Abstract: A memory device includes a first memory cell array, a second memory cell array disposed in a first direction with respect to the first memory cell array, a first contact plug extending in the first direction through the first memory cell array, and a second contact plug extending in the first direction through the second memory cell array. The first memory cell array includes first electrode layers stacked in a first direction, and a first semiconductor pillar extending through the first electrode layers in the first direction. The second memory cell array including second electrode layers stacked in the first direction, and a second semiconductor pillar extending in the first direction through the second electrode layers. The first contact plug is electrically connected to the first semiconductor pillar, and the second contact plug is electrically connected to the second semiconductor pillar and the first contact plug.

Abstract: A filtering device is used for obtaining a chemical liquid by purifying a liquid to be purified and includes an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path that includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion. The filter A has a porous membrane made of ultra-high-molecular-weight polyethylene and a resin layer disposed to cover at least a portion of the surface of the porous membrane, and the resin layer includes a resin having a neutral group or an ion exchange group.

Abstract: The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.

Abstract: A container has a base material and a coating layer which is disposed on at least a portion of the base material, contains a composition containing at least one kind of metal component selected from the group consisting of Ti, Al, Mg, Zr, Hf, Fe, Ni, Sn, Zn, Cr, and Mo, and has a thickness equal to or greater than 50 ?m. In a case where the composition contains one kind of metal component, a ratio RCAs calculated by CA1s/CA2s is less than 1.0. Alternatively, in a case where the composition contains two or more kinds of metal components, in at least a portion of the coating layer, an average of RCAs determined for each of two or more kinds of the metal components is less than 1.0.

Abstract: A pattern forming method including forming a film using an actinic ray-sensitive or radiation-sensitive resin composition; exposing the formed film; and treating the exposed film using a treatment liquid for manufacturing a semiconductor. The treatment liquid for manufacturing a semiconductor includes a quaternary ammonium compound represented by the following Formula (N); at least one additive selected from the group consisting of an anionic surfactant, a nonionic surfactant, a cationic surfactant, and a chelating agent; and water. The treatment liquid for manufacturing a semiconductor includes one kind or two or more kinds of metal atoms selected from the group consisting of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn. A total mass of the metal atoms is 1 mass ppt to 1 mass ppm with respect to the sum of a total mass of the additive and the total mass of the metal atoms.

Abstract: An object of the present invention is to provide a treatment liquid that, when used as a developer or a rinsing liquid, is less likely to cause defects when applied onto a surface to be coated and, in addition, is less likely to cause defects on a surface to be coated also when used after being housed in a container whose inner wall surface is made of metal. Another object of the present invention is to provide a treatment liquid housing body. A treatment liquid according to the present invention is a treatment liquid including an aliphatic hydrocarbon solvent, an acid component that is at least one selected from the group consisting of carboxylic acids having a hydrocarbon group having 1 to 3 carbon atoms and formic acid, and a metallic impurity including a metallic element that is at least one selected from the group consisting of Fe, Ni, and Cr. The mass ratio of the content of the metallic element to the content of the acid component is 1.0×10?9 to 3.0×10?5.

Abstract: A processing device of a displacement detection device includes an AD conversion device, a switching circuit, and an arithmetic processing unit. The AD conversion device has first and second AD conversion units. The switching circuit periodically switches between a first connection mode in which a first differential signal is AD-converted by the first AD conversion unit and a second differential signal is AD-converted by the second AD conversion unit, and a second connection mode in which the first differential signal is AD-converted by the second AD conversion unit and the second differential signal is AD-converted by the first AD conversion unit. The arithmetic processing unit outputs displacement information of a scale based on an addition average value of the first differential signals output from the first and second AD conversion units and an addition average value of the second differential signals output from the first and second AD conversion units.

Abstract: The present invention provides a chemical liquid that provides a pattern with good resolution and that also has a good ability to suppress the occurrence of defects when the pattern is formed using the chemical liquid as a developer or a rinsing liquid. The chemical liquid according to the present invention is a chemical liquid including an aromatic hydrocarbon, an organic solvent other than the aromatic hydrocarbon, and metal X. The aromatic hydrocarbon is composed only of hydrogen atoms and carbon atoms. A content of the aromatic hydrocarbon is 1 mass % or less relative to a total mass of the chemical liquid. The organic solvent includes an aliphatic hydrocarbon. The metal X is at least one metal selected from the group consisting of Al, Fe, and Ni. A mass ratio of the content of the aromatic hydrocarbon to a content of the metal X is 5.0×104 to 2.0×1010.

