Abstract: A shift register according to an embodiment includes: a magnetic nanowire; a first control electrode group and a second control electrode group arranged with the magnetic nanowire being sandwiched therebetween, the first control electrode group including a plurality of first control electrodes arranged to be spaced apart from each other along a direction in which the magnetic nanowire extends, the second control electrode group including a plurality of second control electrodes arranged to be spaced apart from each other to correspond to the plurality of first control electrodes along the direction in which the magnetic nanowire extends, and the second control electrodes corresponding to the first control electrodes being shifted in the direction in which the magnetic nanowire extends; a first driving unit for driving the first control electrode group; and a second driving unit for driving the second control electrode group.

Abstract: A semiconductor memory device includes memory units, each of which includes first and second select transistors and memory cells connected in series between the first and second select transistors. A control circuit applies a first potential difference between a source and a drain of either the first or second select transistor in a first memory unit, thereby programming either the first or second select transistor. The control circuit applies a second potential difference between a source and a drain of either the first or second select transistor in a second memory unit connected in common to the same select gate line as that of the first memory unit, thereby inhibiting either the first or second select transistor from being programmed.

Abstract: A magnetic storage element according to an embodiment includes: a magnetic nanowire having a cross-sectional area varying in a first direction, the magnetic nanowire having at least two positions where the cross-sectional area is minimal; first and second electrode groups having the magnetic nanowire interposed in between, the magnetic nanowire including at least one of a first region where the first electrodes overlap the second electrodes with the magnetic nanowire interposed in between and a second region where neither the first electrodes nor the second electrodes exist with the magnetic nanowire interposed in between, the magnetic nanowire including at least one of a third region where the first electrodes exist and the second electrodes do not exist with the magnetic nanowire interposed in between and a fourth region where the first electrodes do not exist and the second electrodes exist with the magnetic nanowire interposed in between.

Abstract: According to one embodiment, a shift register memory device includes a shift register, a program/read element, and a rotating force application unit. The shift register includes a plurality of rotors arranged along one direction and provided with a uniaxial anisotropy. Each of the plurality of rotors has a characteristic direction rotatable around a rotational axis extending in the one direction. The program/read element is configured to program data to the shift register by causing the characteristic direction of one of the rotors to match one selected from two directions conforming to the uniaxial anisotropy and configured to read the data by detecting the characteristic direction. The rotating force application unit is configured to apply a rotating force to the shift register to urge the characteristic direction to rotate. The plurality of rotors are organized into a plurality of pairs of every two mutually adjacent rotors.

Abstract: A non-volatile semiconductor memory device includes first through third memory strings, a first word line group shared by first and second memory strings and a second word line group shared by second and third memory strings, the first and second word line groups extending in a first direction and disposed adjacent to each other in a second direction that is perpendicular to the first direction. The first word line group includes laminated first word lines with each upper first word line extending in the first direction less than the first word line directly below, and the second word line group includes laminated second word lines with each upper second word line extending in the first direction less than the second word line directly below.

Abstract: A magnetic storage element includes a magnetic nanowire. A cross-section of the magnetic nanowire has first and second visible outlines, the first visible outline has a first minimal point at which a distance from a virtual straight line becomes minimal, a second minimal point at which the distance from the virtual straight line becomes minimal, and a first maximal point at which the distance from the virtual straight line becomes longest between the first minimal point and the second minimal point, and an angle between a first straight line connecting the first minimal point and the second minimal point, and one of a second straight line connecting the first minimal point and the first maximal point and a third straight line connecting the second minimal point and the first maximal point is not smaller than four degrees and not larger than 30 degrees.

Abstract: A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of insulating films alternately stacked with a plurality of electrode films in a first direction; a selection gate electrode stacked on the stacked structural unit in the first direction; an insulating layer stacked on the selection gate electrode in the first direction; a first semiconductor pillar piercing the stacked structural unit, the selection gate electrode, and the insulating layer in the first direction, a first cross section of the first semiconductor pillar having an annular configuration, the first cross section being cut in a plane orthogonal to the first direction; a first core unit buried in an inner side of the first semiconductor pillar, the first core unit being recessed from an upper face of the insulating layer; and a first conducting layer of the first semiconductor pillar provided on the first core unit to contact the first core unit.

Abstract: A nonvolatile semiconductor memory device according to an embodiment includes: a semiconductor layer; a block insulating film; an organic molecular layer, which is formed between the semiconductor layer and the block insulating film, and provided with a first organic molecular film on the semiconductor layer side containing first organic molecules and a second organic molecular film on the block insulating film side containing second organic molecules, and in which the first organic molecule has a charge storing unit and the second organic molecule is an amphiphilic organic molecule; and a control gate electrode formed on the block insulating film.

Abstract: A magnetic memory device comprises a first electrode, a second electrode, a laminated structure comprising plural first magnetic layers being provided between the first electrode and the second electrode, a second magnetic layer comprising different composition elements from that of the first magnetic layer and being provided between plural first magnetic layers, a piezoelectric body provided on a opposite side to a side where the first electrode is provided in the laminated structure, and a third electrode applying voltage to the piezoelectric body and provided on a different position from a position where the first electrode is provided in the piezoelectric body.

Abstract: A nonvolatile semiconductor memory device includes a semiconductor layer, a control gate electrode, and an organic molecular layer provided between the semiconductor layer and the control gate electrode and having an organic molecule including a porphyrin structure.

