Deposition ring for physical vapor deposition chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a perspective view of a deposition ring for a physical vapor deposition chamber, according to the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation view thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a left side elevation view thereof.

FIG. 7 is a right side elevation view thereof.

FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2.

FIG. 9 is a perspective view of a deposition ring for a physical vapor deposition chamber, according to the novel design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a front elevation view thereof.

FIG. 13 is a back elevation view thereof.

FIG. 14 is a left side elevation view thereof.

FIG. 15 is a right side elevation view thereof; and,

FIG. 16 is a cross-sectional view taken along line 16-16 in FIG. 10.

The dashed lines in FIGS. 9-16 represent unclaimed environment forming no part of the claimed design.

Claims

The ornamental design for a deposition ring for a physical vapor deposition chamber, as shown and described.

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Patent History
Patent number: D888903
Type: Grant
Filed: Dec 17, 2018
Date of Patent: Jun 30, 2020
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: David Gunther (San Jose, CA), Cheng-Hsiung Tsai (Cupertino, CA), Kirankumar Neelasandra Savandaiah (Bangalore)
Primary Examiner: Amy C Wierenga
Application Number: 29/673,685
Classifications