Patents by Inventor Tomio Iwasaki

Tomio Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240092958
    Abstract: A thermosetting resin composition containing a maleimide compound (a) having at least one N-substituted maleimide group, and a compound (b) represented by the following general formula (1) exhibiting no reactivity with the maleimide group of the component (a) (Xb1 represents a single bond or a substituted or unsubstituted aliphatic hydrocarbon group having 1 to 5 carbon atoms; Rb1 and Rb2 each independently represent a substituted or unsubstituted aliphatic hydrocarbon group having 1 to 10 carbon atoms, a substituted or unsubstituted aromatic hydrocarbon group having 6 to 18 ring carbon atoms, a substituted or unsubstituted heterocyclic aromatic hydrocarbon group having 5 to 20 ring atoms, an oxygen atom-containing group, or a group containing a combination of these groups; and m and n each independently represent an integer of 0 to 5).
    Type: Application
    Filed: December 17, 2021
    Publication date: March 21, 2024
    Inventors: Koji MORITA, Ryo SHIMOKAWA, Shinji TSUCHIKAWA, Keiichi KASUGA, Chihiro HAYASHI, Tomio IWASAKI
  • Publication number: 20230143193
    Abstract: The preset invention has as its object the provision of a laminate free of hexavalent chromium and excellent in corrosion resistance and wear resistance, and a manufacturing process of the laminate. To solve the above-described problems, a laminate according to the present invention includes a substrate, and a laminated film portion with metal films laminated in two or more layers. The laminate has an interface layer between each two adjacent ones of the metal films. The laminated film portion contains a first metal element as a principal component, the first metal element being at least one element of Ni, Cr, Co, and W, and a second metal element that is a metal element of smaller cohesive energy than that of the first metal element. The second metal element contained in the interface layer is at a content ratio higher than that of the second metal element contained in each of the adjacent metal films.
    Type: Application
    Filed: October 7, 2020
    Publication date: May 11, 2023
    Applicant: HITACHI, LTD.
    Inventors: Takuya AOYAGI, Hiroshi KANEMOTO, Tomio IWASAKI, Toshinori KAWAMURA, Hitoshi SUZUKI
  • Publication number: 20230020010
    Abstract: An alloy having resistance to an aluminum alloy or the like in a molten state. An alloy includes Nb and Mo as a first element group, and at least two elements selected from Ta, W, Ti, Hf and Zr, as a second element group, wherein when the total of the first element group and the second element group is 100 at. %, a content range of each of the elements contained is 5 to 35 at. %; and has such a resistance with respect to at least one of Al, Cu and Zn that a lattice mismatch therewith is 13% or more, and a migration barrier energy of dislocation is 310 kJ/mol or more.
    Type: Application
    Filed: March 22, 2021
    Publication date: January 19, 2023
    Inventors: Tomio Iwasaki, Hiroshi Shiratori, Tatsuya Kimura, Shuho Koseki
  • Publication number: 20220211899
    Abstract: The present invention provides a biocompatible material improved in biocompatibility owing to adsorption of a peptide that has high adhesion with a resin and hardly separates from a surface of the resin, and a functional material including the biocompatible material. The biocompatible material includes a resin and a peptide adsorbed on the resin. The resin has methoxycarbonyl groups and methyl groups, and tryptophan or arginine accounts for 70% or more of amino acid residues in the peptide. As an alternative, the resin is a fluorinated resin, and 2,3,4,5,6-pentafluoro-phenylalanine, 3-(trifluoromethyl)alanine, serine, threonine, histidine, aspartic acid, glutamic acid, phenylalanine, or aspartic acid accounts for 40% or more of the amino acid residues in the peptide. The functional material includes the biocompatible material, and a functional substance. The functional substance is held on a surface of the biocompatible material or is released from the surface of the biocompatible material.
    Type: Application
    Filed: March 3, 2020
    Publication date: July 7, 2022
    Inventors: Tomio IWASAKI, Masashi MARUYAMA, Takeshi SERIZAWA, Toshiki SAWADA
  • Patent number: 10403899
    Abstract: Provided is an alloy comprising eight or more types of constituent elements, wherein the relative difference in terms of distance between nearest neighbors DNN between a constituent element having the largest distance between nearest neighbors DNN when constituting a bulk crystal from a single element and a constituent element having the smallest distance between nearest neighbors DNN when constituting a bulk crystal from a single element is 9% or less, the number of constituent elements having the same crystal structure when constituting a bulk crystal from a single element is not more than 3, and the difference in concentration between the constituent element having the highest concentration and the constituent element having the lowest concentration is 2 at. % or lower.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: September 3, 2019
    Assignee: Hitachi, Ltd.
