Attracting plate of an electrostatic chuck for semiconductor manufacturing

- Tokyo Electron Limited
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Description

FIG. 1 is a front elevational view of an attracting plate of an electrostatic chuck for semiconductor manufacturing, or the like, showing my new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a top plan view thereof, the bottom plan view being a mirror image of the plan view shown;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof; and,

FIG. 6 is a bottom, rear and lower perspective view thereof.

The broken line showing in the figures is for illustrative purposes only and forms no part of the claimed design.

Claims

The ornamental design for an attracting plate of an electrostatic chuck for semiconductor manufacturing, as shown and described.

Referenced Cited
U.S. Patent Documents
5671116 September 23, 1997 Husain
6278600 August 21, 2001 Shamouilian et al.
D546784 July 17, 2007 Hayashi
D548200 August 7, 2007 Hayashi
D548705 August 14, 2007 Hayashi
20040212947 October 28, 2004 Nguyen et al.
20050252447 November 17, 2005 Zhao et al.
20060002053 January 5, 2006 Brown et al.
20060221539 October 5, 2006 Morita et al.
Patent History
Patent number: D570310
Type: Grant
Filed: Feb 1, 2007
Date of Patent: Jun 3, 2008
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Yasuharu Sasaki (Nirasaki)
Primary Examiner: Selina Sikder
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Application Number: 29/276,679