Patents by Inventor Yong Soo Kim

Yong Soo Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7968912
    Abstract: A semiconductor device includes a substrate, a gate formed over the substrate, a gate spacer provided against first and second sidewalls of the gate, and a source/drain region formed in the substrate proximate to the gate spacer. The source/drain region includes first and second epitaxial layers including Ge, wherein the second epitaxial layer which is formed over an interfacial layer between the first epitaxial layer and the substrate has a higher germanium concentration than that of the first epitaxial layer.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: June 28, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Yong-Soo Kim, Hong-Seon Yang, Seung-Ho Pyi, Tae-Hang Ahn
  • Patent number: 7948025
    Abstract: A non-volatile memory device includes a substrate, a tunneling layer over the substrate, a charge trapping layer including a nitride layer and a silicon boron nitride layer over the tunneling layer, and a blocking layer over the charge trapping layer, and a control gate electrode arranged on the blocking layer.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: May 24, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Moon Sig Joo, Seung Ho Pyi, Yong Soo Kim
  • Patent number: 7928493
    Abstract: A nonvolatile memory device with a blocking layer controlling the transfer of electric charges in a charge storage layer includes the blocking layer having a first blocking layer in contact with the charge storage layer and a second blocking layer over the first blocking layer, wherein the first blocking layer has a greater energy band gap than the second blocking layer and the second blocking layer has a greater permittivity than the first blocking layer.
    Type: Grant
    Filed: April 27, 2009
    Date of Patent: April 19, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Heung-Jae Cho, Moon-Sig Joo, Yong-Soo Kim, Won-Joon Choi
  • Publication number: 20110068380
    Abstract: A method for fabricating a semiconductor device includes providing a substrate having a bulb-type recessed region, forming a gate insulating layer over the bulb-type recessed region and the substrate, and forming a gate conductive layer over the gate insulating layer. The gate conductive layer fills the bulb-type recessed region. The gate conductive layer includes two or more conductive layers and a discontinuous interface between the conductive layers.
    Type: Application
    Filed: November 23, 2010
    Publication date: March 24, 2011
    Applicant: Hynix Semiconductor Inc.
    Inventors: Yong-Soo KIM, Hong-Seon YANG, Se-Aug JANG, Seung-Ho PYI, Kwon HONG, Heung-Jae CHO, Kwan-Yong LIM, Min-Gyu SUNG, Seung-Ryong LEE, Tae-Yoon KIM
  • Publication number: 20110061578
    Abstract: The present disclosure relates to a roll-suppression device for an offshore structure. The device includes a damping plate separated downward from a hull to be placed below a bottom of the offshore structure by a connection unit, so that the width of the damping plate may be effectively enlarged without occurrence of collision during shuttle docking or ship-to-ship operation. Accordingly, the device may maximize roll-suppression, as compared with a bilge-keel or a step, and a detachable design of the device facilitates ship construction or shore operation inside a drydock.
    Type: Application
    Filed: March 12, 2010
    Publication date: March 17, 2011
    Applicant: DAEWOO SHIPBUILDING & MARINE ENGINEERING CO., LTD.
    Inventors: Jung Han Lee, Yong Soo Kim, Je Hyouk Woo, Dae Woong Kim, Sung Gun Park, Jong Ou Nahm, Byeong Won Park
  • Patent number: 7902614
    Abstract: A semiconductor device includes a first conductive layer, a first intermediate structure over the first conductive layer, a second intermediate structure over the first intermediate structure, and a second conductive layer over the second intermediate structure. The first intermediate structure includes a metal silicide layer and a nitrogen containing metal layer. The second intermediate structure includes at least a nitrogen containing metal silicide layer.
    Type: Grant
    Filed: September 26, 2007
    Date of Patent: March 8, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Kwan-Yong Lim, Hong-Seon Yang, Heung-Jae Cho, Tae-Kyung Kim, Yong-Soo Kim, Min-Gyu Sung
  • Publication number: 20110042760
    Abstract: A gate structure of a semiconductor device includes an intermediate structure, wherein the intermediate structure includes a titanium layer and a tungsten silicide layer. A method for forming a gate structure of a semiconductor device includes forming a polysilicon-based electrode. An intermediate structure, which includes a titanium layer and a tungsten silicide layer, is formed over the polysilicon-based electrode. A metal electrode is formed over the intermediate structure.
