Mask carrier treatment to prevent haze and ESD damage

Abstract

A reticle carrier including a base portion and a cover portion at least partially detachable from the base portion. The base portion and the cover portion are configured to collectively house a reticle in a region collectively defined by the base portion and the cover portion when the base portion and the cover portion are fully attached. At least a portion of an interior surface of at least one of the base portion and the cover portion is treated with a sulfide-absorbing composition, such as silver or a silver-containing alloy.

Description

This application is related to commonly-assigned U.S. application Ser. No. 11/236,169, entitled “FULLY ELECTRIC FIELD SHIELDING RETICLE POD,” filed Sep. 27, 2005.

BACKGROUND

When not in use, reticles and other masks are housed in reticle pods and/or similar reticle carriers. The carriers are often made of dissipative material to reduce the risk of electrostatic discharge (ESD) inadvertently damaging the reticle when the reticle is being transferred to or from the carrier. Generally, the reticle is housed in a carrier until its utilization during lithographic processing, such as in a scanner or stepper. Thereafter, the reticle is returned to the same carrier or another carrier until its next use.

When the reticle is employed during lithography processing, the exposure light utilized for pattern transfer can enhance sulfide and ammonia in the environment. The subsequent reaction can result in the formation of a haze on the reticle, whether on the glass side and/or patterned (chromium) side. Moreover, previous attempts to prevent the formation of such haze generally result in increased risk of ESD damage.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is best understood from the following detailed description when read with the accompanying figures. It is emphasized that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.

FIG. 1 is a sectional view of at least a portion of an embodiment of apparatus according to aspects of the present disclosure.

FIG. 2 is a sectional view of the apparatus shown in FIG. 1 in a subsequent stage of manufacture according to aspects of the present disclosure.

FIG. 3 is a perspective view of at least a portion of an embodiment of the apparatus shown in FIG. 1.

FIG. 4 is a perspective view of a portion of the apparatus shown in FIG. 3.

FIG. 5 is a magnified view of a portion of the apparatus shown in FIG. 4.

FIG. 6 is a perspective view of a portion of the apparatus shown in FIG. 3.

FIG. 7 is a magnified view of a portion of the apparatus shown in FIG. 6.

FIG. 8 is a top view of at least a portion of an embodiment of apparatus according to aspects of the present disclosure, the apparatus being depicted in a closed configuration.

FIG. 9 is a front view of the apparatus shown in FIG. 8, the apparatus being depicted in the closed configuration of FIG. 8.

FIG. 10 is a top view of the apparatus shown in FIG. 9, the apparatus being depicted in an open configuration.

DETAILED DESCRIPTION

It is to be understood that the following disclosure provides many different embodiments, or examples, for implementing different features of various embodiments. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. Moreover, the formation of a first feature over or on a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed interposing the first and second features, such that the first and second features may not be in direct contact.

Referring to FIG. 1, illustrated is a sectional view of at least a portion of an embodiment of apparatus 100 according to aspects of the present disclosure. The apparatus 100 may be or include a container or carrier (hereafter collectively referred to as a container) configured to house at least one reticle 110. However, the scope of the present disclosure is not limited to such implementations. For example, aspects of the present disclosure may be applicable or readily adaptable to containers utilized to house other ESD-sensitive object(s), whether for storage and/or transportation. Such ESD-sensitive objects may include, without limitation, photomasks and other masks. The container apparatus 100 may also be referred to as reticle box, reticle pod or reticle carrier. The container 100 may be configured to contain a single reticle 100 or multiple reticles, including multiple different reticles.

The container 100 may include a base portion 102 and a cover portion 104. The base portion 102 and cover portion 104 are configured to substantially envelope the one or more reticles 110 being stored and/or transported via the container 100. For example, as in the embodiment depicted in FIG. 1, the base portion 102 and the cover portion 104 may be configured to cooperate to form a six-sided box. However, the base portion 102 may not necessarily exhibit the substantially planar shape depicted in FIG. 1, yet may still be configured to cooperate with the cover portion 104 to form a box or otherwise-shaped enclosure.

