Abstract: A resistive memory cell includes a lower electrode, a resistive transition metal oxide layer, and an upper electrode. The lower electrode includes at least one lower metallic barrier layer, a lower metal layer including a first metal having a melting point higher than 2,000 degrees Celsius, and a transition metal compound layer including an oxide or nitride of a transition metal selected from Ti, Ta, and W. The resistive transition metal oxide layer includes a conductive-filament-forming dielectric oxide of at least one transition metal and located on the transition metal compound layer. The upper electrode includes an upper metal layer including a second metal having a melting point higher than 2,000 degrees Celsius and at least one upper metallic barrier layer.

Abstract: A deposition system is provided capable of controlling an amount of a target material deposited on a substrate and/or direction of the target material that is deposited on the substrate. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, wherein a length of at least one of the plurality of hollow structures is adjustable.

Abstract: Novel small molecule proteolysis-targeting chimeras (PROTACs) are provided, along with methods for their use as Bruton's tyrosine kinase (BTK) degraders. The small molecule PROTACs described herein are useful in treating and/or preventing BTK-related diseases, such as cancer, neurodegenerative disorders, inflammatory diseases, and metabolic disorders. Also provided are methods for inducing BTK degradation in a cell using the compounds and compositions described herein.

Abstract: A thin film deposition system includes: a first precursor supply system configured to generate and supply a first precursor vapor from a first precursor source, the first precursor supply system comprising a first precursor source container, wherein at least a portion of an interior surface of the first precursor source container has a three-dimensional (3D) pattern, wherein the 3D pattern comprises a plurality of area enlarging elements configured to enlarge a total contact area of the interior surface of the first precursor source container with the first precursor source stored therein; and a deposition chamber in gas communication with the first precursor source container, the deposition chamber configured to receive the first precursor vapor and deposit a layer of a first precursor source onto a substrate placed in the deposition chamber.

Abstract: An integrated circuit design method includes receiving an integrated circuit design, and determining a floor plan for the integrated circuit design. The floor plan includes an arrangement of a plurality of functional cells and a plurality of tap cells. Potential latchup locations in the floor plan are determined, and the arrangement of at least one of the functional cells or the tap cells is modified based on the determined potential latchup locations.

Abstract: A correction method for a scatter signal caused by a wedge filter includes: S10: performing an air scan by using CT equipment, and calculating a relative intensity Wair of a scatter signal caused by a wedge filter in the air scan according to an air scan result, S20: performing an object scan on a plurality of experimental objects by using the CT equipment, and calculating theoretical scatter signal intensities Wtheo of the experimental objects in the object scan in combination with the result of S10, S30: fitting Wtheo of the experimental objects in the object scan and scatter signal intensity estimations Wact of the experimental objects in the object scan, and S40: correcting the scan results according to a difference between a scatter signal intensity estimation Wact of an actual object in the object scan and a theoretical scatter signal intensity Wtheo of the actual object in the object scan.

Abstract: A memory address generation device for a test mode comprises row and column address random number counters and a control unit. The row address random number counter receives a counting signal to update a first count value, generates a row address random number based on the first count value, and outputs a row address to the memory. The column address random number counter receives the counting signal to update a second count value, generates a column address random number based on the second count value, and outputs a column address to the memory. The control unit controls the test mode and sets the first/second count value. A difference value between the currently and previously generated row addresses is greater than or equal to 2, and a difference value between the currently and previously generated column addresses is greater than or equal to 2.

Abstract: A sputtering target structure includes a back plate characterized by a first size and a plurality of sub-targets bonded to the back plate. Each of the sub-targets is characterized by a size that is a fraction of the first size and is no greater than a threshold target size. A given sub-target characterized by a size no greater than the threshold target size exhibits no crack formation in a sputtering operation. Each of the plurality of sub-targets is in direct contact with one or more adjacent sub targets.

Abstract: A stylus pen including a pen unit, a switch, and a control unit is provided. The pen unit includes a tip, and a shaft connected to the tip. The control unit is switchable between a default mode and an alternative mode in response to operation on the switch. In the default mode, the control unit emits a default-mode wave of a default-mode frequency to the shaft. In the alternative mode, the control unit emits an alternative-mode wave to the shaft in a pulsating pattern. The pulsating pattern has a wave period that includes a working period where the control unit emits the alternative-mode wave of the default-mode frequency, and a non-working period where the control unit stops emitting the alternative-mode wave.

Abstract: Systems and methods for improving design performance of a layout design through placement of functional and spare cells by leveraging layout dependent effect (LDE) is disclosed. The method includes the steps of: importing a plurality of technology files associated with the layout design into an EDA system; importing a netlist associated with the layout design into the EDA system; importing a standard cell library containing pattern-S timing information of the functional cells and the spare cells; performing floorplan and spare cell insertion, wherein the spare cells are distributed uniformly across the floorplan; and conducting placement and optimization through re-placement of the at least one functional cells and the spare cells to form pattern-S with at least one timing critical cells to improve an overall timing performance of the layout design.

