Abstract: A calibration method of a pipeline analog-to-digital converter (ADC) that includes a residue amplifier includes the following steps: (A) generating an offset voltage; (B) adjusting a first input voltage of the residue amplifier according to the offset voltage and a reference digital code; (C) converting an output voltage of the residue amplifier into a second digital code; (D) performing a correlation operation on the reference digital code and the second digital code to generate an intermediate gain; (E) recording the intermediate gain; (F) repeating step (A) to step (E) to record a plurality of intermediate gains; (G) selecting one of the intermediate gains as a digital gain according to the second digital code; and (H) generating an output digital code according to a first digital code, the reference digital code, the digital gain, and the second digital code.

Abstract: A capacitor unit includes a first finger electrode, a second finger electrode, and a third finger electrode. The first finger electrode points to the second finger electrode and the third finger electrode, and is configured to receive a first terminal signal. The second finger electrode points to the first finger electrode, and is configured to receive a second terminal signal. The third finger electrode is disposed adjacent to the second finger electrode with an interval. The third finger electrode points to the first finger electrode, and is configured to receive another second terminal signal. One part of the first finger electrode is disposed interleaved with the second finger electrode, and the other part of the first finger electrode is disposed interleaved with the third finger electrode.

Abstract: A method, system, and computer program product for protecting API KEYs for accessing services in a cloud environment are disclosed. A first request for generating a virtual key for a user in an organization to access a service in a cloud environment is received. The first request includes information of the organization, an identity of the user, and information of the service. A first authentication request is sent to an identity provider of the organization based on the information of the organization and the identity of the user. In response to the first authentication being successful, an API key for the organization to access the service is determined. The virtual key for the user to access the service is generated based on the API key, the information of the organization, and the identity of the user. The virtual key is returned as a response of the first request.

Abstract: The present invention relates to the technical field of tunnel shield construction, specifically to a method for calculating diameter of an annular non-full formwork support for a circular shaft. By calculating and designing an inner diameter of a formwork support, sufficient space left inside a shaft can be ensured, and the thickness of secondary lining can be ensured at the same time, thereby preventing from affecting the structural stability of the shaft.

Abstract: A mask for extreme ultraviolet (EUV) lithography includes a multilayer (ML) stack including alternating metal and semiconductor layers disposed over a first surface of a mask substrate, a capping layer disposed over the ML stack, and an absorber layer disposed over the capping layer. An image pattern is formed in the absorber layer. A border layer surrounding the image pattern is disposed over the absorber layer.

Abstract: A method of manufacturing an extreme ultraviolet mask, including forming a multilayer Mo/Si stack including alternating Mo and Si layers over a first major surface of a mask substrate, and forming a capping layer over the multilayer Mo/Si stack. An absorber layer is formed on the capping layer, and a hard mask layer is formed over the absorber layer. The hard mask layer is patterned to form a hard mask layer pattern. The hard mask layer pattern is extended into the absorber layer to expose the capping layer and form a mask pattern. A border pattern is formed around the mask pattern. The border pattern is extended through the multilayer Mo/Si stack to expose the mask substrate and form a trench surrounding the mask pattern. A passivation layer is formed along sidewalls of the trench.

Abstract: A voice processing method includes: performing voice conversion processing based on a user voice of a target user and specified timbre information to obtain a specified converted voice having a specified timbre; training a voice conversion model based on the user voice of the target user and the specified converted voice to obtain a target voice conversion model; inputting a target text for voice synthesis and the specified timbre information into a voice synthesis model to generate an intermediate voice having the specified timbre; and performing voice conversion processing on the intermediate voice by the target voice conversion model to generate a target synthesized voice that matches a timbre of the target user.

Abstract: Disclosed is a brand value evaluation method, comprising: acquiring a brand set to be processed containing a plurality of brands to be processed; collecting evaluation data corresponding to the brand set to be processed, and identifying the brand set to be processed based on the evaluation data to obtain a reputation degree and a volume of each brand to be processed in the brand set to be processed; acquiring a brand to be evaluated, and judging whether the brand to be evaluated exists in the brand set to be processed; when it exists, determining the reputation degree and volume of the brand to be evaluated as a target reputation degree and a target volume; determining a value for the brand to be evaluated according to the reputation degree of each brand to be processed, the volume of each brand to be processed, the target reputation degree and the target volume.

