Abstract: Systems and methods for document processing that can process and understand the layout, text size, text style, and multimedia of a document can generate more accurate and informed document representations. The layout of a document paired with text size and style can indicate what portions of a document are possibly more important, and the understanding of that importance can help with understanding of the document. Systems and methods utilizing a hierarchical framework that processes the block-level and the document-level of a document can capitalize on these indicators to generate a better document representation.

Abstract: A method for forming a semiconductor device structure is provided. The semiconductor device includes forming nanowire structures stacked over a substrate and spaced apart from one another, and forming a dielectric material surrounding the nanowire structures. The dielectric material has a first nitrogen concentration. The method also includes treating the dielectric material to form a treated portion. The treated portion of the dielectric material has a second nitrogen concentration that is greater than the first nitrogen concentration. The method also includes removing the treating portion of the dielectric material, thereby remaining an untreated portion of the dielectric material as inner spacer layers; and forming the gate stack surrounding nanowire structures and between the inner spacer layers.

Abstract: A semiconductor package has a substrate, a chip and an encapsulation. The substrate has a dielectric layer, a copper wiring layer and a solder resist layer formed thereon. The copper wiring layer is formed on the dielectric layer and is covered by the solder resist layer. The solder resist layer has a chip area defined thereon and an annular opening formed thereon. The annular opening surrounds the chip area and exposes part of the copper wiring layer. The chip is mounted on the chip area and is encapsulated by the encapsulation. Therefore, the semiconductor package with the annular opening makes the solder resist layer discontinuous, and the concentration stress is decreased to avoid a crack formed on the solder resist layer or the copper wiring layer when doing thermal-cycle test.

Abstract: A device structure includes at least one selector device. Each selector device includes a vertical stack including, from bottom to top, a bottom electrode, a metal oxide semiconductor channel layer, and a top electrode and located over a substrate, a gate dielectric layer contacting sidewalls of the bottom electrode, the metal oxide semiconductor channel layer, and the top electrode, and a gate electrode formed within the gate dielectric layer and having a top surface that is coplanar with a top surface of the top electrode. Each top electrode or each bottom electrode of the at least one selector device may be contacted by a respective nonvolatile memory element to provide a one-selector one-resistor memory cell.

Abstract: An IC structure comprises a substrate, a first dielectric structure, a second dielectric structure, a first via structure, and a memory cell structure. The substrate comprises a memory region and a logic region. The first dielectric structure is over the memory region. The second dielectric structure laterally extends from the first dielectric structure to over the logic region. The second dielectric structure has a thickness less than a thickness of the first dielectric structure. The first via structure extends through the first dielectric structure. A top segment of the first via structure is higher than a top surface of the first dielectric structure. The first memory cell structure is over the first via structure.

Abstract: In some embodiments, the present disclosure relates to an integrated chip that includes a first conductive structure arranged over a substrate. A memory layer is arranged over the first conductive structure, below a second conductive structure, and includes a ferroelectric material. An annealed seed layer is arranged between the first and second conductive structures and directly on a first side of the memory layer. An amount of the crystal structure that includes an orthorhombic phase is greater than about 35 percent.

Abstract: This invention relates generally to blockchain application implementations. It can be used for allowing regular users to obtain formal authorization for accessing files from blockchain powered file storage devices. Before a user accesses a file, a smart contract should be invoked and check if the user device possesses an authorized file access token which is non-fungible token and recorded in the blockchain network. Accordingly, this invention can turn a file abstractly into a token that can be traded or distributed on the internet. Furthermore, these files are encrypted by the access token and binding with it, unauthorized access or illegal copy is not possible. Eventually, Digital File becomes tradable and unique Digital Asset, which will result in a new era of e-commerce transactions. Virtual things Real.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a gate structure formed over a substrate, and the gate structure includes a gate dielectric layer and a gate electrode layer. The semiconductor device structure includes an insulating capping layer formed over the gate electrode layer, and the insulating capping layer covers a top surface of the gate dielectric layer. The semiconductor device structure also includes a conductive via structure formed through the insulating capping layer, and a portion of the conductive via structure is lower than a top surface of the gate dielectric layer.

Abstract: A memory structure, device, and method of making the same, the memory structure including: a channel comprising a semiconductor material; a source electrode electrically connected to a first end of the channel; a drain electrode electrically connected to an opposing second end of the channel; a high-k dielectric layer surrounding the channel; a gate electrode surrounding the high-k dielectric layer; and a memory cell electrically connected to the drain electrode and a bit line. The memory cell includes a first electrode that is electrically connected to the drain electrode.

Abstract: A device includes a conductive feature, a dielectric layer, a bottom electrode via, and a liner layer. The dielectric layer is over the conductive feature. The bottom electrode via is in the dielectric layer and over the conductive feature. A topmost surface of the bottom electrode via is substantially flat. A liner layer cups an underside of the bottom electrode via. The liner layer has a topmost end substantially level with the topmost surface of the bottom electrode via.

