Patents by Inventor Yen-Hung Lin

Yen-Hung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230253477
    Abstract: A semiconductor structure includes a substrate; a first column of active regions over the substrate; a second column of active regions over the substrate; and a dummy padding disposed between the first and the second columns from a top view. The dummy padding includes multiple dummy regions. A first dummy region of the multiple dummy regions is disposed between a first active region in the first column of active regions and a second active region in the second column of active regions. An outer boundary line tracing an edge of the first active region, an edge of the first dummy region, and an edge of the second active region includes at least two substantially 90-degree bends from a top view. The first and the second active regions include a semiconductor material doped with a same dopant.
    Type: Application
    Filed: May 20, 2022
    Publication date: August 10, 2023
    Inventors: Sheng-Hsiung Wang, Chun-Yen Lin, Yen-Hung Lin, Yuan-Te Hou, Tung-Heng Hsieh
  • Publication number: 20230195991
    Abstract: A semiconductor device includes: M*1st conductors in a first layer of metallization (M*1st layer) and being aligned correspondingly along different corresponding ones of alpha tracks and representing corresponding inputs of a cell region in the semiconductor device; and M*2nd conductors in a second layer of metallization (M*2nd layer) aligned correspondingly along beta tracks, and the M*2nd conductors including at least one power grid (PG) segment and one or more of an output pin or a routing segment; and each of first and second ones of the input pins having a length sufficient to accommodate at most two access points; each of the access points of the first and second input pins being aligned to a corresponding different one of first to fourth beta tracks; and the PG segment being aligned with one of the first to fourth beta tracks.
    Type: Application
    Filed: February 7, 2023
    Publication date: June 22, 2023
    Inventors: Pin-Dai SUE, Po-Hsiang HUANG, Fong-Yuan CHANG, Chi-Yu LU, Sheng-Hsiung CHEN, Chin-Chou LIU, Lee-Chung LU, Yen-Hung LIN, Li-Chun TIEN, Yi-Kan CHENG
  • Patent number: 11663392
    Abstract: A method for cell swapping is provided. A location for swapping a first cell is determined. One or more legal positions for cell placement are determined at the location. A plurality of cells is determined for of the plurality of legal positions. A second cell from the plurality of cells is determined based on timing information associated with each of the plurality. The first cell is swapped with the second cell.
    Type: Grant
    Filed: April 12, 2021
    Date of Patent: May 30, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Yen-Hung Lin
  • Publication number: 20230153507
    Abstract: A partitioning method for partitioning a group of power-ground (PG) cells is disclosed. The method includes: placing at least one out-boundary PG cell on a substrate, wherein power strips of the at least one out-boundary PG cell are aligned with corresponding power rails on the substrate; and placing at least one in-boundary PG cell on the substrate, wherein power strips of the at least one in-boundary PG cell are aligned with corresponding power rails on the substrate.
    Type: Application
    Filed: January 13, 2023
    Publication date: May 18, 2023
    Inventors: Yen-Hung Lin, Yuan-Te Hou, Chung-Hsing Wang
  • Patent number: 11574107
    Abstract: A method of manufacturing a semiconductor device includes forming a transistor layer with an M*1st layer that overlays the transistor layer with one or more first conductors that extend in a first direction. Forming an M*2nd layer that overlays the M*1st layer with one or more second conductors which extend in a second direction. Forming a first pin in the M*2nd layer representing an output pin of a cell region. Forming a long axis of the first pin substantially along a selected one of the one or more second conductors. Forming a majority of the total number of pins in the M*1st layer, the forming including: forming second, third, fourth and fifth pins in the M*1st layer representing corresponding input pins of the circuit; and forming long axes of the second to fifth pins substantially along corresponding ones of the one or more first conductors.
    Type: Grant
    Filed: June 4, 2021
    Date of Patent: February 7, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Pin-Dai Sue, Po-Hsiang Huang, Fong-Yuan Chang, Chi-Yu Lu, Sheng-Hsiung Chen, Chin-Chou Liu, Lee-Chung Lu, Yen-Hung Lin, Li-Chun Tien, Yi-Kan Cheng
  • Patent number: 11574106
    Abstract: A method includes: accessing a design data of an integrated circuit (IC), wherein the design data includes a transistor layer and a plurality of metal layers over the transistor layer; assigning a bin size for each of the metal layers based on layout properties of the respective metal layers, wherein a bin size of a higher larger of the metal layers has a greater bin size than that of a lower layer of the metal layers; performing resource planning on the transistor layer and each of the metal layers according to the assigned bin sizes of the respective metal layers; and updating the design data according to the resource planning. At least one of the accessing, assigning, performing and updating steps is conducted by at least one processor.
