Gas supply nozzle for substrate processing apparatus

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Description

FIG. 1 is a front, top and right side perspective view of a gas supply nozzle for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross-sectional view take along line 8-8 in FIG. 5.

Claims

We claim the ornamental design for a gas supply nozzle for substrate processing apparatus, as shown and described.

Referenced Cited
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Foreign Patent Documents
1563647 November 2016 JP
Patent History
Patent number: D890572
Type: Grant
Filed: Dec 7, 2018
Date of Patent: Jul 21, 2020
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Koji Saiki (Toyama), Makoto Tsuri (Toyama)
Primary Examiner: Derrick E Holland
Assistant Examiner: Andrew Kerr
Application Number: 29/672,652