Abstract: A method for forming a semiconductor device. The method includes performing a first etching process to define one or more fins and corresponding device isolation structures on a substrate. The method further includes forming an enhancement layer on each of the fins, such that the enhancement layer encapsulates each fin. The method further performs a second etching process to remove one or more of the fins, and performs a third etching process to remove a portion of the enhancement layer. The method also includes depositing an STI material on the fins and the device isolation structures, followed by recessing the fins relative to the STI material.

Abstract: An integrated circuit design method includes receiving an integrated circuit design, and determining a floor plan for the integrated circuit design. The floor plan includes an arrangement of a plurality of functional cells and a plurality of tap cells. Potential latchup locations in the floor plan are determined, and the arrangement of at least one of the functional cells or the tap cells is modified based on the determined potential latchup locations.

Abstract: A wireless transmission method includes obtaining an MCS (modulation and coding scheme) rate and a power amplifier gain of each station in a set of stations for a multi-user (MU) transmission, generating a maximum available MCS rate according to a plurality of MCS rates of the set of stations, selecting a power amplifier gain of the MU transmission according to the maximum available MCS rate, adjusting a digital gain of each station according to the power amplifier gain of the MU transmission and the power amplifier gain of each station, adjusting a frequency domain signal of each station according to the digital gain thereof, converting a plurality of adjusted frequency domain signals of the set of stations into a time domain signal, and generating an amplified signal for the MU transmission according to the power amplifier gain of the MU transmission and the time-domain signal.

Abstract: A package structure is provided. The package structure includes a substrate and a ground structure laterally surrounded by the substrate. The package structure also includes a chip-containing structure over the substrate and a protective lid attached to the substrate through a first adhesive element and a second adhesive element. The ground structure is electrically connected to the protective lid through the first adhesive element. The second adhesive element is closer to a corner edge of the substrate than the first adhesive element, and a portion of the second adhesive element is between the first adhesive element and the chip-containing structure.

Abstract: A semiconductor package is provided, which includes a first chip disposed over a first package substrate, a molding compound surrounding the first chip, a first thermal interface material disposed over the first chip and the molding compound, a heat spreader disposed over the thermal interface material, and a second thermal interface material disposed over the heat spreader. The first thermal interface material and the second thermal interface material have an identical width.

Abstract: A semiconductor device includes a substrate with a high voltage region and a low voltage region. A first deep trench isolation is disposed within the high voltage region. The first deep trench isolation includes a first deep trench and a first insulating layer filling the first deep trench. The first deep trench includes a first sidewall and a second sidewall facing the first sidewall. The first sidewall is formed by a first plane and a second plane. The edge of the first plane connects to the edge of the second plane. The slope of the first plane is different from the slope of the second plane.

Abstract: A semiconductor package includes a first die having a first substrate, an interconnect structure overlying the first substrate and having multiple metal layers with vias connecting the multiple metal layers, a seal ring structure overlying the first substrate and along a periphery of the first substrate, the seal ring structure having multiple metal layers with vias connecting the multiple metal layers, the seal ring structure having a topmost metal layer, the topmost metal layer being the metal layer of the seal ring structure that is furthest from the first substrate, the topmost metal layer of the seal ring structure having an inner metal structure and an outer metal structure, and a polymer layer over the seal ring structure, the polymer layer having an outermost edge that is over and aligned with a top surface of the outer metal structure of the seal ring structure.

Abstract: An optical device is provided. The optical device includes a first photonic component and a second photonic component. The first photonic component is configured to communicate with the second photonic component through a first optical path or an electrical path depending on a distance between the first photonic component and the second photonic component.

Abstract: A package structure is provided. The package structure includes a substrate and a chip-containing structure over the substrate. The package structure also includes a protective lid attached to the substrate through a first adhesive element and a second adhesive element. The first adhesive element has a first electrical resistivity, and the second adhesive element has a second electrical resistivity. The second electrical resistivity is greater than the first electrical resistivity. The second adhesive element is closer to a corner edge of the substrate than the first adhesive element, and a portion of the second adhesive element is between the first adhesive element and the chip-containing structure.

Abstract: An artificial leather and a method for manufacturing the artificial leather are provided. The artificial leather includes a fabric layer, a thermoplastic polyolefin layer, a modified thermoplastic polyolefin layer, and a polyurethane surface layer. The thermoplastic polyolefin layer is disposed on the fabric layer. The modified thermoplastic polyolefin layer is disposed on the thermoplastic polyolefin layer. The polyurethane surface layer is attached to the modified thermoplastic polyolefin layer through an adhesive.

