Patents by Inventor Wei-Lin Chen

Wei-Lin Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190008373
    Abstract: The present application provides an arthroscopic system, which comprises an disposable arthroscope having a distal end and a proximal end, and comprising a light source, a lens set, an image sensor, a transmitter, and a control interface. The present application eliminates the possibility of infecting the patient with contaminated devices by its cost-effectively disposable arthroscope. The present application also provides a method for image rotating in an arthroscopic system.
    Type: Application
    Filed: September 12, 2018
    Publication date: January 10, 2019
    Inventors: Chung-Sheng Chen, Ching-Chuan Jiang, Chien-Hsiang Chang, Wei-lin Chen
  • Patent number: 10164156
    Abstract: Structures and formation methods of an image sensor structure are provided. The image sensor structure is provided. The image sensor structure includes a substrate, a photodiode component in the substrate, and a grid structure over the substrate. The grid structure includes a bottom dielectric element over the substrate, a reflective element over the bottom dielectric element, and an upper dielectric element over the reflective element. The reflective element has a sidewall which is anti-corrosive in a basic condition and an acidic condition. The image sensor structure also includes a color filter element over the substrate and surrounded by the grid structure. The color filter element is aligned with the photodiode component.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: December 25, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ching-Chung Su, Hung-Wen Hsu, Wei-Chuang Wu, Wei-Lin Chen, Jiech-Fun Lu
  • Patent number: 10157693
    Abstract: A neutron moderation material for use in a BNCT beam shaping assembly. The neutron moderation material comprises three elements, i.e., Mg, Al, and F, wherein the mass fraction of the Mg element is 3.5%-37.1%, the mass fraction of the Al element is 5%-90.4%, and the mass fraction of the F element is 5.8%-67.2%; the sum of the weights of the Mg, Al, and F elements is 100% of the total weight of the neutron moderation material. The neutron moderation material may be doped with a small amount of 6Li-containing substances, and the addition of the 6Li-containing substances effectively decreases the content of ?-rays in epithermal neutron beams.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: December 18, 2018
    Assignee: NEUBORON MEDTECH LTD.
    Inventors: Yuan-Hao Liu, Wei-Lin Chen
  • Publication number: 20180286907
    Abstract: Structures and formation methods of an image sensor structure are provided. The image sensor structure is provided. The image sensor structure includes a substrate, a photodiode component in the substrate, and a grid structure over the substrate. The grid structure includes a bottom dielectric element over the substrate, a reflective element over the bottom dielectric element, and an upper dielectric element over the reflective element. The reflective element has a sidewall which is anti-corrosive in a basic condition and an acidic condition. The image sensor structure also includes a color filter element over the substrate and surrounded by the grid structure. The color filter element is aligned with the photodiode component.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 4, 2018
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ching-Chung SU, Hung-Wen HSU, Wei-Chuang WU, Wei-Lin CHEN, Jiech-Fun LU
  • Publication number: 20180277278
    Abstract: Disclosed is a method for evaluating an irradiation angle of a beam, including a step of sampling the irradiation angle of the beam, wherein the irradiation angle of the beam is defined as being the direction of the vector of the irradiation point of the beam to the pre-set point of the tumor; and a step of calculating the track of the beam passing through the organs, wherein it is determined whether the tumor is fully covered within the effective treatment depth, and if so, entering the steps of calculating the evaluation coefficient, recording the irradiation conditions and calculating the results, and returning to the step of sampling the irradiation angle of the beam; and if not, entering the step of giving the worst evaluation coefficient and returning to the step of sampling the irradiation angle of the beam.
