Heater for semiconductor manufacturing

- Tokyo Electron Limited
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FIG. 1 is an enlarged front elevation view of a heater for semiconductor manufacturing showing our new design;

FIG. 2 is an enlarged left side elevation view, the right side being a mirror image thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is an enlarged top plan view of the area 55 shown in FIG. 3; and,

FIG. 6 is an enlarged bottom plan view of the area 66 shown in FIG. 4.

The broken lines shown in the figures are for illustrative purposes only and form no part of the claimed design.


The ornamental design for a heater for semiconductor manufacturing, as shown and described.

Referenced Cited
U.S. Patent Documents
5408071 April 18, 1995 Ragland et al.
5575941 November 19, 1996 Johnson
D424025 May 2, 2000 Mori
6061500 May 9, 2000 Su
6407371 June 18, 2002 Toya et al.
7311520 December 25, 2007 Saito et al.
Foreign Patent Documents
D1191934 December 2003 JP
Patent History
Patent number: D604257
Type: Grant
Filed: Apr 27, 2006
Date of Patent: Nov 17, 2009
Assignees: Tokyo Electron Limited (Tokyo), Toshiba Ceramics Co., Ltd. (Tokyo)
Inventors: Yasuhiro Inatomi (Tokyo), Kenichi Yamaga (Tokyo), Hiroyuki Honma (Tokyo)
Primary Examiner: Selina Sikder
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
Application Number: 29/258,749