Patents by Inventor Yoshio Kawai

Yoshio Kawai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ester compounds
    Patent number: 6603037
    Abstract: Acrylic esters containing fluorine at &agr;-position and having an alkoxymethyl group introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters are improved in transparency, acid elimination and substrate adhesion and are used to formulate chemically amplified resist compositions for lithographic microfabrication.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: August 5, 2003
    Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Kazuhiko Maeda, Michitaka Ootani, Haruhiko Komoriya
  • Polymers, resist compositions and patterning process
    Patent number: 6582880
    Abstract: An acrylate resin containing fluorinated alkyl groups in ester side chains has high transmittance to VUV radiation. A resist composition using the resin as a base polymer is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for lithographic microprocessing.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: June 24, 2003
    Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co. Ltd., Central Glass Co., Ltd.
    Inventors: Yuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Fixed-length cell data and time-division data hybrid multiplexing apparatus
    Patent number: 6577623
    Abstract: Terminal ports, line ports, and various process boards can be freely connected to a TDM bus and an ATM bus through a TDM bus slot and an ATM bus slot. Therefore, a terminal port for terminating a time-division multiplexing, a terminal port for terminating an asynchronous transfer mode, a terminal port for terminating both, etc. can be freely combined in the same unit. Additionally, the communications system can be easily modified using the same unit by changing a package device of the line port. Furthermore, the functions realized by the unit can be flexibly extended by changing the package device of various process board.
    Type: Grant
    Filed: October 26, 1998
    Date of Patent: June 10, 2003
    Assignee: Fujitsu Limited
    Inventors: Yoshio Kawai, Kazuhiro Shibuya, Yasuyuki Mitsumori, Shigeharu Murakami
  • NOVEL ESTER COMPOUNDS
    Publication number: 20030100791
    Abstract: Acrylic esters containing fluorine at &agr;-position and having an alkoxymethyl group introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters are improved in transparency, acid elimination and substrate adhesion and are used to formulate chemically amplified resist compositions for lithographic microfabrication.
    Type: Application
    Filed: November 27, 2002
    Publication date: May 29, 2003
    Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Kazuhiko Maeda, Michitaka Ootani, Haruhiko Komoriya
  • Chemically amplified resist compositions and patterning process
    Publication number: 20030099901
    Abstract: A chemically amplified resist composition comprising (A) a polymer comprising recurring units containing at least one fluorine atom, (B) a compound of formula (1) wherein R1 and R2 are H, F or alkyl or fluorinated alkyl, at least one of R1 and R2 contains at least one fluorine atom, R3 is a single bond or alkylene, R4 is a n-valent aromatic or cyclic diene group, R5 is H or C(═O)R6, R6 is H or methyl, and n is 2, 3 or 4, (C) an organic solvent, and (D) a photoacid generator is sensitive to high-energy radiation and has improved sensitivity and transparency at a wavelength of less than 200 nm.
    Type: Application
    Filed: September 27, 2002
    Publication date: May 29, 2003
    Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Haruhiko Komoriya, Kazuhiko Maeda
  • ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME
    Publication number: 20030096189
    Abstract: Disclosed are novel onium salts represented by general formula (R) 3S+M, wherein three R's may be the same or different, each being an aryl group, provided that at least one of R's is a t-alkoxy substituted phenyl group, and M is an anion capable of foxing the sulfonium salts; and high energy radiation-responsive positive resist materials using said novel onium salts as acid generator.
    Type: Application
    Filed: March 11, 1997
    Publication date: May 22, 2003
    Inventors: FUJIO YAGIHASHI, TOMOYOSHI FURIHATA, JUN WATANABE, AKINOBU TANAKA, YOSHIO KAWAI, TADAHITO MATSUA
  • Polymers, resist compositions and patterning process
    Publication number: 20030082479
    Abstract: A copolymer of an acrylic monomer having at least one C6-20 alicyclic structure with a norbornene derivative or styrene monomer having a hexafluoroalcohol pendant is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.
    Type: Application
    Filed: June 25, 2002
    Publication date: May 1, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Publication number: 20030031953
    Abstract: A ternary copolymer comprising units of &agr;-trifluoro-methylacrylic carboxylate having acid labile groups substituted thereon, units of &agr;-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
    Type: Application
    Filed: June 25, 2002
    Publication date: February 13, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Publication number: 20030031952
    Abstract: A copolymer of an acrylate monomer containing fluorine at &agr;-position with a fluorinated hydroxystyrene derivative is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, resolution, transparency, substrate adhesion and plasma etching resistance, and is suited for lithographic microprocessing.
    Type: Application
    Filed: June 25, 2002
    Publication date: February 13, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Patent number: 6511787
    Abstract: An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: January 28, 2003
    Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Publication number: 20030008231
    Abstract: A base polymer having incorporated an ester group having a fluorinated alicyclic unit is provided. A resist composition comprising the polymer is sensitive to high-energy radiation, and has excellent sensitivity at a wavelength of less than 200 nm, significantly improved transparency by virtue of the fluorinated alicyclic units incorporated as well as satisfactory plasma etching resistance. The resist composition has a low absorption at the exposure wavelength of a F2 laser and is ideal as a micropatterning material in VLSI fabrication.