    Type: Grant
    Filed: March 5, 2021
    Date of Patent: February 7, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
  • Patent number: 11574108
    Abstract: A partitioning method for partitioning a group of power-ground (PG) cells is disclosed. The method includes: placing at least one out-boundary PG cell on a substrate, wherein power strips of the at least one out-boundary PG cell are aligned with corresponding power rails on the substrate; and placing at least one in-boundary PG cell on the substrate, wherein power strips of the at least one in-boundary PG cell are aligned with corresponding power rails on the substrate.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: February 7, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Hung Lin, Yuan-Te Hou, Chung-Hsing Wang
  • Patent number: 11507246
    Abstract: The disclosure provides a method for dynamically showing a virtual boundary, an electronic device and a computer readable storage medium thereof. The method includes: obtaining a virtual scene boundary of a virtual reality (VR) environment; determining a distance threshold based on a moving speed of a specific element of a VR system, wherein the specific distance threshold is positively related to the moving speed of the specific element; monitoring a specific distance between the specific element and the virtual scene boundary of the VR environment; in response to determining that the specific distance is smaller than the distance threshold, showing the virtual scene boundary of the VR environment.
    Type: Grant
    Filed: October 7, 2020
    Date of Patent: November 22, 2022
    Assignee: HTC Corporation
    Inventors: Yen-Hung Lin, Ying-Jing Wang
  • Publication number: 20220310929
    Abstract: The invention relates to an optoelectronic device comprising: (a) a layer comprising a crystalline A/M/X material, wherein the crystalline A/M/X material comprises a compound of formula: [A]a[M]b[X]c wherein: [A] comprises one or more A cations; [M] comprises one or more M cations which are metal or metalloid cations; [X] comprises one or more X anions; a is a number from 1 to 6; b is a number from 1 to 6; and c is a number from 1 to 18; and (b) an ionic solid which is a salt comprising an organic cation and a counter anion. The invention also provides various processes for producing an ionic solid-modified film of the crystalline A/M/X material.
    Type: Application
    Filed: May 28, 2020
    Publication date: September 29, 2022
    Inventors: HENRY JAMES SNAITH, YEN-HUNG LIN
  • Publication number: 20220107722
    Abstract: The disclosure provides a method for dynamically showing a virtual boundary, an electronic device and a computer readable storage medium thereof. The method includes: obtaining a virtual scene boundary of a virtual reality (VR) environment; determining a distance threshold based on a moving speed of a specific element of a VR system, wherein the specific distance threshold is positively related to the moving speed of the specific element; monitoring a specific distance between the specific element and the virtual scene boundary of the VR environment; in response to determining that the specific distance is smaller than the distance threshold, showing the virtual scene boundary of the VR environment.
    Type: Application
    Filed: October 7, 2020
    Publication date: April 7, 2022
    Applicant: HTC Corporation
    Inventors: Yen-Hung Lin, Ying-Jing Wang
  • Patent number: 11182527
    Abstract: The present disclosure describes an example method for cell placement in an integrated circuit (IC) layout design. The method includes partitioning a layout area into one or more contiguous units, where each unit includes a plurality of placement sites. The method also includes mapping a first set of pin locations and a second set of pin locations to each of the one or more contiguous units. The method further includes placing a cell in the one or more contiguous units, where the cell is retrieved from a cell library that includes a plurality of pin locations for the cell. The placement of the cell is based on an allocation of one or more pins associated with the cell to at least one of a pin track from the first plurality of pin locations, a pin track from second plurality of pin locations, or a combination thereof.
