Patents by Inventor Tetsuya Shimizu
Tetsuya Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128902Abstract: A displacement detection device includes a detection signal processor including a first differential amplifier a to output a first AC signal acquired by synthesizing a cosine function and a minus cosine function, a second differential amplifier to output a second AC signal acquired by synthesizing a sine function and a minus sine function, and a processor to determine, at least at a start of use of the displacement detection device, a value that substantially indicates a phase displacement amount between an excitation signal and the first AC signal and the second AC signal. When detecting displacement, the processor is configured or programmed to perform an arctangent computation using values of the first and second AC signals acquired at a timing based on the value that is determined, and output relative displacement information of a scale with respect to a magnetic detection head.Type: ApplicationFiled: February 2, 2022Publication date: April 18, 2024Inventors: Tetsuya SHIMIZU, Kentaro OTOMO, Ryohei KIDO
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Publication number: 20240100482Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A is a porous membrane containing a polyimide-based resin.Type: ApplicationFiled: December 6, 2023Publication date: March 28, 2024Applicant: FUJIFILM CorporationInventors: Tadashi OMATSU, Tetsuya KAMIMURA, Tetsuya Shimizu, Satomi TAKAHASHI
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Publication number: 20240103374Abstract: An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor, a pattern forming method using the same, and a method of manufacturing an electronic device using the same. The treatment liquid for manufacturing a semiconductor comprising: one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, wherein a total content of particulate metal including at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing a semiconductor.Type: ApplicationFiled: November 28, 2023Publication date: March 28, 2024Applicant: FUJIFILM CorporationInventors: Tetsuya SHIMIZU, Tetsuya KAMIMURA
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Publication number: 20240069187Abstract: An observation allocating section exclusively allocates an observation point to each existing tracker in accordance with a distance between observation information acquired by an information acquiring section and observation information indicated by a predictive distribution. A hypothesis generating section generates a hypothesis likelihood and a hypothesis distribution, for each target tracker and for each hypothesis belonging to a hypothesis group including a first hypothesis and a second hypothesis. The first hypothesis is a hypothesis that the observation point is a result of observation of a subject target. The second hypothesis is a hypothesis that the observation point is not a result of observation of the subject target. The hypothesis likelihood is the likelihood of the hypothesis. The hypothesis distribution is the state distribution updated on the assumption that the hypothesis is correct.Type: ApplicationFiled: November 9, 2023Publication date: February 29, 2024Inventors: Tetsuya KUSUMOTO, Shingo SHIMIZU, Takashi OGAWA, Masaki YONEDA
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Publication number: 20240050898Abstract: A filtering device is used for obtaining a chemical liquid by purifying a liquid to be purified and includes an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path that includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion. The filter A has a porous membrane made of ultra-high-molecular-weight polyethylene and a resin layer disposed to cover at least a portion of the surface of the porous membrane, and the resin layer includes a resin having a neutral group or an ion exchange group.Type: ApplicationFiled: September 29, 2023Publication date: February 15, 2024Applicant: FUJIFILM CorporationInventors: Tetsuya KAMIMURA, Satomi Takahashi, Tadashi Omatsu, Tetsuya Shimizu
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Patent number: 11892775Abstract: A storage container storing a treatment liquid for manufacturing a semiconductor is provided, wherein the occurrence of defects on the semiconductor, such as particles, is suppressed and a fine resist pattern or a fine semiconductor element is manufactured. The storage container includes a storage portion that stores the treatment liquid, wherein the treatment liquid includes one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, and a total content of particulate metal that is a metal component derived from the metal atoms and that is a nonionic metal component present in the treatment liquid as a solid without being dissolved is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid.Type: GrantFiled: February 21, 2022Date of Patent: February 6, 2024Assignee: FUJIFILM CorporationInventors: Tetsuya Shimizu, Tetsuya Kamimura
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Publication number: 20240038731Abstract: A memory device includes a first memory cell array, a second memory cell array disposed in a first direction with respect to the first memory cell array, a first contact plug extending in the first direction through the first memory cell array, and a second contact plug extending in the first direction through the second memory cell array. The first memory cell array includes first electrode layers stacked in a first direction, and a first semiconductor pillar extending through the first electrode layers in the first direction. The second memory cell array including second electrode layers stacked in the first direction, and a second semiconductor pillar extending in the first direction through the second electrode layers. The first contact plug is electrically connected to the first semiconductor pillar, and the second contact plug is electrically connected to the second semiconductor pillar and the first contact plug.Type: ApplicationFiled: October 13, 2023Publication date: February 1, 2024Applicant: KIOXIA CORPORATIONInventors: Masayoshi TAGAMI, Ryota KATSUMATA, Jun IIJIMA, Tetsuya SHIMIZU, Takamasa USUI, Genki FUJITA