The base portion 102 and/or the cover portion 104 may partially or substantially comprise a dissipative material (e.g., electrostatic dissipative material). The dissipative material may include cellophane, glassine and/or other materials, including those having a surface resistivity ranging between about 10⁵ ohms/in² and about 10¹² ohms/in². Alternatively, or additionally, the base portion 102 and cover portion 104 may partially or substantially comprise a plastic material and/or other dielectric materials. For example, the base portion 102 and cover portion 104 may include a multilayer structure including a layer of plastic film and a layer of electrostatic-dissipative material film, which may be adhered or otherwise coupled to one another.

The cover portion 104 may be configured to include one or more doors located in one or more of its side walls operable to provide one or more openings through which one or more reticles 110 may be transferred into and out of the container 100. Alternatively, or additionally, such door may be located on the base portion 102 and/or a portion of the cover portion 104 distally opposing and, possibly, substantially parallel to the base portion 102. The cover portion 104 may also include a handle extending from or coupled to one or more of the outer surfaces of the cover portion 104 and/or the base portion 102. For example, such handle may be configured to aid human or automatic handling of the container apparatus 100.

The reticle 110 includes a substantially transparent substrate 112 having an opaque pattern 114 formed thereon. The substrate 112 may partially or substantially comprise fused quartz (e.g., SiO₂) and/or calcium fluoride (e.g., CaF₂), and/or other materials or combinations thereof. The reticle 110 also includes a patterned absorption layer 114 formed on the substrate 112, such as may include chromium, iron oxide, or an inorganic film made with MoSi, ZrSiO, SiN, and/or TiN, among other materials. The reticle 110 may also include a plurality of phase-shifting features, such as may be etched into or deposited onto the substrate 112, or such as may be integral to the absorption layer 114 for phase shifting of a radiation beam incident thereon. The patterned layer 114 may partially or substantially comprise MoSi, which may also function as a phase shifter. The shifter may also be incorporated into a phase-shift mask (PSM).

The reticle 110 may also include a pellicle 116, which may be supported at a distance from the substrate 112 by a standoff or pellicle frame 118. The pellicle 116 may be offset from the substrate 112 by an amount such that any particulates or contaminants may settle on the pellicle 116 instead of on the substrate 112. For example, if such contaminants are allowed to settle on the substrate 112, the pattern transferred from the reticle 110 to a working piece (e.g., a silicon process wafer) may be inaccurate. However, by employing the pellicle 116 at an offset distance from the substrate 112, the contaminants may instead settle on the pellicle 116, which may be out of the focal plane of the exposure apparatus employed to transfer the pattern of the absorption layer 114. Consequently, the contaminants may have less or no effect on the accuracy of the pattern transferred to the working piece.

The pellicle 116 may comprise a thin layer (e.g., relative to the thickness of the substrate 112) that is stretched or otherwise formed over the frame 118 above the surface of the substrate 112. The pellicle 116 may be substantially transparent, at least optically, relative to the exposure apparatus employed during pattern transfer.

The container 100 may also include one or more support members 106 configured to individually or collectively support one or more reticles 110 inside the container 100. The support members 106 may be formed integrally with the base portion 102 and/or the cover portion 104. Alternatively, the support members 106 may be discrete members that are coupled to the base portion 102 and/or the cover portion 104 by adhesive, welding, threaded or other mechanical fasteners, and/or other coupling means.

The container apparatus 100, the reticle 110, and/or portions thereof may be commercially available apparatus. For example, the container apparatus 100 may be (or be substantially similar to) a reticle pod commercially available from Microtome Precision, Inc., of Colorado Springs, Colo. Examples of such Microtome reticle pods include the E111 SEMI SPRA 99101-00 (a SEMI-compliant, 150 mm, single reticle pod for automated operations) and the E111 SEMI SPRA 99101-00 (a SEMI-compliant, 150 mm, single reticle pod for manual operations). Additional examples of Microtome reticle pods include the E112 SEMI MRC 99600-00 (a SEMI-compliant, 6 inch, multi-reticle cassette), the 6 inch multi-reticle cassette 87620-00 (for use on ASML equipment), the E112 SEMI MRPA 21321-00 (a SEMI-compliant, 150 mm, multi-reticle pod for automated operations), and the E112 SEMI MRPM 21320-00 (a SEMI-compliant, 150 mm, multi-reticle pod for manual operations).

