Fluorine-containing polyimide gas separation membrane and method of manufacturing the same

- Nitto Denko Corporation

A fluorine-containing polyimide gas separation membrane which is pinhole-free, uniform over a large area, and has a high permeability and a high separation factor .alpha. is provided. A polyimide resin is dissolved in at least one solvent selected from the group consisting of an organic solvent (A) or (B). The organic solvent (A) has a dielectric constant of 30 or less and a dipole moment of 3.0 D or less. The organic solvent (B) mainly contains an organic solvent having at least one ether bonding in the molecular unit. In the next step, the polyimide resin is dipped in a solvent (C) in order for desolvation. The solvent (C) does not dissolve the fluorine-containing polyimide resin while it is miscible with the organic solvent (A) or (B). As a result, an asymmetric gas separation membrane is formed. The fluorine-containing polyimide resin layer comprises a skin layer the thickness L.sub.1 thereof is about 40 nm and a sponge like layer the thickness L.sub.2 thereof is about 30 .mu.m. The membrane is formed on a supporter of, for example, a nonwoven cloth.

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Claims

1. A fluorine-containing polyimide gas separation membrane, comprising a sponge-like layer of solvent-soluble fluorine-containing polyimide resin and a skin layer on the sponge-like layer, the membrane being at least 0.5 m.sup.2 in area, the skin layer having an average thickness ranging from 1 to 100 nm, the permeability of the membrane for CO.sub.2 gas ranging from 0.01 to 50 Nm.sup.3 /m.sup.2 /h/atm, the separation factor.alpha. for the membrane for CO.sub.2 /methane ranging from 15-60, the sponge-like layer being free from void parts having a diameter of more than one micron.

2. The fluorine-containing polyimide gas separation membrane according to claim 1, which is in the shape of a tube membrane, a hollow membrane, or a membrane formed on a gas permeable supporter.

3. The fluorine-containing polyimide gas separation membrane according to claim 1, wherein the solvent-soluble fluorine-containing polyimide resin is at least a resin selected from fluorine-containing polyimide resins having at least three fluorine atoms and at least one --SO.sub.2 -- part in the repeating molecular unit which composes the polyimide resin layer.

4. The fluorine-containing polyimide gas separation membrane according to claim 1, which has at least one --CF.sub.3 group in the repeating molecular unit which composes the fluorine-containing polyimide resin.

5. The fluorine-containing polyimide gas separation membrane according to claim 1, wherein the main component of the fluorine-containing polyimide resin is substantially the repeating unit expressed as at least one formula selected from the group consisting of Formulas (2), (3), (4), (5), (6), (7) and (8): ##STR16## where R.sub.3 -R.sub.6 indicate hydrogen, hydrocarbon groups having from one to four carbons, halogen, hydroxyl groups, carboxylic acid groups, carboxylic acid ion groups, sulfonic groups, sulfonic ion groups, amino groups, nitrile groups, nitro groups, or isocyanate groups; ##STR17## where the bonding position of the benzene ring is either ortho position or meta position; ##STR18## where X indicates ##STR19## and R.sub.1 and R.sub.2 represent hydrogen or hydrocarbon groups from one to four carbons ##STR20##

6. The fluorine-containing polyimide gas separation membrane according to claim 1, further comprising a protective film of elastomer polymer.

7. The fluorine-containing polyimide gas separation membrane according to claim 6, said protective film of elastomer polymer is a membrane of crosslinked silicone resin.

8. The fluorine-containing polyimide gas separation membrane according to claim 1, wherein the fluorine-containing polyimide resin thereof mainly comprises a repeating unit shown in Formula (1), where A.sub.1 -A.sub.n indicate at least one tetravalent organic group selected from the group consisting of aromatic, aliphatic and alicyclic hydrocarbon groups, R.sub.1 -R.sub.n indicate divalent aromatic, aliphatic or alicyclic hydrocarbon groups or a divalent organic group of these hydrocarbon groups bonded by a divalent organic bonding group, and at least one of the organic groups of said A.sub.1 -A.sub.n is an organic group having at least three fluorine atoms while at least one of said organic groups of R.sub.1 -R.sub.n indicate either --SO.sub.2 --, a divalent organic group located in ortho position or meta position, or at least two ether bonding groups, where n.sub.1, n.sub.2... n.sub.x indicate the composition ratio of the repeating unit and n.sub.1 +n.sub.2... +n.sub.x =1 ##STR21##