    Type: Application
    Filed: August 23, 2010
    Publication date: February 24, 2011
    Applicant: Hynix Semiconductor Inc.
    Inventors: Min-Gyu SUNG, Hong-Seon YANG, Heung-Jae CHO, Yong-Soo KIM, Kwan-Yong LIM
  • Publication number: 20110014759
    Abstract: A method of fabricating a non-volatile memory device includes: forming a tunnel insulation layer pattern and a floating gate electrode layer pattern over a semiconductor substrate; forming an isolation trench by etching an exposed portion of the semiconductor substrate so that the isolation trench is aligned with the tunnel insulation layer pattern and the floating gate electrode layer pattern; forming an isolation layer by filling the isolation trench with a filling insulation layer; forming a hafnium-rich hafnium silicon oxide layer over the isolation layer and the floating gate electrode layer pattern; forming a hafnium-rich hafnium silicon oxynitride layer by carrying out a first nitridation on the hafnium-rich hafnium silicon oxide layer; forming a silicon-rich hafnium silicon oxide layer over the hafnium-rich hafnium silicon oxynitride layer; forming a silicon-rich hafnium silicon oxynitride layer by carrying out a second nitridation on the silicon-rich hafnium silicon oxide layer; and forming a control
    Type: Application
    Filed: September 29, 2010
    Publication date: January 20, 2011
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Moon Sig Joo, Heung Jae Cho, Yong Soo Kim, Won Joon Choi
  • Publication number: 20110003795
    Abstract: The invention relates to substituted aromatic carboxamide and urea derivatives, to processes for the preparation thereof, to pharmaceutical compositions containing these compounds and also to the use of these compounds for preparing pharmaceutical compositions.
    Type: Application
    Filed: May 6, 2010
    Publication date: January 6, 2011
    Applicant: Gruenenthal GmbH
    Inventors: Robert FRANK, Gregor BAHRENBERG, Thomas CHRISTOPH, Klaus SCHIENE, Jean DE VRY, Nils DAMANN, Sven FRORMANN, Bernhard LESCH, Jeewoo LEE, Yong-Soo KIM, Myeong-Seop KIM
  • Patent number: 7861899
    Abstract: A single-use dispenser using air pressure and includes an outer vessel in which air and content material are charged, a fixed body coupled to an open upper end of the outer vessel, a valve installed in the fixed body for selectively dispensing the content material using pressurized air, and a push button coupled to a top of the valve for pushing the valve, thereby spraying out the content material and air, wherein the valve includes a hollow body, a hollow valve body elastically supported to a top of the body and moving into and out of a hollow of the body, a packing member installed on the valve body for blocking an orifice pipe, and an air suction hole formed to penetrate the body for supplementing air pressure of the outer vessel.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: January 4, 2011
    Inventor: Yong-Soo Kim
  • Publication number: 20100331381
    Abstract: The invention relates to substituted phenylureas and phenylamides, to processes for the preparation thereof, to pharmaceutical compositions containing these compounds and also to the use of these compounds for preparing pharmaceutical compositions.
    Type: Application
    Filed: May 6, 2010
    Publication date: December 30, 2010
    Applicant: Gruenenthal GmbH
    Inventors: Robert Frank, Gregor Bahrenberg, Thomas Christoph, Klaus Schiene, Jean De Vry, Nils Damann, Sven Frormann, Bernhard Lesch, Jeewoo Lee, Yong-Soo Kim, Myeong-Seop Kim
  • Publication number: 20100309256
    Abstract: Provided is an electrical connector for a print ink cartridge.
    Type: Application
    Filed: August 29, 2008
    Publication date: December 9, 2010
    Applicant: MOLEX INCORPORATED
    Inventor: Yong-Soo Kim
  • Publication number: 20100310149
    Abstract: There are provided a device and method for detecting joint parts of a steel strip in an endless hot rolling process.
