Patents by Inventor Yoshiaki Saito

Yoshiaki Saito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090179667
    Abstract: It is made possible to provide a reconfigurable logic circuit with which high integration can be achieved. A reconfigurable logic circuit includes: a multiplexer which includes a plurality of spin MOSFETs each having a source and drain containing a magnetic material, and a selecting portion including a plurality of MOSFETs and selecting a spin MOSFET from the plurality of spin MOSFETs, based on control data transmitted from control lines; a determining circuit which determines whether magnetization of the magnetic material of the source and drain of a selected spin MOSFET, which is selected by the selecting portion, is in a first state or in a second state; and a first and second write circuits which put the magnetization of the magnetic material of the source and drain of the selected spin MOSFET into the second and first states respectively by supplying a write current flowing between the source and drain of the selected spin MOSFET.
    Type: Application
    Filed: December 19, 2008
    Publication date: July 16, 2009
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hideyuki SUGIYAMA, Mizue ISHIKAWA, Tomoaki INOKUCHI, Yoshiaki SAITO, Tetsufumi TANAMOTO
  • Publication number: 20090180215
    Abstract: A magnetoresistive effect element includes a first ferromagnetic layer, Cr layer, Heusler alloy layer, barrier layer, and second ferromagnetic layer. The first ferromagnetic layer has the body-centered cubic lattice structure. The Cr layer is formed on the first ferromagnetic layer and has the body-centered cubic lattice structure. The Heusler alloy layer is formed on the Cr layer. The barrier layer is formed on the Heusler alloy layer. The second ferromagnetic layer is formed on the barrier layer.
    Type: Application
    Filed: December 23, 2008
    Publication date: July 16, 2009
    Inventors: Mizue ISHIKAWA, Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi
  • Patent number: 7547934
    Abstract: It is possible to obtain excellent heat stability even though the element is miniaturized and keep stable magnetic domains even though switching is repeated any number of times. A magneto-resistive effect element includes: a magnetization-pinned layer including a magnetic film having a spin moment oriented in a direction perpendicular to a film surface thereof and pinned in the direction; a magnetic recording layer having a spin moment oriented in a direction perpendicular to a film surface thereof; a nonmagnetic layer formed between the magnetization-pinned layer and the magnetic recording layer; and an anti-ferromagnetic film formed on at least side surfaces of the magnetization-pinned layer.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: June 16, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Yoshiaki Saito
  • Patent number: 7511991
    Abstract: A spin-injection magnetic random access memory according to an embodiment of the invention includes a magnetoresistive element having a magnetic fixed layer whose magnetization direction is fixed, a magnetic recording layer whose magnetization direction can be changed by injecting spin-polarized electrons, and a tunnel barrier layer provided between the magnetic fixed layer and the magnetic recording layer, a bit line which passes spin-injection current through the magnetoresistive element, the spin-injection current being used for generation of the spin-polarized electrons, a writing word line through which assist current is passed, the assist current being used for the generation of an assist magnetic field in a magnetization easy-axis direction of the magnetoresistive element, and a driver/sinker which determines a direction of the spin-injection current and a direction of the assist current.
    Type: Grant
    Filed: May 18, 2007
    Date of Patent: March 31, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi, Yoshihisa Iwata
  • Publication number: 20090059659
    Abstract: A spin transistor includes a first ferromagnetic layer provided on a substrate and having an invariable magnetization direction, a second ferromagnetic layer provided on the substrate apart from the first ferromagnetic layer in a first direction, and having a variable magnetization direction, a plurality of projecting semiconductor layers provided on the substrate to extend in the first direction, and sandwiched between the first ferromagnetic layer and the second ferromagnetic layer, a plurality of channel regions respectively provided in the projecting semiconductor layers, and a gate electrode provided on the channel regions.
    Type: Application
    Filed: August 28, 2008
    Publication date: March 5, 2009
    Inventors: Tomoaki INOKUCHI, Mizue Ishikawa, Hideyuki Sugiyama, Yoshiaki Saito
  • Publication number: 20090057654
    Abstract: A spin FET of an aspect of the present invention includes source/drain regions, a channel region between the source/drain regions, and a gate electrode above the channel region. Each of the source/drain regions includes a stack structure which is comprised of a low work function material and a ferromagnet. The low work function material is a non-oxide which is comprised of one of Mg, K, Ca and Sc, or an alloy which includes the non-oxide of 50 at % or more.
    Type: Application
    Filed: August 25, 2008
    Publication date: March 5, 2009
    Inventors: Yoshiaki SAITO, Hideyuki Sugiyama, Tomoaki Inokuchi, Mizue Ishikawa
  • Publication number: 20090050948
    Abstract: A spin MOS field effect transistor includes a source electrode and a drain electrode each having a structure obtained by stacking an impurity diffusion layer, a (001)-oriented MgO layer and a Heusler alloy. The impurity diffusion layer is formed in a surface region of a semiconductor layer. The (001)-oriented MgO layer is formed on the impurity diffusion layer. The Heusler alloy is formed on the MgO layer.
