Abstract: Embodiment of present invention provide a micro-optics module. The module includes a glass body of pentagon shape having five side surfaces including an upper side surface, a left side and a right side surface next to the upper side surface, a lower side surface next to the left side surface, and a 5th side surface next to and between the lower side surface and the right side surface. The glass body is adapted to, upon incident of a first optical signal at the left side surface, cause the first optical signal to propagate toward and exit the glass body at the right side surface and, upon incident of a second optical signal at the right side surface, cause the second optical signal to reflect back at the left side surface; reflect back at the 5th side surface; and finally exit the glass body at the upper side surface.

Abstract: The present invention discloses an image capture device and depth information calculation method thereof. The depth information calculation method includes: acquiring, a stereo camera module, an image information; and determining a re-projection mode according to a usage scenario, and transforming the image information to a depth information corresponding to the re-projection mode according to the re-projection mode. The re-projection mode is planar mode, cylinder mode or spherical mode, and the corresponding coordinate systems are planar coordinate system, cylinder coordinate system and spherical coordinate system respectively.

Abstract: Methods of identifying a hot spot from a design layout or of predicting whether a pattern in a design layout is defective, using a machine learning model. An example method disclosed herein includes obtaining sets of one or more characteristics of performance of hot spots, respectively, under a plurality of process conditions, respectively, in a device manufacturing process; determining, for each of the process conditions, for each of the hot spots, based on the one or more characteristics under that process condition, whether that hot spot is defective; obtaining a characteristic of each of the process conditions; obtaining a characteristic of each of the hot spots; and training a machine learning model using a training set including the characteristic of one of the process conditions, the characteristic of one of the hot spots, and whether that hot spot is defective under that process condition.

Abstract: A method of controlling a computer process for designing or verifying a photolithographic component, the method including building a source tree including nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, including generating a separate node for each different defined process condition, and duplicating dependent nodes having an input relationship to each generated separate node, determining respective computing hardware requirements for processing the node, selecting computer hardware constraints based on capabilities of the host computing system, determining, based on the requirements and constraints and on dependency relations in the expanded tree, an execution sequence for the computer process, and performing the computer process on the computing system.

Abstract: Methods of identifying a hot spot from a design layout or of predicting whether a pattern in a design layout is defective, using a machine learning model. An example method disclosed herein includes obtaining sets of one or more characteristics of performance of hot spots, respectively, under a plurality of process conditions, respectively, in a device manufacturing process; determining, for each of the process conditions, for each of the hot spots, based on the one or more characteristics under that process condition, whether that hot spot is defective; obtaining a characteristic of each of the process conditions; obtaining a characteristic of each of the hot spots; and training a machine learning model using a training set including the characteristic of one of the process conditions, the characteristic of one of the hot spots, and whether that hot spot is defective under that process condition.

Abstract: Disclosed is a gap-free epidemic-preventing partition board structure, which includes a transparent board, a plurality of arc surfaces, two lateral side edges, a flat form, and a plurality of arc surface transitions. The arc surfaces are arranged on a bottom portion of the transparent board. The arc surfaces gradually change in an upward direction into the flat form. The two lateral side edges are arranged on two opposite sides of the arc surfaces and are on the same plane as the flat form. The arc surfaces include the arc surface transitions. The arc surfaces, the flat form, the two lateral side edges, and arc surface transitions that make up the gap-free epidemic-preventing partition board structure are integrally formed together as a unitary structure. The bottom in the form of multiple arc surfaces helps increase a contact area with a tabletop for securely standing thereon to achieve separation for epidemic prevention.

Abstract: A method including: obtaining a thin-mask transmission function of a patterning device and a M3D model for a lithographic process, wherein the thin-mask transmission function is a continuous transmission mask (CTM) and the M3D model at least represents a portion of M3D attributable to multiple edges of structures on the patterning device; determining a M3D mask transmission function of the patterning device by using the thin-mask transmission function and the M3D model; and determining an aerial image produced by the patterning device and the lithographic process, by using the M3D mask transmission function.

Abstract: A method for recording data of a trip is implemented by a processor of a recording device and includes: in response to receipt of a location record, performing a trajectory analysis on the location record so as to determine, with respect to a plurality of point of interest (POI), whether each of the POIs has been visited; and generating a travel record that includes the location record and any POI that has been visited.

Abstract: A titration module includes a base, at least one titration unit, a contact angle measuring module, and a computing unit. The at least one titration unit is disposed above the base for titrating a globule onto a device under test. The contact angle measurement module is disposed above the base for measuring a first height and a first radius of the globule. The computing unit can calculate a second radius according to the first height and the first radius, and can calculate a contact angle of the globule according to the first height and the second radius. Also disclosed are a test apparatus, and a method for measuring titration contact angles.

Abstract: An optical element includes a waveguide substrate, first and second optical film structures, and a sub-wavelength nanostructure. The waveguide substrate has first and second sides, a light entering surface and a light exiting surface. An image beam can enter the interior of the waveguide substrate through the light entering surface and travel in a manner of total internal reflection. The image beam exits the waveguide substrate via the light exiting surface after one or more reflections. The first and second optical film structures are respectively arranged on the first and second sides. The sub-wavelength nanostructure arranged on the first side can receive and diffract the image beam to couple the image beam to the waveguide substrate. The first and second optical film structures can reflect the part of the image beam at the incident angle smaller than the critical angle of the waveguide substrate.

