Abstract: A device is provided to generate a three-dimensional (3D) real image. A display panel is divided into several sub-areas for emitting scenes. Through a projecting lens-array unit, the scenes enter a fusion lens unit to form a real image of light field at a position beyond common barrier. Through an eyepiece unit, the image is emitted to human eye. Thus, the present invention provides a device for near-eye viewing, which reduces existing human-eye vergence accommodation conflict (VAC) in most augmented reality and mixed reality devices. Therein, the display of near-eye light field is a process of light-field reproduction, which merges the scenes and reduces aberration.

Abstract: A light field synthesis method and a light field synthesis system are provided. The light field synthesis method includes inputting light field information corresponding to a scene into a trained learning model. The light field information is a light field having a plurality of views. The light field synthesis method further includes configuring the trained learning model to generate a synthesized light field according to the input light field information. The synthesized light field has a plurality of new views other than the plurality of views. The trained learning model is obtained by performing a training process on a learning model, and the training process includes optimizing the learning model in a refocused image domain, so as to minimize refocused image errors.

Abstract: A device is provided to generate a three-dimensional (3D) real image. A display panel is divided into several sub-areas for emitting scenes. Through a projecting lens-array unit, the scenes enter a fusion lens unit to form a real image of light field at a position beyond common barrier. Through an eyepiece unit, the image is emitted to human eye. Thus, the present invention provides a device for near-eye viewing, which reduces existing human-eye vergence accommodation conflict (VAC) in most augmented reality and mixed reality devices. Therein, the display of near-eye light field is a process of light-field reproduction, which merges the scenes and reduces aberration.

Abstract: A spray gun nozzle may include a main body, and a spray hole is formed at a front end thereof. A tapered cylindrical guiding surface having gradually wider diameter from rear to front is extended forwardly from the spray hole, and the inclined angle of the guiding surface with respect to the spray hole is between 45 degrees and 75 degrees. A plurality of air grooves having U-shaped cross-section are formed on the outer periphery of the front end of the main body axially extending from a front end of the guiding surface, and the air grooves are spaced apart with the same interval. With the air grooves on the front end of the main body having the fixed groove diameter, the flow rate of the high-pressure airflow passing through the air groove is consistent.

Abstract: A system include a light source that is deficient of a first primary color, a display device to visually present a content using light beams of the light source, and a processing device to receive the content, calculate, taking into account an effect of deficiency of the first primary color in the light source, a metamer of a visual presentation of the content to compensate for the deficiency of the first primary color in the light source, wherein the calculated metamer when presented on the display device substantially preserves color appearance of the visual presentation rendered on the display device and substantially preserves a hue of the visual presentation by means of digital image processing that compensates for the effect of the deficiency of the first primary color on the color appearance, and provide, to the display device, the metamer of the visual presentation to display using the light beams.

Abstract: A spray gun nozzle may include a main body, and a spray hole is formed at a front end thereof. A tapered cylindrical guiding surface having gradually wider diameter from rear to front is extended forwardly from the spray hole, and the inclined angle of the guiding surface with respect to the spray hole is between 45 degrees and 75 degrees. A plurality of air grooves having U-shaped cross-section are formed on the outer periphery of the front end of the main body axially extending from a front end of the guiding surface, and the air grooves are spaced apart with the same interval. With the air grooves on the front end of the main body having the fixed groove diameter, the flow rate of the high-pressure airflow passing through the air groove is consistent.

Abstract: A system include a light source that is deficient of a first primary color, a display device to visually present a content using light beams of the light source, and a processing device to receive the content, calculate, taking into account an effect of deficiency of the first primary color in the light source, a metamer of a visual presentation of the content to compensate for the deficiency of the first primary color in the light source, wherein the calculated metamer when presented on the display device substantially preserves color appearance of the visual presentation rendered on the display device and substantially preserves a hue of the visual presentation by means of digital image processing that compensates for the effect of the deficiency of the first primary color on the color appearance, and provide, to the display device, the metamer of the visual presentation to display using the light beams.

Abstract: A system include an light emitter to generate a primary light, a filter to filter the primary light to substantially remove a spectrum energy in a wavelength band, a display device to present visual content using the filtered primary light, and a processing device to receive a visual content, calculate, in view of the filtered primary light, a metamer of the visual content, and provide, to the display device, the metamer of the visual content to display in view of the filtered light.

Abstract: A system include an light emitter to generate a primary light, a filter to filter the primary light to substantially remove a spectrum energy in a wavelength band, a display device to present visual content using the filtered primary light, and a processing device to receive a visual content, calculate, in view of the filtered primary light, a metamer of the visual content, and provide, to the display device, the metamer of the visual content to display in view of the filtered light.

Abstract: A method and system of enhancing a backlight-scaled image include a minimum perceptible luminance threshold of cone response with dim backlight being determined, and a luminance layer associated with an image being extracted. The luminance layer is decomposed into an HVS response layer and a background luminance layer for each pixel of the luminance layer. Luminance of dark pixels of the background luminance layer is boosted and compressed to a perceptible range above the minimum perceptible luminance threshold, thereby resulting in an enhanced background luminance layer. An enhanced luminance layer is generated through composition using the HVS response layer and the enhanced background luminance layer as inputs.