    Type: Application
    Filed: August 20, 2008
    Publication date: February 26, 2009
    Inventors: Mizue ISHIKAWA, Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi
  • Patent number: 7485938
    Abstract: It is possible to perform a writing operation with low power consumption and a low current, and enhance reliability without causing element breakdown. There are provided a first magnetization-pinned layer including at least one magnetic film in which a magnetization direction is pinned; a second magnetization-pinned layer including at least one magnetic film in which a magnetization direction is pinned; a magnetic recording layer formed between the first magnetization-pinned layer and the second magnetization-pinned layer and including at least one magnetic film in which a magnetization direction is changeable by injecting spin-polarized electrons; a tunnel barrier layer formed between the first magnetization-pinned layer and the magnetic recording layer; and a nonmagnetic intermediate layer formed between the magnetic recording layer and the second magnetization-pinned layer.
    Type: Grant
    Filed: September 15, 2006
    Date of Patent: February 3, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki Saito, Hideyuki Sugiyama
  • Publication number: 20090026010
    Abstract: A process for producing a sound absorber having skin layers constituting front and back surfaces and, interposed between the skin layers, a void layer having a number of voids, and having a plurality of formed holes each having a depth which is enough to penetrate one of the skin layers and is not enough to reach the other skin layer; comprising: providing a mold having a fixed part, a movable part, and at least one pin disposed in a manner that it can be projected into and retracted from a cavity; and having a step to cause the pin to project into the cavity during the course of charging the cavity with a resin material and molding the sound absorber and form the holes communicating with the void layer simultaneously with molding of the sound absorber.
    Type: Application
    Filed: March 7, 2006
    Publication date: January 29, 2009
    Applicants: PRIME POLYMER CO., LTD., DAIKYONISHIKAWA CORPORATION
    Inventors: Yoshiaki Saito, Minoru Sugawara, Hirofumi Goda, Takeharu Suga, Masaharu Okamura, Toshifumi Sakai
  • Patent number: 7483291
    Abstract: A magneto-resistance effect element includes: a first ferromagnetic layer serving as a magnetization fixed layer; a magnetization free layer including a second ferromagnetic layer provided on one side of the first ferromagnetic layer, a third ferromagnetic layer which is formed on an opposite side of the second ferromagnetic layer from the first ferromagnetic layer and has a film face having an area larger than that of the second ferromagnetic layer and whose magnetization direction is changeable by an external magnetic field, and an intermediate layer provided between the second ferromagnetic layer and the third ferromagnetic layer; and a tunnel baffler layer provided between the first ferromagnetic layer and the second ferromagnetic layer. The second ferromagnetic layer and the third ferromagnetic layer are magnetically coupled via the intermediate layer, and an aspect ratio of a plane shape of the third ferromagnetic layer is within a range from 1 to 2.
    Type: Grant
    Filed: August 12, 2005
    Date of Patent: January 27, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki Saito, Katsuya Nishiyama, Shigeki Takahashi
  • Publication number: 20090010577
    Abstract: The present invention provides a structure for closing a track rail mounting hole, which prevents a closing cap from being press-fitted with an inclined state into the rail mounting hole, thereby being capable of positively preventing formation of a gap between the rail mounting hole and the closing cap. The closing cap (70) includes: a fitting portion (71) having an outer diameter larger than an inner diameter of the rail mounting hole (11b), to be press-fitted into the rail mounting hole (11b); and a leading end portion (72) to be inserted into the rail mounting hole (11b) before press-fitting the fitting portion (71) into the rail mounting hole (11b), for provisionally positioning the closing cap (70) with respect to the rail mounting hole (11b).
    Type: Application
    Filed: December 15, 2005
    Publication date: January 8, 2009
    Applicants: THK CO., LTD., THK GMBH
    Inventors: Katsuya Iida, Yoshiaki Saito, Masahiro Kumagai, Reinhard G. Welle
  • Patent number: 7470963
    Abstract: There are provided a first reference layer, in which a direction of magnetization is fixed, and a storage layer including a main body, in which a length in an easy magnetization axis direction is longer than a length in a hard magnetization axis direction, and a projecting portion provided to a central portion of the main body in the hard magnetization axis direction, a direction of magnetization of the storage layer being changeable in accordance with an external magnetic field.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: December 30, 2008
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Tadashi Kai, Shigeki Takahashi, Tomomasa Ueda, Tatsuya Kishi, Yoshiaki Saito
  • Publication number: 20080299007
    Abstract: A specimen rack and a specimen carrier system includes a luminous body disposed on a vicinity of a specimen container loading slot to notify, to an operator, information concerning an analyzing situation and condition of the specimen contained in the specimen container held by the specimen rack.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 4, 2008
    Inventors: Kiyoteru Noguchi, Hitoshi Ohtake, Yoshimitsu Takagi, Takuya Yamaguchi, Yoshiaki Saito, Yasuaki Takebe
  • Publication number: 20080285183
    Abstract: An area of an element can be made small and fluctuation in area can be reduced. A magneto-resistance effect element is provided with a first electrode with an end face; a magneto-resistance effect film which is formed such that a surface thereof comes in contact with the end face of the first electrode; and a second electrode which is formed on another surface of the magneto-resistance effect element opposed from the surface coming in contact with the surface of the first electrode. The magneto-resistance effect film includes a magnetization pinned layer whose magnetization direction is pinned, a magnetization free layer whose magnetization direction is changeable, and a first non-magnetic layer which is provided between the magnetization pinned layer and the magnetization free layer.