Abstract: A two-dimensional array of discrete dielectric template structures is formed over a substrate. A first dielectric spacer matrix may be formed in lower portions of the trenches between the discrete dielectric template structures. A second dielectric spacer matrix layer may be formed in upper portions of the trenches. A pair of a source cavity and a drain cavity may be formed within a volume of each of the discrete dielectric template structures. A source electrode and a drain electrode may be formed in each source cavity and each drain cavity, respectively. The gate electrodes may be formed prior to, or after, formation of the two-dimensional array of discrete dielectric template structures to provide a two-dimensional array of field effect transistors that may be connected to, or may contain, memory elements.

Abstract: A method includes forming a transistor having source and drain regions. The following are formed on the source/drain region: a first via, a first metal layer extending along a first direction on the first via, a second via overlapping the first via on the first metal layer, and a second metal extending along a second direction different from the first direction on the second via; and the following are formed on the drain/source region: a third via, a third metal layer on the third via, a fourth via overlapping the third via over the third metal layer, and a controlled device at a same height level as the second metal layer on the third metal layer.

Abstract: A flow optimizer is disclosed for use in plasma chamber. The flow optimizer includes a ring that is disposed between a wafer support and a dielectric window defined in the plasma chamber. The ring of the flow optimizer is configured to be positioned between the wafer support and the dielectric window so that an outer edge of the ring is adjacent to side walls of the plasma chamber and an opening of the ring is substantially aligned with a diameter of the wafer support.

Abstract: A semiconductor device is described. The semiconductor device includes a substrate and a metal layer disposed on the substrate. A seed layer is formed on the metal layer. A ferroelectric gate layer is formed on the seed layer. A channel layer is formed over the ferroelectric gate layer. The seed layer is arranged to increase the orthorhombic phase fraction of the ferroelectric gate layer.

Abstract: The present disclosure relates integrated chip structure. The integrated chip structure includes a memory array having a plurality of memory devices arranged in a plurality of rows and a plurality of columns. A word-line is coupled to a first set of the plurality of memory devices disposed within a first row of the plurality of rows. A bit-line is coupled to a second set of the plurality of memory devices disposed within a first column of the plurality of columns. A local interconnect extends in parallel to the bit-line and is coupled to the bit-line and two or more of the second set of the plurality of memory devices. The local interconnect is coupled to the bit-line by a plurality of interconnect vias that are between the local interconnect and the bit-line.

Abstract: A method for manufacturing a semiconductor feature includes: alternatingly forming first and second dielectric layers on a semiconductor substrate along a vertical direction; forming multiple spaced-apart trenches penetrating the first and second dielectric layers; forming multiple support segments filling the trenches; removing the second dielectric layers to form multiple spaces; forming multiple conductive layers filling the spaces; removing the support segments to expose the conductive layers and the first dielectric layers; selectively forming a blocking layer covering the first dielectric layers outside of the conductive layers; forming multiple selectively-deposited sub-layers on the exposed conductive layers outside of the blocking layer and each connected to one of the conductive layers; forming multiple channel sub-layers on the selectively-deposited sub-layers outside of the blocking layer; removing the blocking layer; forming multiple isolation sub-layers filling the trenches; and forming multiple

Abstract: A semiconductor device and methods of fabricating the same are disclosed. The method can include forming a fin structure on a substrate, forming a source/drain (S/D) region on the fin structure, forming a gate structure on the fin structure adjacent to the S/D region, and forming a capping structure on the gate structure. The forming the capping structure includes forming a conductive cap on the gate structure, forming a cap liner on the conductive cap, and forming a carbon-based cap on the cap liner. The method further includes forming a first contact structure on the S/D region, forming an insulating cap on the first contact structure, and forming a second contact structure on the conductive cap.

Abstract: In a method of manufacturing a semiconductor device, an underlying structure is formed over a substrate. A film is formed over the underlying structure. Surface topography of the film is measured and the surface topography is stored as topography data. A local etching is performed by using directional etching and scanning the substrate so that an entire surface of the film is subjected to the directional etching. A plasma beam intensity of the directional etching is adjusted according to the topography data.

Abstract: A ferroelectric memory device, a manufacturing method of the ferroelectric memory device and a semiconductor chip are provided. The ferroelectric memory device includes a gate electrode, a ferroelectric layer, a channel layer, first and second blocking layers, and source/drain electrodes. The ferroelectric layer is disposed at a side of the gate electrode. The channel layer is capacitively coupled to the gate electrode through the ferroelectric layer. The first and second blocking layers are disposed between the ferroelectric layer and the channel layer. The second blocking layer is disposed between the first blocking layer and the channel layer. The first and second blocking layers comprise a same material, and the second blocking layer is further incorporated with nitrogen. The source/drain electrodes are disposed at opposite sides of the gate electrode, and electrically connected to the channel layer.

Abstract: A device includes gates and a first conductive segment. A first distance is present between a first gate of the gates and the first conductive segment. A second distance is present between a second gate of the gates and the first conductive segment. The first distance is greater than the second distance.