Abstract: The invention provides an in-vehicle controller equipped with a heat radiation coating film which can efficiently radiate heat from a high temperature portion such as a heat generating body to a casing. An in-vehicle controller includes a heat radiation coating film, wherein the heat radiation coating film includes a first region that has a first boundary surface abutting on a base material, and a second region that has a second boundary surface where the heat radiation coating film abuts on air, wherein a thermal conductivity of the first region is higher than that of the second region, and wherein a thermal emissivity of the second region is higher than that of the first region.

Abstract: A method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate includes forming the silicon-containing inorganic film such that a surface has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent, the silicon-containing inorganic film being an SiO film or an SiON film and serving as a hard mask film.

Abstract: The present invention provides a patterning process, which comprises step of forming a BPSG film on the under layer film by using a composition for forming a coating type BPSG film including a base polymer and an organic compound with a content of 25 parts by mass or more of the organic compound with respect to 100 parts by mass of the base polymer, the base polymer having a silicon containing unit, a boron containing unit and a phosphorus containing unit with a total content of the boron containing unit and the phosphorus containing unit being 10 mol % or more, the organic compound having two or more hydroxyl groups or carboxyl groups per one molecule.

Abstract: A method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate includes forming the silicon-containing inorganic film such that a surface has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent, the silicon-containing inorganic film being an SiO film or an SiON film and serving as a hard mask film.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the silicon-containing inorganic film, comprising: forming the silicon-containing inorganic film such that a surface that will contact the resist film has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent; performing a silylation process after forming the silicon-containing inorganic film; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: A heat-generating component (3) is mounted on a surface (4b), on a case (12) side, of a circuit board (4). A recessed portion (5) is formed in a position facing the heat-generating component (3), on an inner wall surface (12e) side of a bottom wall (12a) of the case (12). Between an inner wall surface (5a) of this recessed portion (5) and the heat-generating component (3), a predetermined-sized component clearance (Ca) is provided, and a heat radiation member (6) is interposed in a position of the component clearance (Ca). A peripheral clearance (Cb) is provided between the surface (4b), on the case (12) side, of the circuit board (4) and the inner wall surface (12e) of the bottom wall (12a) of the case (12) on a peripheral edge side of the recessed portion (5).

Abstract: Depending on the orientation by which a breathing filter is mounted in a vehicle, water can accumulate in the breathing filter, and prevent the pressure difference between the space inside a case and the outside air from being adjusted; therefore, the vehicular layout is limited. Also, because the filter is formed in the center of the case, electronic parts cannot be installed on substrates on the upper and lower surfaces of the filter, meaning that the substrate size and the case size will increase. In addition, the costs will increase. The structure of the present invention is characterized in that breathing paths are provided on the surfaces sandwiching a portion where a filter film is welded in the corner of a resin-side case of a vehicle-mounted electronic control device such as an engine control unit or an automatic transmission control unit, and in that the breathing paths are connected inside.

Abstract: The present invention provides a patterning process, which comprises step of forming a BPSG film on the under layer film by using a composition for forming a coating type BPSG film including a base polymer and an organic compound with a content of 25 parts by mass or more of the organic compound with respect to 100 parts by mass of the base polymer, the base polymer having a silicon containing unit, a boron containing unit and a phosphorus containing unit with a total content of the boron containing unit and the phosphorus containing unit being 10 mol % or more, the organic compound having two or more hydroxyl groups or carboxyl groups per one molecule.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the inorganic film, comprising: forming the silicon-containing inorganic film; heat treating the formed silicon-containing inorganic film at a temperature more than 200° C. under an atmosphere containing oxygen; performing a silylation process after the heat treatment; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

Abstract: An electronic control apparatus includes housing members, and a circuit board. At least one of the housing members is opposed to a heat-generating region which is heated by the heat-generating electronic component. A heat radiating portion of the housing member includes a convex portion protruding from an inner wall surface at a location opposed to the heat-generating region, and a concave portion opened to an outer wall surface at a location shifted from the convex portion in a thickness direction. The convex portion is close to the heat-generating region through a clearance. The concave portion has a lateral wall formed in a tapered shape such that an opening area of the concave portion is larger than a bottom area of the concave portion. A thickness of the heat radiating portion is smaller than a thickness of a region peripheral to the heat radiating portion in the housing member.

