Compounds and infrared devices including stoichiometric semiconductor compounds of indium, thallium, and including at least one of arsenic and phosphorus

- S.R.I. International

A semiconductor layer of In.sub.1-x Tl.sub.x Q carried on a substrate forms an infrared device, where Q is selected from the group consisting essentially of As.sub.1-y P.sub.y and 0<x<1, 0<y<1.

Skip to:  ·  Claims  ·  References Cited  · Patent History  ·  Patent History

Claims

2. The device of claim 1 where y=1.

3. The device of claim 2 where x=0.67.

4. The device of claim 2 where x=0.57.

5. The device of claim 1 where x=0.24.

6. The device of claim 2 wherein the layer is formed on the substrate and the substrate portion on which the layer is formed consists essentially of InP.

7. The device of claim 6 wherein the layer is doped to have a first conductivity polarization.

8. The device of claim 7 wherein another layer of In.sub.1-x Tl.sub.x P having the second conductivity polarization is formed on the layer having the first polarization to form a p-n homojunction.

9. The device of claim 1 wherein y=0.

10. The device of claim 9 wherein x=0.15.

11. The device of claim 10 wherein the layer is formed on the substrate and the substrate portion on which the layer is formed consists essentially of InAs.

12. The device of claim 1 wherein the layer is doped to have a first conductivity polarization, and a second layer having substantially the same compound as the layer having the first conductivity polarization contacting the first conductivity polarization layer to form a p-n homojunction, the second layer being doped to have a second conductivity polarization.

13. The device of claim 1 wherein the layer is formed on the substrate and the substrate portion on which the layer is formed consists essentially of InQ, the layer and substrate having substantially the same lattice constants.

14. The device of claim 13 where y=1.

15. The device of claim 13 where y=0.

16. The device of claim 13 where 0<y<1.

17. The device of claim 1 where 0<y<1.

18. The device of claim 1 wherein the device is a detector and the substrate includes a second layer of In.sub.1-z Tl.sub.z Q, where z is less than x, the second layer being positioned above the In.sub.1-x Tl.sub.x Q layer so certain optical radiation wavelengths incident on the second layer pass through the second layer and are absorbed by the In.sub.1-x Tl.sub.x Q layer and other optical radiation wavelengths incident on the second layer are absorbed thereby.

19. The device of claim 18 where y=1, x=0.67, z=0.57.

20. The device of claim 1 where y=1, x=0.24.

21. The device of claim 1 further including an ohmic contact on the layer.

22. In In.sub.1-x Tl.sub.x Q, where Q is selected from the group consisting essentially of As.sub.1-y P.sub.y and 0<x<1, 0.ltoreq.y.ltoreq.1.

23. The composition of claim 22 where y=0.

24. The composition of claim 22 where y=1.

25. The composition of claim 22 where 0<y<1..Iadd.

26. A stoichiometric semiconductor compound comprising the elements In, Tl, and including at least one of the elements of As and P, wherein the compound is stoichiometric with respect to at least three of said elements..Iaddend..Iadd.

27. The stoichiometric semiconductor compound of claim 26 wherein the compound is stoichiometric with respect to four elements including at least three of said four elements..Iaddend..Iadd.28. The stoichiometric semiconductor compound of claim 27 wherein the compound includes dopants.

.Iaddend..Iadd.29. The stoichiometric semiconductor compound of claim 26 wherein the compound is an alloy including at least three of said elements

in a zinc blende structure..Iaddend..Iadd.30. The stoichiometric semiconductor compound of claim 26 wherein the compound is stoichiometric with respect to four elements, including said four elements.

.Iaddend..Iadd.31. An infrared detector or emitter device comprising a substrate, and a semiconductor layer carried by the substrate, the layer including a stoichiometric semiconductor compound comprising the elements In, Tl, and including at least one of the elements of As and P, wherein the compound is stoichiometric with respect to at least three of said

elements carried by the substrate..Iaddend..Iadd.32. The infrared detector or emitter device of claim 31 wherein the compound is stoichiometric with respect to four elements, including at least three of said four elements..Iaddend..Iadd.33. The infrared detector or emitter device of claim 32 wherein the compound includes dopants.

.Iaddend..Iadd.. The infrared detector or emitter device of claim 31 wherein the compound is stoichiometric with respect to four elements, including said four elements.