    Type: Application
    Filed: February 28, 2002
    Publication date: January 9, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Novel ester compounds
    Publication number: 20020198390
    Abstract: Acrylic esters containing fluorine at &agr;-position and having a lactone ring introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters have a high transparency to VUV and good adhesion to substrates and are used to formulate chemically amplified resist compositions for lithographic microfabrication.
    Type: Application
    Filed: June 25, 2002
    Publication date: December 26, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Publication number: 20020161148
    Abstract: A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
    Type: Application
    Filed: February 8, 2002
    Publication date: October 31, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Resist compositions and patterning process
    Publication number: 20020051935
    Abstract: A resist composition comprising (A) a polymer comprising recurring units having an alicyclic hydrocarbon backbone to which a carboxylate moiety capable of generating carboxylic acid when decomposed under acidic conditions is attached through a C1-C20 alkylene spacer, (B) a photoacid generator, and (C) an organic solvent is sensitive to high-energy radiation, and has excellent sensitivity and resolution at a wavelength below 180 nm, and good plasma etching resistance. Because these features of the inventive resist composition enable its use particularly as a resist at the exposure wavelength of a F2 excimer laser, a finely defined pattern can easily be formed, making the resist ideal as a micropatterning material in VLSI fabrication.
    Type: Application
    Filed: September 7, 2001
    Publication date: May 2, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd
    Inventors: Jun Hatakeyama, Yuji Harada, Jun Watanabe, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Publication number: 20020051936
    Abstract: An acrylate resin containing fluorinated alkyl groups in ester side chains has high transmittance to VUV radiation. A resist composition using the resin as a base polymer is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for lithographic microprocessing.
    Type: Application
    Filed: September 7, 2001
    Publication date: May 2, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Publication number: 20020048724
    Abstract: An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.
    Type: Application
    Filed: September 7, 2001
    Publication date: April 25, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Polymers, resist compositions and patterning process
    Publication number: 20020012871
    Abstract: Polymers comprising recurring units of formula (1) are provided wherein R1 is a straight, branched or cyclic divalent C1-20 hydrocarbon group or a bridged cyclic hydrocarbon group, R is hydrogen atom or an acid labile group, 0≦m≦3, 0≦n≦3 and 0≦m+n≦6.
    Type: Application
    Filed: June 1, 2001
    Publication date: January 31, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Toshiaki Takahashi, Toshinobu Ishihara, Jun Watanabe, Tohru Kubota, Yoshio Kawai
  • Image displaying apparatus
    Patent number: 6118458
    Abstract: An image displaying apparatus stores plural image data and displays one of the image data, which image data represent a growing plant (animal) or represent a series of motions of an animal. The apparatus further stores plural element data for growing the plant (animal). When one of the element data is selected, another image data of the plant (animal) is displayed in place of the previously displayed imaged data to show how the plant (animal) grew up responsive to the selected element data. The apparatus is provided with a sensor for detecting motion of a user. Detecting the motion of the user, the apparatus displays new image data representing a motion of the animal in place of the previously displayed image data to show how the animal reacts to the user's motion.
    Type: Grant
    Filed: April 27, 1998
    Date of Patent: September 12, 2000
    Assignee: Casio Computer Co., Ltd.
    Inventors: Yoshio Kawai, Shinichiro Sato, Yuichi Kobayashi, Jun Oshima
  • Apparatus for displaying images of living things to show growth and/or movement of the living things
    Patent number: 6061071
    Abstract: An image displaying apparatus stores plural image data and displays one of the image data, which image data represent a growing plant (animal) or represent a series of motions of an animal. The apparatus further stores plural element data for growing the plant (animal). When one of the element data is selected, another image data of the plant (animal) is displayed in place of the previously displayed imaged data to show how the plant (animal) grew up responsive to the selected element data. The apparatus is provided with a sensor for detecting motion of a user. Detecting the motion of the user, the apparatus displays new image data representing a motion of the animal in place of the previously displayed image data to show how the animal reacts to the user's motion.
    Type: Grant
    Filed: February 2, 1998
    Date of Patent: May 9, 2000
    Assignee: Casio Computer Co., Ltd.
    Inventors: Yoshio Kawai, Shinichiro Sato, Yuichi Kobayashi, Jun Oshima
  • Vibrating gyroscope
    Patent number: 6035713
    Abstract: A vibrating gyroscope includes a bar-shaped vibrator and a support member. The bar-shaped vibrator includes a drive element for vibrating the bar-shaped vibrator and a detection element for detecting the vibration of the bar-shaped vibrator. The bar-shaped vibrator has two grooves therein which extend along a direction perpendicular to a longitudinal direction of the bar-shaped vibrator in the vicinity of two node points of the vibration of the bar-shaped vibrator, respectively. The support member has a shape in which two arch portions held in a non-horizontal direction are connected by two connecting portions at both ends of the arch portions. The arch portions of the support member are connected to the bar-shaped vibrator at respective bottoms of the grooves thereof.
    Type: Grant
    Filed: September 3, 1998
    Date of Patent: March 14, 2000
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Akira Mori, Akira Kumada, Yoshio Kawai