Gas supply nozzle for substrate processing apparatus
Latest KOKUSAI ELECTRIC CORPORATION Patents:
- METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
- Method of forming film, method of manufacturing semiconductor device, film forming apparatus, and recording medium
- Semiconductor device
- SUBSTRATE PROCESSING APPARATUS, SWITCHING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
- METHOD OF FORMING FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, FILM FORMATION APPARATUS, AND RECORDING MEDIUM
Description
Claims
We claim the ornamental design for a gas supply nozzle for substrate processing apparatus, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
| 45556 | December 1864 | Cocker |
| 3484122 | December 1969 | Sanders |
| D620085 | July 20, 2010 | Okada |
| D675298 | January 29, 2013 | Gridley |
| D720051 | December 23, 2014 | Dole |
| D818509 | May 22, 2018 | Miyazaki |
| D827150 | August 28, 2018 | Nakagawa |
| D828091 | September 11, 2018 | Fujino |
| D872843 | January 14, 2020 | Stoffa, Sr. |
| D873392 | January 21, 2020 | Hruschak |
| 20100264646 | October 21, 2010 | Follini |
| 20170152984 | June 1, 2017 | Dole |
| 1563647 | November 2016 | JP |
Patent History
Patent number: D890572
Type: Grant
Filed: Dec 7, 2018
Date of Patent: Jul 21, 2020
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Koji Saiki (Toyama), Makoto Tsuri (Toyama)
Primary Examiner: Derrick E Holland
Assistant Examiner: Andrew Kerr
Application Number: 29/672,652
Type: Grant
Filed: Dec 7, 2018
Date of Patent: Jul 21, 2020
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Koji Saiki (Toyama), Makoto Tsuri (Toyama)
Primary Examiner: Derrick E Holland
Assistant Examiner: Andrew Kerr
Application Number: 29/672,652
Classifications
Current U.S. Class:
D7/407;
Dispersal (i.e., Sprayer, Fogger, Nozzle, Aerator, Etc.) (4) (D23/213)