Gas inlet attachment for substrate processing apparatus

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Description

FIG. 1 is a front, top and left side perspective view of a gas inlet attachment for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof; and,

FIG. 4 is a left side elevational view thereof;

FIG, 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross-sectional view take along line 8-8 in Fig.4.

Claims

I claim the ornamental design for a gas inlet attachment for substrate processing apparatus, as shown and described.

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Patent History
Patent number: D924953
Type: Grant
Filed: Dec 4, 2018
Date of Patent: Jul 13, 2021
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventor: Hironori Shimada (Toyama)
Primary Examiner: Selina Sikder
Application Number: 29/672,229