MATERIAL TEST STRUCTURE
Material test structures having cantilever portions and methods of forming the same are described herein. As an example, a method of forming a material test structure includes forming a number of electrode portions in a first dielectric material, forming a second dielectric material on the first dielectric material, wherein the second dielectric material includes a first cantilever portion and a second cantilever portion, and forming a test material on the number of electrode portions, the first dielectric material, and the second dielectric material.
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The present disclosure relates generally to material test structures and methods, and more particularly to material test structures having cantilever portions.
BACKGROUNDMemory devices are utilized as non-volatile memory for a wide range of electronic applications in need of high memory densities, high reliability, and data retention without power. Memory devices are typically provided as internal, semiconductor, integrated circuits in computers or other electronic devices. There are many different types of memory, including random-access memory (RAM), read only memory (ROM), dynamic random access memory (DRAM), synchronous dynamic random access memory (SDRAM), flash memory, and resistive memory, among others. Types of resistive memory include phase change random access memory (PCRAM) and resistive random access memory (RRAM), for instance.
Various memory cells, such as resistive memory cells include a resistive storage element whose resistance can be adjusted to represent a number of different data states. For instance, voltage and/or current pulses can be applied to such resistive memory cells to program the resistive storage element to a particular resistance level corresponding to a particular data state, and the particular data state of the cell can be read by determining the resistance level of the resistive storage element, e.g., by sensing a current through the cell responsive to an applied voltage.
As an example, resistive storage elements can include a resistance variable material, such as a phase change material or metal oxide, formed between a pair of electrodes. The properties of a resistance variable material can affect the characteristics of a memory cell comprising the particular resistance variable material. As such, it can be useful to test the properties, e.g., physical and/or electrical properties, of different memory cell materials and/or alloys thereof. However, testing various different memory cell materials without contaminating production tools and/or the memory cell materials themselves can be challenging. In addition, fabrication of test structures used to test different memory cell materials can be time consuming and process intensive.
Material test structures having cantilever portions and methods of forming the same are described herein. As an example, a method of forming a material test structure includes forming a number of electrode portions in a first dielectric material, forming a second dielectric material on the first dielectric material, wherein the second dielectric material includes a first cantilever portion and a second cantilever portion, and forming a test material on the number of electrode portions, the first dielectric material, and the second dielectric material.
Embodiments of the present disclosure can provide material test structures that are isolated, e.g., electrically, from adjacent material test structures. Embodiments of the present disclosure can also include forming the test material on electrodes, which are not affected by further processing after the formation and planarization of the electrodes.
In the following detailed description of the present disclosure, reference is made to the accompanying drawings that form a part hereof, and in which is shown by way of illustration how one or more embodiments of the disclosure may be practiced. These embodiments are described in sufficient detail to enable those of ordinary skill in the art to practice the embodiments of this disclosure, and it is to be understood that other embodiments may be utilized and that process, electrical, and/or structural changes may be made without departing from the scope of the present disclosure.
The figures herein follow a numbering convention in which the first digit or digits correspond to the drawing figure number and the remaining digits identify an element or component in the drawing. Similar elements or components between different figures may be identified by the use of similar digits. For example, 112 may reference element “12” in
The material test structure illustrated in
The material test structure 150 includes a base region 103 comprising a dielectric material 105 formed on a substrate material 101. A number of conductive elements can be formed in dielectric material 105 and can be used to couple other elements of the material test structure 150 to select device 128 and/or other circuitry associated therewith. Source/drain (SAD) regions 129-1 and 129-2 can be formed in substrate material 101 to couple conductive elements to select devices.
The material test structure can include a select device 128 formed on a substrate material 101. The select device 128 may be a field effect transistor, e.g., metal oxide semiconductor field effect transistor (MOSFET), a bipolar junction transistor (BJT) or a diode, among other types of select devices. The select device 128 is coupled to an electrode 120 of material test structure 150 via a conductive element 126. Conductive element 126 is a conductive plug coupling electrode 120 to conductive elements 123 and 125, which is coupled to a SID region 129-1 of select device 128. The conductive elements 123, 125, and 126 can be comprised of tungsten (W), titanium nitride (TiN), tantalum nitride (TaN), tantalum (Ta), and/or copper (Cu), for instance.
In the example illustrated in
Operation of material test structure 150 can include providing voltage differences between electrode 120 and electrode material 124 formed on the test material 122 in order to determine various properties, e.g., physical and electrical characteristics, of the test material 122. The test material structure can be used to determine how the resistance of a test material changes when different voltages are applied to the material test structure 150, for instance.
In a number of embodiments, material test structures can include multiple levels of cantilever portions. The addition of levels of cantilever portions can provide increased likelihood and/or certainty of physical and electrical isolation of a material test structure from other material test structures, for instance.
