Patents by Inventor Yen-Hung Lin
Yen-Hung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200082046Abstract: The present disclosure describes an example method for cell placement in an integrated circuit layout design. The method includes retrieving, from a cell library, first and second cells each including a first local metal track proximate to a top boundary and a second local metal track proximate to a bottom boundary. The method includes placing, by a processor, the first and second cells in a layout area including global metal tracks of first and second types. Each global metal track of the first type and each global metal tracks of the second type alternate between one another in the layout area. The first and second local metal tracks of the first cell is aligned with adjacent first global metal track of the first and second types, respectively. The first and second local metal tracks of the second cell is aligned with adjacent second global metal track of the first and second types, respectively.Type: ApplicationFiled: November 18, 2019Publication date: March 12, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
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Publication number: 20200074038Abstract: A method includes assigning a first color group to a first routing track of the layout. The method further includes assigning a second color group to a second routing track of the layout. The method includes assigning the first color group to a third routing track of the layout, wherein the second routing track is between the first routing track and the third routing track. The method further includes assigning a first color from the first color group to a first conductive element along the first routing track. The method further includes assigning a second color from the first color group to a second conductive element along the first routing track. The method further includes assigning a third color from the second color group to a third conductive element on the second routing track, wherein the third color is different from each of the first color and the second color.Type: ApplicationFiled: November 7, 2019Publication date: March 5, 2020Inventors: Yen-Hung LIN, Chung-Hsing WANG, Yuan-Te HOU
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Patent number: 10565341Abstract: The present disclosure describes an example method for cell placement in an integrated circuit layout design. The method includes retrieving, from a cell library, first and second cells each including a first local metal track proximate to a top boundary and a second local metal track proximate to a bottom boundary. The method includes placing, by a processor, the first and second cells in a layout area including global metal tracks of first and second types. Each global metal track of the first type and each global metal tracks of the second type alternate between one another in the layout area. The first and second local metal tracks of the first cell is aligned with adjacent first global metal track of the first and second types, respectively. The first and second local metal tracks of the second cell is aligned with adjacent second global metal track of the first and second types, respectively.Type: GrantFiled: January 24, 2018Date of Patent: February 18, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
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Patent number: 10515175Abstract: A partitioning method for partitioning a group of power-ground (PG) cells is disclosed. The method includes forming a first partition by selecting at least one in-boundary PG cell from the group of PG cells, adding at least one out-boundary PG cell from the group of PG cells into the first partition, forming a second partition by selecting the remaining in-boundary PG cells and the remaining out-boundary PG cells in the group of PG cells, calculating the total area of the in-boundary PG cells in the first partition, calculating the total area of the out-boundary PG cells in the first partition, calculating the total area of the in-boundary PG cells in the second partition, calculating the total area of the out-boundary PG cells in the second partition, and calculating the difference between the total areas of in-boundary PG cells in the first partition and the out-boundary PG cells in the first partition.Type: GrantFiled: October 3, 2017Date of Patent: December 24, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Hung Lin, Yuan-Te Hou, Chung-Hsing Wang
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Patent number: 10489547Abstract: A method of designing a layout includes assigning a first color group to a plurality of first routing tracks. The method includes assigning a second color group to a plurality of second routing tracks. A first routing track is between adjacent second routing tracks. The method includes assigning a color from the first color group to each default conductive element along each first routing track. A color of a first default conductive element along each first routing track is different from a color of an adjacent default conductive element along a same first routing track. The method includes assigning a color from the second color group to each default conductive element along each second routing track. A color of a first default conductive element along each second routing track is different from a color of an adjacent default conductive element along a same second routing track.Type: GrantFiled: September 8, 2016Date of Patent: November 26, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
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Patent number: 10388318Abstract: A disc drive has an opening portion for inserting a disc. The disc drive includes a driving unit, a moving member, a traverse, a disc positioning structure and a restoring structure. When the disc is intended to be clamped on the traverse, the driving unit drives the moving member to move the traverse to a disc holding position to clamp the disc; and the moving member moves the disc positioning structure to a disc release position so that the disc positioning structure does not contact the disc. When the disc is intended to be released from the traverse, the driving unit drives the moving member to move the traverse to a disc unloading position to unload the disc; and the restoring structure moves the disc positioning structure to a disc loading position to support the disc.Type: GrantFiled: April 9, 2018Date of Patent: August 20, 2019Assignees: LITE-ON ELECTRONICS (GUANGZHOU) LIMTED, LITE-ON TECHNOLOGY CORPORATIONInventors: Ming-Chun Tsao, Yen-Hung Lin, Howard Yuen-Ho Shaw, Chien-Shou Chen
