Gas inlet attachment for substrate processing apparatus
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Description
FIG, 5 is a right side elevational view thereof;
Claims
I claim the ornamental design for a gas inlet attachment for substrate processing apparatus, as shown and described.
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Patent History
Patent number: D924953
Type: Grant
Filed: Dec 4, 2018
Date of Patent: Jul 13, 2021
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Hironori Shimada (Toyama)
Primary Examiner: Selina Sikder
Application Number: 29/672,229
Type: Grant
Filed: Dec 4, 2018
Date of Patent: Jul 13, 2021
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Hironori Shimada (Toyama)
Primary Examiner: Selina Sikder
Application Number: 29/672,229
Classifications