The reticle 110 may substantially conform to industry standard SEMI P1 or SEMI P34, and the pellicle 118 may substantially conform to industry standard SEMI P5. The lateral dimensions of the reticle 110 (with or without the pellicle 118) may range between about 5 inches and about 6 inches, with a thickness of about 3/32-inch, ⅛-inch or ¼-inch. The overall lateral dimensions of the apparatus 100 may range between about 4 inches and about 9 inches, with an overall thickness ranging between about one-half inch and about 2 inches. Of course, the scope of the present disclosure is not limited to such dimensions.

Referring to FIG. 2, illustrated is a sectional view of the container apparatus 100 shown in FIG. 1 in a subsequent manufacturing stage according to aspects of the present disclosure. One or more surfaces of one or more of the above-described components of the container 100 may include an absorbing layer 120. The absorbing layer 120 may be formed on one or more external surfaces 104a of the cover portion 104, one or more internal surfaces 104b of the cover portion 104, one or more external surfaces 102a of the base portion 102, and/or one or more internal surfaces 102b of the base portion 102. The absorbing layer 120 may additionally or alternatively be formed on one or more surfaces of the reticle substrate 112 and/or one or more surfaces of the reticle pellicle 116. While the embodiment shown in FIG. 2 includes an absorbing layer 120 on each of these surfaces, other embodiments may not include such extensive coverage of absorbing layers 120. For example, the reticle substrate 112 and/or pellicle 116 may include absorbing layers 120 even if the base portion 102 and/or cover portion 104 do not, and the base portion 102 and/or cover portion 104 may include absorbing layers 120 even if the reticle substrate 112 and/or pellicle 116 do not.

Each absorbing layer 120 may partially or substantially comprise silver (Ag). A characteristic of silver is its ability to absorb sulfide. Consequently, sulfide may be partially or substantially absorbed by the absorbing layer(s) 120, thus reducing or eliminating the sulfide-ammonia reaction that conventionally forms a haze on the reticle substrate 112 and/or pellicle 116. However, other materials may also or additionally be employed in one or more of the absorbing layers 120. One or more of the absorbing layers 120 may also or alternatively include stainless steel, copper, aluminum, iron, nickel, or combinations thereof.

One or more of the absorbing layers 120 may have a thickness ranging between about 0.6 mm and about 1.0 mm, although other thicknesses are also within the scope of the present disclosure. The absorbing layer(s) 120 may be formed by electroplating, electroless plating, spin-on coating, chemical vapor deposition (CVD), physical vapor deposition (PVD) such as evaporation and sputtering, or a combination thereof. The absorbing layer(s) 120 may also be formed by implant or doping procedures. The container apparatus 100 may also include one or more adhesive layers to enhance the adhesion of one or more of the absorbing layers 120 to underlying surfaces. Each absorbing layer 120 may also be substantially similar in composition and/or manufacture, although other embodiments may include different absorbing layers 120 that vary in composition and/or manufacture.

Aspects of the present disclosure may allow the elimination of the haze which conventionally formed on the reticle substrate 112, pellicle 116 and/or portions of the container apparatus 100 due to the reaction of sulfide and ammonia. Alternatively, such aspects may substantially decrease the rate at which the haze conventionally forms. In either case, the lifetime (e.g., exposure cycles and/or storage duration) of the reticle 110 and/or pellicle 116 may be substantially increased.