Abstract: A heat sink includes a heat conduction portion and a heat dissipation portion. The heat conduction portion is a flat plate with two main surfaces parallel with each other and a plurality of side surfaces. One of the two main surfaces is a contacting surface contacting a heat source. The heat dissipation portion is extended outward from at least one of the plurality of side surfaces of the heat conduction portion. The heat dissipation portion includes a plurality of first branches and a plurality of second branches. Each of the first branches is a flat plate and has two opposite main surfaces and four side surfaces. The two opposite main surfaces of each of the first branches are parallel to the two main surfaces of the heat conduction portion. The second branches are extended from the first branches and parallel to the heat conduction portion.

Abstract: A method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method including: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both.

Abstract: A receptacle connector with a metal housing encircling an insulative housing with a slot to receive a paddle card of a plug connector. The metal housing may have a tab engaging a wall of the insulative housing bounding the slot. The tab may be positioned such that, if a plug is improperly inserted into the receptacle, it presses against the tab. The tab may be configured to distribute force generated during an attempt to mate a misaligned plug away from thin wall portions of the insulative housing at an end of the slot. The tab may extend over a surface of the insulative housing beyond that thin wall portion and may be recessed into the housing.

Abstract: The present invention provides a semiconductor memory device and a fabricating method thereof. The semiconductor memory device includes a substrate, a plurality of capacitors and a supporting layer disposed on the substrate, wherein each of the capacitors is connected with at least one of the adjacent capacitors through the supporting layer. Each of the capacitors includes first electrodes, a high-k dielectric layer and a second electrode, and the high-k dielectric layer is disposed between the first electrodes and the second electrode. Due to the supporting layer directly contacts the high-k dielectric layer through a surface thereof, and the high-k dielectric layer completely covers the surface, the second electrode may be formed directly within openings with an enlarged dimension. Accordingly, the process difficulty of performing the deposition and etching processes within the openings may be reduced, and the capacitance of the capacitors is further increased.

Abstract: A method for training a patterning process model, the patterning process model configured to predict a pattern that will be formed by a patterning process. The method involves obtaining an image data associated with a desired pattern, a measured pattern of the substrate, a first model including a first set of parameters, and a machine learning model including a second set of parameters; and iteratively determining values of the first set of parameters and the second set of parameters to train the patterning process model. An iteration involves executing, using the image data, the first model and the machine learning model to cooperatively predict a printed pattern of the substrate; and modifying the values of the first set of parameters and the second set of parameters such that a difference between the measured pattern and the predicted pattern is reduced.

Abstract: A method of controlling a computer process for designing or verifying a photolithographic component includes building a source tree including nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, including generating a separate node for each different defined process condition, and duplicating dependent nodes having an input relationship to each generated separate node, determining respective computing hardware requirements for processing the node, selecting computer hardware constraints based on capabilities of the host computing system, determining, based on the requirements and constraints and on dependency relations in the expanded tree, an execution sequence for the computer process, and performing the computer process on the computing system.

Abstract: Embodiment of present invention provide a wavelength division multiplexing (WDM) module. The WDM module includes a substrate having a first side and a second side opposing the first side, wherein the first side includes a transpassing region coated with an anti-reflective (AR) film and a reflective region coated with a high-reflective (HR) film, and the second side includes multiple ports of optical paths; multiple WDM filters attached to the multiple ports at the second side of the substrate, wherein surfaces of the WDM filters attached to the substrate are coated with WDM films; and at least one reflector attached to the second side of the substrate in a space between the multiple WDM filters, wherein the reflector has a first surface attached to the substrate and a second surface, opposing the first surface, that has a convex shape and coated with a high-reflective (HR) coating.

Abstract: A method to determine a curvilinear pattern of a patterning device that includes obtaining (i) an initial image of the patterning device corresponding to a target pattern to be printed on a substrate subjected to a patterning process, and (ii) a process model configured to predict a pattern on the substrate from the initial image, generating, by a hardware computer system, an enhanced image from the initial image, generating, by the hardware computer system, a level set image using the enhanced image, and iteratively determining, by the hardware computer system, a curvilinear pattern for the patterning device based on the level set image, the process model, and a cost function, where the cost function (e.g., EPE) determines a difference between a predicted pattern and the target pattern, where the difference is iteratively reduced.

Abstract: A cross flow fan includes a fan frame and a rotor having a hub, a shaft connected with the hub at its rotation center, a plurality of blades, and a disk structure connected with the blades and hub within the fan frame. The fan frame has a frame wall having a lateral flow inlet to the rotor and a lateral flow outlet from the rotor, a base carrying the rotor and frame wall, a cover on one side of the frame wall opposite to the base, and a partition structure disposed between the blades and an inner wall surface of the frame wall. A normal line of the lateral flow inlet and a normal line of the lateral flow outlet are not parallel to an extension direction of the shaft. The blades directly face the lateral flow inlet and the lateral flow outlet along radial directions of the shaft.