Abstract: An image processing system and method include first processing a color stimulus relative to a first anchor, and then second processing a processed color stimulus relative to a second anchor. The first processing unit and the second processing unit preserve relative attributes of the color stimulus to enhance color sensation.

Abstract: A perceptual radiometric compensation system adaptable to a projector-camera system includes a brightness scaling unit that scales down brightness of an input image and obtains appearance attributes by a color appearance model (CAM). A hue adjustment unit adjusts hue of the input image toward tone of a colored projection surface by the CAM.

Abstract: A method and system of enhancing a backlight-scaled image include a minimum perceptible luminance threshold of cone response with dim backlight being determined, and a luminance layer associated with an image being extracted. The luminance layer is decomposed into an HVS response layer and a background luminance layer for each pixel of the luminance layer. Luminance of dark pixels of the background luminance layer is boosted and compressed to a perceptible range above the minimum perceptible luminance threshold, thereby resulting in an enhanced background luminance layer. An enhanced luminance layer is generated through composition using the HVS response layer and the enhanced background luminance layer as inputs.

Abstract: A method for removing a metal oxide overlayer over a target polishing surface in conjunction with a chemical mechanical polishing (CMP) process to improve polishing uniformity including providing a substrate target polishing surface having a layer of an oxide of a metal overlying said metal to be chemically mechanically polished; removing the layer of an oxide of the metal using an oxide removal solution prior to performing a CMP process with an abrasive slurry; and, polishing the target polishing surface according to an a CMP process with an abrasive slurry including at least one of an oxidizer and a complexing agent.

Abstract: An improvement in a copper damascene process is disclosed. The improvement comprises the step of projecting an electron beam on to a chemical mechanically polished material surface having copper filled etched trenches at a known angle of incidence with respect to the material surface for a known period of time, the electron beam having a beamwidth substantially covering the material surface and a known intensity.

Abstract: An interconnect structure utilizing a silicon carbon-containing film as an interlayer between dielectrics. A semiconductor substrate having a conductor thereon is provided, and an insulating layer overlies the semiconductor substrate. The insulating layer has a via hole therein to expose the conductor. A conductive plug, e.g. a tungsten plug, substantially fills the via hole and electrically connects the underlying conductor. A silicon carbon-containing film and a low k dielectric layer overlie the insulating layer and the conductive plug, and have a trench therein exposing the conductive plug. A copper or copper alloy conductor substantially fills the trench.

Abstract: A method for preventing peeling of a metal layer formed over a semiconductor wafer process surface during a chemical mechanical polishing (CMP) process including providing a semiconductor wafer having a process surface comprising a periphery portion and a central portion said central portion including active areas having semiconductor devices features formed therein the process surface including a dielectric insulating layer; forming a plurality of openings in the periphery portion to form closed communication with the dielectric insulating layer the plurality of openings having an aspect ratio of at least 2; blanket depositing a metal layer to cover the process surface including the periphery portion to include filling the plurality of openings to anchor the metal layer; and, performing a CMP process to remove at least a portion of the metal layer from the process surface.

Abstract: A method is provided for forming contact/via hole openings without the detrimental volcano effect that is normally encountered in forming damascene structures. It is disclosed that the hole openings are needed to be filled with a protective material, in the first place, so as to prevent any damage to the exposed surface at the bottom of the openings. However, the filling material must be chosen properly, for otherwise, the material can leave behind a scum-like residue which then can erupt like a volcano during the subsequent process steps, which in turn can lead to functionality as well as reliability problems. It is disclosed in the present invention that when i-line photoresist (i-line PR), or, spin-on organic oxide is used as the protective filler material, the volcano effect can be avoided, and a Cu dual damascene interconnect with low RC delay characteristics can be obtained.

Abstract: An improvement in a copper damascene process is disclosed. The improvement comprises the step of projecting an electron beam on to a chemical mechanically polished material surface having copper filled etched trenches at a known angle of incidence with respect to the material surface for a known period of time, the electron beam having a beamwidth substantially covering the material surface and a known intensity.

Abstract: A sacrificial semiconductor feature for preventing corrosion that can result during chemical-mechanical planarization (CMP) is disclosed. A semiconductor device of the invention is fabricated at least in part by performing CMP. The device includes a desired semiconductor feature and a sacrificial semiconductor feature. The desired semiconductor feature may have an unbalanced geometric pattern that includes a metallic line ending in at least one tip. The at least one tip is susceptible to corrosion resulting from performing CMP. The sacrificial semiconductor feature is preferably located off the metallic line of the desired semiconductor feature. The sacrificial semiconductor feature attracts charge induced during CMP that is otherwise attracted by the at least one tip of the desired semiconductor feature. The presence of the sacrificial semiconductor feature thus substantially prevents corrosion of the desired semiconductor feature, including its tip(s).