Patents by Inventor Xi Wang

Xi Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190024253
    Abstract: The present invention relates to applying at least one ultra/mega sonic device and its reflection plate for forming standing wave in a metallization apparatus to achieve highly uniform metallic film deposition at a rate far greater than conventional film growth rate in electrolyte. In the present invention, the substrate is dynamically controlled so that the position of the substrate passing through the entire acoustic field with different power intensity in each motion cycle. This method guarantees each location of the substrate to receive the same amount of total sonic energy dose over the interval of the process time, and to accumulatively grow a uniform deposition thickness at a rapid rate.
    Type: Application
    Filed: September 26, 2018
    Publication date: January 24, 2019
    Applicant: ACM Research (Shanghai) Inc.
    Inventors: Hui Wang, Fuping Chen, Xi Wang
  • Patent number: 10182101
    Abstract: A webpage sharing method, an apparatus and a system are disclosed, the method includes: acquiring, by a device with memory and at least one processor, a webpage sharing instruction, acquiring an terminal identification (ID) corresponding to a terminal according to the webpage sharing instruction, acquiring a webpage identifier that identifies at least a portion of the webpage, and transmitting the webpage identifier to an event monitoring process that is associated with a web browser in the terminal corresponding to the ID. The above page sharing method, apparatus and system enable a user to operate without need to additionally open an instant messaging tool so as to avoid extra memory usage, increase memory utilization and improve the running speed of a mobile device.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: January 15, 2019
    Assignee: Tencent Technology (Shenzhen) Company Limited
    Inventors: Cheng Feng, Tingyong Tang, Zhipei Wang, Hao Tang, Xi Wang, Kai Zhang, Xin Qing, Sirui Liu, Huijao Yang, Ying Huang, Yulei Liu, Wei Li, Bo Hu, Ruiyi Zhou, Lei Guan, Bosen He, Ning Ma, Yang Li, Yingge Li, Lei Zheng
  • Patent number: 10180949
    Abstract: The present invention provides a method and an apparatus for information searching. The method includes: displaying a shooting interface for image search, and displaying guide information in the shooting interface; obtaining an image shot according to the guide information; and obtaining a search result according to the image shot and displaying the search result. With the present method for information searching, an accuracy rate of the image search may be improved, and requirements of a user may be better satisfied.
    Type: Grant
    Filed: December 15, 2015
    Date of Patent: January 15, 2019
    Assignee: BAIDU ONLINE NETWORK TECHNOLOGY (BEIJING) CO., LTD.
    Inventors: Zhen Wang, Na Zhang, Kai Chen, Wenbo Yang, Xi Wang
  • Publication number: 20190012812
    Abstract: A method of calibrating time in a Positron Emission Tomography (PET) device includes obtaining original time information and energy information of a first pulse signal collected by a detecting module during a scanning process of the PET device. A detector of the PET device includes a plurality of detecting modules. The original time information of the first pulse signal includes a moment at which an amplitude of the first pulse signal begins to be greater than a threshold. The method includes determining a pulse time calibration amount corresponding to the energy information of the first pulse signal according to stored information indicative of a correspondence between the pulse time calibration amount and the energy information of each detecting module. The method includes generating calibrated time information of the first pulse signal by calibrating the original time information with the pulse time calibration amount; and reconstructing a PET image based on the generated calibrated time information.
