Patents by Inventor Wen Fan

Wen Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100140741
    Abstract: A structure of a capacitor set is described, including at least two capacitors that are disposed at the same position on a substrate and include a first capacitor and a second capacitor. The first capacitor includes multiple first capacitor units electrically connected with each other in parallel. The second capacitor includes multiple second capacitor units electrically connected with each other in parallel. The first and the second capacitor units are arranged spatially intermixing with each other to form an array.
    Type: Application
    Filed: February 6, 2010
    Publication date: June 10, 2010
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Victor Chiang Liang, Chien-Kuo Yang, Hua-Chou Tseng, Chun-Yao Ko, Cheng-Wen Fan, Yu-Ho Chiang, Chih-Yuh Tzeng
  • Patent number: 7632544
    Abstract: A nanopatterned template for use in manufacturing nanoscale objects. The nanopatterned template contains a nanoporous thin film with a periodically ordered porous geomorphology which is made from a process comprising the steps of: (a) using a block copolymerization process to prepare a block copolymer comprising first and second polymer blocks, the first and second polymer blocks being incompatible with each other; (b) forming a thin film under conditions such that the first polymer blocks form into a periodically ordered topology; and (c) selectively degrading the first polymer blocks to cause the thin film to become a nanoporous material with a periodically ordered porous geomorphology. In a preferred embodiment, the block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, the first polymer is poly(L-lactide), and the second polymer is polystyrene.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: December 15, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Ming Ho, Hui-Wen Fan, Wen-Hsien Tseng, Yeo-Wan Chiang, Chu-Chien Lin, Bao-Tsan Ko, Bor-Hunn Huang, Hsi-Hsin Shih, Joung-Yei Chen
  • Publication number: 20090230357
    Abstract: An electroluminescent phosphor comprising ZnS:Mn is disclosed. Also disclosed are ZnS:Mn electroluminescent phosphors that are free of or substantially free of copper, and/or wherein the phosphor has a D50 size of less than about 5 ?m. In addition, a method for preparing a ZnS:Mn phosphor is disclosed, comprising the steps of contacting at least a portion of each of a first solution comprising a Zn2+ compound, a manganese source, and a second solution comprising a S2? source agent; and then heating the mixture at a temperature and for a time sufficient to form a phosphor.
    Type: Application
    Filed: March 11, 2009
    Publication date: September 17, 2009
    Inventors: Xianzhong Chen, Shellie Kaye Northrop, Chen-Wen Fan
  • Patent number: 7535176
    Abstract: Blue-emitting phosphors for use with plasma display panels (PDP) or other vacuum ultraviolet-excited (VUV) devices are provided. These blue-emitting phosphors and mixtures thereof include at least a europium-activated calcium-substituted barium hexa-aluminate (CBAL) phosphor. Preferably, the CBAL phosphor has a composition which may be represented by the formula: Ba1.29-x-yCaxEuyAl12O19.29, wherein 0<x<0.25 and 0.01<y<0.20. These blue-emitting phosphors exhibit improved degradation characteristics, including reduced color shift and increased intensity maintenance, under conditions found in VUV-excited devices.
    Type: Grant
    Filed: May 13, 2004
    Date of Patent: May 19, 2009
    Assignee: Osram Sylvania Inc.
    Inventors: Gregory A. Marking, Chung-Nin Chau, Thomas M. Snyder, Shellie K. Northrop, Chen Wen Fan
  • Patent number: 7497974
    Abstract: The sensitivity of YPO4:Ce phosphors to 185 nm radiation may be increased by incorporating a praseodymium coactivator. The use of Ce and Pr as co-activators in a YPO4 phosphor improves the sensitivity of the phosphor to excitation by both 185 nm and 254 nm radiation and should increase total UVA and UVB output in fluorescent lamps. The co-activated phosphor has emission peaks at about 355 nm and about 335 nm.
    Type: Grant
    Filed: August 1, 2006
    Date of Patent: March 3, 2009
    Assignee: Osram Sylvania Inc.
    Inventors: Chen Wen Fan, Gregory A. Marking, Thomas M. Snyder
  • Publication number: 20080278045
    Abstract: The present invention relates to a case assembly structure. The case assembly structure includes a first case and a second case. The first case has a first connection portion including an extension part and a trench from the external side to the internal side thereof. The second case has a second connection portion including a protrusion corresponding to the trench of the first connection portion of the first case. An inner wall of the extension part of the first connection portion is in contact with the external side of the second connection portion of the second case such that the first case and the second case are combined together.
    Type: Application
    Filed: July 11, 2007
    Publication date: November 13, 2008
    Applicant: Delta Electronics, Inc.