    Inventor: Tomio Iwasaki
  • Publication number: 20190244855
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Application
    Filed: April 16, 2019
    Publication date: August 8, 2019
    Inventors: Junji NOGUCHI, Takayuki OSHIMA, Noriko MIURA, Kensuke ISHIKAWA, Tomio IWASAKI, Kiyomi KATSUYAMA, Tatsuyuki SAITO, Tsuyoshi TAMARU, Hizuru YAMAGUCHI
  • Patent number: 10304726
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: May 28, 2019
    Assignee: Renesas Electronics Corporation
    Inventors: Junji Noguchi, Takayuki Oshima, Noriko Miura, Kensuke Ishikawa, Tomio Iwasaki, Kiyomi Katsuyama, Tatsuyuki Saito, Tsuyoshi Tamaru, Hizuru Yamaguchi
  • Publication number: 20190035678
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Application
    Filed: September 21, 2018
    Publication date: January 31, 2019
    Inventors: Junji NOGUCHI, Takayuki OSHIMA, Noriko MIURA, Kensuke ISHIKAWA, Tomio IWASAKI, Kiyomi KATSUYAMA, Tatsuyuki SAITO, Tsuyoshi TAMARU, Hizuru YAMAGUCHI
  • Patent number: 10121693
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Grant
    Filed: October 9, 2017
    Date of Patent: November 6, 2018
    Assignee: Renesas Electronics Corporation
    Inventors: Junji Noguchi, Takayuki Oshima, Noriko Miura, Kensuke Ishikawa, Tomio Iwasaki, Kiyomi Katsuyama, Tatsuyuki Saito, Tsuyoshi Tamaru, Hizuru Yamaguchi
  • Publication number: 20180047620
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Application
    Filed: October 9, 2017
    Publication date: February 15, 2018
    Inventors: Junji NOGUCHI, Takayuki OSHIMA, Noriko MIURA, Kensuke ISHIKAWA, Tomio IWASAKI, Kiyomi KATSUYAMA, Tatsuyuki SAITO, Tsuyoshi TAMARU, Hizuru YAMAGUCHI
  • Patent number: 9818639
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Grant
    Filed: March 27, 2017
    Date of Patent: November 14, 2017
    Assignee: Renesas Electronics Corporation
    Inventors: Junji Noguchi, Takayuki Oshima, Noriko Miura, Kensuke Ishikawa, Tomio Iwasaki, Kiyomi Katsuyama, Tatsuyuki Saito, Tsuyoshi Tamaru, Hizuru Yamaguchi
  • Publication number: 20170317355
    Abstract: Provided is an alloy comprising eight or more types of constituent elements, wherein the relative difference in terms of distance between nearest neighbors DNN between a constituent element having the largest distance between nearest neighbors DNN when constituting a bulk crystal from a single element and a constituent element having the smallest distance between nearest neighbors DNN when constituting a bulk crystal from a single element is 9% or less, the number of constituent elements having the same crystal structure when constituting a bulk crystal from a single element is not more than 3, and the difference in concentration between the constituent element having the highest concentration and the constituent element having the lowest concentration is 2 at. % or lower.
    Type: Application
    Filed: October 31, 2014
    Publication date: November 2, 2017
    Applicant: HITACHI, LTD.
    Inventor: Tomio IWASAKI
  • Patent number: 9735429
    Abstract: A lithium ion secondary battery includes a binder that binds an active material to a current collector in the positive electrode or negative electrodes or both. The binder contains a base material including a resin having a benzene ring, and a polyacene additive selected from the group consisting of naphthalene, anthracene, tetracene, and derivatives thereof. The active material is a carbonaceous material or a lithium-containing composite oxide having a crystal structure in which a distance between nearest oxygen atoms is 0.19 to 0.29 nm. Adhesion of the binder to the active material during the manufacturing of the lithium ion secondary battery is led to a closest-packed crystal plane in the crystal structure of the active material, so that inhibition of moving of lithium ions in and out of the active material due to the binder may be reduced.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: August 15, 2017
    Assignee: HITACHI, LTD.
