Patents by Inventor Shu Yen

Shu Yen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11739642
    Abstract: The disclosed embodiment is related to a manufacturing method of a die-formed 3-dimensional plastic impeller of a centrifugal pump and the impeller manufactured thereby, including a mold for twisted blade and a mold for impeller outlet, the mold for twisted blade is configured to form a twisted blade portion of each blade of the impeller, the mold for impeller outlet is configured to form a rear portion of each blade, a hub rim part of the impeller, and a shroud rim part of the impeller so that the hub rim part, the shroud rim part, and the blades are formed in a single piece at the same molding process.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: August 29, 2023
    Assignee: ASSOMA INC.
    Inventors: Chih-Hsien Shih, Chih-Kuan Shih, Huan-Jan Chien, Shu-Yen Chien, Chin-Cheng Wang, Yuan Hung Lin, Peng-Hsiang Chen
  • Publication number: 20230189498
    Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.
    Type: Application
    Filed: February 6, 2023
    Publication date: June 15, 2023
    Applicants: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
  • Patent number: 11643471
    Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.
    Type: Grant
    Filed: July 26, 2022
    Date of Patent: May 9, 2023
    Assignee: GlycoNex Inc.
    Inventors: Tong-Hsuan Chang, Mei-Chun Yang, Liahng-Yirn Liu, Jerry Ting, Shu-Yen Chang, Yen-Ying Chen, Yu-Yu Lin, Shu-Lun Tang
  • Patent number: 11641979
    Abstract: The present invention is concerned with a culinary whisk with an elongate profile defining a longitudinal axis and having a proximal end and a distal end, comprising a handle portion and a utility portion, wherein the utility portion includes a plurality of wire loops, and wherein the wire loop has an asymmetric profile and includes an upper elongate leg portion and a lower foot portion and wherein each wire loop has a web member extending across a wire segment of the lower foot portion.
    Type: Grant
    Filed: November 12, 2020
    Date of Patent: May 9, 2023
    Assignee: Dandre Technology Innovation Limited
    Inventors: Shu Yen Wong, Andre Ludwig
  • Patent number: 11631679
    Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.
    Type: Grant
    Filed: May 10, 2022
    Date of Patent: April 18, 2023
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
  • Publication number: 20230059336
    Abstract: An electrical connector assembly is applied to be disposed on a circuit board. The electrical connector assembly includes an electrical connector and a grounding metal member that is sleeved around an outer side of the electrical connector. The grounding metal member has a first surrounding segment and a second surrounding segment that outwardly extends from an end of the first surrounding segment. The second surrounding segment has a shielding portion being ring-shaped and a plurality of extension portions that extend from the shielding portion. The grounding metal member is configured to be connected to a grounding circuit of the circuit board through the shielding portion and the extension portions.
    Type: Application
    Filed: July 6, 2022
    Publication date: February 23, 2023
    Inventors: PEI-SHU YEN, PING-CHUNG LO, WEI-CHUN TSAO
  • Patent number: 11581199
    Abstract: A wafer drying method that detects molecular contaminants in a drying gas as a feedback parameter for a multiple wafer drying process is disclosed. For example, the method includes dispensing, in a wafer drying module, a drying gas over a batch of wafers. Further, the method includes collecting the drying gas from an exhaust of the wafer drying module and determining the concentration of contaminants in the drying gas. The method also includes re-dispensing the drying gas over the batch of wafers if the concentration of contaminants is greater than a baseline value and transferring the batch of wafers out of the wafer drying module if the concentration is equal to or less than the baseline value.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: February 14, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Chun Hsu, Sheng-Wei Wu, Shu-Yen Wang
  • Publication number: 20220403042
    Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.
    Type: Application
    Filed: July 26, 2022
    Publication date: December 22, 2022
    Inventors: Tong-Hsuan CHANG, Mei-Chun YANG, Liahng-Yirn LIU, Jerry TING, Shu-Yen CHANG, Yen-Ying CHEN, Yu-Yu LIN, Shu-Lun TANG
  • Publication number: 20220362815
    Abstract: The present disclosure describes a wafer cleaning process in which a drained cleaning solution, which is used to remove metal contaminants from the wafer, is sampled and analyzed to determine the concentration of metal ions in the solution. The wafer cleaning process includes dispensing, in a wafer cleaning station, a chemical solution on one or more wafers; collecting the dispensed chemical solution; determining a concentration of contaminants in the chemical solution; in response to the concentration of the contaminants being greater than a baseline value, adjusting one or more parameters in the cleaning process; and in response to the concentration of the contaminants being equal to or less than the baseline value, transferring the one or more wafers out of the wafer cleaning station.
    Type: Application
    Filed: July 28, 2022
    Publication date: November 17, 2022
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Wei Chao, Shu-Yen Wang
  • Patent number: 11502180
    Abstract: A semiconductor device includes a substrate having at least a trench formed therein. A conductive material fills a lower portion of the trench. A barrier layer is between the conductive material and the substrate. An insulating layer is in the trench and completely covers the conductive material and the barrier layer, wherein a portion of the insulating layer covering the barrier layer has a bird's peak profile.
    Type: Grant
    Filed: February 17, 2020
    Date of Patent: November 15, 2022
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Chia-Wei Wu, Ting-Pang Chung, Tien-Chen Chan, Shu-Yen Chan
  • Publication number: 20220359237
    Abstract: In an embodiment, a method includes: immersing a wafer in a bath within a cleaning chamber; removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber; determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is beyond a threshold value.