Referenced Cited
U.S. Patent Documents
RE29009 October 26, 1976 Jeffers
3632431 January 1972 Andre et al.
3805601 April 1974 Jeffers
3849874 November 1974 Jeffers
3875451 April 1975 Bachmann et al.
3929970 December 1975 Isaacs et al.
4291323 September 22, 1981 Bachmann
4622845 November 18, 1986 Ryan et al.
4723448 February 9, 1988 Veligdan
4955699 September 11, 1990 Singh et al.
5410178 April 25, 1995 Razeghi
5449930 September 12, 1995 Zhou
Foreign Patent Documents
2127219 April 1984 GBX
Other references
  • Schilfgaarde et al., "InTISb: An Infrared Detector Material?", Appl. Phys. Lett., vol. 62, No. 16, 1993, pp. 1857-1859. Razeghi et al., "In.sub.1-x TI.sub.x Sb for Long-Wavelength Infrared Photodetectors", The Electrochemical Society, 184th Meeting, New Orleans, Louisiana, Oct. 10-15, 1993. Choi et al., "Characterization of InTISb/InSb Grown by Low-Pressure Metal-Organic Chemical Vapor Deposition on a GaAs Substrate", J.Appl.Phys., vol. 75, No. 6, 1994, pp. 3196-3198. Liao et al., "Electronic Structure of the III-V Tetramer Clusters and Their Positive Ions", Journal of Chemical Physics, 1992, vol. 96, No. 12, pp. 8938-8947. Fung, "Convergent Beam Electron Diffraction Study of Semiconductor Superlattices and High Tc Superconducting Oxides", Application of Electron Microscopy to Materials Science, Held: Gauonzhou, China, Aug. 7-9, 1988, Diffusion and Defect Data-Solid State Data, Part B, (Solid State Phenomena), 1989, vol. B5, pp. 85-101. Finch et al., "Noise Characterization Mode-Locked Laser Sources Using High-Speed InGaAs Photodetectors", IEE Colloquium on `Applications of Ultrashort Pulses for Optoelectronics`, (Digest No. 87), Held: London, UK, May 26, 1989, (Abstract Only). Karimov et al., "Thermoelectric Properties of TIPse", Inorganic Materials, 1988, vol. 24, No. 3, pp. 406-408. Choi, Growth and Characterization of InSb and InTISb for Long Wavelength Infrared Detector Applications, doctoral thesis, Northwestern University, Nov. 1993. Staveteig et al., Photoconductance measurements on InTISb/InSb/GaAs grown by low-pressure metalorganic chemical vapor deposition, Appl. Phys. Lett 64(4), Jan. 24, 1994, pp. 460-462. Razeghi et al., Growth of InTISb for Long-Wavelength Infrared Detector Applications, Center for Quantum Devices, Northwestern University, Jun. 1994. Bliss et al., Phosphorus-rich InP Grown by a One Step In-situ MLEK Crystal Growth Process, 5th International Conference in InP and Related Materials (No Date). Zach et al., Determination of Fe.sup.2+ and Fe.sup.3+ Concentrations in Semi-insulating InP:Fe, 4th International Conference on InP and Related Materials, pp. 638-640, Apr. 21-24, 1992. Carlson et al., Near Infrared Microscopy for the Determination of Dopant Distributions and Segregation in N-Type/InP, Fourth International Conference on InP and Related Materials, Apr. 21-24, 1992, pp. 515-517. Nosov, V.B., et al. "Calorimetric measurements of the volume and surface absorption of IR materials in 5-6 .mu.m spectral region," Soviet Journal of Optical Technology Apr. 1989, vol. 56, No. 4, pp. 238-240. Bliss et al., In-Situ Synthesis and Crystal Growth of High Purity InP, 4th Int. Conf. on InP and Related Materials, Apr. 21-24, 1992, pp. 262-265. Bliss et al., MLEK Crystal Growth of Large Diameter (100) Indium Phosphate, Journal of Crystal Growth, 128 (1993), pp. 451-456.
Patent History
Patent number: RE36315
Type: Grant
Filed: Apr 17, 1997
Date of Patent: Sep 28, 1999
Assignee: S.R.I. International (Menlo Park, CA)
Inventors: An-Ban Chen (Auburn, AL), Arden Sher (San Carlos, CA), Mark van Schilfgaarde (Palo Alto, CA)
Primary Examiner: Constantine Hannaher
Law Firm: Lowe Hauptman Gopstein Gilman & Berner
Application Number: 8/839,835
Classifications
Current U.S. Class: Layer Is A Group Iii-v Semiconductor Compound (257/189); 250/3384; 250/37012; 250/4931; Group Iii-v Compound (e.g., Inp) (257/615); Phosphorus Or Compound Thereof (423/299)
International Classification: H01L 29205;