abstract: In an embodiment, a method includes: immersing a wafer in a bath within a cleaning chamber; removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber; determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is beyond a threshold value.Type: ApplicationFiled: July 26, 2022Publication date: November 10, 2022Inventors: Wei-Chun HSU, Shu-Yen WANG, Chui-Ya PENG
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Publication number: 20220359188Abstract: In an embodiment, a method includes: receiving a wafer from a first dilution tank; immersing the wafer in a deionization tank, wherein the deionization tank comprises a tank solution that comprises a deionizing solution; determining a metal ion concentration within the tank solution; performing remediation within the deionization tank in response to determining that the metal ion concentration is greater than a threshold value; and moving the wafer to a second dilution tank.Type: ApplicationFiled: July 22, 2022Publication date: November 10, 2022Inventors: Chih-Wei CHAO, Shu-Yen WANG
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Patent number: 11440967Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.Type: GrantFiled: May 30, 2019Date of Patent: September 13, 2022Assignee: GlycoNex Inc.Inventors: Tong-Hsuan Chang, Mei-Chun Yang, Liahng-Yim Liu, Jerry Ting, Shu-Yen Chang, Yen-Ying Chen, Yu-Yu Lin, Shu-Lun Tang
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Publication number: 20220271037Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.Type: ApplicationFiled: May 10, 2022Publication date: August 25, 2022Applicants: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
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Patent number: 11393826Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.Type: GrantFiled: October 31, 2018Date of Patent: July 19, 2022Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
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Publication number: 20220213897Abstract: The disclosed embodiment is related to a manufacturing method of a die-formed 3-dimensional plastic impeller of a centrifugal pump and the impeller manufactured thereby, including a mold for twisted blade and a mold for impeller outlet, the mold for twisted blade is configured to form a twisted blade portion of each blade of the impeller, the mold for impeller outlet is configured to form a rear portion of each blade, a hub rim part of the impeller, and a shroud rim part of the impeller so that the hub rim part, the shroud rim part, and the blades are formed in a single piece at the same molding process.Type: ApplicationFiled: September 25, 2019Publication date: July 7, 2022Inventors: Chih-Hsien SHIH, Chih-Kuan SHIH, Huan-Jan CHIEN, Shu-Yen CHIEN, Chin-Cheng WANG, Yuan Hung Lin, PENG-HSIANG CHEN
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Patent number: 11331811Abstract: A finger device including a finger segment, a finger base, a first steering control mechanism, a first actuator, a second steering control mechanism, a universal joint and a second actuator is provided. The finger base is connected to one end of the finger segment, and the first steering control mechanism is disposed on the finger base. The first actuator is configured to provide a first moment to the first steering control mechanism, so that the finger segment and the finger base have a degree of freedom in a first moving direction. The second steering control mechanism is disposed on the finger base. The second actuator is configured to provide a second moment to the universal joint. The universal joint is rotatably connected between the second actuator and the second steering control mechanism, so that the finger segment has a degree of freedom in a second moving direction.Type: GrantFiled: January 15, 2021Date of Patent: May 17, 2022Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Shu-Yen Lo, Kai-Jen Pai
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Publication number: 20220143842Abstract: A finger device including a finger segment, a finger base, a first steering control mechanism, a first actuator, a second steering control mechanism, a universal joint and a second actuator is provided. The finger base is connected to one end of the finger segment, and the first steering control mechanism is disposed on the finger base. The first actuator is configured to provide a first moment to the first steering control mechanism, so that the finger segment and the finger base have a degree of freedom in a first moving direction. The second steering control mechanism is disposed on the finger base. The second actuator is configured to provide a second moment to the universal joint. The universal joint is rotatably connected between the second actuator and the second steering control mechanism, so that the finger segment has a degree of freedom in a second moving direction.Type: ApplicationFiled: January 15, 2021Publication date: May 12, 2022Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Shu-Yen LO, Kai-Jen PAI
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Publication number: 20220142412Abstract: The present invention is concerned with a culinary whisk with an elongate profile defining a longitudinal axis and having a proximal end and a distal end, comprising a handle portion and a utility portion, wherein the utility portion includes a plurality of wire loops, and wherein the wire loop has an asymmetric profile and includes an upper elongate leg portion and a lower foot portion and wherein each wire loop has a web member extending across a wire segment of the lower foot portion.Type: ApplicationFiled: November 12, 2020Publication date: May 12, 2022Inventors: Shu Yen Wong, Andre Ludwig
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Publication number: 20210215424Abstract: The present disclosure is directed to a wafer drying system and method that detects airborne molecular contaminants in a drying gas as a feedback parameter for a single wafer or multi-wafer drying process. For example, the system comprises a wafer drying station configured to dispense a drying gas over one or more wafers to dry the one or more wafers, a valve configured to divert the drying gas to a first portion and a second portion, and an exhaust line configured to exhaust the first portion of the drying gas. The system further comprises a detector configured to receive the second portion of the drying gas and to determine a real time property of the second portion of the drying gas, and a control unit configured to control a feedback operation of the wafer drying station based on the real time property of the second portion of the drying gas.Type: ApplicationFiled: March 29, 2021Publication date: July 15, 2021Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Wei-Chun HSU, Sheng-Wei Wu, Shu-Yen Wang