Abstract: An imaging lens assembly includes a plurality of lens elements, wherein at least one of the lens elements is a dual molded lens element. The dual molded lens element includes a light transmitting portion and a light absorbing portion. The light transmitting portion includes an effective optical section. The light absorbing portion is located on at least one surface of an object-side surface and an image-side surface of the dual molded lens element, wherein a plastic material and a color of the light absorbing portion are different from a plastic material and a color of the light transmitting portion, and the light absorbing portion includes an opening. The opening is non-circular and disposed correspondingly to the effective optical section.

Abstract: Various embodiments are directed to electrostatic discharge (ESD) protection apparatus comprising a bipolar junction transistor (BJT) having terminals, a field-effect transistor (FET) having terminals, and a common base region connected to a recombination region. The BJT and the FET are integrated with one another and include a common region that is shared by the BJT and the FET. The BJT and FET collectively bias the common base region and prevent triggering of the BJT by causing a potential of the common base region to follow a potential of one of the terminals of the BJT in response to an excessive but tolerable non-ESD voltage change at one or more of the terminals.

Abstract: The present disclosure describes an apparatus with a local interconnect structure. The apparatus can include a first transistor, a second transistor, a first interconnect structure, a second interconnect structure, and a third interconnect structure. The local interconnect structure can be coupled to gate terminals of the first and second transistors and routed at a same interconnect level as reference metal lines coupled to ground and a power supply voltage. The first interconnect structure can be coupled to a source/drain terminal of the first transistor and routed above the local interconnect structure. The second interconnect structure can be coupled to a source/drain terminal of the second transistor and routed above the local interconnect structure. The third interconnect structure can be routed above the local interconnect structure and at a same interconnect level as the first and second interconnect structures.

Abstract: An imaging lens assembly includes a plurality of lens elements, wherein at least one of the lens elements is a dual molded lens element. The dual molded lens element includes a light transmitting portion and a light absorbing portion. The light transmitting portion includes an effective optical section. The light absorbing portion is located on at least one surface of an object-side surface and an image-side surface of the dual molded lens element, wherein a plastic material and a color of the light absorbing portion are different from a plastic material and a color of the light transmitting portion, and the light absorbing portion includes an opening. The opening is non-circular and disposed correspondingly to the effective optical section.

Abstract: A bipolar junction transistor is configured to provide electrostatic discharge (ESD) protection for an integrated circuit. The bipolar junction transistor includes a substrate configured to function as a gate for the bipolar junction transistor. At least one drain finger extends in a first direction on a first surface of the substrate and is configured to function as a collector for the bipolar junction transistor. At least one source finger extends in the first direction on the first surface of the substrate and is configured to function as an emitter for the bipolar junction transistor. The at least one source finger includes a pickup region that is configured to set a substrate potential.

Abstract: A stator for the rotary electric machine including an outer yoke, an inner yoke and a plurality of coils is provided. The inner yoke is coaxially held within the outer yoke, and includes a plurality of teeth and a plurality of slots. The teeth are extending from the center of the stator radially and alternately. The slots are configured between the neighboring teeth. The coils are wound on the teeth respectively to provide a gap between the neighboring coils wherein the gap comprises a gap area equal to or less than 20% of a slot area. Therefore, the stator for the rotary electric machine provides higher torque and the motor efficiency by increasing the coil area factor.

Abstract: A contact lens includes a central region, an annular region and a peripheral region. The central region includes a central point of the contact lens. The annular region symmetrically surrounds the central region. The peripheral region symmetrically surrounds the annular region. The peripheral region includes at least one color pattern portion. The annular region includes at least one power of critical point.

Abstract: Semiconductor devices with cross-domain electrostatic discharge (ESD) protection and related fabrication methods are provided. An exemplary semiconductor device includes first domain circuitry, second domain circuitry, and an interface coupled between an output node of the first domain driver circuitry and second domain receiver circuitry. The receiver circuitry includes a transistor having a gate electrode coupled to the interface, with a body electrode of the transistor being coupled to protection circuitry of the first domain circuitry. The body electrode is effectively biased to a reference voltage node of the first domain by the protection circuitry in response to an ESD event to protect the gate oxide of the transistor from a potentially damaging ESD voltage.

Abstract: Embodiments of an electrostatic discharge (ESD) protection device and a method of operating an ESD protection device are described. In one embodiment, an ESD protection device includes a bipolar transistor device connected between a first node and a second node, a series protection device connected in series with the bipolar transistor device, and a diode device connected between the second node and a third node. A drain terminal of an NMOS device to be protected is connectable to the first node. A body of the NMOS device to be protected is connectable to the second node. A source terminal of the NMOS device to be protected is connectable to the third node. The diode device and the bipolar transistor device are configured to form a parasitic silicon controlled rectifier. Other embodiments are also described.

Abstract: An ESD circuit is connected with a pad. The ESD circuit includes a voltage divider, a RC circuit and a path control circuit. The voltage divider is connected between the pad and a first node and provides plural divided voltages. The RC circuit is connected between the pad and the first node. The RC circuit receives the plural divided voltages and provides a control circuit. The path control circuit is connected with the pad and the first node. The path control circuit receives the plural divided voltages and the control voltage. When the pad receives a first ESD zap, the RC circuit controls the path control circuit to turn on a first ESD current path. Consequently, an ESD current flows from the pad to the first node through the first ESD current path.