Abstract: A package structure includes a package substrate, a semiconductor die module on the package substrate, a ring structure on the package substrate adjacent to the semiconductor die module, and a hybrid adhesive having a first modulus and a second modulus less than the first modulus and attaching the ring structure to the package substrate.

Abstract: A resistive memory device includes a bottom electrode, a top electrode and a resistance changing element. The top electrode is disposed above and spaced apart from the bottom electrode, and has a downward protrusion aligned with the bottom electrode. The resistance changing element covers side and bottom surfaces of the downward protrusion.

Abstract: A wireless communication method for optimizing uplink transmission from a communication partner to a wireless communication device includes the following steps: after receiving an uplink performance estimation, determining uplink adjustment information including resource unit allocation and a target received signal strength indicator according to the uplink performance estimation; generating a target channel quality indicator (CQI) according to previous uplink sounding information and the uplink adjustment information, wherein the previous uplink sounding information indicates the characteristics of the uplink transmission; determining uplink transmission setting including a modulation and coding scheme and dual carrier modulation according to the target CQI and the type of an error correction technique and transmitting a control signal to a communication partner according to the uplink transmission setting; and updating the uplink performance estimation according to a reception signal from the communication

Abstract: A probe head structure is provided. The probe head structure includes a flexible substrate having a top surface and a bottom surface. The probe head structure includes a first probe pillar passing through the flexible substrate. The probe head structure includes a redistribution structure on the top surface of the flexible substrate and the first probe pillar. The probe head structure includes a wiring substrate over the redistribution structure. The probe head structure includes a first conductive bump connected between the wiring substrate and the redistribution structure.

Abstract: An embodiment semiconductor package structure may include a package substrate, a semiconductor die coupled to the package substrate, and a package lid attached to the package substrate and covering the semiconductor die. The package lid may include a top portion having a spatially varying thermal conductivity that is greater in a first region than in a second region. The first region may include a multi-layer structure including a metal/diamond composite material supported by a copper layer. The metal/diamond composite material may include a silver/diamond, copper/diamond, or aluminum/diamond material and may have a thermal conductivity that is within a range from 600 W/m·K to 900 W/m·K and a coefficient of thermal expansion that is in a second range from 5 ppm/° C. to 10 ppm/° C. The package lid may have an effective coefficient of thermal expansion that is in a range from 14.5 ppm/° C. to 17 ppm/° C.

Abstract: A neutron measuring method is provided. The method includes utilizing the thermoluminescent crystal in the thermoluminescent dosimeter to convert the ionizing radiation emitted by an activated metallic body into scintillation light. The method further includes using a photodetector to measure the intensity of the scintillation light. The method further includes calculating the activity of the metallic body based on the intensity of the scintillation light and the second conversion factor. The method further includes using the second conversion formula to calculate the neutron intensity at the location of the metallic body based on the calculated activity of the metallic body.

Abstract: The present disclosure is relates to a conductive film and a manufacturing method thereof. The conductive film includes a base layer, a TPU complex layer, a conductive layer and a TPU surface layer. The TPU complex layer includes a TPU heat-resistant layer and a TPU melting layer. The TPU heat-resistant layer is disposed on the TPU melting layer, and the TPU melting layer is disposed on the base layer. The conductive layer includes a conductive circuit disposed on the TPU heat-resistant layer. The TPU surface layer is disposed on the conductive layer. Utilizing the TPU complex layer, the conductive layer does not contact directly with the base layer to avoid breaking the conductive line of the conductive layer when the base layer is pulled. Therefore, the lifetime of the conductive film can be increased.

Abstract: A resistive memory device includes a bottom electrode, a top electrode and a resistance changing element. The top electrode is disposed above and spaced apart from the bottom electrode, and has a downward protrusion aligned with the bottom electrode. The resistance changing element covers side and bottom surfaces of the downward protrusion.

Abstract: A method of inspecting flatness of substrate is provided and includes providing a substrate. N first inspecting points are selected from the surface of the substrate along a first straight line, where the coordinate of the i-th first inspecting point is (Xi,Yi,Zi). By using a formula “ D = ? i = 1 N - 1 ? ( X i + 1 - X i ) 2 + ( Y i + 1 - Y i ) 2 + ( Z i + 1 - Z i ) 2 ” , a first measurement length D is calculated. By using a formula “F=(D?S)/S”, a first flatness index F is calculated. S is the horizontal distance between 1st first inspecting point and N-th first inspecting point. When the first flatness index F is larger than a first threshold, the substrate is determined to be unqualified.

Abstract: A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.