Abstract: According to one embodiment, a method for manufacturing a semiconductor memory device processing the first sidewall films into a plurality of island shape patterns. The method includes processing the base mask using the core material films, the first sidewall films, and the second sidewall films as masks to simultaneously form a plurality of mask slits extending in a first direction and a plurality of mask holes in the base mask. The method includes simultaneously forming a plurality of slits extending in the first direction and a plurality of holes in the stacked body using the base mask as a mask. The method includes forming a memory film and a channel body in the hole, and forming an insulating film in the slit.

Abstract: In this embodiment, a mask material is formed above a film to be processed, and a plurality of sacrifice films are formed above the mask material, each of the sacrifice films having a columnar shape. Then, a sidewall film is formed on a sidewall of the sacrifice films, and then the sacrifice films are removed. Thereafter, the sidewall films are caused to flow. In addition, a plurality of holes are formed in the mask material using the sidewall film as a mask. Then, isotropic etching is performed for the mask material to etch back the sidewall of the mask material with respect to a sidewall of the sidewall film by a first distance. Thereafter, a deposition layer is deposited inside the plurality of holes to close an opening of the plurality of holes with the deposition layer. Anisotropic etching is conducted to remove the deposition layer in the opening.

Abstract: A shift register type magnetic memory according to an embodiment includes: a magnetic nanowire; a magnetic material chain provided in close vicinity to the magnetic nanowire, the magnetic material chain including a plurality of disk-shaped ferromagnetic films arranged along a direction in which the magnetic nanowire extends; a magnetization rotation drive unit configured to rotate and drive magnetization of the plurality of ferromagnetic films; a writing unit configured to write magnetic information into the magnetic nanowire; and a reading unit configured to read magnetic information from the magnetic nanowire.

Abstract: A shift register memory according to the present embodiment includes a magnetic pillar including a plurality of magnetic layers and a plurality of nonmagnetic layers provided between the magnetic layers adjacent to each other. A stress application part applies a stress to the magnetic pillar. A magnetic-field application part applies a static magnetic field to the magnetic pillar. The stress application part applies the stress to the magnetic pillar in order to transfer magnetization states of the magnetic layers in a stacking direction of the magnetic layers.

Abstract: According to one embodiment, a semiconductor memory device includes a stacked body including a plurality of electrode layers and a plurality of insulating layers each provided between adjacent ones of the electrode layers; and a columnar portion penetrating through the stacked body and extending in a stacking direction of the stacked body. The columnar portion includes a channel body extending in the stacking direction; a charge storage film provided between the channel body and the electrode layer; and a gap provided between the charge storage film and the electrode layer.

Abstract: A semiconductor memory device according to one embodiment includes a connecting member including a semiconductor material, a first electrode film, a first insulating film, a stacked body and three or more semiconductor pillars. The stacked body includes second electrode films and second insulating films that alternately stacked. The semiconductor pillars are arrayed along two or more directions, extend in a stacking direction, pierce through the stacked body and the first insulating film, and are connected to the connecting member. The device includes a third insulating film provided between the semiconductor pillars and the stacked body and between the connecting member and the first electrode film. A charge storage layer is provided at least between one of the second electrode films and the third insulating film.

Abstract: A shift register memory device includes a shift register, program/read element, and rotating force application unit. The shift register includes plural rotors arranged along a direction with uniaxial anisotropy. Each rotor has a characteristic direction rotatable around a rotational axis extending in the direction. The program/read element can program data to the shift register by matching the characteristic direction of one of the rotors to one selected from two directions conforming to the uniaxial anisotropy and to read data by detecting the characteristic direction. The rotating force application unit can apply a rotating force to the shift register to urge the characteristic direction to rotate. The rotors are organized into plural pairs of every two adjacent rotors. Respective first and second forces urge the characteristic directions to be opposingly parallel for two rotors of the same pair and for two mutually adjacent rotors of mutually adjacent pairs.

Abstract: According to one embodiment, a memory system includes a nonvolatile semiconductor memory device and a controller. The system includes the nonvolatile semiconductor memory device including a plurality of memory cells; and the controller configured to control one of read operation, write operation, and a use frequency of the read operation or the write operation on the nonvolatile semiconductor memory device, and configured to change controlling for a memory cell belonging to a first group of the memory cells and to change controlling for a memory cell belonging to a second group located on an upper side or a lower side of the memory cell belonging to the first group.

Abstract: A non-volatile semiconductor storage device has a plurality of memory strings to each of which a plurality of electrically rewritable memory cells are connected in series. Each of the memory strings includes first semiconductor layers each having a pair of columnar portions extending in a vertical direction with respect to a substrate and a coupling portion formed to couple the lower ends of the pair of columnar portions; a charge storage layer formed to surround the side surfaces of the columnar portions; and first conductive layers formed to surround the side surfaces of the columnar portions and the charge storage layer. The first conductive layers function as gate electrodes of the memory cells.

Abstract: A nonvolatile semiconductor memory device according to an embodiment includes a memory cell array having a plurality of electrically rewritable memory transistors arranged therein; and a control unit configured to govern control that repeats a voltage application operation and a step-up operation, the voltage application operation applying an applied voltage to a selected memory transistor to change a threshold voltage at which the selected memory transistor is conductive, and the step-up operation, in the case where a threshold voltage of the selected memory transistor has not changed to a desired value, raising the applied voltage by an amount of a certain step-up value. The control unit is configured to control the step-up operation to monotonically decrease the step-up value as the number of times of the voltage application operations increases.