    Type: Application
    Filed: June 26, 2018
    Publication date: January 10, 2019
    Inventors: Xi WANG, Jian ZHAO, Guocheng WU, Baowei XU, Guodong LIANG
  • Publication number: 20190002542
    Abstract: The present invention provides for a one-pot enzymatic approach which does not require removal of the enzyme and purification of the intermediate after deglycosylation step, and the Endo-S treatment is able to do both deglycosylation and transglycosylation. The one-pot strategy of the present invention enables chemoenzymatic synthesis of an azido-tagged N-glycoform of monocloncal antibodies which could be further modified through orthogonal chemical ligation for various applications.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 3, 2019
    Inventors: LAI-XI WANG, XIN TONG, TIEZHENG LI
  • Publication number: 20190002945
    Abstract: The present invention provides for recombinant Endo-S mutants (named Endo-S glycosynthases) that exhibit reduced hydrolysis activity and increased transglycosylation activity for the synthesis of glycoproteins wherein a desired sugar chain is added to a fucosylated or nonfucosylated GlcNAc-IgG acceptor. As such, the present invention allows for the synthesis and remodeling of therapeutic antibodies thereby providing for certain biological activities, such as, prolonged half-life time in vivo, less immunogenicity, enhanced in vivo activity, increased targeting ability, and/or ability to deliver a therapeutic agent.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 3, 2019
    Inventors: LAI-XI WANG, XIN TONG, TIEZHENG LI
  • Publication number: 20180372890
    Abstract: A method of calibrating time in a Positron Emission Computed Tomography (PET) device includes determining a rising edge slope of an electrical signal corresponding to a photon which is detected by a detector of the PET device when the PET device is used to scan a part of a subject to be examined. The method includes determining a time shift corresponding to the rising edge slope based on a correspondence between the rising edge slope and the time shift; calibrating time information of the photon based on the time shift; and reconstructing a PET image of the part of the subject to be examined based on the calibrated time information of the photon.
    Type: Application
    Filed: June 26, 2018
    Publication date: December 27, 2018
    Inventors: Jian ZHAO, Guocheng WU, Xi WANG, Baowei XU, Guodong LIANG, Nan LI
  • Patent number: 10162068
    Abstract: A method of calibrating time in a Positron Emission Computed Tomography (PET) device includes determining a rising edge slope of an electrical signal corresponding to a photon which is detected by a detector of the PET device when the PET device is used to scan a part of a subject to be examined. The method includes determining a time shift corresponding to the rising edge slope based on a correspondence between the rising edge slope and the time shift; calibrating time information of the photon based on the time shift; and reconstructing a PET image of the part of the subject to be examined based on the calibrated time information of the photon.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: December 25, 2018
    Assignee: Shenyang Neusoft Medical Systems Co., Ltd.
    Inventors: Jian Zhao, Guocheng Wu, Xi Wang, Baowei Xu, Guodong Liang, Nan Li
  • Publication number: 20180353876
    Abstract: The present invention provides a high temperature chemical solution supply system for cleaning substrates. The system includes a solution tank, a buffer tank, a first pump and a second pump. The solution tank contains high temperature chemical solution. The buffer tank has a tank body, a vent line and a needle valve. The tank body contains the high temperature chemical solution. An end of the vent line connects to the tank body, and the other end of the vent line connects to the solution tank. The needle valve is mounted on the vent line, wherein the needle valve is adjusted to reach a flow rate to vent gas bubbles inside of the high temperature chemical solution out of the buffer tank through the vent line. An inlet of the first pump connects to the solution tank, and an outlet of the first pump connects to the buffer tank. An inlet of the second pump connects to the buffer tank, and an outlet of the second pump connects to a cleaning chamber in which a substrate is cleaned.
    Type: Application
    Filed: December 9, 2015
    Publication date: December 13, 2018
    Applicant: ACM Research (Shanghai) Inc.
    Inventors: Fuping Chen, Hui Wang, Xi Wang, Shena Jia, Danying Wang, Chaowei Jiang, Yingwei Dai, Jian Wang
  • Patent number: 10148552
    Abstract: Methods and systems are provided for determining a shortest path with a constraint in an optical network. The method includes identifying a permitted number of events defined by the constraint. The method further includes creating virtual nodes for each node in the optical network, the virtual nodes corresponding with the permitted number of events. The method also includes traversing the virtual nodes from a source node to a destination node with a shortest path algorithm, wherein traversing the virtual nodes comprises creating virtual links between the virtual nodes when the constraint is not violated, the virtual link corresponding with a physical link; and identifying a shortest path between the source node and the destination node from the virtual links, the shortest path not violating the constraint.