    Type: Application
    Filed: November 25, 2008
    Publication date: December 9, 2010
    Applicant: POSCO
    Inventors: Yong-Soo Kim, Jong-Il Park, Oh-Dae Kim, Yun-Hyeon Kim, Myoung-Koo Kang, Jin-Su Bae
  • Patent number: 7838364
    Abstract: A method for fabricating a semiconductor device includes providing a substrate having a bulb-type recessed region, forming a gate insulating layer over the bulb-type recessed region and the substrate, and forming a gate conductive layer over the gate insulating layer. The gate conductive layer fills the bulb-type recessed region. The gate conductive layer includes two or more conductive layers and a discontinuous interface between the conductive layers.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: November 23, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventors: Yong-Soo Kim, Hong-Seon Yang, Se-Aug Jang, Seung-Ho Pyi, Kwon Hong, Heung-Jae Cho, Kwan-Yong Lim, Min-Gyu Sung, Seung-Ryong Lee, Tae-Yoon Kim
  • Patent number: 7824992
    Abstract: A method of fabricating a non-volatile memory device includes: forming a tunnel insulation layer pattern and a floating gate electrode layer pattern over a semiconductor substrate; forming an isolation trench by etching an exposed portion of the semiconductor substrate so that the isolation trench is aligned with the tunnel insulation layer pattern and the floating gate electrode layer pattern; forming an isolation layer by filling the isolation trench with a filling insulation layer; forming a hafnium-rich hafnium silicon oxide layer over the isolation layer and the floating gate electrode layer pattern; forming a hafnium-rich hafnium silicon oxynitride layer by carrying out a first nitridation on the hafnium-rich hafnium silicon oxide layer; forming a silicon-rich hafnium silicon oxide layer over the hafnium-rich hafnium silicon oxynitride layer; forming a silicon-rich hafnium silicon oxynitride layer by carrying out a second nitridation on the silicon-rich hafnium silicon oxide layer; and forming a control
    Type: Grant
    Filed: December 30, 2008
    Date of Patent: November 2, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventors: Moon Sig Joo, Heung Jae Cho, Yong Soo Kim, Won Joon Choi
  • Publication number: 20100265614
    Abstract: A method of writing a servo pattern in a hard disk drive includes manufacturing a master pattern, and writing the reference servo pattern to the disk by using the master pattern and a magnet for magnetizing the disk. The master pattern includes a plurality of ammonite cycles that have substantially the same pattern as the reference servo pattern and are radially formed from the outside toward the inside of the disk. A final servo pattern may be written using the reference servo pattern.
    Type: Application
    Filed: April 15, 2010
    Publication date: October 21, 2010
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ha Yong KIM, Cheol-Soon KIM, Yong-Soo KIM, Sang-Hyun PARK
  • Publication number: 20100261945
    Abstract: Provided is a method of separating an aromatic compound from a mixture containing the aromatic compound and an aliphatic compound. The method includes separating an aromatic compound from a mixture containing the aromatic compound and an aliphatic compound, wherein the separating is performed using a liquid-liquid extracting method using an ionic liquid as an extracting solvent.
    Type: Application
    Filed: April 7, 2010
    Publication date: October 14, 2010
    Applicant: Samsung Engineering Co., Ltd.
    Inventors: Myong Hoon LIM, Young Mi Kim, Yong Soo Kim, Jae Eun Rho, Hyun Woo, Young Youl Koo
  • Patent number: D624512
    Type: Grant
    Filed: January 20, 2010
    Date of Patent: September 28, 2010
    Assignee: LG Electronics Inc.
    Inventors: Yong Soo Kim, Sang Won Yoon, A Reum Kwon, Yong Ho Lee
  • Patent number: D630618
    Type: Grant
    Filed: January 20, 2010
    Date of Patent: January 11, 2011
    Assignee: LG Electronics Inc.
    Inventors: Yong Soo Kim, Sang Won Yoon, A Reum Kwon, Yong Ho Lee
  • Patent number: D635943
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: April 12, 2011
    Assignee: LG Electronics Inc.
    Inventors: Yong Soo Kim, Sang Won Yoon, Yong Ho Lee