    Type: Application
    Filed: July 26, 2022
    Publication date: November 10, 2022
    Inventors: Wei-Chun HSU, Shu-Yen WANG, Chui-Ya PENG
  • Publication number: 20220359188
    Abstract: In an embodiment, a method includes: receiving a wafer from a first dilution tank; immersing the wafer in a deionization tank, wherein the deionization tank comprises a tank solution that comprises a deionizing solution; determining a metal ion concentration within the tank solution; performing remediation within the deionization tank in response to determining that the metal ion concentration is greater than a threshold value; and moving the wafer to a second dilution tank.
    Type: Application
    Filed: July 22, 2022
    Publication date: November 10, 2022
    Inventors: Chih-Wei CHAO, Shu-Yen WANG
  • Patent number: 11440967
    Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: September 13, 2022
    Assignee: GlycoNex Inc.
    Inventors: Tong-Hsuan Chang, Mei-Chun Yang, Liahng-Yim Liu, Jerry Ting, Shu-Yen Chang, Yen-Ying Chen, Yu-Yu Lin, Shu-Lun Tang
  • Publication number: 20220271037
    Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.
    Type: Application
    Filed: May 10, 2022
    Publication date: August 25, 2022
    Applicants: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
  • Patent number: 11393826
    Abstract: A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a discontinuous sidewall having a turning portion. Next, a first deposition process is performed, to deposit a first semiconductor layer to fill up the trench and to further cover on the top surface of the dielectric layer. Following these, the first semiconductor layer is laterally etched, to partially remove the first semiconductor layer till exposing the turning portion of the trench. Finally, a second deposition is performed, to deposit a second semiconductor layer to fill up the trench.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: July 19, 2022
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Luo-Hsin Lee, Ting-Pang Chung, Shih-Han Hung, Po-Han Wu, Shu-Yen Chan, Shih-Fang Tzou
  • Publication number: 20220213897
    Abstract: The disclosed embodiment is related to a manufacturing method of a die-formed 3-dimensional plastic impeller of a centrifugal pump and the impeller manufactured thereby, including a mold for twisted blade and a mold for impeller outlet, the mold for twisted blade is configured to form a twisted blade portion of each blade of the impeller, the mold for impeller outlet is configured to form a rear portion of each blade, a hub rim part of the impeller, and a shroud rim part of the impeller so that the hub rim part, the shroud rim part, and the blades are formed in a single piece at the same molding process.
    Type: Application
    Filed: September 25, 2019
    Publication date: July 7, 2022
    Inventors: Chih-Hsien SHIH, Chih-Kuan SHIH, Huan-Jan CHIEN, Shu-Yen CHIEN, Chin-Cheng WANG, Yuan Hung Lin, PENG-HSIANG CHEN
  • Patent number: 11331811
    Abstract: A finger device including a finger segment, a finger base, a first steering control mechanism, a first actuator, a second steering control mechanism, a universal joint and a second actuator is provided. The finger base is connected to one end of the finger segment, and the first steering control mechanism is disposed on the finger base. The first actuator is configured to provide a first moment to the first steering control mechanism, so that the finger segment and the finger base have a degree of freedom in a first moving direction. The second steering control mechanism is disposed on the finger base. The second actuator is configured to provide a second moment to the universal joint. The universal joint is rotatably connected between the second actuator and the second steering control mechanism, so that the finger segment has a degree of freedom in a second moving direction.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: May 17, 2022
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shu-Yen Lo, Kai-Jen Pai
  • Publication number: 20220143842
    Abstract: A finger device including a finger segment, a finger base, a first steering control mechanism, a first actuator, a second steering control mechanism, a universal joint and a second actuator is provided. The finger base is connected to one end of the finger segment, and the first steering control mechanism is disposed on the finger base. The first actuator is configured to provide a first moment to the first steering control mechanism, so that the finger segment and the finger base have a degree of freedom in a first moving direction. The second steering control mechanism is disposed on the finger base. The second actuator is configured to provide a second moment to the universal joint. The universal joint is rotatably connected between the second actuator and the second steering control mechanism, so that the finger segment has a degree of freedom in a second moving direction.
    Type: Application
    Filed: January 15, 2021
    Publication date: May 12, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shu-Yen LO, Kai-Jen PAI
  • Publication number: 20220142412
    Abstract: The present invention is concerned with a culinary whisk with an elongate profile defining a longitudinal axis and having a proximal end and a distal end, comprising a handle portion and a utility portion, wherein the utility portion includes a plurality of wire loops, and wherein the wire loop has an asymmetric profile and includes an upper elongate leg portion and a lower foot portion and wherein each wire loop has a web member extending across a wire segment of the lower foot portion.
    Type: Application
    Filed: November 12, 2020
    Publication date: May 12, 2022
    Inventors: Shu Yen Wong, Andre Ludwig
  • Publication number: 20210215424
    Abstract: The present disclosure is directed to a wafer drying system and method that detects airborne molecular contaminants in a drying gas as a feedback parameter for a single wafer or multi-wafer drying process. For example, the system comprises a wafer drying station configured to dispense a drying gas over one or more wafers to dry the one or more wafers, a valve configured to divert the drying gas to a first portion and a second portion, and an exhaust line configured to exhaust the first portion of the drying gas. The system further comprises a detector configured to receive the second portion of the drying gas and to determine a real time property of the second portion of the drying gas, and a control unit configured to control a feedback operation of the wafer drying station based on the real time property of the second portion of the drying gas.
    Type: Application
    Filed: March 29, 2021
    Publication date: July 15, 2021
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Chun HSU, Sheng-Wei Wu, Shu-Yen Wang