As shown in
In a number of embodiments, forming the test material 122 and the electrode material 124 on cantilever portions 108, 112, 116, and 118 using a non-conformal process can create noncontiguous portions of the test material 122 and electrode material 124 because the non-conformal process will not form the test material 122 and electrode material 124 on the sidewalls of the dielectric materials 102, 104, and 112. The noncontiguous portions of the test material and electrode material 124 are isolated from other portions of the test material and electrode material that may be associated with an adjacent material test structure.
The material test structure illustrated in
The material test structure 370 includes a base region 303 comprising a dielectric material 305 formed on a substrate material 301. A number of conductive elements can be formed in dielectric material 305 and can be used to couple other elements of the material test structure 370 to select device 328 and/or other circuitry associated therewith.
The material test structure can include a select device 328 formed on a substrate material 301. The select device 328 may be a field effect transistor, e.g., metal oxide semiconductor field effect transistor (MOSFET), a bipolar junction transistor (BJT) or a diode, among other types of select devices. The select device 328 is coupled to an electrode 320 of material test structure 370 via a number of conductive elements 326 and 336. Conductive elements 323, 325, 326, and 336 are conductive plugs coupling electrode 320 to a metallization level 325, which is coupled to a SID region 329-1 of select device 328. The conductive elements 326 and 336 can be comprised of tungsten (W), titanium nitride (TiN), tantalum nitride (TaN), tantalum (Ta), and/or copper (Cu), for instance.
In the example illustrated in
Operation of material test structure 370 can include providing voltage differences between electrode 320 and electrode material 324 formed on the test material 322 in order to determine various properties, e.g., physical and electrical characteristics, of the test material 322. The test material structure can be used to determine how the resistance of a test material changes when different voltages are applied to the material test structure 370.
In a number of embodiments, material test structures can include a number of levels of cantilever portions. The addition of levels of cantilever portions can provide increased likelihood and/or certainty of physical and electrical isolation of a material test structure from other material test structures. Also, the addition of levels of cantilever portions increases the aspect ratio of the conductive elements that are used to couple an electrode to a select device.
The dielectric material 402 formed on base region 403 can be a nitride, such as silicon nitride (Si3N4), for example. In this example, a dielectric material 404 is formed on the dielectric material 402. The dielectric material 404 can be an oxide, such as silicon oxide (SiO2), for example.
In the example shown in
As shown in
In a number of embodiments, forming the test material 322 and the electrode material 324 on cantilever portions 308, 312, 316, and 318 using a non-conformal process can create noncontiguous portions of the test material 322 and electrode material 324 because the non-conformal process will not form the test material 322 and electrode material 324 on the sidewalls of the dielectric material 304 and 312. The noncontiguous portions of the test material and electrode material 324 are isolated from other portions of the test material and electrode material that may be associated with an adjacent material test structure.
As will be appreciated, elements shown in the various embodiments herein can be added, exchanged, and/or eliminated so as to provide a number of additional embodiments of the present disclosure. In addition, the proportion and the relative scale of the elements provided in the figures are intended to illustrate various embodiments of the present invention and are not to be used in a limiting sense.
Although specific embodiments have been illustrated and described herein, those of ordinary skill in the art will appreciate that an arrangement calculated to achieve the same results can be substituted for the specific embodiments shown. This disclosure is intended to cover adaptations or variations of various embodiments of the present disclosure.
It is to be understood that the above description has been made in an illustrative fashion, and not a restrictive one. Combination of the above embodiments, and other embodiments not specifically described herein will be apparent to those of skill in the art upon reviewing the above description. The scope of the various embodiments of the present disclosure includes other applications in which the above structures and methods are used. Therefore, the scope of various embodiments of the present disclosure should be determined with reference to the appended claims, along with the full range of equivalents to which such claims are entitled.
In the foregoing Detailed Description, various features are grouped together in a single embodiment for the purpose of streamlining the disclosure. This method of disclosure is not to be interpreted as reflecting an intention that the disclosed embodiments of the present disclosure have to use more features than are expressly recited in each claim.
Rather, as the following claims reflect, inventive subject matter lies in less than all features of a single disclosed embodiment. Thus, the following claims are hereby incorporated into the Detailed Description, with each claim standing on its own as a separate embodiment.
Claims
1. A method of forming a material test structure, the method comprising:
- forming a number of electrode portions in a first dielectric material;
- forming a second dielectric material on the first dielectric material, wherein the second dielectric material includes a first cantilever portion and a second cantilever portion; and
- forming a test material on the number of electrode portions, the first dielectric material, and the second dielectric material.
2. The method claim 1, wherein the method includes planarizing the number of electrode portions and the first dielectric material prior to forming the test material.
3. The method claim 2, wherein planarizing the number of electrode portions and the first dielectric material includes performing a chemical mechanical planarization (CMP) process.