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Publication number: 20190236239Abstract: A method for cell swapping is provided. A location for swapping a first cell is determined. One or more legal positions for cell placement are determined at the location. A plurality of cells is determined for of the plurality of legal positions. A second cell from the plurality of cells is determined based on timing information associated with each of the plurality. The first cell is swapped with the second cell.Type: ApplicationFiled: January 25, 2019Publication date: August 1, 2019Inventor: YEN-HUNG LIN
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Publication number: 20190228802Abstract: A disc drive has an opening portion for inserting a disc. The disc drive includes a driving unit, a moving member, a traverse, a disc positioning structure and a restoring structure. When the disc is intended to be clamped on the traverse, the driving unit drives the moving member to move the traverse to a disc holding position to clamp the disc; and the moving member moves the disc positioning structure to a disc release position so that the disc positioning structure does not contact the disc. When the disc is intended to be released from the traverse, the driving unit drives the moving member to move the traverse to a disc unloading position to unload the disc; and the restoring structure moves the disc positioning structure to a disc loading position to support the disc.Type: ApplicationFiled: April 9, 2018Publication date: July 25, 2019Inventors: Ming-Chun TSAO, Yen-Hung LIN, Howard Yuen-Ho SHAW, Chien-Shou CHEN
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Patent number: 10318698Abstract: A method includes operations below. A layout of a circuit is converted to a first conflict graph. A first vertex and a second vertex in the first conflict graph are adjusted based on first data indicating a color patterns assignment for the circuit, in order to generate a second conflict graph, in which the first vertex indicates a first pattern in the layout, and the second vertex indicates a second pattern in the layout. According to the second conflict graph, a first color pattern is assigned to both of the first pattern and the second pattern, or the first color pattern is assigned to the first pattern and a second color pattern is assigned to the second pattern, in order to generate second data for fabricating the circuit.Type: GrantFiled: May 15, 2017Date of Patent: June 11, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yen-Hung Lin, Yuan-Te Hou, Chin-Chang Hsu
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Patent number: 10310563Abstract: An accessory suitable for an electronic device is provided. The electronic device has a display area. The accessory includes a coupling portion and a cover portion. The coupling portion is suitable to be coupled to the electronic device. The cover portion is connected to the coupling portion and is suitable for covering the display area of the electronic device. The cover portion has a plurality of light-transmitting areas, and the light-transmitting areas are arranged on the display area in an array. An image generated by the display area is projected out of the cover portion through the light-transmitting areas. Moreover, an electronic assembly containing the electronic device and the accessory is also provided. Furthermore, a control method is also provided for controlling the electronic assembly. A method is also provided for forming an accessory.Type: GrantFiled: May 4, 2016Date of Patent: June 4, 2019Assignee: HTC CorporationInventors: Yen-Hung Lin, Chien-Wei Hsieh, Chun-Ta Huang, Hung-Chuan Wen, Michael Ross Massucco
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Publication number: 20190155980Abstract: A method includes accessing a design data of an integrated circuit (IC), the design data including a plurality of layers. For each of the layers, the method performs: assigning a bin size of the respective layer based on a layout property of the respective layer; and performing a bin-based feature allocation according to the assigned bin size. The method also includes updating the design data according to the bin-based feature allocation. At least one of the accessing, assigning, performing and updating steps is conducted by at least one processor.Type: ApplicationFiled: April 24, 2018Publication date: May 23, 2019Inventors: YEN-HUNG LIN, CHUNG-HSING WANG, YUAN-TE HOU
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Publication number: 20190147133Abstract: An integrated circuit that includes a first row having a first height, with a first cell in the first row that has the first height. The integrated circuit further includes a second row having a second height, where the first height is not an integer multiple of the second height. A second cell is in the second row that has the second height.Type: ApplicationFiled: February 28, 2018Publication date: May 16, 2019Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
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Patent number: 10268791Abstract: A method is disclosed that includes the operation below. Vertices in a conflict graph are sorted into a first clique and a second clique, in which the conflict graph corresponds to a layout of a circuit. A first vertex of the vertices is merged with a second vertex of the vertices, to generate a reduced graph, in which the first clique excludes the second vertex, and the second clique excludes the first vertex. A first color pattern of a plurality of color patterns is assigned to a first pattern, corresponding to the first vertex, and a second pattern, corresponding to the second vertex, in the layout according to the reduced graph.Type: GrantFiled: December 11, 2015Date of Patent: April 23, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yen-Hung Lin, Chung-Hsing Wang, Chin-Chou Liu, Chi-Wei Hu