Abstract: A motor rotor includes a rotor core and a plurality of reluctance parts. The rotor core includes a plurality of metal parts and an inner hole for the motor rotor, the inner hole of the motor rotor passes through the rotor core, and the areas of the metal parts form a rotor metal total area ?Ametal. The plurality of reluctance parts are disposed surrounding the inner hole of the motor rotor, each of the reluctance parts comprising a plurality of flux barriers penetrating through the rotor core. The areas of the flux barriers in all the reluctance parts form a flux barrier total area ?Aair. The sum of ?Aair and ?Ametal is a rotor effective total area, and the ratio of ?Aair to the rotor effective total area is a flux barrier ratio KA, which is expressed as K A = ? A air ? A air + ? A metal , and satisfies 0.25?KA?0.5.

Abstract: A first capping layer is deposited over a substrate. A first capping layer is deposited over a substrate. A network of nanowires is grown over the first capping layer. A second capping layer is deposited over the network of nanowires. The substrate is etched to expose the first capping layer. The first capping layer and the second capping layer are thinned around the nanowires to form a coating on the nanowires.

Abstract: The present disclosure provides an apparatus for a semiconductor lithography process. The apparatus includes a mask defining a circuit pattern to be transferred. The apparatus further includes a pellicle including a pattern formed in a first surface, wherein the pellicle is attached to the mask at the first surface. The apparatus also includes an adhesive material layer disposed between the mask and the first surface. The pattern may include a plurality of capillaries. Each capillary of the plurality of capillaries may have a dimension in a plane of the first surface between about 1 ?m and about 500 ?m. Each capillary of the plurality of capillaries may have a ratio of depth to width greater than or equal to about 100. The adhesive material layer may include an adhesive having a glass transition temperature (Tg) greater than room temperature.

Abstract: A photolithography mask includes a substrate, a reflective multilayer structure over the substrate, an adhesion layer over the reflective multilayer structure, a capping layer over the adhesion layer, and a patterned absorber layer over the capping layer. The capping layer includes a non-crystalline conductive material.

Abstract: A pellicle for an EUV photo mask includes a first capping layer, a matrix layer disposed over the first capping layer, a second capping layer disposed over the matrix layer; and a metallic layer disposed over the second capping layer.

Abstract: A method of manufacturing an extreme ultraviolet mask, including forming a multilayer Mo/Si stack including alternating Mo and Si layers over a first major surface of a mask substrate, and forming a capping layer over the multilayer Mo/Si stack. An absorber layer is formed on the capping layer, and a hard mask layer is formed over the absorber layer. The hard mask layer is patterned to form a hard mask layer pattern. The hard mask layer pattern is extended into the absorber layer to expose the capping layer and form a mask pattern. A border pattern is formed around the mask pattern. The border pattern is extended through the multilayer Mo/Si stack to expose the mask substrate and form a trench surrounding the mask pattern. A passivation layer is formed along sidewalls of the trench.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. The absorber layer includes one or more layers of an Jr based material, a Pt based material or a Ru based material.

Abstract: A pellicle for an EUV photo mask includes a first capping layer, a matrix layer disposed over the first capping layer, a second capping layer disposed over the matrix layer; and a metallic layer disposed over the second capping layer.

Abstract: A pellicle for an EUV photo mask includes a base membrane layer, a core layer disposed over the base membrane layer and one or more metallic layers disposed over the core layer.

Abstract: The application relates to the technical field of information extraction, in particular to a keyword extraction method. The method comprises: acquiring a text to be processed, and performing word segmentation on the text to be processed to obtain at least one word segmentation result; performing entity recognition on all the word segmentation results through a preset entity recognition model to obtain at least one entity recognition result; performing part-of-speech tagging on all the entity recognition results to obtain part-of-speech tagging results; scoring all the part-of-speech tagging results through a preset scoring metric to obtain score values; filtering all the part-of-speech tagging results based on all the score values to obtain at least one target word; running word co-occurrence statistics on all the target words to obtain word co-occurrence values, and performing keyword extraction on all the target words based on the word co-occurrence values to obtain keyword extraction results.