    Type: Grant
    Filed: May 31, 2016
    Date of Patent: December 4, 2018
    Assignee: FUJITSU LIMITED
    Inventors: Inwoong Kim, Xi Wang, Qiong Zhang, Paparao Palacharla, Tadashi Ikeuchi
  • Patent number: 10141205
    Abstract: An apparatus and method for cleaning semiconductor wafer are provided. The apparatus includes a brush module, a swing arm, a rotating actuator and an elevating actuator. The brush module has a brush head for providing mechanical force on a surface of a wafer. An end of the swing arm mounts the brush module. The rotating actuator is connected with the other end of the swing arm. The rotating actuator drives the swing arm to swing across the whole surface of the wafer, which brings the brush head moving across the whole surface of the wafer. The elevating actuator is connected with the other end of the swing arm. The elevating actuator drives the swing arm to rise or descend, which brings the brush module rising or descending. The apparatus cleans the semi-conductor wafer by means of the brush head, which improves the cleaning effect.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: November 27, 2018
    Assignee: ACM Research (Shanghai) Inc.
    Inventors: Xi Wang, Cheng Cheng, Jun Wu, Hui Wang
  • Patent number: 10140265
    Abstract: A method for phone number processing may comprise providing a terminal device including a processor operating a browser to a user. The processor my conduct the acts of opening a web page on the browser, wherein the web page includes an unclickable text content; detecting a string from the text content when the user selects the text content; and displaying a phone number processing interface on the web page when the string is a valid phone number.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: November 27, 2018
    Assignee: TENCENT TECHNOLOGY (SHENZHEN) CO., LTD.
    Inventors: Yingge Li, Tingyong Tang, Zhipei Wang, Hao Tang, Xi Wang, Kai Zhang, Xin Qing, Sirui Liu, Huijiao Yang, Ying Huang, Yulei Liu, Wei Li, Cheng Feng, Bo Hu, Ruiyi Zhou, Lei Guan, Bosen He, Ning Ma, Yang Li
  • Publication number: 20180327894
    Abstract: A phase-transition type vanadium oxide material and a preparation method therefor. The preparation method includes the following steps: providing a vanadium oxide base material, and implanting gaseous ions into the vanadium oxide base material, to obtain a phase-transition type vanadium oxide material having a preset phase-transition temperature. Subsequently, optionally, further annealing may be performed to adjust a bubble generation status in vanadium oxide after the gaseous ions are implanted, to further adjust the stress and strain and the phase-transition temperature. The method for preparing a phase-transition type vanadium oxide material consistent with the present invention has simple steps, desirable process reproducibility, high flexibility, and the phase-transition temperature of vanadium oxide can be continuously adjusted by changing an implantation dosage of the gaseous ions.
    Type: Application
    Filed: January 6, 2016
    Publication date: November 15, 2018
    Applicant: SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADEMY OF SCIENCES
    Inventors: XIN OU, QI JIA, KAI HUANG, XI WANG
  • Publication number: 20180330964
    Abstract: The present disclosure provides an annealing method for improving interface bonding strength of a wafer. The method includes: providing a substrate, the substrate having a bonding interface; performing a first annealing step, wherein the first annealing step is practiced in an oxygen-containing atmosphere, and an oxidation protection layer is formed on a surface of the substrate through the annealing step; and performing a second annealing step upon the first annealing step, wherein a temperature of the second annealing step is higher than that of the first annealing step, and the second annealing step is practiced in a nitrogen-free environment.
    Type: Application
    Filed: February 27, 2018
    Publication date: November 15, 2018
    Applicant: Shanghai Simgui Tehcnology Co., Ltd.
    Inventors: Xing WEI, Yongwei CHANG, Meng CHEN, Guoxing CHEN, Lu FEI, Xi WANG
  • Publication number: 20180326726
    Abstract: The present invention relates to devices and methods for coating surfaces including surfaces of medical devices, in particular the coating of microprojections on microprojection arrays. The present invention also relates to print head devices and their manufacture and to methods of using the print head devices for manufacturing articles such as microprojection arrays as well as to coating the surfaces of microprojection arrays. The present invention also relates to high throughput printing devices that utilize the print heads of the present invention.
