Abstract: Analyzing blocks of a conversion source program one block by one block, a function directed by one or more blocks are extracted. Then one or more blocks in a conversion destination program, which correspond to the extracted function, is extracted. In this manner, the conversion source program is converted. The one or more blocks in the conversion source program and the one or more blocks in the conversion destination program, which correspond to the function, are displayed side by side on a screen so as to allow an operator to easily recognize the correspondence between them.

Abstract: When the system is powered on, a BOOT device detecting unit detects which data exchange device (memory card or the like) is to be booted first, and the detected data exchange device is booted first. A data exchange process program which is set as software starting at BOOT is started to detect a data exchange file. At this time, with reference to a type code of a numerical control apparatus to be used, data matched to the type code is selected. A data exchange file is transferred to an internal storing device to which the data exchange device is connected. Then, a data exchange file is transferred to an internal storing device to which the data exchange device is not connected.

Abstract: A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen atom-containing acetal type acid-dissociative, dissolution inhibiting group, as well as a photoresist composition comprising the same. The photoresist composition is highly stable during storage and can give a resist pattern excellent in sectional rectangular shape and having high transparency to an exposure light, particularly a light having a wavelength of 300 nm or less.

Abstract: A photoresist composition containing a polymer (A) containing an alkali-soluble constituent unit (a1) containing an alicyclic group having both a fluorine atom or a fluorinated alkyl group (i) and an alcoholic hydroxyl group (ii), whose alkali-solubility is changeable by an action of an acid; an acid generator (B) which generates an acid by light irradiation; and a dissolution inhibitor (C) having a fluorine atom(s) and/or a nitrogen-containing compound (D) selected from a tertiary amine (d1) having a polar group, a tertiary alkylamine (d2) having 7 or more and 15 or less of carbon atoms or an ammonium salt (d3). The composition has a resist property capable of accomplishing line and space (1:1) of 90 nm or less in good shape as a pattern processing accuracy of a semiconductor integrated circuit by lithography.

Abstract: A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of acid; and (B) an acid generator which generates acid due to exposure to light, and a method for forming a resist pattern using the resist composition. By the resist composition or the method, an adverse effect of the immersion liquid can be avoided while achieving high resolution and high depth of focus.

Abstract: A wire electric discharge machine capable of preventing a straightness error from being caused by consumption of a wire electrode, to eliminate insufficient machining. A correction angle ? is predetermined for preventing the straightness error of the workpiece due to consumption. Correction amounts d1?, d2? on a program plane and an upper surface of a workpiece, respectively, are determined based on the predetermined correction angle ?, and are added to or substracted from a predetermined offset amount depending on a wire electrode radius and an electric discharging gap, to determine corrected offset amounts d1, d2 on the program plane and the upper surface of the workpiece, respectively. Correction amounts dlo, dup for lower and upper wire guides in an offset direction are obtained based on the corrected offset amounts d1, d2, respectively, so that motion paths of upper and lower wire guides relative to the workpiece are determined.

Abstract: Set feed speed is lowered when a short circuit is detected in a range within which machining is unstable, the range starting from the point at which discharge is detected after machining starts from a machining start point, thus control is carried our according to a machining rate, thereby preventing successive occurrence of short circuits. When machining proceeds beyond the unstable range, the lowered feed speed is returned to the normal feed speed.

Abstract: A wire electric discharge machine capable of adjusting spacing between a nozzle and a workpiece without manual operation and without causing damage to a machine and a workpiece. The wire electric discharge machine includes wire supply apparatus for supplying a wire electrode through the wire guide toward the workpiece; wire supply-amount measuring apparatus for measuring a supply amount of the wire electrode; wire front-end detecting apparatus for detecting a front end of the wire electrode being supplied by the wire supply apparatus at a wire front-end detecting position; and wire contact detecting apparatus for detecting contact of the front end of the wire electrode with an upper surface of the workpiece.

Abstract: Set feed speed is lowered when a short circuit is detected in a range within which machining is unstable, the range starting from the point at which discharge is detected after machining starts from a machining start point, thus control is carried our according to a machining rate, thereby preventing successive occurrence of short circuits. When machining proceeds beyond the unstable range, the lowered feed speed is returned to the normal feed speed.

Abstract: When die machining including machining processes from a rough machining process to a finish machining process is carried out on the same workpiece along a closed machining path, each of the points equally dividing a length of the closed machining path by the repetition number of machining processes is defined as an approach point, so that the approach points are different from each other for each machining process. This makes it possible to avoid a concentration of the approach points at one points thereby preventing a dent from being formed at the approach point.