9. A method of manufacturing a fluorine-containing polyimide gas separation membrane that comprises a sponge-like layer of solvent-soluble fluorine-containing polyimide resin and a skin layer formed thereon, the method comprising:

dissolving the polyimide resin in a first solvent comprising as a main component at least one selected from the group consisting of diethylene glycol dimethyl ether, diethylene glycol diethyl ether and mixtures thereof; and
desolvating the polyimide resin by exposing the dissolved polyimide resin to a second solvent (C) that dissolves in the first solvent but does not dissolve the fluorine-containing polyimide resin.

10. The method of manufacturing a fluorine-containing polyamide gas separation membrane according to claim 9, wherein the solvent (C) is at least one solution selected from the group consisting of water, alcohols and the mixed solvent thereof.

11. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 9, wherein the gas separation membrane is at least one membrane selected from the group consisting of tubular membrane, hollow membrane or a membrane formed on a gas permeable supporter.

12. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 9, wherein the solvent-soluble fluorine-containing polyimide resin is at least one resin selected from the group consisting of fluorine-containing polyimide resins having at least three fluorine atoms and at least one --SO.sub.2 -- part in the repeating molecular unit composing the polyimide resin layer.

13. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 9, wherein the repeating molecular unit composing the fluorine-containing polyimide resin comprises at least one --CF.sub.3 group.

14. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 9, wherein the fluorine-containing polyimide resin mainly contains a repeating unit expressed as at least one formula selected from the following formulas: ##STR22## where R.sub.3 -R.sub.6 indicate hydrogen, hydrocarbon groups having from one to four carbons, halogen, hydroxyl groups, carboxylic acid groups, carboxylic acid ion groups, sulfonic groups, sulfonic ion groups, amino groups, nitrile groups, nitro groups, or isocyanate groups; ##STR23## where the bonding position of the benzene ring is either ortho position or meta position; ##STR24## where X indicates ##STR25## R.sub.1 and R2 represent hydrogen or hydrocarbon groups having from one to four carbons ##STR26##

15. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 9, wherein the sponge like layer has no void parts of more than 1.mu.m in diameter.

16. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 9, wherein a protective film of elastomer polymer is further formed on the fluorine-containing polyimide gas separation membrane.

17. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 16, wherein the protective film of elastomer polymer is prepared by crosslinking a croslinked silicone resin.

18. The method of manufacturing a fluorine-containing polyimide gas separation membrane according to claim 9, wherein the fluorine-containing polyimide resin contains mainly the repeating unit substantially expressed as Formula (9), where A.sub.1 -A.sub.n indicate at least one tetravalent organic group selected from the group consisting of aromatic, alicyclic and aliphatic hydrocarbon groups, R.sub.1 -R.sub.n indicate divalent aromatic, alicyclic or aliphatic hydrocarbon groups or a divalent group where said hydrocarbon groups are bonded by divalent organic groups; at least one organic group of said A.sub.1 -A.sub.n is an organic group having at least three fluorine atoms, and at least one organic group of R.sub.1 -R.sub.n is at least one group selected from the groups consisting of --SO.sub.2 -- bonding groups, divalent organic groups at ortho position or meta position, and at least two ether bonding groups, where n.sub.1, n.sub.2... n.sub.x indicate the composition ratio of the repeating unit and n.sub.1 +n.sub.2 +... +n.sub.x =1 ##STR27##

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Patent History
Patent number: 5817165
Type: Grant
Filed: Jun 13, 1996
Date of Patent: Oct 6, 1998
Assignee: Nitto Denko Corporation (Osaka)
Inventors: Hisao Hachisuka (Kyoto), Masatoshi Maeda (Osaka), Kenichi Ikeda (Shiga)
Primary Examiner: Robert Spitzer
Law Firm: Merchant, Gould, Smith, Edell, Welter & Schmidt, P.A.
Application Number: 8/663,509