Abstract: An information handling system includes a storage and a processor. The storage stores a machine learning (ML) model. The processor receives first telemetry data associated with a second information handling system, and user survey data associated with the second information handling system. Based on the first telemetry data and the user survey data, the processor trains the ML model. The processor receives second telemetry data for the second information handling system. The processor executes the ML model to determine a composite score for the second information handling system.

Abstract: A stylus pen including a pen unit, a switch, and a control unit is provided. The pen unit includes a tip, and a shaft connected to the tip. The control unit is switchable between a default mode and an alternative mode in response to operation on the switch. In the default mode, the control unit emits a default-mode wave of a default-mode frequency to the shaft. In the alternative mode, the control unit emits an alternative-mode wave to the shaft in a pulsating pattern. The pulsating pattern has a wave period that includes a working period where the control unit emits the alternative-mode wave of the default-mode frequency, and a non-working period where the control unit stops emitting the alternative-mode wave.

Abstract: A system, method, and computer-readable medium for performing an information technology system monitoring and management operation. The information technology system monitoring and management operation includes: identifying IT asset data from a plurality IT asset data sources contained within an IT environment; extracting information from at least some of the IT asset information, the information being extracted via a named entity recognition model; analyzing the information extracted from the at least some of the IT asset information; and, provisioning an IT asset for the new user based upon the analyzing.

Abstract: The present disclosure generally provides an apparatus and method for gas diffuser support structure for a vacuum chamber. The gas diffuser support structure comprises a backing plate having a central bore, and a gas deflector having a length and a width unequal to the length coupled to the backing plate by a plurality of outward fasteners coupled to a plurality of outward threaded holes formed in the backing plate, in which a spacer is disposed between the backing plate and the gas deflector, and in which a length to width ratio of the gas deflector is about 0.1:1 to about 10:1.

Abstract: Embodiments described herein relate to a device including a substrate, a plurality of adjacent pixel-defining layer (PDL) structures disposed over the substrate, and a plurality of sub-pixels. Each sub-pixel includes adjacent first overhangs, adjacent second overhangs, an anode, a hole injection layer (HIL) material, an additional organic light emitting diode (OLED) material, and a cathode. Each first overhang is defined by a body structure disposed on and extending laterally past a base structure disposed on the PDL structure. Each second overhang is defined by a top structure disposed on and extending laterally past the body structure. The HIL material is disposed over and in contact with the anode and disposed under the adjacent first overhangs. The additional OLED material is disposed on the HIL material and extends under the first overhang.

Abstract: A core test method, for testing a processing circuit with multi cores, comprising: (a) testing defects of the cores to determine at least one failed core; (b) recording the failed core; (c) performing a performance test to all of the cores to generate performance data; and (d) filtering the performance data based on the failed core recorded in the step (b).

Abstract: Embodiments described herein relate to a device comprising a substrate, a pixel-defining layer (PDL) structures disposed over the substrate and defining sub-pixels of the device, and a plurality overhang structures. Each overhang structure is defined by a top structure extending laterally past a body structure. Each body structure is disposed over an upper surface of each PDL structure. Overhang structures define a plurality of sub-pixels including a first sub-pixel and a second sub-pixel. Each sub-pixel includes an anode, an organic light-emitting diode (OLED) material, a cathode, and an encapsulation layer. The OLED materials are disposed over the first anode and extends under the overhang structures. The cathodes are disposed over the OLED materials and under the overhang structures. The encapsulation layers are disposed over the first cathode. The first encapsulation layer has a first thickness and the second encapsulation layer has a second thickness different from the first thickness.

Abstract: A multi-bit flip-flop includes a first flip-flop and a second flip-flop. The first flip-flop has a first driving capability. The first flip-flop includes a first set pin configured to receive a first set signal. The second flip-flop has a second driving capability different from the first driving capability. The second flip-flop includes a second set pin configured to receive the first set signal, and the first set pin and the second set pin are coupled together. The first flip-flop and the second flip-flop are configured to share at least a first clock pin.

Abstract: A lithography exposure system includes a light source, a substrate stage, and a mask stage between the light source and the substrate stage along an optical path from the light source to the substrate stage. The lithography exposure system further comprises a reflector along the optical path. The reflector comprises: a first layer having a first material and a first thickness; a second layer having the first material and a second thickness different from the first thickness; and a third layer between the first layer and the second layer, and having a second material different from the first material.

Abstract: An integrated circuit includes a first region of the integrated circuit including a first set of pins extending in a first direction, being on a first level, and having a first width in a second direction different from the first direction. The first region has a first height in the second direction. An integrated circuit further includes a second region of the integrated circuit adjacent to the first region, the second region including a second set of pins extending in the first direction, being on a first level, being separated from the first set of pins in the second direction, and having a second width in the second direction, the first width being different from the second width. The second region has a second height in the second direction different from the first height, and the first level is a first metal layer of the integrated circuit.