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Patent number: 11878274Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A is a porous membrane containing a polyimide-based resin.Type: GrantFiled: July 13, 2020Date of Patent: January 23, 2024Assignee: FUJIFILM CORPORATIONInventors: Tadashi Omatsu, Tetsuya Kamimura, Tetsuya Shimizu, Satomi Takahashi
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Patent number: 11833475Abstract: A filtering device is used for obtaining a chemical liquid by purifying a liquid to be purified and includes an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path that includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion. The filter A has a porous membrane made of ultra-high-molecular-weight polyethylene and a resin layer disposed to cover at least a portion of the surface of the porous membrane, and the resin layer includes a resin having a neutral group or an ion exchange group.Type: GrantFiled: August 12, 2020Date of Patent: December 5, 2023Assignee: FUJIFILM CorporationInventors: Tetsuya Kamimura, Satomi Takahashi, Tadashi Omatsu, Tetsuya Shimizu
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Publication number: 20230367212Abstract: A pattern forming method including: (1) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin (A) which is decomposed by action of acid to increase polarity and a compound (B) which generates an acid by irradiation with an actinic ray or a radiation; (2) exposing the film; and (3) subjecting the exposed film to at least one of development or rinsing with an organic treatment liquid containing butyl acetate and a hydrocarbon having 11 or more carbon atoms, in which a content of the hydrocarbon having 11 or more carbon atoms in the organic treatment liquid is 1% by mass or more and 35% by mass or less.Type: ApplicationFiled: July 19, 2023Publication date: November 16, 2023Applicant: FUJIFILM CorporationInventors: Keita Kato, Michihiro Shirakawa, Satomi Takahashi, Tetsuya Shimizu
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Patent number: 11817428Abstract: A memory device includes a first memory cell array, a second memory cell array disposed in a first direction with respect to the first memory cell array, a first contact plug extending in the first direction through the first memory cell array, and a second contact plug extending in the first direction through the second memory cell array. The first memory cell array includes first electrode layers stacked in a first direction, and a first semiconductor pillar extending through the first electrode layers in the first direction. The second memory cell array including second electrode layers stacked in the first direction, and a second semiconductor pillar extending in the first direction through the second electrode layers. The first contact plug is electrically connected to the first semiconductor pillar, and the second contact plug is electrically connected to the second semiconductor pillar and the first contact plug.Type: GrantFiled: February 1, 2022Date of Patent: November 14, 2023Assignee: KIOXIA CORPORATIONInventors: Masayoshi Tagami, Ryota Katsumata, Jun Iijima, Tetsuya Shimizu, Takamasa Usui, Genki Fujita
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Publication number: 20230356151Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified and has an inlet portion, an outlet portion, a filter A, a filter B different from the filter A, and a flow path extending from the inlet portion to the outlet portion, in which the filter A and the filter B are arranged in series between the inlet portion and the outlet portion and have, and the filter A is selected from the group consisting of predetermined filters A1, A2, and A3.Type: ApplicationFiled: July 18, 2023Publication date: November 9, 2023Applicant: FUJIFILM CorporationInventors: Tetsuya KAMIMURA, Tadashi OMATSU, Tetsuya SHIMIZU, Satomi TAKAHASHI
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Patent number: 11759749Abstract: A filtering device for obtaining a chemical liquid by purifying a liquid to be purified has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series between the inlet portion and the outlet portion and extends from the inlet portion to the outlet portion, in which the filter A has a porous base material made of polyfluorocarbon and a coating layer which is disposed to cover the porous base material and contains a first resin having a hydrophilic group.Type: GrantFiled: August 13, 2020Date of Patent: September 19, 2023Assignee: FUJIFILM CorporationInventors: Tadashi Omatsu, Tetsuya Kamimura, Tetsuya Shimizu, Satomi Takahashi
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Patent number: 11745142Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified and has an inlet portion, an outlet portion, a filter A, a filter B different from the filter A, and a flow path extending from the inlet portion to the outlet portion, in which the filter A and the filter B are arranged in series between the inlet portion and the outlet portion and have, and the filter A is selected from the group consisting of predetermined filters A1, A2, and A3.Type: GrantFiled: August 3, 2020Date of Patent: September 5, 2023Assignee: FUJIFILM CorporationInventors: Tetsuya Kamimura, Tadashi Omatsu, Tetsuya Shimizu, Satomi Takahashi