Abstract: A machining configuration drawing apparatus includes a drawing unit for drawing a machining configuration and a present machining position, a setting unit for setting a display area in an overall drawing area, a division unit for dividing the overall drawing area into a plurality of display areas based on the set display area, and a selection unit for selecting a drawing region drawn by the drawing unit from a plurality of drawing regions. The selection unit selects a drawing region in which the present machining position exists. Further, the drawing unit draws a machining configuration and a present machining position of the selected drawing region.

Abstract: Fluorinated polymers useful in photoresist compositions and associated processes for microlithography are described. These polymers and photoresists have a fluoroalcohol functional group that simultaneously imparts high ultraviolet (UV) transparency and developability in basic media. The polymers also have a repeat unit derived from a C1-C25 alkyl hydroxymethylacrylate comonomer, e.g., tert-butyl hydroxymethylacrylate, or a C5-C50 polycyclic alkyl acrylate in which the polycyclic group contains a hydroxy group, e.g., hydroxyadamantyl acrylate. The materials of this invention have high UV tansparency, particularly at short wavelengths, e.g., 193 nm and 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer compound. To ensure etching resistance, an alicyclic group is introduced into a side chain portion. Hydrogen atoms on the ring of the alicyclic group are highly fluorinated to ensure transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 ?m?1. As the alicyclic group, a polycyclic group is preferably used. Hydrogen atoms are highly fluorinated by preferably substituting all hydrogen atoms on the ring by fluorine atoms, that is, forming a perfluoroalicyclic group. The resist composition is formed by using the polymer compound as a base polymer and further, the dissolution inhibitor agent is formed of the polymer compound.

Abstract: A positive resist composition includes (A) an alkali-soluble polysiloxane resin, (B) an acid generator composed of a compound which generates an acid upon irradiation of active light or radiant ray, and (C) a compound in which at least one hydrogen atom of phenolic hydroxyl group or carboxyl group is substituted with an acid-decomposable group. This positive resist composition is useful for processes using F2 excimer laser (157 nm), extreme-ultraviolet rays (EUV, vacuum ultraviolet rays; 13 nm) and other light sources having wavelengths equal to or shorter than that of KrF excimer laser, and has high definition and can form resist patterns with good sectional shapes. A base material carrying a layer of the positive resist composition is also useful.

Abstract: A machining monitor has a depicting function for depicting the machining status of a wire electric discharge machine controlled by a numerical control device. The machining monitor has current position depicting means for depicting a current position according to current position information obtained during machining by the wire electric discharge machine and/or during an operation check by depicting, and has workpiece shape depicting means for depicting a workpiece shape according to workpiece shape information obtained during machining and/or workpiece shape information during an operation check by depicting. The machining monitor displays the workpiece shape and current position concurrently.

Abstract: A wire electric discharge machine capable of adjusting spacing between a nozzle and a workpiece without manual operation and without causing damage to a machine and a workpiece. The wire electric discharge machine comprises: wire supply means for supplying a wire electrode through the wire guide toward the workpiece; wire supply-amount measuring means for measuring a supply amount of the wire electrode; wire front-end detecting means for detecting a front end of the wire electrode being supplied by the wire supply means at a wire front-end detecting position; and wire contact detecting means for detecting contact of the front end of the wire electrode with an upper surface of the workpiece.

Abstract: The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formula in which R1 is preferably a hydrogen atom or methyl group, R2 is preferably a trifluoromethyl group, R3 is a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and R4 is preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.

Abstract: A machining monitor has a depicting function for depicting the machining status of a wire electric discharge machine controlled by a numerical control device. The machining monitor has current position depicting means for depicting a current position according to current position information obtained during machining by the wire electric discharge machine and/or during an operation check by depicting, and has workpiece shape depicting means for depicting a workpiece shape according to workpiece shape information obtained during machining and/or workpiece shape information during an operation check by depicting. The machining monitor displays the workpiece shape and current position concurrently.

Abstract: When die machining including machining processes from a rough machining process to a finish machining process is carried out on the same workpiece along a closed machining path, each of the points equally dividing a length of the closed machining path by the repetition number of machining processes is defined as an approach point, so that the approach points are different from each other for each machining process. This makes it possible to avoid a concentration of the approach points at one points thereby preventing a dent from being formed at the approach point.

Abstract: A positive resist composition includes (A) an alkali-soluble polysiloxane resin, (B) an acid generator composed of a compound which generates an acid upon irradiation of active light or radiant ray, and (C) a compound in which at least one hydrogen atom of phenolic hydroxyl group or carboxyl group is substituted with an acid-decomposable group. This positive resist composition is useful for processes using F2 excimer laser (157 nm), extreme-ultraviolet rays (EUV, vacuum ultraviolet rays; 13 nm) and other light sources having wavelengths equal to or shorter than that of KrF excimer laser, and has high definition and can form resist patterns with good sectional shapes. A base material carrying a layer of the positive resist composition is also useful.