    Type: Application
    Filed: April 2, 2018
    Publication date: November 15, 2018
    Inventors: Xi WANG, Michael Carl JUNGER, Sasikaran KANDASAMY, Neil HARRIS, Christopher FLAIM
  • Publication number: 20180315366
    Abstract: The embodiments of the disclosure provide a source drive IC, a display device and a drive method therefor. The source drive IC comprises: a control selection module, a solid color grayscale control module and a non-solid color grayscale control module. The control selection module may be configured to receive a timing control signal inputted by a timing controller, and determine according thereto whether a current drive image is a solid color grayscale image, in response to determining that the current drive image is a solid color grayscale image, send the timing control signal to the solid color grayscale control module, and in response to determining that the current drive image is a non-solid color grayscale image, send the timing control signal to the non-solid color grayscale control module. The non-solid color grayscale control module may, according to the received timing control signal, obtain multiple sets of data voltages.
    Type: Application
    Filed: December 15, 2017
    Publication date: November 1, 2018
    Inventors: Dongwang JIA, Xi WANG, Xinghua LI, Junping BAO
  • Patent number: 10113244
    Abstract: The present invention relates to applying at least one ultra/mega sonic device and its reflection plate for forming standing wave in a metallization apparatus to achieve highly uniform metallic film deposition at a rate far greater than conventional film growth rate in electrolyte. In the present invention, the substrate is dynamically controlled so that the position of the substrate passing through the entire acoustic field with different power intensity in each motion cycle. This method guarantees each location of the substrate to receive the same amount of total sonic energy dose over the interval of the process time, and to accumulatively grow a uniform deposition thickness at a rapid rate.
    Type: Grant
    Filed: April 22, 2013
    Date of Patent: October 30, 2018
    Assignee: ACM Research (Shanghai) Inc.
    Inventors: Hui Wang, Fuping Chen, Xi Wang
  • Patent number: 10114490
    Abstract: The present disclosure provides a color filter substrate, a method of manufacturing the color filter substrate, a touch screen and a display device, and pertains to the technical field of touch screen. The color filter substrate includes a transparent substrate, and a touch screen panel pattern provided on a side of the transparent substrate. A surface of the touch screen panel pattern is provided with a plurality of concave curved faces.
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: October 30, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Xi Wang
  • Publication number: 20180308729
    Abstract: The substrate can be selectively transferred by a vacuum or edge grip method according to the process characteristics, using a single substrate transfer robot equipped in the front end module. Additionally, after the process, the substrate can be loaded using the buffer chamber, for the cooling process and transfer of the substrate.
    Type: Application
    Filed: May 27, 2016
    Publication date: October 25, 2018
    Inventors: Dai Kyu CHOI, Hui WANG, Xi WANG, Xiaoyan ZHANG, Shena JIA
  • Publication number: 20180294179
    Abstract: The present invention provides an apparatus for substrate bevel and backside protection. The apparatus includes a vacuum chuck (103), a protecting apparatus, a gas supplying apparatus (114), a spin actuator (115) and a vertical actuator (113). The vacuum chuck (103) holds and positions a substrate. The protecting apparatus has s base portion and a supporting portion (104). The supporting portion (104) is set close to the substrate (101). The supporting portion (104) has a plurality of injecting ports (107) for delivering gas to the gap (105) and a plurality of releasing ports (108) for releasing the gas out of the gap (105). The base portion has a plurality of gas lines (111) and each gas line (111) is connected to one injecting port (107). The gas supplying apparatus (114) supplies the gas to the gas lines (111) of the protecting apparatus.
    Type: Application
    Filed: May 14, 2015
    Publication date: October 11, 2018
    Applicant: ACM Research (Shanghai) Inc.
    Inventors: Xi Wang, Hui Wang