Process tube for manufacturing semiconductor wafers

- Tokyo Electron Limited
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Description

FIG. 1 is a perspective view of the design for a process tube for manufacturing semiconductor wafers in accordance with the invention;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof;

FIG. 8 is a sectional view through line 88 of FIG. 6;

FIG. 9 is an enlarged detailed top plan view of the portion of the process tube in the rectangle shown in FIG. 8; and,

FIG. 10 is an enlarged detailed sectional view taken along line 88 in FIG. 6 of the portion of the process tube in the rectangle shown in FIG. 8.

Environmental structure, which forms no part of the claimed design, is illustrated in broken lines.

The design is a type of process tube for decompression (vacuum) equipment.

Claims

The ornamental design for a process tube for manufacturing semiconductor wafers, as shown and described.

Referenced Cited
U.S. Patent Documents
5037502 August 6, 1991 Suzuki et al.
5618349 April 8, 1997 Yuuki
D405062 February 2, 1999 Shimazu
D406113 February 23, 1999 Hanagata et al.
D409490 May 11, 1999 Page
5948300 September 7, 1999 Gero et al.
D415027 October 12, 1999 Blazar
D442864 May 29, 2001 Davies
D473788 April 29, 2003 Chen et al.
D495600 September 7, 2004 Kouri
D510524 October 11, 2005 Houk et al.
D521464 May 23, 2006 Ishii et al.
D558419 December 25, 2007 Zychlinski
D562684 February 26, 2008 Brashear
D595913 July 7, 2009 Traxler
Patent History
Patent number: D619630
Type: Grant
Filed: Nov 8, 2007
Date of Patent: Jul 13, 2010
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Hirofumi Kaneko (Iwate)
Primary Examiner: Sandra Snapp
Assistant Examiner: Patricia Palasik
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/290,247
Classifications
Current U.S. Class: Element Or Attachment (D15/138)