Abstract: A magnetic response section provided by a scale of a magnetic linear sensor is configured so that changes in magnetic influence on a magnetic detection head appear alternately and repeatedly every first pitch in a displacement detection direction. The magnetic detection head is provided on one side of the scale in the first direction, which is a direction perpendicular to the displacement detection direction, and provided with a base substrate section and a plurality of signal output sections. The signal output sections are arranged on an insulating plate and in the displacement detection direction at a second pitch based on a first pitch. The first conductive pattern and the second conductive pattern included by each of the signal output sections are formed to arrange coil elements side by side in an elongated area in a second direction orthogonal to both the displacement detection direction and the first direction.

Abstract: The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.

Abstract: An object of the present invention is to provide a method for inspecting a treatment liquid to determine whether the treatment liquid, when used as a developer or a rinsing liquid, allows formation of a resist pattern with reduced variation in line width. Another object of the present invention is to provide a method for producing a treatment liquid. The method for inspecting a treatment liquid according to the present invention is a method for inspecting a treatment liquid including an aliphatic hydrocarbon solvent and has a step A1 of acquiring measurement data of a content of an acid component in the treatment liquid, the acid component being at least one selected from the group consisting of carboxylic acids having a hydrocarbon group having 1 to 3 carbon atoms and formic acid, and a step A2 of determining whether the measurement data acquired in the step A1 falls within a preset allowable range.

Abstract: Provided is a method for inspecting a resist composition, the method being able to easily determine a resist composition whose LWR performance after storage for a predetermined period of time is good. Also provided are a method for producing a resist composition and a resist composition. The method for inspecting a resist composition is a method for inspecting a resist composition with which a resist pattern can be formed by performing an exposure treatment and a development treatment using a first developer. The method has a step A1 of forming a resist film on a substrate using the resist composition, a step B1 of exposing the resist film, a step C1 of bringing a second developer that dissolves the resist film at a higher rate than the first developer into contact with the resist film, a step X1 of acquiring specific measurement data, and a step Y1 of determining whether the measurement data falls within a preset allowable range.

Abstract: A method for manufacturing an electronic device, the method including performing a treatment using a treatment liquid for manufacturing a semiconductor, the treatment liquid for manufacturing a semiconductor includes: a quaternary ammonium compound represented by the following Formula (N); at least one additive selected from the group consisting of an anionic surfactant, a nonionic surfactant, a cationic surfactant, and a chelating agent; water; and one kind or two or more kinds of metal atoms selected from the group consisting of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn. A ratio T1 of a total mass of the metal atoms to the sum of a total mass of the additive and the total mass of the metal atoms is in a range from 1 ppt to 1 ppm.

Abstract: A displacement detection device includes a detection signal processor including a first differential amplifier a to output a first AC signal acquired by synthesizing a cosine function and a minus cosine function, a second differential amplifier to output a second AC signal acquired by synthesizing a sine function and a minus sine function, and a processor to determine, at least at a start of use of the displacement detection device, a value that substantially indicates a phase displacement amount between an excitation signal and the first AC signal and the second AC signal. When detecting displacement, the processor is configured or programmed to perform an arctangent computation using values of the first and second AC signals acquired at a timing based on the value that is determined, and output relative displacement information of a scale with respect to a magnetic detection head.

Abstract: An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor, a pattern forming method using the same, and a method of manufacturing an electronic device using the same. The treatment liquid for manufacturing a semiconductor comprising: one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, wherein a total content of particulate metal including at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing a semiconductor.

Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A is a porous membrane containing a polyimide-based resin.

Abstract: A filtering device is used for obtaining a chemical liquid by purifying a liquid to be purified and includes an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path that includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion. The filter A has a porous membrane made of ultra-high-molecular-weight polyethylene and a resin layer disposed to cover at least a portion of the surface of the porous membrane, and the resin layer includes a resin having a neutral group or an ion exchange group.

Abstract: A storage container storing a treatment liquid for manufacturing a semiconductor is provided, wherein the occurrence of defects on the semiconductor, such as particles, is suppressed and a fine resist pattern or a fine semiconductor element is manufactured. The storage container includes a storage portion that stores the treatment liquid, wherein the treatment liquid includes one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, and a total content of particulate metal that is a metal component derived from the metal atoms and that is a nonionic metal component present in the treatment liquid as a solid without being dissolved is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid.

Abstract: A memory device includes a first memory cell array, a second memory cell array disposed in a first direction with respect to the first memory cell array, a first contact plug extending in the first direction through the first memory cell array, and a second contact plug extending in the first direction through the second memory cell array. The first memory cell array includes first electrode layers stacked in a first direction, and a first semiconductor pillar extending through the first electrode layers in the first direction. The second memory cell array including second electrode layers stacked in the first direction, and a second semiconductor pillar extending in the first direction through the second electrode layers. The first contact plug is electrically connected to the first semiconductor pillar, and the second contact plug is electrically connected to the second semiconductor pillar and the first contact plug.

Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A is a porous membrane containing a polyimide-based resin.