    Type: Grant
    Filed: April 1, 2020
    Date of Patent: November 23, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
  • Patent number: 11176303
    Abstract: The present disclosure describes an example method for cell placement in an integrated circuit layout design. The method includes retrieving, from a cell library, first and second cells each including a first local metal track proximate to a top boundary and a second local metal track proximate to a bottom boundary. The method includes placing, by a processor, the first and second cells in a layout area including global metal tracks of first and second types. Each global metal track of the first type and each global metal tracks of the second type alternate between one another in the layout area. The first and second local metal tracks of the first cell is aligned with adjacent first global metal track of the first and second types, respectively. The first and second local metal tracks of the second cell is aligned with adjacent second global metal track of the first and second types, respectively.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: November 16, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
  • Publication number: 20210326509
    Abstract: A partitioning method for partitioning a group of power-ground (PG) cells is disclosed. The method includes: placing at least one out-boundary PG cell on a substrate, wherein power strips of the at least one out-boundary PG cell are aligned with corresponding power rails on the substrate; and placing at least one in-boundary PG cell on the substrate, wherein power strips of the at least one in-boundary PG cell are aligned with corresponding power rails on the substrate.
    Type: Application
    Filed: June 30, 2021
    Publication date: October 21, 2021
    Inventors: Yen-Hung LIN, Yuan-Te Hou, Chung-Hsing Wang
  • Publication number: 20210294957
    Abstract: A method of manufacturing a semiconductor device includes forming a transistor layer with an M*1st layer that overlays the transistor layer with one or more first conductors that extend in a first direction. Forming an M*2nd layer that overlays the M*1st layer with one or more second conductors which extend in a second direction. Forming a first pin in the M*2nd layer representing an output pin of a cell region. Forming a long axis of the first pin substantially along a selected one of the one or more second conductors. Forming a majority of the total number of pins in the M*1st layer, the forming including: forming second, third, fourth and fifth pins in the M*1st layer representing corresponding input pins of the circuit; and forming long axes of the second to fifth pins substantially along corresponding ones of the one or more first conductors.
    Type: Application
    Filed: June 4, 2021
    Publication date: September 23, 2021
    Inventors: Pin-Dai SUE, Po-Hsiang HUANG, Fong-Yuan CHANG, Chi-Yu LU, Sheng-Hsiung CHEN, Chin-Chou LIU, Lee-Chung LU, Yen-Hung LIN, Li-Chun TIEN, Yi-Kan CHENG
  • Publication number: 20210232749
    Abstract: A method for cell swapping is provided. A location for swapping a first cell is determined. One or more legal positions for cell placement are determined at the location. A plurality of cells is determined for of the plurality of legal positions. A second cell from the plurality of cells is determined based on timing information associated with each of the plurality. The first cell is swapped with the second cell.
    Type: Application
    Filed: April 12, 2021
    Publication date: July 29, 2021
    Inventor: YEN-HUNG LIN
  • Patent number: 11055466
    Abstract: A partitioning method for partitioning a group of power-ground (PG) cells is disclosed. The method includes: placing at least one out-boundary PG cell on a substrate, wherein power strips of the at least one out-boundary PG cell are aligned with corresponding power rails on the substrate; and placing at least one in-boundary PG cell on the substrate, wherein power strips of the at least one in-boundary PG cell are aligned with corresponding power rails on the substrate.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: July 6, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Hung Lin, Yuan-Te Hou, Chung-Hsing Wang
  • Publication number: 20210192117
    Abstract: A method includes: accessing a design data of an integrated circuit (IC), wherein the design data includes a transistor layer and a plurality of metal layers over the transistor layer; assigning a bin size for each of the metal layers based on layout properties of the respective metal layers, wherein a bin size of a higher larger of the metal layers has a greater bin size than that of a lower layer of the metal layers; performing resource planning on the transistor layer and each of the metal layers according to the assigned bin sizes of the respective metal layers; and updating the design data according to the resource planning. At least one of the accessing, assigning, performing and updating steps is conducted by at least one processor.
    Type: Application
    Filed: March 5, 2021
    Publication date: June 24, 2021
    Inventors: YEN-HUNG LIN, CHUNG-HSING WANG, YUAN-TE HOU
  • Patent number: D942744
    Type: Grant
    Filed: June 1, 2020
    Date of Patent: February 8, 2022
    Assignee: ROTHY'S, INC.
    Inventors: Yen-Hung Lin, La Vion Gibson, William Roth Martin
  • Patent number: D958510
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: July 26, 2022
    Assignee: ROTHY'S, INC.
    Inventors: William Roth Martin, La Vion Gibson, Erin D. Lowenberg, Yen-Hung Lin
  • Patent number: D988647
    Type: Grant
    Filed: September 16, 2020
    Date of Patent: June 13, 2023
    Assignee: ROTHY'S, INC.
    Inventors: William Roth Martin, La Vion Gibson, Erin D. Lowenberg, Yen-Hung Lin