Process tube for semiconductor device manufacturing apparatus

Description

FIG. 1 is an isometric view of a process tube for semiconductor device manufacturing apparatus of the present invention;

FIG. 2 is a front view thereof;

FIG. 3 is a left side view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a top view thereof;

FIG. 6 is a bottom view thereof;

FIG. 7 is a sectional view along line 7—7 shown in FIG. 5;

FIG. 8 is a sectional view along line 8—8 shown in FIG. 7;

FIG. 9 is a sectional view along line 9—9 shown in FIG. 5;

FIG. 10 is a sectional view along line 10—10 shown in FIG. 5; and,

FIG. 11 is a sectional view along line 11—11 shown in FIG. 5.

A rear view is not shown as the rear view is a mirror image of the front view shown in FIG. 2.

Claims

The ornamental design for a process tube for semiconductor device manufacturing apparatus, as shown and described.