    Inventors: Yao-Wen Fan, Chun Wen, Chun-Chen Chen
  • Publication number: 20080213152
    Abstract: A method of producing a UV-emitting magnesium pentaborate phosphor is described. The method comprises combining a hydrated magnesium hexaborate with oxides of Y, Gd, Ce and Pr to form a mixture and firing the mixture in a slightly reducing atmosphere to form the phosphor. The hydrated magnesium hexaborate, which is preferably prepared as a precipitate, preferably has a formula MgB6O10.XH2O where X is from 4 to 6.
    Type: Application
    Filed: February 13, 2008
    Publication date: September 4, 2008
    Applicant: OSRAM SYLVANIA INC.
    Inventors: Gregory A. Marking, Chen-Wen Fan, Thomas M. Snyder
  • Publication number: 20080030120
    Abstract: The sensitivity of YPO4:Ce phosphors to 185 nm radiation may be increased by incorporating a praseodymium coactivator. The use of Ce and Pr as co-activators in a YPO4 phosphor improves the sensitivity of the phosphor to excitation by both 185 nm and 254 nm radiation and should increase total UVA and UVB output in fluorescent lamps. The co-activated phosphor has emission peaks at about 355 nm and about 335 nm.
    Type: Application
    Filed: August 1, 2006
    Publication date: February 7, 2008
    Applicant: OSRAM SYLVANIA INC.
    Inventors: Chen Wen Fan, Gregory A. Marking, Thomas M. Snyder
  • Publication number: 20080029854
    Abstract: The invention is directed to a conductive shielding pattern for shielding a inductor device. The conductive shielding pattern comprises a plurality of conductive layers and a plurality of diffusion regions. The conductive layers are located on a substrate. The diffusion regions are located in the substrate and the conductive layers and the diffusion regions are arranged alternatively and are free ends respectively.
    Type: Application
    Filed: August 3, 2006
    Publication date: February 7, 2008
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Cheng-Chou Hung, Hua-Chou Tseng, Yu-Chia Chen, Victor-Chiang Liang, Cheng-Wen Fan
  • Publication number: 20080012092
    Abstract: A structure of a capacitor set is described, including at least two capacitors that are disposed at the same position on a substrate and include a first capacitor and a second capacitor. The first capacitor includes multiple first capacitor units electrically connected with each other in parallel. The second capacitor includes multiple second capacitor units electrically connected with each other in parallel. The first and the second capacitor units are arranged spatially intermixing with each other to form an array.
    Type: Application
    Filed: July 4, 2006
    Publication date: January 17, 2008
    Inventors: Victor-Chiang Liang, Chien-Kuo Yang, Hua-Chou Tseng, Chun-Yao Ko, Cheng-Wen Fan, Yu-Ho Chiang, Chih-Yuh Tzeng
  • Patent number: 7309454
    Abstract: A UV-emitting phosphor comprising SrB4O7:Eu phosphor particles that have been treated to yield a surface layer containing from greater than 0 to about 25 atomic percent aluminum. The holdover stability of the treated SrB4O7:Eu phosphor improves the 100-hour maintenance in a fluorescent tanning lamp to the extent that the treated phosphor may be subject to a holdover period of more than 25 days without a significant change in its 100-hour maintenance.
    Type: Grant
    Filed: April 25, 2005
    Date of Patent: December 18, 2007
    Assignee: Osram Sylvania Inc.
    Inventors: Chen-Wen Fan, Thomas M. Snyder, Eric A. Thomason
  • Patent number: 7288215
    Abstract: A method is provided for making narrow-band, UVB-emitting, (Y,Gd,Ce,Pr)Mg borate phosphors. The method involves the use of a mixed oxide co-precipitate which is combined with MgO and boric acid and fired twice to form the borate phosphor. The mixed oxide co-precipitate is formed by dissolving sources of Y, Gd, Ce, and optionally Pr, in an acid solution. Oxalic acid or ammonia is added to the solution (or vice versa) to form a co-precipitate of oxalates or hydroxides that are further fired to obtain a mixed oxide co-precipitate. The use of the mixed oxide co-precipitate improves homogeneity and yields a phosphor having a higher brightness with very little or no sticking between the fired cakes and the firing crucibles.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: October 30, 2007
    Assignee: Osram Sylvania Inc.
    Inventors: Chen-Wen Fan, Thomas M. Snyder, Eric A. Thomason
  • Patent number: 7271428
    Abstract: The invention provides a heterojunction bipolar transistor comprising a substrate having a collector therein, an intrinsic base region, a first extrinsic base region, a second extrinsic base region, an emitter on the intrinsic base layer and a spacer adjacent the emitter and on the first extrinsic base region. The first extrinsic base region is adjacent the intrinsic base region and the second extrinsic base region is adjacent the first extrinsic base region on the substrate, wherein a dopant concentration of the second extrinsic base region is higher than a dopant concentration of the first extrinsic base region.
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: September 18, 2007
    Assignee: United Microelectronics Corp.