Moreover, such results can be achieved even with the base portion 102 and/or the cover portion 104 being substantially metallic, including in a manner that substantially prevents or reduces electric fields passing through the base and/or cover portions 102, 104, isolating charge items in the environment. Thus, one embodiment within the scope of the present disclosure can include modifying a commercially available reticle pod, cassette, carrier, etc. by forming the above-described absorbing layer(s) 120 on one or more surfaces. Alternatively, such formation of the absorbing layer(s) 120 may be performed by the manufacturer of the reticle pod, cassette or carrier, whether such formation includes deposition and/or doping processing. However, the elimination or reduction of haze on the reticle substrate 112 and/or pellicle 116 resulting from the reaction of sulfide and ammonia can also or alternatively be achieved by covering or implanting at least a portion of the reticle substrate 112 and/or pellicle 116 with the above-described absorbing layer(s) 120.

In either case, the number of reticles and/or pellicles which are conventionally scrapped due to haze formation or ESD damage can be substantially reduced with the implementation of one or more aspects of the present disclosure. Moreover, as a result of reduced, delayed or eliminated haze formation, wafer yield can also be improved with the implementation of one or more aspects of the present disclosure.

Additionally, aspects of the above-described absorbing layer(s) 120 may be applicable or readily adaptable to a reticle operation environment, in contrast to the reticle storage and transportation environment of the container apparatus 100. For example, by coating, implanting or otherwise treating surfaces of the reticle operation environment (e.g., within a lithographic pattern transfer apparatus) with silver and/or other absorbing materials, haze formation on the reticle may also be reduced, delayed or eliminated during and after reticle operations.

Aspects of the present disclosure are also applicable or readily adapted to non-conventional reticle carrier apparatus. For example, in contrast to coating the surfaces of a conventional reticle carrier apparatus with a sulfide- or ammonia-absorbing composition, the structure of a reticle carrier apparatus can substantially comprise a sulfide- or ammonia-absorbing composition. Thus, in one embodiment, the base and cover portions 102, 104 shown in FIGS. 1 and 2 may substantially comprise silver, for example. Moreover, such structure may also be doped or implanted with one or more dissipative materials, in contrast to embodiments described above in which the base and cover portions 102, 104 substantially comprise one or more dissipative materials that are doped or implanted with one or more sulfide- or ammonia-absorbing materials.

In a related embodiment, a liner, sheet, plate or other component may be coupled inside the apparatus 100, and may partially or substantially comprise silver and/or another absorbing composition, and/or may be coated with silver and/or another absorbing composition. Thus, in contrast to coating or implanting an absorbing composition into an existing apparatus (e.g., a commercially available reticle container), or in addition to such processing, the additional component may be coupled inside the apparatus 100, whether by adhesive, welding, threaded or other mechanical fasteners, and/or otherwise.

Referring to FIG. 3, illustrated is a perspective view of at least a portion an embodiment of the apparatus 100 shown in FIGS. 1 and 2, herein designated by the reference numeral 150. The container apparatus 150 is substantially similar to the container apparatus 100 shown in FIGS. 1 and 2, with the possible exceptions/additions described below.

The apparatus 150 includes a base portion 152 and a cover portion 154 which may be substantially similar in composition and manufacture to the base portion 102 and cover portion 104 shown in FIGS. 1 and 2, but may have a different shape compared to the base and cover portions 102, 104. When assembled, the base portion 152 may be substantially enclosed by the cover portion 154. For example, only tabs 153 of the base portion 152 are visible in FIG. 3. The tabs 153 may be function in the alignment and/or engagement of the base and cover portions 152, 154.

The apparatus 150 also includes a handle 160 secured to or extending from the cover portion 154. The handle 160 may be configured for manual and/or automated operations involving the apparatus 150. The apparatus 150 may also include an exterior platform 162 secured to or extending from the cover portion 154. The platform 162 may aid in stacking multiple instances of the apparatus 150, particular where the handle 160 is externally positioned in a central portion of the cover portion 154, such as in the embodiment depicted in FIG. 3. For example, the height to which the platform 162 extends from the cover portion 154 may be about equal to or greater than the height to which the handle extends from the cover portion 154 (or other mutual reference point). Consequently, the platform 162 may provide a substantially flat or planar surface upon which an additional instance of the apparatus 150 may be stacked with greater stability, at least compared to the stability of such stacking in the absence of the platform 162.