    Type: Application
    Filed: May 29, 2018
    Publication date: September 27, 2018
    Inventors: Yuan-Hao Liu, Wei-Lin Chen
  • Publication number: 20180243587
    Abstract: The present disclosure provides a neutron capture therapy system including a beam shaping assembly. The beam shaping assembly includes a beam inlet; a neutron generator arranged into the beam shaping assembly, the neutron generator has nuclear reaction with an incident proton beam from the beam inlet to produce neutrons; a moderator adjacent to the neutron generator, the neutrons are moderated by the moderator to epithermal neutron energies; a reflector surrounding the neutron generator and the moderator, the reflector leads the deflected neutrons back to enhance epithermal neutron beam intensity; a beam outlet; and at least a movable member moving away from or close to the neutron generator, the movable member moves between a first position where the neutron generator is replaceable, and a second position where the neutron generator is irreplaceable. The neutron capture therapy system has a simple structure, and the neutron generator is easy to be replaced.
    Type: Application
    Filed: May 1, 2018
    Publication date: August 30, 2018
    Inventors: Yuan-Hao LIU, Wei-Lin CHEN
  • Publication number: 20180228361
    Abstract: The present application provides an arthroscopic system, which comprises an arthroscope having a distal end and a proximal end, a light source attached to the distal end of the arthroscope for providing a light, a lens attached to the distal end of the arthroscope for gathering the light, an image sensor set up next to the lens for generating digital raw data from the light, a transmitter set up between the distal end and the proximal end for transmitting the digital raw data toward the proximal end, a processing system attached to the proximal end for capturing and converting the digital raw data into digital video data and a video display device for displaying said digital video data. The present application eliminates the possibility of infecting the patient with contaminated devices by its cost-effectively disposable arthroscope. The present application also provides a method for image transmitting in an arthroscopic system.
    Type: Application
    Filed: February 15, 2017
    Publication date: August 16, 2018
    Inventors: Chung-Sheng Chen, Ching-Chuan Jiang, Chien-Hsiang Chang, Wei-lin Chen
  • Publication number: 20180233246
    Abstract: A neutron moderation material for use in a BNCT beam shaping assembly. The neutron moderation material comprises three elements, i.e., Mg, Al, and F, wherein the mass fraction of the Mg element is 3.5%-37.1%, the mass fraction of the Al element is 5%-90.4%, and the mass fraction of the F element is 5.8%-67.2%; the sum of the weights of the Mg, Al, and F elements is 100% of the total weight of the neutron moderation material. The neutron moderation material may be doped with a small amount of 6Li-containing substances, and the addition of the 6Li-containing substances effectively decreases the content of ?-rays in epithermal neutron beams.
    Type: Application
    Filed: April 13, 2018
    Publication date: August 16, 2018
    Inventors: Yuan-Hao LIU, Wei-Lin CHEN
  • Publication number: 20180193673
    Abstract: Abeam shaping assembly for neutron capture therapy includes a beam inlet, a target having nuclear reaction with an incident proton beam from the beam inlet to produce neutrons forming a neutron beam, a moderator adjoining to the target, a reflector surrounding the moderator. The neutrons are moderated to epithermal neutron energies by the moderator, and part of the moderator disposed on the back of the target can be replaced so as to adjust the epithermal neutron energies. The reflector leads the neutrons deviated from the main axis back.
    Type: Application
    Filed: March 12, 2018
    Publication date: July 12, 2018
    Inventors: Yuan-Hao LIU, Wei-Lin Chen
  • Publication number: 20180152140
    Abstract: An oscillation device includes an oscillator and a logic circuit. The oscillator generates an output oscillation signal. The logic circuit controls the oscillator according to the output oscillation signal, such that the output oscillation signal includes two different oscillation periods. The oscillation device may be used as a temperature-to-frequency converter without any bandgap reference circuit.