4. The method of claim 2, wherein the method includes forming a conductive plug that couples one of the number of electrode portions and the test material to a select device.
5. The method claim 1, wherein forming the test material on the number of electrode portions, the first dielectric material, and the second dielectric material includes forming a number of noncontiguous portions of the test material.
6. The method claim 1, wherein method includes forming the test material on the number of electrode portions, the first dielectric material, and the second dielectric material via physical vapor deposition (PVD).
7. The method claim 1, wherein forming the test material includes forming a resistance variable material on the number of electrode portions, the first dielectric material, and the second dielectric material.
8. The method claim 1, wherein the method includes forming an electrode material on the test material.
9. A method of forming a number of material test structures, the method comprising:
- forming a number of electrode portions in one of a number of dielectric materials and planarizing a surface of the number of electrode portions;
- forming a number of openings by removing a number of portions of the number of dielectric materials, wherein forming the number of openings separates the number of material test structures from each other and wherein removing the number of portions of the number of dielectric materials forms a number cantilever portions in the number of dielectric materials; and
- forming a test material on the number of cantilever portions and the number of electrode portions; and
- forming an electrode material on the test material.
10. The method claim 9, wherein forming the test material includes forming a number of portions of the test material on each material test structure that are noncontiguous to the test material of an adjacent material test structure.
11. The method claim 9, wherein removing the number of portions of the dielectric materials includes performing a dry etch process and a wet etch process.
12. The method claim 9, wherein removing the number of portions of the dielectric materials includes forming a number of lateral recessions in the dielectric materials.
13. The method claim 9, wherein the method includes forming the test material on the number of cantilever portions and the number of electrode portions via physical vapor deposition (PVD).
14. The method claim 9, wherein the method includes forming the test material on the number of cantilever portions and the number of electrode portions without further processing of the number of electrode portions after planarization of the surface of the number of electrode portions.
15. A method of forming a material test structure, the method comprising:
- forming a conductive plug in a number of dielectric materials, the plug coupling an electrode to a select device formed in a substrate;
- performing a selective etch to remove a number of portions of the number of dielectric materials such that a number of cantilever portions are formed;
- forming a test material on the number of cantilever portions and the electrode.
16. The method claim 15, wherein the method includes planarizing a surface of the electrode.
17. The method claim 15, wherein the method includes forming the test material via a non-conformal deposition process.
18. The method claim 15, wherein forming the test material includes forming a number of noncontiguous portions of the test material.
19. The method claim 18, wherein the number noncontiguous portions of the test material are physically and electrically isolated from each other.
20. A material test structure, comprising:
- a first dielectric material formed on a second dielectric material, wherein the first dielectric material includes a first cantilever portion and a second cantilever portion;
- a third dielectric material formed on a fourth dielectric material, wherein the third dielectric material includes a third cantilever portion and a fourth cantilever portion;
- a test material formed on the first dielectric material and the third dielectric material, wherein the test material includes a number of noncontiguous portions; and
- an electrode material formed on the test material.
21. The material test structure of claim 20, wherein the test material comprises a resistance variable material.
22. The material test structure of claim 20, wherein the first and third dielectric materials comprise a nitride.
23. The material test structure of claim 20, wherein the second and fourth dielectric materials comprise an oxide.
24. The material test structure of claim 20, wherein the test material is coupled to a select device by a conductive plug.
25. The material test structure of claim 20, wherein a number of first electrode material portions are formed in the third dielectric material.
26. An array of material test structures, comprising:
- a number of material test structures; wherein each of the respective material test structures include a first dielectric material having a first cantilever portion and a second cantilever portion and a second dielectric material having a third cantilever portion and a fourth cantilever portion, wherein a test material is formed on the first, second, third and fourth, cantilever portions, and wherein the test material on the first, second, third, and fourth cantilever portions of each respective material test structure is noncontiguous with the material portion of an adjacent material test structure, such that the number of material test structures are electrically isolated from each other.
27. The array of claim 26, wherein an electrode material is formed on the test material on the first, second, third and fourth, cantilever portions of each respective material test structure.
28. The array of claim 26, wherein the test material comprises a resistance variable material.
Type: Application
Filed: Apr 27, 2012
Publication Date: Oct 31, 2013
Patent Grant number: 8945403
Applicant: MICRON TECHNOLOGY, INC. (Boise, ID)
Inventors: Fabio Pellizzer (Cornate D'adda), Innocenzo Tortorelli (Moncalieri), Christina Papagianni (San Jose, CA), Gianpaolo Spadini (Scotts Valley, CA), Jong Won Lee (San Francisco, CA)
Application Number: 13/458,048
International Classification: G01N 33/00 (20060101); H01B 13/00 (20060101); C23C 16/455 (20060101); B05D 5/12 (20060101);