Abstract: A polymer comprising recurring units having an acid-eliminatable group on a side chain and aromatic ring-bearing cyclic olefin units is used to formulate a chemically amplified negative resist composition. Any size shift between the irradiated pattern and the formed resist which can arise in forming a pattern including isolated feature and isolated space portions is reduced, and a high resolution is obtained.

Abstract: In a configuration that a thermal grease is applied between a circuit board having an electronic component mounted thereon and a case body containing the board to thermally connect both by the thermal grease, the application has not been easy since the thermal grease is high in initial viscosity. A thermal grease is made of a material that has a viscosity not impeding applicability at the initial stage (before application), for example, a viscosity of about 50-400 (Pa·s), and that increases to about 600-3,000 (Pa·s) in viscosity after application.

Abstract: A heat-generating component (3) is mounted on a surface (4b), on a case (12) side, of a circuit board (4). A recessed portion (5) is formed in a position facing the heat-generating component (3), on an inner wall surface (12e) side of a bottom wall (12a) of the case (12). Between an inner wall surface (5a) of this recessed portion (5) and the heat-generating component (3), a predetermined-sized component clearance (Ca) is provided, and a heat radiation member (6) is interposed in a position of the component clearance (Ca). A peripheral clearance (Cb) is provided between the surface (4b), on the case (12) side, of the circuit board (4) and the inner wall surface (12e) of the bottom wall (12a) of the case (12) on a peripheral edge side of the recessed portion (5).

Abstract: An electronic control device including a circuit board, a connector with connector pins having a board connecting portion at which the connector pins are electrically connected with the circuit board, a pair of housing members accommodating the circuit board and the connector therebetween, a waterproof seal portion through which connection between the connector and the pair of housing members and connection between the pair of housing members are provided in a fluid-tight manner, the waterproof seal portion including a connector-side waterproof seal portion disposed between the connector and one of the pair of housing members which is opposed to the board connecting portion of the connector pins, and a barrier portion disposed between the board connecting portion of the connector pins and the connector-side waterproof seal portion.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the inorganic film, comprising: forming the silicon-containing inorganic film; heat treating the formed silicon-containing inorganic film at a temperature more than 200° C. under an atmosphere containing oxygen; performing a silylation process after the heat treatment; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the silicon-containing inorganic film, comprising: forming the silicon-containing inorganic film such that a surface that will contact the resist film has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent; performing a silylation process after forming the silicon-containing inorganic film; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: A seal structure for an electronic control device having a circuit board housed in a watertight space a housing that is formed by fitting a plurality of fitting members together, has first and second seal portions which are formed at a fitting surface portion between the fitting members that are fitted together. One side of a pair of the fitting members of each of the first and second seal portions is provided with a seal groove, the other side is provided with a protruding line. An auxiliary seal groove and an auxiliary protruding line are formed on opposing surfaces of the seal groove and the protruding line at a merged part where the first and second seal portions meet each other. The auxiliary seal groove and the auxiliary protruding line continuously extend from the seal groove up to an end surface of the protruding line.

Abstract: A photomask blank is provided comprising a transparent substrate, a single or multi-layer film including an outermost layer composed of chromium base material, and an etching mask film. The etching mask film is a silicon oxide base material film formed of a composition comprising a hydrolytic condensate of a hydrolyzable silane, a crosslink promoter, and an organic solvent and having a thickness of 1-10 nm. The etching mask film has high resistance to chlorine dry etching, ensuring high-accuracy processing of the photomask blank.

Abstract: An electronic controller for a vehicle includes a circuit board on which an electronic component is mounted and a metal housing accommodating the circuit board therein. The housing includes an inner face and an outer face, at least one of the inner face and the outer face being subjected to surface treatment facilitating heat absorption and dissipation. The inner face of the housing further includes a protruding portion extending to a heating portion of the circuit board so as to be close to the heating portion, or includes concavities and convexities at at least a part thereof opposed to a surface of the circuit board on which the electronic component is mounted so as to increase a surface area of the inner face.