The platform 162 may include a perimeter and/or inner profile (whether two-dimensional or three-dimensional) that substantially conforms or otherwise cooperates with a corresponding profile of the base portion 152. Consequently, engagement or other cooperation of the corresponding perimeters and/or profiles of the platform 162 of a first instance of the apparatus 150 and the base portion 152 of a second instance of the apparatus 150 may limit the relative lateral translation of the first and second instances of the apparatus 150 when stacked one upon the other. Thus, for example, the height of the platform 162 relative to the handle 160 may provide roll, pitch and/or vertical stability when multiple instances of the apparatus 150 are stacked, and the corresponding perimeters and/or profiles of the platform 162 and the base portion 152 may simultaneously provide lateral and/or yaw stability.

The exterior surfaces 154a of the cover portion 154, the handle 160 and/or the platform 162 may be partially or substantially treated with one or more absorbing layers 170. Each absorbing layer 170 may be substantially similar in composition and manufacture to the absorbing layer 120 described above. For example, the absorbing layer(s) 170 may substantially comprise silver, and may be applied to the cover portion 152, handle 160 and/or platform 162 by plating or implant processes.

Referring to FIG. 4, illustrated is a perspective view of the inside of the cover portion 154 shown in FIG. 3. A substantial portion of the interior surfaces 154b of the cover portion 154 is coated with an absorbing layer 170 partially or substantially comprising silver and/or other sulfide-absorbing compositions. FIG. 4 also depicts that the cover portion 154 may include various supports and/or mechanisms for positioning and securing a reticle, possibly in conjunction with corresponding supports and/or mechanisms of the base portion 152.

FIG. 5 is a magnified perspective view of a portion of the cover portion 154 shown in FIG. 4. Referring to FIGS. 4 and 5, collectively, the container apparatus 150 may contain one or more standoffs 164 which may reduce or prevent erosion of the absorbing layer 170 in response to contact with the reticle or other structure within the apparatus 150. For example, the standoffs 164 may partially or substantially comprise iron, rubber, plastic, and/or other materials selected to prevent rubbing, wearing, chipping, scratching, or otherwise comprising the integrity of the absorbing layer 170. The standoffs 164 may be coupled to the absorbing layer and/or other portion of the cover portion 154 by adhesive, bonding, welding, threaded or other mechanical fasteners, and/or other means. The coupling between the standoffs 164 may be a detachable coupling, such that the standoffs 164 may be replaced when necessary. The standoffs 164 may also be coated with silver and/or other sulfide-absorbing compositions. Such coating may be applied to the standoffs 164 before or after the standoffs 164 are secured to the cover portion 154.

Referring to FIG. 6, illustrated is a perspective view of the inside of the base portion 152 shown in FIG. 3. A substantial portion of the interior surfaces 152b of the base portion 152 is coated with an absorbing layer 170 partially or substantially comprising silver and/or other sulfide-absorbing compositions. FIG. 6 also depicts that the base portion 152 may include various supports and/or mechanisms for positioning and securing a reticle, possibly in conjunction with corresponding supports and/or mechanisms of the cover portion 154.

FIG. 7 is a magnified perspective view of a portion of the base portion 152 shown in FIG. 6. Referring to FIGS. 6 and 7, collectively, the container apparatus 150 may contain one or more standoffs 166 which may reduce or prevent erosion of the absorbing layer 170 in response to contact with the reticle or other structure within the apparatus 150. The standoffs 166 may be substantially similar to the standoffs 164, at least with respect to composition, manufacture and assembly.

FIG. 8 is a top view of at least a portion of an embodiment of a container apparatus 200 according to aspects of the present disclosure, and FIG. 9 is a front view of the apparatus 200 shown in FIG. 8. Referring to FIGS. 8 and 9, collectively, the container 200 may be a mask package for housing reticles with or without pellicles during storage and/or transportation. At least in this regard, the container 200 may be substantially similar to the apparatus 100 and/or the apparatus 150 described above, such as with respect to composition, manufacture, and/or functionality.

