Gas inlet attachment for wafer processing apparatus

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Description

FIG. 1 is a front, top and right side perspective view of a gas inlet attachment for wafer processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.

Claims

The ornamental design for a gas inlet attachment for wafer processing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
D326272 May 19, 1992 Nakao
D326273 May 19, 1992 Nakao
D787458 May 23, 2017 Kim
D796458 September 5, 2017 Jang
10364493 July 30, 2019 Lee
20040217217 November 4, 2004 Han
20070131168 June 14, 2007 Gomi
20080092815 April 24, 2008 Chen
20100243166 September 30, 2010 Hayashi
20110098841 April 28, 2011 Tsuda
20150240359 August 27, 2015 Jdira
20150348755 December 3, 2015 Han
20170051408 February 23, 2017 Takagi
20180087152 March 29, 2018 Yoshida
20180087156 March 29, 2018 Fukushima
20180135173 May 17, 2018 Kim
20180135179 May 17, 2018 Ikeuchi
Patent History
Patent number: D901564
Type: Grant
Filed: Jul 26, 2019
Date of Patent: Nov 10, 2020
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Satoru Murata (Toyama), Shinya Morita (Toyama)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/699,539