    Type: Application
    Filed: November 8, 2017
    Publication date: May 31, 2018
    Inventors: Wei-Lin CHEN, Kuan-Ta CHEN
  • Publication number: 20180114605
    Abstract: A shielding material for shielding radioactive ray and preparation method thereof. The shielding material consists of water, a cementing material, a fine aggregate material, a coarse aggregate material and an additive, wherein the fine aggregate material consists of a borosilicate glass powder and a barite sand, and the coarse aggregate material consists of a barite. A content of boron element in the borosilicate glass powder accounts for 0.5%-1% of the total weight of the shielding material. A content of barium sulfate in the barite sand and the barite accounts for 71%-75% of the total weight of the shielding material. Other contents include water, the cementing material and the additive, and a sum of contents of all components is 100% total weight of the shielding material.
    Type: Application
    Filed: November 30, 2017
    Publication date: April 26, 2018
    Applicant: NEUBORON MEDTECH LTD.
    Inventors: Ming-Chuan CHANG, Wei-Lin Chen, Yuan-Hao Liu
  • Publication number: 20180001112
    Abstract: A beam shaping assembly for neutron capture therapy includes a beam inlet, a target having nuclear reaction with an incident proton beam from the beam inlet to produce neutrons forming a neutron beam, a moderator adjoining to the target, a reflector surrounding the moderator, a thermal neutron absorber adjoining to the moderator, a radiation shield arranged inside the beam shaping assembly and a beam outlet. The material of the moderator is subjected to a powder sintering process using a powder sintering device so as to change powders or a power compact into blocks. The reflector leads the neutrons deviated from the main axis back. The thermal neutron absorber is used for absorbing thermal neutrons so as to avoid overdosing in superficial normal tissue during therapy. The radiation shield is used for shielding leaking neutrons and photons so as to reduce dose of the normal tissue not exposed to irradiation.
    Type: Application
    Filed: September 14, 2017
    Publication date: January 4, 2018
    Inventors: Yuan-hao LIU, Wei-lin CHEN, Pei-yi LEE, Ming-chuan CHANG, Wenyu XU
  • Patent number: 9224857
    Abstract: A semiconductor structure comprises a substrate having a first conductive type; a deep well having a second conductive type formed in the substrate and extending down from a surface of the substrate; a first well having the first conductive type and a second well having the second conductive type both formed in the deep well and extending down from the surface of the substrate, and the second well spaced apart from the first well; a gate electrode formed on the substrate and disposed between the first and second wells; an isolation extending down from the surface of the substrate and disposed between the gate electrode and the second well; a conductive plug penetrating into the isolation and reaching the bottom thereof; and a first doping electrode region having the second conductive type, formed within the second well and below the isolation to connect the conductive plug.
    Type: Grant
    Filed: November 12, 2012
    Date of Patent: December 29, 2015
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Wei-Lin Chen, Chih-Chien Chang, Ke-Feng Lin, Chiu-Te Lee, Chih-Chung Wang, Chiu-Ling Lee
  • Patent number: 9159791
    Abstract: A semiconductor device includes a semiconductor substrate, a buried layer disposed in the semiconductor substrate; a deep well disposed in the semiconductor substrate; a first doped region disposed in the deep well, wherein the first doped region contacts the buried layer; a conductive region having the first conductivity type surrounding and being adjacent to the first doped region, wherein the conductive region has a concentration higher than the first doped region; a first heavily doped region disposed in the first doped region; a well having a second conductivity type disposed in the deep well; a second heavily doped region disposed in the well; a gate disposed on the semiconductor substrate between the first heavily doped region and the second heavily doped region; and a first trench structure and a second trench structure, wherein a depth of the second trench structure is substantially deeper than a depth of the buried layer.
    Type: Grant
    Filed: June 6, 2012
    Date of Patent: October 13, 2015
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Wei-Lin Chen, Ke-Feng Lin, Chih-Chien Chang, Chih-Chung Wang
  • Patent number: 8994103
    Abstract: A lateral double-diffused metal-oxide-semiconductor transistor device includes a substrate having at least a shallow trench isolation formed therein, an epitaxial layer encompassing the STI in the substrate, a gate, and a drain region and a source region formed in the substrate at respective two sides of the gate. The epitaxial layer, the source region and the drain region include a first conductivity type. The gate includes a first portion formed on the substrate and a second portion extending into the STI.
