Abstract: A plasma processing apparatus includes a processing vessel, a means for holding a substrate to be processed, an evacuation system coupled to the processing vessel, a means for supplying plasma gas to an interior of the processing vessel, a microwave antenna provided on the processing vessel, and a process gas supply part comprised of two components. The first component includes a plurality of first apertures for passing through plasma formed in interior of the processing vessel, a process gas passage, and a plurality of second apertures in communication with the process gas passage. The second component includes a plurality of third apertures axially aligned with the first apertures in the first component and diffusion surfaces upon recessed areas of the second component, located opposite to the second apertures in the first component.

Abstract: In a microwave plasma processing apparatus that uses a radial line slot antenna, the efficiency of cooling of a shower plate is optimized and simultaneously the efficiency of microwave excitation is optimized, by causing a radiation surface of the radial line slot antenna to make an intimate contact with a cover plate that forms a part of an outer wall of the processing chamber and makes an intimate contact with the shower plate.

Abstract: In a microwave plasma processing apparatus that uses a radial line slot antenna, a slot plate (16) is formed by a material having a thermal expansion rate close to the wave retardation plate (18), or depositing a metal on a dielectric plate constituting the wave retardation plate (18). An intimate contact between the wave retardation plate and a slot plate constituting a microwave radiation surface is improved so as to prevent an abnormal electric discharge.

Abstract: In a microwave plasma processing apparatus, the reflection of microwave by the joint unit between the microwave supplying waveguide and the microwave antenna is reduced by providing a taper surface or a member having a medium permittivity between the microwave supplying waveguide and the microwave antenna so as to moderate an impedance change. Accordingly, the efficiency of power supplying is improved, and reduced discharge ensures stable formation of plasma.

Abstract: A hydraulic parking brake device is selectively switched between a braking state and a non-braking state. A braking force decreases as a pressure in the control oil chamber increases and increases as the pressure in the control oil chamber decreases. The device includes a discharged oil restrictor located in a discharge passage and an accumulator connected to the control oil chamber. The accumulator is capable of releasing hydraulic oil to the control oil chamber when the braking force is greater than that at the time when the parking brake device is switched from the non-braking state to the braking state and the braking force can further be increased during the braking state of the parking brake device. Thus, the parking brake device can gradually brake the vehicle from the running state.

Abstract: Disclosed is a method for fabricating a color filter for a transflective liquid crystal display device inexpensively in which desired color purities, brightnesses, and color tones are obtained for reflective display and transmissive display. A color filter for a liquid crystal display device includes pixels of a plurality of colors, each pixel of at least one color including a transmissive area and a reflective area. The pixel of at least one color includes a plurality of laminated color layers. The uppermost color layer in the pixel including the plurality of laminated color layers is composed of a photosensitive color resist. In the reflective area of the pixel including the plurality of laminated color layers, a transparent resin layer is disposed between a substrate and the color layer portion.

Abstract: A plasma processing apparatus comprises a processing vessel defined by an outer wall and provided with a stage that holds a substrate to be processed thereon, an evacuation system coupled to the processing vessel, a microwave window provided on the processing vessel as a part of the outer wall so as to face the substrate to be processed on the stage, a plasma gas supplying part supplying a plasma gas to the processing vessel, and a microwave antenna provided on the processing vessel in correspondence to the microwave. The plasma gas supplying part includes a porous medium and the plasma gas supplying part supplies the plasma gas through the porous medium.

Abstract: A heat exchanger includes plural laminated tubes through which a coolant from a fuel cell flows, fins arranged between the tubes and at outermost sides in a lamination direction of the tubes, core plates connected to longitudinal end portions of the tubes, and tank members attached to the core plates to form tank spaces. The tubes are made of a first insulating material, and the fins and the core plates are bonded to the tubes by using metal parts provided separately from each other on surfaces of the tubes. In addition, a coating portion is coated with a second insulating material on surfaces of the core plates at least at an exposed position of the core plates and at positions around brazing portions of the core plate bonded to the tubes. Accordingly, the heat exchanger can be insulated from the fuel cell without using an electrical insulating liquid.

Abstract: A placement stage (24) on which a semiconductor wafer (W) is place is provided within a processing container (22). A microwave is generated by a microwave generator (76), and the microwave is introduced into a process container (22) through a flat antenna member (66). The flat antenna member (66) has a plurality of slots (84) arranged along a plurality of circumferences, and the plurality of circumferences are non-concentric to each other. A distribution of plasma density in the flat antenna member (66) in a radial direction is uniform.

Abstract: In a microwave plasma processing apparatus that uses a radial line slot antenna, a slot plate (16) is formed by a material having a thermal expansion rate close to the wave retardation plate (18), or depositing a metal on a dielectric plate constituting the wave retardation plate (18). An intimate contact between the wave retardation plate and a slot plate constituting a microwave radiation surface is improved so as to prevent an abnormal electric discharge.