For example, each of the containers 100, 150 and 200 may be configured to house reticles with minimal contact to the reticles, including to the extent that the containers may be easily opened and closed for the addition or removal of one or more reticles. The containers 100, 150 and 200 may also be configured to minimize particle generation during the opening and closing of the containers 100, 150 and 200, as well as during translation of reticles in and out of the containers 100, 150 and 200. For example, and as described above, the containers 100, 150 and 200 may comprise two structural halves or portions, such as the base portions 102, 152 described above and the cover portions 104, 154 described above. The container apparatus 200 also includes a base portion 202 and a cover portion 204, which may be hinged together to facilitate opening and closing the container 200 without separating the base and covering portions 202, 204 (the base portions 102, 152 and the cover portions 104, 154 may be similarly hinged). For example, the base portion 202 may be hinge-coupled to the cover portion 204 by a roller hinge, which may minimize particle generation relative to other types of hinges. However, other embodiments within the scope of the present disclosure may include hinges other than or in addition to roller hinges to couple the base portion 202 and the cover portion 204.

The container apparatus 200, as well as the apparatus 100 and 150 described above and others within the scope of the present disclosure, may be configured to house a single reticle or multiple reticles. In either case, the housed reticles may include pellicles on one or both sides. The reticles may include Ultratech reticles, Nikon reticles, GCA reticles, ASM reticles, and/or Canon reticles, among other commercially available examples, although future-developed or non-conventional reticles may also be housed with the apparatus 200.

The apparatus 200 may also include latching means 270 configured to keep the apparatus 200 closed after rotating the base portion 202 and cover portion 204 towards each other. The latching means 270 may comprise any commercially available latches, hooks, fasteners, and/or other structure for maintaining the closed configuration shown in FIG. 8. The latching means 270 may also include robotic-compatible latching means.

An absorbing material may substantially cover the external surfaces 202a of the base portion 202 and the external surfaces 204a of the cover portion 204. The absorbing material may be substantially similar to the absorbing layer 120 described above, at least with respect to composition and manufacture. For example, the base and cover portions 202, 204 may substantially comprise an aluminum, iron or steel structure that is partially or substantially plated or otherwise coated with silver, other sulfide-absorbing materials, and/or combinations or alloys thereof. The composition of such structure may also or alternatively comprise other electrostatic dissipative materials. The structure of the base and cover portions 202, 204 may, alternatively, substantially comprise silver, other sulfide-absorbing materials, and/or combinations or alloys thereof, in contrast to merely being plated or otherwise coated with a sulfide-absorbing composition.

The apparatus 200 may be configured to be generally compact and/or otherwise able to be stacked with other instances of the apparatus 200. For example, the base portion 202 may include a recess 202c, and the cover portion 204 may include a protrusion 204c configured to be received by the recess 202c. The perimeters of the protrusion 204c and the recess 202c may be configured such that, when multiple instances of the apparatus 200 are stacked in a vertical direction, the protrusion 204c and the recess 202c cooperate to restrain or limit relative translation of the base and cover portions 202, 204 in a horizontal direction.

For example, the perimeters of the protrusion 204c and the recess 202c may substantially follow or conform to the outer perimeters of the base and cover portions 202, 204, although being offset radially inward. However, such similarity between the shape or lateral profile of the protrusion 204c and recess 202c relative to the perimeters of the base and cover portions 202, 204 may not exist in some embodiments within the scope of the present disclosure, such that the protrusion 204c and/or the recess 202c may have otherwise-shaped perimeters or lateral profiles, including those with less or no similarity to the perimeter of the base or cover portions 202, 204. Moreover, the base portion 202 may include a protrusion instead of the recess 202c, such that the cover portion 204 includes a recess instead of the protrusion 204c. The height/depth of the protrusion 204c and/or the recess 202c, may range between about 1.0 mm and about 2.0 cm, such as about 5.0 mm. However, the depth of the recess 202c may be at least slightly greater than the height of the protrusion 204c. Similarly, the lateral dimensions of the recess 202c may be at least slightly greater than the lateral dimensions of the protrusion 204c.