Abstract: Methods for application management in an electronic device are provided. It is first determined whether the application to be installed is listed in a first list, wherein the first list lists a set of applications which are hardware accelerable. The application is then marked as a hardware accelerable application in response to the application being listed in the first list. Thereafter, the application is installed, wherein a hardware acceleration function of the application is enabled to activate a hardware acceleration unit of the electronic device for hardware acceleration during executing the application being marked as the hardware accelerable application.

Abstract: Embodiments of an electrostatic discharge (ESD) protection device and a method for operating an ESD protection device are described. In one embodiment, an ESD protection device includes stacked first and second PNP bipolar transistors that are configured to shunt current between a first node and a second node in response to an ESD pulse received between the first and second nodes and an NMOS transistor connected in series with the stacked first and second PNP bipolar transistors and the second node. An emitter and a base of the second PNP bipolar transistor are connected to a collector of the first PNP bipolar transistor. A gate terminal of the NMOS transistor is connected to a source terminal of the NMOS transistor. Other embodiments are also described.

Abstract: A semiconductor device and method. The device includes a first domain and a second domain each having a power rail and a ground rail. The device further includes a signal line connected between the first domain and the second domain. The device also includes an electrostatic discharge protection circuit for providing cross-domain ESD protection. The protection circuit includes a blocking transistor connected between the first domain power rail and the signal line. The protection circuit also includes a power rail clamp connected between the first domain power rail and the first domain ground rail. The power rail clamp is operable to apply a control signal to a gate of the blocking transistor to switch it on during normal operation and to switch it off during an ESD event. The power rail clamp is operable during the ESD event to conduct an ESD current.

Abstract: Embodiments of an electrostatic discharge (ESD) protection device and a method for operating an ESD protection device are described. In one embodiment, an ESD protection device includes a first bipolar device connected to a first node, a second bipolar device connected to the first bipolar device and to a second node, and a metal-oxide-semiconductor (MOS) device connected to the first and second nodes and to the first and second bipolar devices and configured to shunt current in response to an ESD pulse received between the first and second nodes. The first bipolar device, the second bipolar device, and the MOS device are formed on a deep well structure. Other embodiments are also described.

Abstract: Embodiments of an electrostatic discharge (ESD) protection device and a method for operating an ESD protection device are described. In one embodiment, an ESD protection device includes three or more bipolar transistors that are configured to shunt current between a first node and a second node in response to an ESD pulse received between the first and second nodes and a diode connected in series with the three or more bipolar transistors and one of the first and second nodes. Each of the three or more bipolar transistors includes a collector comprising collector components, an emitter comprising emitter components, and a base structure comprising a substrate region or an active region. The emitter components are alternately located with respect to the collector components. The substrate region or the active region surrounds the collector components and the emitter components. Other embodiments are also described.

Abstract: A liquid crystal display panel includes a first and a second substrate, scan lines, data lines, pixel structures, a counter electrode layer, and a liquid crystal layer. The scan lines, the data lines, and the pixel structures are located above the first substrate. Each of the pixel structures includes a first active device and a first pixel electrode. The first active device is electrically connected to the scan line and the data line. The first pixel electrode is electrically connected to the first active device and has a plurality of first stripe portions. Two adjacent first stripe portions define a first slit. The first stripe portion has a width L, the first slit has a width S, the first stripe portions have a pitch p there between, and p=L+S. The liquid crystal layer is disposed between the first and second substrates and has a thickness d.

Abstract: A first embodiment is a method for semiconductor process control comprising clustering processing tools of a processing stage into a tool cluster based on processing data and forming a prediction model for processing a semiconductor wafer based on the tool cluster. A second embodiment is a method for semiconductor process control comprising providing cluster routes between first stage tool clusters and second stage tool clusters, assigning a comparative optimization ranking to each cluster route, and scheduling processing of wafers. The comparative optimization ranking identifies comparatively which cluster routes provide for high wafer processing uniformity.

Abstract: For a mapping application, a method for reporting a problem related to a map displayed by the mapping application is described. The method identifies a mode in which the mapping application is operating. The method identifies a set of types of problems to report based on the identified mode. The method displays, in a display area of the mapping application, a graphical user interface (GUI) page that includes a set of selectable user interface (UI) items that represent the identified set of types of problems.

Abstract: A silicon controlled rectifier (SCR) circuit is configured to shunt electrostatic discharge (ESD) current from a node to a reference voltage. The SCR circuit includes a first bipolar PNP transistor having a first emitter connected to the node, a first base, and a first collector. A second bipolar NPN transistor has a second collector sharing a first region with the first base, a second base sharing a second region with the first collector, and an emitter electrically connected to the reference voltage. A guard region is configured and arranged to delay triggering of the SCR circuit in response to an ESD event by impeding current flow in the second region.

Abstract: An electrostatic discharge power rail clamp circuit and an integrated circuit including the same. The power rail clamp circuit includes a first power rail, a second power rail and a first node. The circuit further includes an n-channel field effect transistor having a source and drain located in an isolated p-well in a semiconductor substrate. The drain is connected to the first power rail. The source and isolated p-well are connected to the first node. The circuit also includes a capacitor connected between the first node and the second power rail. The circuit further includes a resistor connected between the first power rail and the first node. The circuit also includes an inverter for controlling the gate of the field effect transistor, wherein the inverter has an input connected to the first node. The circuit further a silicon controlled rectifier connected between the first node and the second power rail.