    Type: Application
    Filed: July 22, 2008
    Publication date: November 20, 2008
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Hideyuki Sugiyama, Yoshiaki Saito
  • Publication number: 20080283888
    Abstract: A spin transistor includes a non-magnetic semiconductor substrate having a channel region, a first area, and a second area. The channel region is between the first and the second areas. The spin transistor also includes a first conductive layer located above the first area and made of a ferromagnetic material magnetized in a first direction; and a second conductive layer located above the second area and made of a ferromagnetic material magnetized in one of the first direction and a second direction that is antiparallel with respect to the first direction. The channel region introduces electron spin between the conductive layers. The spin transistor also includes a gate electrode located between the conductive layers and above the channel region; and a tunnel barrier film located between the non-magnetic semiconductor substrate and at least one of the conductive layers.
    Type: Application
    Filed: July 8, 2008
    Publication date: November 20, 2008
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki SAITO, Hideyuki SUGIYAMA
  • Publication number: 20080247223
    Abstract: A spin-injection magnetic random access memory of an aspect of the present invention includes a magnetoresistive element, a unit which writes data into the magnetoresistive element by use of spin-polarized electrons generated by a spin-injection current and which applies, to the magnetoresistive element, a magnetic field of a direction of a hard magnetization of the magnetoresistive element during the writing.
    Type: Application
    Filed: June 4, 2008
    Publication date: October 9, 2008
    Inventors: Tomoaki INOKUCHI, Yoshiaki Saito, Hideyuki Sugiyama
  • Publication number: 20080239930
    Abstract: A spin FET includes a first ferromagnetic film disposed on a first source/drain area, a direction of magnetization thereof being fixed in an upward direction or a downward direction perpendicular to a film surface, a second ferromagnetic film disposed on a second source/drain area, a direction of magnetization thereof being changed in the upward direction or the downward direction, an anti-ferromagnetic ferroelectric film disposed on the second ferromagnetic film, and a tunnel barrier film disposed at least between the first source/drain area and the first ferromagnetic film or between the second source/drain and the second ferromagnetic film. Resistance of the anti-ferromagnetic ferroelectric film is larger than ON resistance when the first and second source/drain areas conduct electricity through the channel area.
    Type: Application
    Filed: February 11, 2008
    Publication date: October 2, 2008
    Inventors: Yoshiaki SAITO, Hideyuki SUGIYAMA, Tomoaki INOKUCHI
  • Publication number: 20080217711
    Abstract: A vertical spin transistor according to an embodiment of the present invention includes: a first source/drain layer including a layer formed of magnetic material; a protruding structure including, a channel layer formed on the first source/drain layer and including a layer formed of semiconductor, and a second source/drain layer formed on the channel layer and including a layer formed of magnetic material; a gate insulating film formed on a side of the channel layer; and a gate electrode formed on a surface of the gate insulating film.
    Type: Application
    Filed: September 14, 2007
    Publication date: September 11, 2008
    Inventors: Naoharu Sugiyama, Yoshiaki Saito
  • Patent number: 7420786
    Abstract: An area of an element can be made small and fluctuation in area can be reduced. A magneto-resistance effect element is provided with a first electrode with an end face; a magneto-resistance effect film which is formed such that a surface thereof comes in contact with the end face of the first electrode; and a second electrode which is formed on another surface of the magneto-resistance effect element opposed from the surface coming in contact with the surface of the first electrode. The magneto-resistance effect film includes a magnetization pinned layer whose magnetization direction is pinned, a magnetization free layer whose magnetization direction is changeable, and a first non-magnetic layer which is provided between the magnetization pinned layer and the magnetization free layer.
    Type: Grant
    Filed: March 1, 2005
    Date of Patent: September 2, 2008
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hideyuki Sugiyama, Yoshiaki Saito
  • Patent number: 7411235
    Abstract: A spin transistor includes a first conductive layer that is made of a ferromagnetic material magnetized in a first direction, and functions as one of a source and a drain; a second conductive layer that is made of a ferromagnetic material magnetized in one of the first direction and a second direction that is antiparallel with respect to the first direction, and functions as the other one of the source and the drain. The spin transistor also includes a channel region that is located between the first conductive layer and the second conductive layer, and introduces electron spin between the first conductive layer and the second conductive layer; a gate electrode that is located above the channel region; and a tunnel barrier film that is located between the channel region and at least one of the first conductive layer and the second conductive layer.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: August 12, 2008
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki Saito, Hideyuki Sugiyama