Referring to FIG. 10, illustrated is a top view of the apparatus 200 shown in FIGS. 8 and 9. The apparatus 200 is depicted in FIG. 10 as being oriented in an open configuration, as opposed to the closed configuration depicted in FIGS. 8 and 9. The apparatus 200 may include one or more landing pads 210 configured to prevent tearing or otherwise damaging the reticles housed in the apparatus 200, and/or the pellicles of such reticles. The landing pads 210 may be substantially to the standoffs 164 described above, at least with respect to composition and/or manufacture. However, the landing pads 210 may not have the same shape as the standoffs 164, and may not have the same shapes as other ones of the landing pads 210. The landing pads 210 may be secured to the inside surfaces of the base and/or cover portions 202, 204 by adhesive, welding, threaded or other mechanical fasteners, and/or other means. The landing pads 210 may also be formed integral to the base and/or cover portions 202, 204, such as by a press-forming manufacturing process. In such embodiments, the raised surface of the landing pads 210 may be coated or treated with a material other than the silver or other sulfide-absorbing composition coating the remainder of the base and cover portions 202, 204, such as a material coating selected to minimize damage resulting from physical contact with the reticle or pellicle.

The apparatus 200 also includes one or more guides 220 each configured to minimize damage to the house reticle(s). For example, the guides 220 may have rounded corners and edges, thereby minimizing the potential for scratching a reticle or tearing a pellicle when positioning a reticle between the guides 220. The guides 220 may also be sized and positioned within the base and/or cover portions 202, 204 such that the housed reticle(s) is secured in a central portion of the inner cavity of the apparatus 200. Consequently, the housed reticle(s) may be protected against impact forces suffered by the exterior of the apparatus 200.

The apparatus 200 can also include one or more hinges 280 coupling the base and cover portions 202, 204. The hinges 280 may be roller hinges, as described above, although other types of hinges are also within the scope of the present disclosure, such as butt hinges, continuous hinges, spring hinges, paumelle or olive knuckle hinges, and others. The hinges 280 may also be configured such that the base and cover portions 202, 204 are detachable when the latches 270 are released, such as may be accomplished via loose joint hinges or other hinges having two separable parts.

In view of all of the above, it should be readily apparent to those skilled in the pertinent art that the present disclosure introduces a reticle carrier including, at least in one embodiment, a base portion and a cover portion at least partially detachable from the base portion. The base portion and the cover portion are configured to collectively house a reticle in a region collectively defined by the base portion and the cover portion when the base portion and the cover portion are fully attached. At least a portion of an interior surface of at least one of the base portion and the cover portion is treated with a sulfide-absorbing composition, such as silver or a silver-containing alloy.

Another embodiment of similar apparatus includes a reticle carrier and a sulfide-absorbing member. The reticle carrier has an internal region configured to house at least one reticle, wherein the reticle carrier at least partially comprises an electrostatic dissipative composition. The reticle carrier may be a commercially available product, in some embodiments. The sulfide-absorbing member is located at least partially within the internal region of the reticle carrier.

According to aspects of these and other embodiments within the scope of the present disclosure, the various environments to which a reticle is exposed and which include sulfide can be less damaging when ammonia is present. That is, the sulfide-absorbing member or similarly treated surface of the reticle carrier may at least partially absorb the sulfide in such embodiments. Consequently, the conventional sulfide-ammonia reaction—that results in a haze forming on the reticle and/or other proximate surfaces—may be reduced, and possibly eliminated to a substantial degree. Moreover, this advantage can be obtained even while the structure of the reticle carrier partially or substantially comprises an electrostatic dissipative composition. Accordingly, the above-described haze reduction can be achieved while maintaining adequate levels of ESD protection.