    Inventors: Cheng-Wen Fan, Hua-Chou Tseng
  • Publication number: 20070172657
    Abstract: An electroluminescent (EL) phosphor is described wherein each individual phosphor particle is encapsulated in an inorganic coating, preferably aluminum oxyhydroxide. The encapsulated phosphor shows an extreme insensitivity to atmospheric moisture and suffers only minor loss of initial brightness in lamps. The method of applying the coating is a hybrid process, which involves EL phosphor particles first being coated with a thin inorganic film using an atomic layer deposition (ALD) method in a fluidized bed wherein the precursors are introduced sequentially in repeated cycles, subsequently followed by an additional coating layer applied by a chemical vapor deposition (CVD) method in which the precursors are introduced simultaneously.
    Type: Application
    Filed: January 12, 2007
    Publication date: July 26, 2007
    Applicant: OSRAM SYLVANIA Inc.
    Inventors: Chen-Wen Fan, Tuan A. Dang, Joan M. Coveleskie, Frank A. Schwab, Dale E. Benjamin, David C. Sheppeck
  • Publication number: 20070172580
    Abstract: The present invention is an electroluminescent phosphor wherein each individual phosphor particle is encapsulated in an inorganic coating applied by an atomic layer deposition (ALD) coating method. In a preferred embodiment, the coating is aluminum oxyhydroxide. The encapsulated phosphor shows an extreme insensitivity to atmospheric moisture and suffers only minor loss of initial brightness in lamps.
    Type: Application
    Filed: January 12, 2007
    Publication date: July 26, 2007
    Applicant: OSRAM SYLVANIA INC.
    Inventors: Chen-Wen Fan, Tuan A. Dang, Joan M. Coveleskie, Frank A. Schwab, Dale E. Benjamin, David C. Sheppeck
  • Publication number: 20070160753
    Abstract: The maintenance characteristics of the phosphors used in VUV-excited devices such as plasma display panels can be improved by applying a coating of an aluminum oxyhydroxide compound by reacting vaporized trimethylaluminum with water vapor at a temperature of about 430° C. or above. In particular, the maintenance of an europium-activated, calcium-substituted barium hexa-aluminate phosphor is significantly improved following exposure to a high intensity VUV flux.
    Type: Application
    Filed: May 13, 2004
    Publication date: July 12, 2007
    Inventors: Chen-Wen Fan, Chung-Nin Chau, Gregory Marking, William Edgerton
  • Patent number: 7238302
    Abstract: The present invention is a single-component, UV-emitting phosphor having a composition represented by the general formula (Y1?x?y?zLaxGdyCeZ)PO4 where x has a value in a range from 0.001 to 0.98, y has a value in a range from 0 and 0.1, z has a value in a range from 0.01 and 0.2, and x+y+z<1. The phosphor when stimulated by 254 nm radiation emits in both the UVA and UVB regions. The relative balance of the UVA and UVB emissions may be varied by adjusting the relative amounts of Y and La. Brightness can be increased by adding Gd to the composition.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: July 3, 2007
    Assignee: Osram Sylvania Inc.
    Inventors: Chen-Wen Fan, Thomas M. Snyder, Eric A. Thomason
  • Patent number: 7220007
    Abstract: An outer suspension type lens shielding mask for a projection apparatus including a sheet body and holding element, in which a rectangular hole is opened in the sheet body, and the sheet body is combined with the holding element to be fixed on a projection apparatus. Another outer suspension type lens shielding mask includes a base plate, in which a rectangular hole is opened in the middle part thereof, and upper and lower adjustable plates are installed behind the base plate. An open rectangular notch is respectively disposed at the middle parts of the upper and the lower adjustable plates. An adjustment mechanism includes a plurality of connecting elements connected to the base plate and the upper and the lower adjustable plates for adjusting the relative positions thereof, to avoid bad shadows yielded outside of a picture due to light diffraction and improve the quality of visual amusement.
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: May 22, 2007
    Assignee: Coretronic Corporation
    Inventors: Chih Chung Yang, Hsi Chih Sun, Hua Wen Fan
  • Patent number: 7221084
    Abstract: A narrow-band UVB emitting phosphor is described wherein the phosphor has a preferred composition represented by the general formula (Y1-x-y-zGdxCeyPrz)MgB5O10 where x has a value in a range from 0.02 to 0.80, y has a value in a range from 0.01 to 0.97, and z has a value in a range from greater than 0 to 0.05 and x+y+z<1. The phosphor has a narrow emission centered at about 312 nm when excited by radiation from a low-pressure mercury discharge.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: May 22, 2007
    Assignee: Osram Sylvania Inc.
    Inventors: Chen-Wen Fan, Thomas M. Snyder, Eric A. Thomason
  • Patent number: D583829
    Type: Grant
    Filed: April 4, 2008
    Date of Patent: December 30, 2008
    Assignee: Lifan Industry (Group) Co., Ltd.
    Inventor: Wen Fan