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Patent number: 11693321Abstract: A storage container storing a treatment liquid for manufacturing a semiconductor is provided, wherein the occurrence of defects on the semiconductor, such as particles, is suppressed and a fine resist pattern or a fine semiconductor element is manufactured. The storage container includes a storage portion that stores a treatment liquid for manufacturing a semiconductor, and the treatment liquid for manufacturing a semiconductor includes one kind or two or more kinds of metal atoms and a total content of particulate metal is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid.Type: GrantFiled: September 27, 2018Date of Patent: July 4, 2023Assignee: FUJIFILM CorporationInventors: Tetsuya Shimizu, Tetsuya Kamimura
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Patent number: 11666864Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series between the inlet portion and the outlet portion and extends from the inlet portion to the outlet portion, in which the filter A includes at least one kind of porous membrane selected from the group consisting of a first porous membrane having a porous base material made of polytetrafluoroethylene and a non-crosslinked coating which is formed to cover the porous base material and contains a perfluorosulfonic acid polymer and a second porous membrane containing polytetrafluoroethylene blended with a perfluorosulfonic acid polymer.Type: GrantFiled: August 12, 2020Date of Patent: June 6, 2023Assignee: FUJIFILM CorporationInventors: Tetsuya Shimizu, Tetsuya Kamimura, Tadashi Omatsu, Satomi Takahashi
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Patent number: 11628402Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series between the inlet portion and the outlet portion and extends from the inlet portion to the outlet portion, in which the filter A includes at least one kind of porous membrane selected from the group consisting of a first porous membrane having a porous base material made of polytetrafluoroethylene and a non-crosslinked coating which is formed to cover the porous base material and contains a perfluorosulfonic acid polymer and a second porous membrane containing polytetrafluoroethylene blended with a perfluorosulfonic acid polymer.Type: GrantFiled: August 12, 2020Date of Patent: April 18, 2023Assignee: FUJIFILM CorporationInventors: Tetsuya Shimizu, Tetsuya Kamimura, Tadashi Omatsu, Satomi Takahashi
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Publication number: 20230116491Abstract: A processing device of a displacement detection device includes an AD conversion device, a switching circuit, and an arithmetic processing unit. The AD conversion device has first and second AD conversion units. The switching circuit periodically switches between a first connection mode in which a first differential signal is AD-converted by the first AD conversion unit and a second differential signal is AD-converted by the second AD conversion unit, and a second connection mode in which the first differential signal is AD-converted by the second AD conversion unit and the second differential signal is AD-converted by the first AD conversion unit. The arithmetic processing unit outputs displacement information of a scale based on an addition average value of the first differential signals output from the first and second AD conversion units and an addition average value of the second differential signals output from the first and second AD conversion units.Type: ApplicationFiled: October 5, 2022Publication date: April 13, 2023Inventors: Tetsuya Shimizu, Kentaro Otomo, Ryohei Kido
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Patent number: 11559758Abstract: An object of the present invention is to provide a filtering device which makes it possible to obtain a chemical liquid having excellent performance and enables filter media to have sufficiently long pot life. Another object of the present invention is to provide a purification device, a chemical liquid manufacturing device, a filtered substance to be purified, a chemical liquid, and an actinic ray-sensitive or radiation-sensitive resin composition. A filtering device according to an embodiment of the present invention has a first filter unit including a first filter, which satisfies at least one condition selected from the group consisting of following conditions 1 to 3, and a housing accommodating the first filter and a second filter unit including a second filter different from the first filter and a housing accommodating the second filter, in which the first filter unit and the second filter unit are independently disposed in a pipe line through which a substance to be purified is supplied.Type: GrantFiled: January 17, 2020Date of Patent: January 24, 2023Assignee: FUJIFILM CorporationInventors: Tetsuya Shimizu, Tetsuya Kamimura
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Patent number: 11541354Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A has a porous base material made of polyfluorocarbon and a coating layer which is disposed to cover the porous base material and contains a resin having an adsorptive group.Type: GrantFiled: July 20, 2020Date of Patent: January 3, 2023Assignee: FUJIFILM CORPORATIONInventors: Tadashi Omatsu, Tetsuya Kamimura, Tetsuya Shimizu, Satomi Takahashi