    Inventor: Tomio Iwasaki
  • Publication number: 20170200637
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Application
    Filed: March 27, 2017
    Publication date: July 13, 2017
    Inventors: Junji NOGUCHI, Takayuki OSHIMA, Noriko MIURA, Kensuke ISHIKAWA, Tomio IWASAKI, Kiyomi KATSUYAMA, Tatsuyuki SAITO, Tsuyoshi TAMARU, Hizuru YAMAGUCHI
  • Patent number: 9659867
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: May 23, 2017
    Assignee: Renesas Electronics Corporation
    Inventors: Junji Noguchi, Takayuki Oshima, Noriko Miura, Kensuke Ishikawa, Tomio Iwasaki, Kiyomi Katsuyama, Tatsuyuki Saito, Tsuyoshi Tamaru, Hizuru Yamaguchi
  • Patent number: 9634316
    Abstract: A lithium ion secondary battery includes a positive electrode capable of occluding and discharging lithium ions, a negative electrode capable of occluding and discharging the lithium ions, and a nonaqueous electrolyte including a lithium salt, and being reversively charged/discharged. The positive electrode includes a metal plate, a metal film formed on a surface of the metal plate, and a positive electrode active material layer, the metal film includes one or more metals selected from the group consisting of ruthenium, osmium, palladium, and platinum having a orientation, the positive electrode active material layer is a compound expressed by the following expression: LiCoxNi1-xO2, (where 0?x?1) and is epitaxially grown and formed on a surface of the metal film, and the positive electrode active material is formed such that a c axis of a crystal structure of the positive electrode active material is perpendicular to the metal film.
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: April 25, 2017
    Assignee: HITACHI, LTD.
    Inventors: Hiromi Shimazu, Tomio Iwasaki
  • Publication number: 20170011994
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Application
    Filed: September 22, 2016
    Publication date: January 12, 2017
    Inventors: Junji NOGUCHI, Takayuki OSHIMA, Noriko MIURA, Kensuke ISHIKAWA, Tomio IWASAKI, Kiyomi KATSUYAMA, Tatsuyuki SAITO, Tsuyoshi TAMARU, Hizuru YAMAGUCHI
  • Patent number: 9490213
    Abstract: The reliability of wirings, each of which includes a main conductive film containing copper as a primary component, is improved. On an insulating film including the upper surface of a wiring serving as a lower layer wiring, an insulating film formed of a silicon carbonitride film having excellent barrier properties to copper is formed; on the insulating film, an insulating film formed of a silicon carbide film having excellent adhesiveness to a low dielectric constant material film is formed; on the insulating film, an insulating film formed of a low dielectric constant material as an interlayer insulating film is formed; and thereafter a wiring as an upper layer wiring is formed.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: November 8, 2016
    Assignee: Renesas Electronics Corporation
    Inventors: Junji Noguchi, Takayuki Oshima, Noriko Miura, Kensuke Ishikawa, Tomio Iwasaki, Kiyomi Katsuyama, Tatsuyuki Saito, Tsuyoshi Tamaru, Hizuru Yamaguchi
  • Patent number: 9269957
    Abstract: Provided is a lithium ion battery having a long service life by improving an adhesion strength between a binder resin and a metal foil. A binder resin, which is a compound having a chemical structure that contains a polyvinylidene fluoride molecular chain, a six-membered ring such as a cyclohexane ring, and an end group selected from the group consisting of SiX3, SH, NH2, GeX3, and TiX3 (wherein X is a functional group that undergoes a condensation reaction), wherein the six-membered ring is disposed in a region between the polyvinylidene fluoride molecular chain and the end group, is mixed with an active material and applied to a metal foil, and the binder resin is chemically bonded to metal atoms such as copper atoms on the surface of the metal foil.
    Type: Grant
    Filed: November 18, 2010
    Date of Patent: February 23, 2016
    Assignee: Hitachi, Ltd.
    Inventor: Tomio Iwasaki
  • Publication number: 20150328713
    Abstract: A stainless steel comprises a base metal and a coating material formed on the surface of the base metal, wherein the coating material has a surface on which crystal planes with a maximum atom density orient.
    Type: Application
    Filed: April 17, 2015
    Publication date: November 19, 2015
    Applicant: Hitachi, Ltd.
    Inventors: Mariko MIYAZAKI, Tomio IWASAKI