Abstract: A microwave plasma processing apparatus is disclosed that enables fast and easy plasma ignition at the pressure for plasma processing In the microwave plasma processing apparatus, a plasma ignition facilitating unit is provided to facilitate plasma ignition induced by a microwave. The plasma ignition facilitating unit includes a deuterium lamp that emits vacuum ultraviolet rays, and a transmission window that allows the vacuum ultraviolet rays to penetrate and irradiate a plasma excitation space. The transmission window is a convex lens, and focuses the vacuum ultraviolet rays to enhance ionization of the plasma excitation gas. With such a configuration, it is possible to induce plasma ignition easily and quickly.

Abstract: A microwave is introduced into a process chamber through a waveguide (26) of the plasma process apparatus, thereby generating plasma. A reflection monitor (40) and an electric power monitor (42) monitor the electric power of a reflected wave reflected by the plasma that is generated in the process chamber. Moreover, an incidence monitor (36) and a frequency monitor (48) monitor the frequency of the microwave generated by a magnetron (24). An electric power supplied to the magnetron (24) is controlled based on the monitored electric power of the reflected wave and the monitored frequency. This method thus controls plasma density to a constant level.

Abstract: In a microwave plasma processing apparatus, a shower plate or plasma transmission window facing a substrate to be processed is formed to have a concaved surface at a side facing the substrate to be processes for compensating for a decrease of plasma density in the peripheral region of the substrate to be processed. As a result, stable and uniform plasma is maintained in the vicinity of the surface of the substrate to be processed even in the case a low pressure plasma process such as etching is conducted. Further, such a construction facilitates plasma ignition.

Abstract: An improved tray for stacking papers formed with images by an image forming apparatus and an improved arrangement for discharging air from the inside to the outside of the apparatus are disclosed. The tray is free from troubles ascribable to deformation caused by the weight of papers without resorting to reinforcement, i.e., an increase in volume. An anti-roll member for stiffening papers does not interfere with the tray when the tray is rotated. Hot air produced by, e.g., a fixing unit is prevented from reaching the operator of the apparatus.

Abstract: Whether or not parts or functions designated by a designating section are operating normally is self-diagnosed by executing tests. Diagnosed results are stored in a storage section along with dates and times read from a clock section, for each part or function. The diagnosed results, dates, and times of the parts or functions stored at this time and diagnosed results, dates, and times of other parts or functions are read from the storage section. Printing data distinguishing and printing the diagnosed results, dates, and times of the parts or functions stored at this time and the diagnosed results, dates, and times of the other parts or functions is prepared, and is output to a printer.

Abstract: An input unit has a first memory section in which various types of menu items for carrying out operation start, setting, and key allocation of respective functions are set, and selects and operates one of a plurality of keys to be set in which the various menu items can be set as key functions, in a state in which a menu item of key allocation is displayed on a display by a key for reading. Then, by reading a menu item for which allocation is desired from the first memory section by the key for reading, the input device allocates the menu item to the one of the keys to be set.

Abstract: In a microwave plasma processing apparatus that uses a radial line slot antenna, the efficiency of cooling of a shower plate is optimized and simultaneously the efficiency of microwave excitation is optimized, by causing a radiation surface of the radial line slot antenna to make an intimate contact with a cover plate that forms a part of an outer wall of the processing chamber and makes an intimate contact with the shower plate.

Abstract: A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.

Abstract: A main spool is located in a bypass line connecting a pump line to a return line. The main spool moves in an axial direction according to the pressure in a spring chamber and the pressure in a pilot chamber, thereby adjusting the opening degree of the bypass line. A pilot switching valve is located in a pressure control passage connecting the spring chamber to the return line. The pilot switching valve controls the flow rate of hydraulic oil that flows from the spring chamber to the return line in accordance with the load pressure of a hydraulic actuator, thereby adjusting the pressure of hydraulic oil in the spring chamber. As a result, the range of the flow rate of hydraulic oil supplied to the hydraulic actuator, which range precludes the influence of the load pressure of the hydraulic actuator, is expanded.

Abstract: A substrate processing apparatus has a processing space provided with a holding stand for holding a substrate to be processed. A hydrogen catalyzing member is arranged in the processing space to face the substrate and for decomposing hydrogen molecules into hydrogen radicals H*. A gas feeding port is arranged in the processing space on an opposite side of the hydrogen catalyzing member to the substrate for feeding a processing gas including at least hydrogen gas. An interval between the hydrogen catalyzing member and the substrate on the holding stand is set less than the distance that the hydrogen radicals H* can reach.