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Publication number: 20190093955Abstract: A dual-loop liquid cooling system is provided. A working liquid flows in the dual-loop liquid cooling system to facilitate heat dissipation. The dual-loop liquid cooling system includes a main liquid cooling head, a first loop assembly and a second loop assembly. The first loop assembly is connected with a first inlet and a first outlet of the main liquid cooling head. A first cooling loop system is defined by the first loop assembly and the main liquid cooling head collaboratively. The second loop assembly is connected with a second inlet and a second outlet of the main liquid cooling head. A second cooling loop system is defined by the second loop assembly and the main liquid cooling head collaboratively. Consequently, the cooling efficiency of removing the heat from the main liquid cooling head is enhanced.Type: ApplicationFiled: October 19, 2017Publication date: March 28, 2019Inventors: AN-CHIH WU, CHIH-WEI CHEN, YEN-HUNG LIN
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Publication number: 20190033707Abstract: A method for mitigating extreme ultraviolet (EUV) mask defects is disclosed. The method includes the steps of providing a wafer blank, identifying a first plurality of defects on the wafer blank, providing an EUV mask design on top of the wafer blank, identifying non-critical blocks with corresponding stretchable zones on the EUV mask design, overlapping the EUV blank with the EUV mask design, identifying a second plurality of defects, the second plurality of defects are solved, identifying a third plurality of defects, the third plurality of defects are not solved, adjusting the relative locations of the EUV mask design and the EUV blank to solve at least one of the third plurality of defects, and adjusting the locations of at least one of the non-critical blocks within corresponding stretchable zones to solve at least one of the third plurality of defects.Type: ApplicationFiled: January 29, 2018Publication date: January 31, 2019Inventors: Hsing-Lin YANG, Chin-Chang HSU, Yen-Hung LIN, Chung-Hsing WANG, Wen-Ju YANG
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Publication number: 20190006346Abstract: A device comprises a first interconnect structure over a first active device layer, a first power circuit in the first active device layer, a second active device layer over and in contact with the first interconnect structure, a first switch in the second active device layer, a second interconnect structure over and in contact with the second active device layer, a third active device layer over and in contact with the second interconnect structure, a second power circuit in the third active device layer and a third interconnect structure over and in contact with the third active device layer and connected to a power source, wherein the power source is configured to provide power to the first power circuit through the first switch.Type: ApplicationFiled: September 10, 2018Publication date: January 3, 2019Inventors: Chien-Ju Chao, Chou-Kun Lin, Yi-Chuin Tsai, Yen-Hung Lin, Po-Hsiang Huang, Kuo-Nan Yang, Chung-Hsing Wang
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Publication number: 20180357351Abstract: The present disclosure describes an example method for cell placement in an integrated circuit (IC) layout design. The method includes partitioning a layout area into one or more contiguous units, where each unit includes a plurality of placement sites. The method also includes mapping a first set of pin locations and a second set of pin locations to each of the one or more contiguous units. The method further includes placing a cell in the one or more contiguous units, where the cell is retrieved from a cell library that includes a plurality of pin locations for the cell. The placement of the cell is based on an allocation of one or more pins associated with the cell to at least one of a pin track from the first plurality of pin locations, a pin track from second plurality of pin locations, or a combination thereof.Type: ApplicationFiled: January 29, 2018Publication date: December 13, 2018Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Hung LIN, Chung-Hsing WANG, Yuan-Te HOU
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Publication number: 20180330034Abstract: The present disclosure describes an example method for cell placement in an integrated circuit layout design. The method includes retrieving, from a cell library, first and second cells each including a first local metal track proximate to a top boundary and a second local metal track proximate to a bottom boundary. The method includes placing, by a processor, the first and second cells in a layout area including global metal tracks of first and second types. Each global metal track of the first type and each global metal tracks of the second type alternate between one another in the layout area. The first and second local metal tracks of the first cell is aligned with adjacent first global metal track of the first and second types, respectively. The first and second local metal tracks of the second cell is aligned with adjacent second global metal track of the first and second types, respectively.Type: ApplicationFiled: January 24, 2018Publication date: November 15, 2018Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Hung Lin, Chung-Hsing Wang, Yuan-Te Hou
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Patent number: 10074641Abstract: Embodiments of mechanisms for forming power gating cells and virtual power circuits on multiple active device layers are described in the current disclosure. Power gating cells and virtual power circuits are formed on separate active device layers to allow interconnect structure for connecting with the power source be formed on a separate level from the interconnect structure for connecting the power gating cells and the virtual power circuits. Such separation prevents these two types of interconnect structures from competing for the same space. Routings for both types of interconnect structures become easier. As a result, metal lengths of interconnect structures are reduced and the metal widths are increased. Reduced metal lengths and increased metal widths reduce resistance, improves resistance-capacitance (RC) delay and electrical performance, and improves interconnect reliability, such as reducing electro-migration.Type: GrantFiled: October 23, 2017Date of Patent: September 11, 2018Assignee: Taiwan Semicondcutor Manufacturing CompanyInventors: Chien-Ju Chao, Chou-Kun Lin, Yi-Chuin Tsai, Yen-Hung Lin, Po-Hsiang Huang, Kuo-Nan Yang, Chung-Hsing Wang
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Patent number: D864179Type: GrantFiled: March 21, 2017Date of Patent: October 22, 2019Assignee: HTC CorporationInventors: Yen-Hung Lin, Michael Ross Massucco