The present disclosure also introduces a method comprising, at least in one embodiment, positioning a reticle in a reticle carrier having an interior space configured to receive and contain the reticle. The method also includes treating at least a portion of the reticle, an internal surface of the interior space, or both, with a sulfide-absorbing composition. Aspects of this method and others within the scope of the present disclosure may be similarly advantageous relative to the apparatus aspects and advantages described above.

The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions and alterations herein without departing from the spirit and scope of the present disclosure.

Claims

1. A reticle carrier, comprising:

a base portion; and

a cover portion at least partially detachable from the base portion, wherein:

the base portion and the cover portion are configured to collectively house a reticle in a region collectively defined by the base portion and the cover portion when the base portion and the cover portion are fully attached, and

at least a portion of an interior surface of at least one of the base portion and the cover portion is treated with a sulfide-absorbing composition.

2. The reticle carrier of claim 1 wherein the sulfide-absorbing composition at least partially comprises silver.

3. The reticle carrier of claim 1 wherein the at least a portion of an interior surface of each of the base portion and the cover portion is treated with the sulfide-absorbing composition.

4. The reticle carrier of claim 1 wherein the sulfide-absorbing composition is coated on the treated portion of the interior surface.

5. The reticle carrier of claim 1 wherein the sulfide-absorbing composition is implanted into the treated portion of the interior surface.

6. The reticle carrier of claim 1 wherein surfaces defining the region configured to house the reticle are substantially treated with the sulfide-absorbing composition.

7. The reticle carrier of claim 1 wherein at least a portion of an exterior surface of at least one of the base portion and the cover portion is treated with the sulfide-absorbing composition.

8. The reticle carrier of claim 1 wherein a substantial portion of the exterior of the base portion and the cover portion are substantially treated with the sulfide-absorbing composition.

9. The reticle carrier of claim 1 wherein at least a portion of at least one of the base portion and the cover portion substantially comprises an electrostatic dissipative composition.

10. A method, comprising:

positioning a reticle in a reticle carrier, the reticle carrier having an interior space configured to receive and contain the reticle; and

treating at least a portion of one of the reticle and an internal surface of the interior space with a sulfide-absorbing composition.

11. The method of claim 10 wherein the sulfide-absorbing composition at least partially comprises silver.

12. The method of claim 10 wherein treating at least a portion of one of the reticle and the internal surface of the interior space includes coating at least a portion of one of the reticle and the internal surface of the interior space with the sulfide-absorbing composition.

13. The method of claim 10 wherein treating at least a portion of one of the reticle and the internal surface of the interior space includes implanting at least a portion of one of the reticle and the internal surface of the interior space with the sulfide-absorbing composition.

14. The method of claim 10 wherein treating at least a portion of one of the reticle and the internal surface of the interior space includes treating a substantial portion of a surface of the reticle with the sulfide-absorbing composition.

15. The method of claim 10 wherein treating at least a portion of one of the reticle and the internal surface of the interior space includes treating a substantial portion of a surface of a pellicle coupled to the reticle with the sulfide-absorbing composition.

16. The method of claim 10 wherein treating at least a portion of one of the reticle and the internal surface of the interior space includes treating a substantial portion of the internal surface of the interior space with the sulfide-absorbing composition.

17. An apparatus, comprising:

a reticle carrier having an internal region configured to house at least one reticle, wherein the reticle carrier at least partially comprises an electrostatic dissipative composition; and

a sulfide-absorbing member located at least partially within the internal region of the reticle carrier.

18. The apparatus of claim 17 wherein the sulfide-absorbing member is a metallic member having the electrostatic dissipative composition, is integral to the reticle carrier, and at least partially defines the internal region of the reticle carrier.

19. The apparatus of claim 17 wherein the sulfide-absorbing member comprises a non-sulfide-absorbing structure, wherein at least a portion of a surface of the non-sulfide-absorbing structure is coated with a sulfide-absorbing composition.

20. The apparatus of claim 17 wherein the sulfide-absorbing member comprises a non-sulfide-absorbing structure, wherein at least a portion of a surface of the non-sulfide-absorbing structure is implanted with a sulfide-absorbing composition.