    Type: Grant
    Filed: July 10, 2013
    Date of Patent: March 31, 2015
    Assignee: United Microelectronics Corp.
    Inventors: Wei-Lin Chen, Tseng-Hsun Liu, Kuan-Yu Chen, Chiu-Ling Lee, Chiu-Te Lee, Chih-Chung Wang
  • Patent number: 8987813
    Abstract: A high voltage metal-oxide-semiconductor transistor device includes a substrate, at least an isolation structure formed in the substrate, a gate formed on the substrate, and a source region and a drain region formed in the substrate at respective sides of the gate. The isolation structure further includes a recess. The gate includes a first gate portion formed on a surface of the substrate and a second gate portion downwardly extending from the first gate portion and formed in the recess.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: March 24, 2015
    Assignee: United Microelectronics Corp.
    Inventors: Chiu-Te Lee, Ke-Feng Lin, Chih-Chien Chang, Wei-Lin Chen, Chih-Chung Wang
  • Publication number: 20150075333
    Abstract: A wrench tool for screwdriver bits contains a body, a biasing member, and an elastic element. The body includes a tool seat received in an end portion thereof, the tool seat includes a fitting groove defined on a first end thereof and fitting with screwdriver bits, the fitting groove has a locking structure for retaining the screwdriver bits, and the tool seat further includes a second end communicating with the fitting groove. The biasing member is secured on the second end of the tool seat, the biasing member has a pushing portion fixed on a first end thereof and extending out of the fitting groove and has a pressing portion disposed on a second end thereof and pressed to push the screwdriver bits. The elastic element is mounted on the second end of the tool seat and used to push the biasing member to move back to an original position.
    Type: Application
    Filed: September 19, 2013
    Publication date: March 19, 2015
    Inventor: Wei-Lin Chen
  • Patent number: 8941175
    Abstract: A power array with a staggered arrangement for improving on-resistance and safe operating area of a device is provided. Each power array includes two or more rows with a plurality of parallel device units arranged along the row. Each device unit includes a source region, a drain region, and a gate disposed between the source region and the drain region, wherein each drain region is offset from the adjacent drain region of adjacent rows in a row direction.
    Type: Grant
    Filed: June 17, 2013
    Date of Patent: January 27, 2015
    Assignee: United Microelectronics Corp.
    Inventors: Wei-Lin Chen, Ke-Feng Lin, Chiu-Ling Lee, Chiu-Te Lee, Chih-Chung Wang, Hsuan-Po Liao
  • Publication number: 20150014768
    Abstract: A lateral double-diffused metal-oxide-semiconductor transistor device includes a substrate having at least a shallow trench isolation formed therein, an epitaxial layer encompassing the STI in the substrate, a gate, and a drain region and a source region formed in the substrate at respective two sides of the gate. The epitaxial layer, the source region and the drain region include a first conductivity type. The gate includes a first portion formed on the substrate and a second portion extending into the STI.
    Type: Application
    Filed: July 10, 2013
    Publication date: January 15, 2015
    Inventors: Wei-Lin Chen, Tseng-Hsun Liu, Kuan-Yu Chen, Chiu-Ling Lee, Chiu-Te Lee, Chih-Chung Wang
  • Publication number: 20140367789
    Abstract: A power array with a staggered arrangement for improving on-resistance and safe operating area of a device is provided. Each power array includes two or more rows with a plurality of parallel device units arranged along the row. Each device unit includes a source region, a drain region, and a gate disposed between the source region and the drain region, wherein each drain region is offset from the adjacent drain region of adjacent rows in a row direction.
    Type: Application
    Filed: June 17, 2013
    Publication date: December 18, 2014
    Inventors: Wei-Lin Chen, Ke-Feng Lin, Chiu-Ling Lee, Chiu-Te Lee, Chih-Chung Wang, Hsuan-Po Liao