Abstract: A positive resist composition includes (A) an alkali-soluble polysiloxane resin, (B) an acid generator composed of a compound which generates an acid upon irradiation of active light or radiant ray, and (C) a compound in which at least one hydrogen atom of phenolic hydroxyl group or carboxyl group is substituted with an acid-decomposable group. This positive resist composition is useful for processes using F2 excimer laser (157 nm), extreme-ultraviolet rays (EUV, vacuum ultraviolet rays; 13 nm) and other light sources having wavelengths equal to or shorter than that of KrF excimer laser, and has high definition and can form resist patterns with good sectional shapes. A base material carrying a layer of the positive resist composition is also useful.

Abstract: The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formula 1

Abstract: A wire electric discharge machine capable of preventing a straightness error from being caused by consumption of a wire electrode, to thereby eliminate insufficient machining. A correction angle &phgr; is predetermined for preventing the straightness error of the workpiece due to consumption thereof. Correction amounts d1′, d2′ on a program plane and an upper surface of a workpiece, respectively, are determined based on the predetermined correction angle &phgr;, and are added to or subtracted from a predetermined offset amount depending on a wire electrode radius and an electric discharging gap, to thereby determine corrected offset amounts d1, d2 on the program plane and the upper surface of the workpiece, respectively. Correction amounts dlo, dup for lower and upper wire guides in an offset direction are obtained based on the corrected offset amounts d1, d2, respectively, so that motion paths of upper and lower wire guides relative to the workpiece are determined.

Abstract: A steel pipe having a low yield ratio is provided. The steel pipe may contain, in mass, 0.01% to 0.20% C, 0.05% to 1.0% Si, 0.1% to 2.0% Mn and 0.001% to 0.05% Al, the microstructure of the steel pipe is composed of ferrite and pearlite, or ferrite and cementite, and the average size of the ferrite grains is at least 20 &mgr;m. The steel pipe may also contain, in mass, 0.03% to 0.20% C, 0.05% to 1.0% Si, 0.1% to 2.0% Mn, 0.001% to 0.05% Al, 0.01% to 0.5% Nb and 0.001% to 0.01% N, with the microstructure of the steel pipe being composed of ferrite and bainite, or ferrite, martensite and bainite, or ferrite and martensite.

Abstract: The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formula in which R1 is preferably a hydrogen atom or methyl group, R2 is preferably a trifluoromethyl group, R3 is a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and R4 is preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.

Abstract: A photosensitive laminate includes a substrate and a resist layer 500 to 5800 angstroms thick formed on the substrate. A composition for the resist layer includes (A) a compound which generates an acid upon irradiation with radioactive ray, (B) an alkali-soluble novolak resin, and (C) a compound having at least one acid-decomposable dissolution-inhibiting group, and the dissolution-inhibiting group is decomposable by action of an acid generated from the ingredient (A) to yield an organic carboxylic acid. This photosensitive laminate is sequentially subjected to selective exposure to KrF excimer laser light or to light having a short wavelength equal to or less than that of F2 laser, post-exposure baking, and developing with an alkali to yield a resist pattern.

Abstract: The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formula 1

Abstract: A photosensitive laminate includes a substrate and a resist layer 500 to 5800 angstroms thick formed on the substrate. A composition for the resist layer includes (A) a compound which generates an acid upon irradiation with radioactive ray, (B) an alkali-soluble novolak resin, and (C) a compound having at least one acid-decomposable dissolution-inhibiting group, and the dissolution-inhibiting group is decomposable by action of an acid generated from the ingredient (A) to yield an organic carboxylic acid. This photosensitive laminate is sequentially subjected to selective exposure to KrF excimer laser light or to light having a short wavelength equal to or less than that of F2 laser, post-exposure baking, and developing with an alkali to yield a resist pattern.

Abstract: A positive resist composition includes (A) an alkali-soluble polysiloxane resin, (B) an acid generator composed of a compound which generates an acid upon irradiation of active light or radiant ray, and (C) a compound in which at least one hydrogen atom of phenolic hydroxyl group or carboxyl group is substituted with an acid-decomposable group. This positive resist composition is useful for processes using F2 excimer laser (157 nm), extreme-ultraviolet rays (EUV, vacuum ultraviolet rays; 13 nm) and other light sources having wavelengths equal to or shorter than that of KrF excimer laser, and has high definition and can form resist patterns with good sectional shapes. A base material carrying a layer of the positive resist composition is also useful.

Abstract: A wire electric discharge machining method capable of improving a machining accuracy of a corner portion. A machining feed speed is gradually reduced from a point A before entering a corner portion machining between points C and D, and in the corner portion between points C and D the machining is performed at a fixed feed speed. The feed speed is gradually increased from the point D, where the machining of the corner portion is completed, and is restored to the original speed. In accordance with the change of the feed speed, an off-state time of the voltage applied between a wire and a workpiece is increased from a point B and is reduced from a point E after completing the corner portion machining, to restore the original off-state time at a point F. Further, a flow rate of machining fluid is reduced depending on the corner portion. The feed speed, the off-state time and the flow rate of the machining fluid are controlled by automatically changing them in dependence on a curvature of the corner portion.

Abstract: A tool life management system for managing a tool life. The system includes a load torque measuring device for measuring an initial load torque of a spindle attached to a tool during an initial machining operation and for measuring an actual load torque of the spindle attached to the tool during a subsequent actual machining operation, a torque calculating device for calculating a tool wear detection torque based on a reference load torque, and for calculating a tool breakage detection torque based on a tool diameter, the reference load torque being the initial load torque of the spindle, a memory for storing the reference load torque, the tool wear detection torque and the tool breakage detection torque, a torque comparing device for comparing the actual load torque of the spindle with each of the tool wear detection torque and the tool breakage detection torque, and for outputting a result of the comparison, and a tool control device for controlling the tool in accordance with the result of the comparison.